Advances in x-ray analysis最新文献

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Analysis of Residual Stress States in Coarse Grained and Single Crystal Nickel-Base Superalloys 粗晶和单晶镍基高温合金残余应力状态分析
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022618
W. Reimers
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引用次数: 2
Refined Determination of the Structure of Kerogen Etc. by Xrd and its Significance 用Xrd精细化测定干酪根等的结构及其意义
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022977
Wei Mingxin, Liu Delian, Cheng Deyu, Wang Guan-xin
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引用次数: 0
Determination of Thickness and Composition of Thin AlxGa1-xAs Films on GaAs substrates by Total Electron Yield (Tey) Measurements 用总电子产额(Tey)测定GaAs衬底上AlxGa1-xAs薄膜的厚度和组成
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023120
H. Ebel, R. Svagera, M. Ebel, N. Zagler
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引用次数: 0
Sample Curvature Effects on d-versus-sin2ѱ plots for Residual Stress Analysis 样品曲率对残余应力分析d- vs - sin2<e:1>图的影响
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022692
A. Ward, H. Allison, Brian Zimmerman, R. Hendricks
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引用次数: 0
Assessing the Validity of Diffraction Stress Data with the Goodness-Of-Fit Statistic 用拟合优度统计评价衍射应力数据的有效性
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022680
Thomas A. Lohkamp, R. A. Winhoitz
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引用次数: 2
Comparison of Various Descriptions of X-Ray Tube Spectra x射线管光谱各种描述的比较
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022539
B. Schossmann, H. Wiederschwinger, H. Ebel, J. Wernisch
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引用次数: 5
Depth profiling by Xrf with Variable Beam Geometry Applied to Thin Films in the Nanometer Region 可变光束几何形状的Xrf深度剖面在纳米区域薄膜中的应用
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023119
H. Ebel, R. Svagera, Robert Hobl, W. Kugler, Hung D Nguyen
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引用次数: 0
New Tools for Grazing Incidence Diffraction Measurements: Comparison of Different Primary and Secondary Beam Conditioners 掠入射衍射测量的新工具:不同主次光束调理器的比较
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022485
R. Stabenow, A. Haase
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引用次数: 3
X-Ray Fluorescence Cross-Section Measurements in the Energy Range 4-18 keV 能量范围4- 18kev的x射线荧光截面测量
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023326
K. Stoev, J. F. Dlouhy
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引用次数: 0
Analysis of Thin Films and Multi-Layer Thin Films containing Light Elements by XRF 含轻元素薄膜和多层薄膜的XRF分析
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023144
M. Kaufmann, M. Mantler, F. Weber
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引用次数: 3
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