Advances in x-ray analysis最新文献

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Determination of thickness and composition of thin Al{sub x}Ga{sub 1-x}As layers on GaAs by total electron yield (TEY) 用总电子产率(TEY)测定GaAs上Al{sub x}Ga{sub 1-x}As薄层的厚度和组成
Advances in x-ray analysis Pub Date : 1995-12-31 DOI: 10.1154/s0376030800017729
M. Ebel, R. Svagera, H. Ebel, Robert Hobl, M. Mantler, J. Wernisch, N. Zagler
{"title":"Determination of thickness and composition of thin Al{sub x}Ga{sub 1-x}As layers on GaAs by total electron yield (TEY)","authors":"M. Ebel, R. Svagera, H. Ebel, Robert Hobl, M. Mantler, J. Wernisch, N. Zagler","doi":"10.1154/s0376030800017729","DOIUrl":"https://doi.org/10.1154/s0376030800017729","url":null,"abstract":"The measurement of the total electron yield (TEY) emitted from a solid specimen when irradiated by monochromatic x-rays is used for quantitative information on the specimen. For this purpose one has to determine the increase of TEY in the course of a variation of the photon energy from below to above the absorption edges of the specimen elements. These increases are the analytical quantities and are correlated with the composition of the specimen. The detected electrons are photo, Auger and secondary electrons. Most of them lost some of their original kinetic energy due to inelastic collisions along their path from the atom of origin to the surface. Low energy electrons are especially found in the secondary electron peak with electron energies of less than 20eV. Electrically nonconductive specimens under x-irradiation tend to positive surface charging. Thus, the relatively high flux of secondary electrons is more or less rejected by the grounded electron detector entrance. The amount of rejected secondary electrons depends on the charging potential. In order to avoid this charging dependent contribution to the TEY-increase the electron detector entrance is set to a negative bias and prevents generally low energy electrons from detection. It is the aim of themore » present investigations to extend the field of application of TEY from quantitative analysis of bulk specimens to thin films and to compare the results obtained by TEY with results from x-ray fluorescence analysis (XRF), electron probe micro analysis (EPMA) and x-ray photoelectron spectrometry (XPS). This comparison allows to demonstrate the application of TEY. For verification of the theoretical considerations, Al{sub x}Ga{sub 1-x}As layers on GaAs have been chosen. Values of layer thicknesses were in the range from 20 to 120 nm. An essential feature of TEY for this specific application is the escape depth of the electrons of approximately 100nm. 7 refs., 9 figs., 5 tabs.« less","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"40 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"1995-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82298198","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Neutron and x-ray scattering studies of the metallurgical condition and residual stresses in Weldalite welds Weldalite焊缝中冶金条件和残余应力的中子和x射线散射研究
Advances in x-ray analysis Pub Date : 1995-12-31 DOI: 10.2172/206556
S. Spooner, E. Pardue
{"title":"Neutron and x-ray scattering studies of the metallurgical condition and residual stresses in Weldalite welds","authors":"S. Spooner, E. Pardue","doi":"10.2172/206556","DOIUrl":"https://doi.org/10.2172/206556","url":null,"abstract":"Weldalite is a lithium-containing aluminum alloy which is being considered for aerospace applications because its favorable strength-to-weight ratio. Successful welding of this alloy depends on the control of the metallurgical condition and residual stresses in the heat affected zone. Neutron and x-ray scattering methods of residual stress measurement were applied to plasma arc welds made in aluminum-lithium alloy test panels as part of an evaluation of materials for use in welded structures. In the course of these studies discrepancies between x-ray and neutron results from the heat affected zone (HAZ) of the weld were found. Texture changes and recovery from the cold work, indicated in peak widths, were found in the HAZ as well. The consideration of x-ray and neutron results leads to the conclusion that there is a change in solute composition which modifies the d-spacings in the HAZ which affects the neutron diffraction determination of residual stresses. The composition changes give the appearance of significant compressive strains in the HAZ. This effect and sharp gradients in the texture give severe anomalies in the neutron measurement of residual stress. The use of combined x-ray and neutron techniques and the solution to the minimizing of the neutron diffraction anomalies are discussed.","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"69 1","pages":"297-303"},"PeriodicalIF":0.0,"publicationDate":"1995-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79906078","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Residual stress and microstructural characterization using Rietveld refinement of a carburized layer in a 5120 steel 利用Rietveld细化5120钢渗碳层的残余应力和显微组织表征
Advances in x-ray analysis Pub Date : 1995-09-01 DOI: 10.2172/106610
P. Rangaswamy, M. Bourke, A. Lawson, J. Orourke, J. Goldstone
