低温下Si(111)和Ge(111)切割表面的一些性质

V.A. Grazhulis, V.F. Kuleshov
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引用次数: 2

摘要

介绍了在超高真空(~ 10-10 Torr)、液态N2和液态He条件下晶体解理制备Ge(111)和Si(111)表面的低温实验结果,并进行了简要讨论。对其中的一些结果进行了重新分析,并提出了新的解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Some properties of Si(111) and Ge(111) cleaved surfaces at low temperatures

Low-temperature experimental results on Ge(111) and Si(111) surfaces prepared by crystal cleavage in ultra-high vacuum (∼ 10-10 Torr), liquid N2, and liquid He are presented and briefly discussed. Some of these results are reanalyzed and new interpretations are suggested.

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