{"title":"用x射线衍射测量铝薄膜溅射在硅片上的残余应力","authors":"Keisuke Tanaka, K. Ishihara, Y. Akiniwa","doi":"10.1154/S0376030800022679","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"78 1","pages":"267-279"},"PeriodicalIF":0.0000,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Residual Stress of Aluminum Thin Films Sputtered on Silicon Wafers Measured by X-Ray Diffraction\",\"authors\":\"Keisuke Tanaka, K. Ishihara, Y. Akiniwa\",\"doi\":\"10.1154/S0376030800022679\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":7518,\"journal\":{\"name\":\"Advances in x-ray analysis\",\"volume\":\"78 1\",\"pages\":\"267-279\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advances in x-ray analysis\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1154/S0376030800022679\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in x-ray analysis","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1154/S0376030800022679","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}