{"title":"Residual stress and microstructural characterization using Rietveld refinement of a carburized layer in a 5120 steel","authors":"P. Rangaswamy, M. Bourke, A. Lawson, J. Orourke, J. Goldstone","doi":"10.2172/106610","DOIUrl":"https://doi.org/10.2172/106610","url":null,"abstract":"Rietveld refinement of X-ray diffraction patterns has been used to provide microstructural information complementary to conventional X-ray residual stress measurements through a carburized layer containing a maximum vol. 25 % of retained austenite. Layers in a simple specimen were removed incrementally by electropolishing and, at each depth in addition to conventional residual stress measurements in both the martensite and retained austenite, data were collected at {Psi} = 0 for Rietveld refinement. The refinements provide accurate values for the lattice parameters in the respective phases that can be related to carbon content and microstructure. Besides to providing qualitative information concerning the microstructure and possible surface decarburization, the c/a ratio of the martensite potentially offers an independent technique for determining carbon content profiles.","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"14 1","pages":"319-329"},"PeriodicalIF":0.0,"publicationDate":"1995-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91482141","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Techniques for the Determination of Particle Size and Texture in Retained Austenite / Martensite Microstructures and Interpretation of the Measurements 残余奥氏体/马氏体显微组织中粒度和织构的测定技术及测量结果的解释
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022898
J. Makinson, W. N. Weins, Y. Xu, D. Medlin, R. V. Lawrence
{"title":"Techniques for the Determination of Particle Size and Texture in Retained Austenite / Martensite Microstructures and Interpretation of the Measurements","authors":"J. Makinson, W. N. Weins, Y. Xu, D. Medlin, R. V. Lawrence","doi":"10.1154/S0376030800022898","DOIUrl":"https://doi.org/10.1154/S0376030800022898","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"2012 1","pages":"473-479"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73432797","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Residual Stress of Aluminum Thin Films Sputtered on Silicon Wafers Measured by X-Ray Diffraction 用x射线衍射测量铝薄膜溅射在硅片上的残余应力
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022679
Keisuke Tanaka, K. Ishihara, Y. Akiniwa
{"title":"Residual Stress of Aluminum Thin Films Sputtered on Silicon Wafers Measured by X-Ray Diffraction","authors":"Keisuke Tanaka, K. Ishihara, Y. Akiniwa","doi":"10.1154/S0376030800022679","DOIUrl":"https://doi.org/10.1154/S0376030800022679","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"78 1","pages":"267-279"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77191353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
X-Ray Stress Measurement of Ni-Ai System Intermetallic Compounds Ni-Ai系金属间化合物的x射线应力测量
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022643
Tokimasa Goto, Hiroyuki Tabata, Y. Hirose
{"title":"X-Ray Stress Measurement of Ni-Ai System Intermetallic Compounds","authors":"Tokimasa Goto, Hiroyuki Tabata, Y. Hirose","doi":"10.1154/S0376030800022643","DOIUrl":"https://doi.org/10.1154/S0376030800022643","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"368 1","pages":"243-249"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76430251","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Polycrystalline Thin Film Diffractometer for Asymmetric Diffraction Using Parallel Beam and High Resolution Parallel Slits 采用平行光束和高分辨率平行狭缝的非对称衍射多晶薄膜衍射仪
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022576
H. Toraya, J. Yoshino
{"title":"A Polycrystalline Thin Film Diffractometer for Asymmetric Diffraction Using Parallel Beam and High Resolution Parallel Slits","authors":"H. Toraya, J. Yoshino","doi":"10.1154/S0376030800022576","DOIUrl":"https://doi.org/10.1154/S0376030800022576","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"17 1","pages":"165-170"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87855738","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Comparison of Modelled and Experimental Data for the NixRu1-xAl Intermetaixic Compound in the Ni-Ru-Al Ternary System Ni-Ru-Al三元体系中NixRu1-xAl中间体的模拟与实验数据比较
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S037603080002320X
A. Harte, P. M. Hung, I. Horner, N. Hall, L. Cornish, M. Witcomb
{"title":"Comparison of Modelled and Experimental Data for the NixRu1-xAl Intermetaixic Compound in the Ni-Ru-Al Ternary System","authors":"A. Harte, P. M. Hung, I. Horner, N. Hall, L. Cornish, M. Witcomb","doi":"10.1154/S037603080002320X","DOIUrl":"https://doi.org/10.1154/S037603080002320X","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"22 1","pages":"747-753"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88779945","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
An Order of Magnitude Improvement in Detection Limits Achieved by Using a New Sample Support in Small Spot Xrf Analysis. 在小点Xrf分析中使用新的样品支架,检测限提高了一个数量级。
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023260
A. Nielson, D. Turner, Alisa A. Wilson, D. Wherry, R. Wong
{"title":"An Order of Magnitude Improvement in Detection Limits Achieved by Using a New Sample Support in Small Spot Xrf Analysis.","authors":"A. Nielson, D. Turner, Alisa A. Wilson, D. Wherry, R. Wong","doi":"10.1154/S0376030800023260","DOIUrl":"https://doi.org/10.1154/S0376030800023260","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"28 1","pages":"799-804"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78196306","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
100 Years of Progress in X-Ray Fluorescence Analysis x射线荧光分析的百年进展
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022424
J. Gilfrich
{"title":"100 Years of Progress in X-Ray Fluorescence Analysis","authors":"J. Gilfrich","doi":"10.1154/S0376030800022424","DOIUrl":"https://doi.org/10.1154/S0376030800022424","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"115 1","pages":"29-39"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76089169","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
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