Applications of Surface Science最新文献_第9页

A rigorous diffraction theory for the optical properties of black chrome 黑铬光学性质的严格衍射理论

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90214-4

G.B. Smith, G.H. Derrick, R.C. McPhedran

引用次数: 1

Two-process model of PSEE from scratched metals 刮伤金属PSEE的两过程模型

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90068-6

Hidemi Shigekawa, Shin-ichi Hyodo

{"title":"Two-process model of PSEE from scratched metals","authors":"Hidemi Shigekawa, Shin-ichi Hyodo","doi":"10.1016/0378-5963(85)90068-6","DOIUrl":"10.1016/0378-5963(85)90068-6","url":null,"abstract":"<div><p>When photoillumination is interrupted, the exoelectron emission from scratched metal samples decays quickly. When the illumination is resumed, however, the recovered exoelectron emission shoots up to a value significantly higher than before and then decreases gradually - a fact overlooked by previous researchers. To explain this “storage effect” in PSEE (photo- stimulated exoelectron emission), the authors have proposed a model, according to which there are two excitation processes competing during PSEE; one is the photoexcitation of the electrons at energy levels within the band gap of surface oxide layers, and the other is the tunneling transition of electrons in bulk metals to occupy the vacant levels of the oxide layers. From the rate equations based on this model and also from the PSEE data obtained for scratched aluminum and zinc, three kinds of quantities, i.e., the number of exo-active sites, the emission rate from the sites and the rate of activating exo-inactive sites, are successfully estimated. Other PSEE phenomena such as the peculiar emission intensity versus time profiles can also be elucidated in view of this model.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 361-368"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90068-6","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81846031","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Charge state fractions of sputtered Ni 溅射镍的电荷态分数

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90045-5

H.-J. Barth, E. Mühling, W. Eckstein

引用次数: 1

The growth mode of Cu overlayers on Pd(100) Pd(100)上Cu覆层的生长方式

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90186-2

H. Asonen, C. Barnes, A. Salokatve, A. Vuoristo

引用次数: 16

Improvement in the adhesion of thin films to semiconductors and oxides using electron and photon irradiation 利用电子和光子辐照改善薄膜对半导体和氧化物的附着力

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90238-7

J. Gazecki, G.A. Sai-Halasz , R.G. Elliman , A. Kellock, G.L. Nyberg, J.S. Williams

{"title":"Improvement in the adhesion of thin films to semiconductors and oxides using electron and photon irradiation","authors":"J. Gazecki, G.A. Sai-Halasz , R.G. Elliman , A. Kellock, G.L. Nyberg, J.S. Williams","doi":"10.1016/0378-5963(85)90238-7","DOIUrl":"10.1016/0378-5963(85)90238-7","url":null,"abstract":"<div><p>The adhesion enhancement of evaporated metal films on silicon and silicon dioxide substrates following electron and photon irradiation has been investigated. It is shown that an electric field applied across the metal-oxide-semiconductor interface during electron irradiation has a dramatic influence on adhesion enhancement. For photon irradiation, comparative adhesion measurements were undertaken as a function of increasing metal film thickness and different irradiation doses, for photon energies <4, <6 and 10.2 eV. Metal-oxide-semiconductor structures were also biased during photon irradiation to indicate the role of secondary processes such as charge flow to the interface from the oxide. Results indicate that adhesion enhancement can be significant even if the metal film thickness exceeds the photon penetration depth, supporting the view that low-energy secondary excitations are responsible for the stronger bonding configurations. It was also concluded that both electron and photon irradiation give rise not only to increased adhesion but also to increased cohesion within the metal film.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 1034-1041"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90238-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89210542","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 18

Characteristics of moisture-sensitive Ta2O5/TiO2 ceramic films 水敏Ta2O5/TiO2陶瓷膜的特性

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90216-8

Tatsuo Yamamoto, Hiromi Shimizu

引用次数: 0

Effect of hydrogen pressure on the deposition of amorphous silicon films by tetrode RF sputtering 氢压力对四极射频溅射沉积非晶硅薄膜的影响

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90222-3

Yasuo Gekka, Hiroshi Asai, Tsuyoshi Temma, Yoh-ichi Yasumura

引用次数: 3

Destructive and non-destructive depth profiling using ESCA 使用ESCA进行破坏性和非破坏性深度剖面分析

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90062-5

K.L. Smith, J.S. Hammond

{"title":"Destructive and non-destructive depth profiling using ESCA","authors":"K.L. Smith, J.S. Hammond","doi":"10.1016/0378-5963(85)90062-5","DOIUrl":"10.1016/0378-5963(85)90062-5","url":null,"abstract":"<div><p>While the chemical analysis of a surface has become commonplace using a variety of techniques including Auger Electron Spectroscopy (AES) and Electron Spectroscopy for Chemical Analysis (ESCA), it is often advantageous to differentiate between the chemistry of the surface and the near surface. The method used to make this distinction depends on the thickness of the layers to be differentiated. If the combined thickness of the layers is greater than 100 Å, then the surface must be physically removed by ion bombardment before the subsurface components can be identified. An example of the chemistry revealed by this method is given in a sputter profile of an eight layer, 3000 Å, metal magnetic tape. The internal interfaces show more oxidation than the bulk of the metal layers. If the combined thickness of the layers is less than 100 Å, then the surface and subsurface components can be identified by non-destructive techniques. This is accomplished by using high energy excitation or by angle resolved studies. Examples will be shown of the change in the surface and near surface chemistry of polystyrene as it is treated in H<sub>2</sub> and H<sub>2</sub>O plasmas. The degree of oxidation of the polymer surface can be monitored as a function of reaction depth using angle resolved ESCA. Extending the range of angle resolved studies by using Au Mα X-rays is shown for a native oxide on silicon.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 288-298"},"PeriodicalIF":0.0,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90062-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88040074","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Comparison of properties of thin films of CuInSe2 and its alloys produced by evaporation, RF-sputtering and chemical spray pyrolysis 蒸发、射频溅射和化学喷雾热解制备CuInSe2薄膜及其合金的性能比较

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90197-7

J.J. Loferski, C. Case, M. Kwietniak , P.M. Sarro , L. Castaner , R. Beaulieu

引用次数: 8

Determination of tunneling transmission probability through thin oxide layer in a tunnel MIS system 隧道MIS系统中薄氧化层隧穿传输概率的测定

Applications of Surface Science Pub Date : 1985-05-01 DOI: 10.1016/0378-5963(85)90235-1

A.G. Nassibian, A.K. Duong

引用次数: 2