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Advances in x-ray analysis最新文献

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What Can Crystallography Tell us About the Intermediate Range Order in Borate Glasses 晶体学对硼酸盐玻璃的中间阶序有何启示
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022965
A. Wright, N. Vedishcheva, B. A. Shakhmatkin
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引用次数: 3
Depth Profiling Biaxial Stresses in Sputter Deposited Molybdenum Films; Use of the Cos2φ Method 溅射沉积钼膜深度剖面双轴应力研究使用Cos2φ法
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022771
B. Ballard, P. Predecki, T. Watkins, K. Kozaczek, D. Braski, C. Hubbard
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引用次数: 9
Actual Tasks of Stress Analysis by Diffraction 衍射应力分析的实际任务
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S037603080002259X
V. Hauk
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引用次数: 4
An Analytical Expression for X-Ray Fluorescence Intensity Distribution Based on the Probability Theory 基于概率论的x射线荧光强度分布解析表达式
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023314
K. Stoev, M. Vutchkov, A. Artinian, J. F. Dlouhy
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引用次数: 0
X-Ray Fractography on Fatigue Fracture Surfaces of Mg-9mass%Al-1mass%Zn Alloy Mg-9mass%Al-1mass%Zn合金疲劳断口的x射线断口形貌
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022916
Y. Kishi, Shigenobu Takahashi, Y. Hirose
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引用次数: 0
Improvement of the Detection Sensitivity of Edxrf Trace Element Analysis by Means of Efficient X-Ray Focusing Based on Strongly Curved Hopg Crystals 基于强弯曲Hopg晶体的高效x射线聚焦提高Edxrf微量元素检测灵敏度
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022515
B. Beckhoff, B. Kanngießer
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引用次数: 2
Selfconsistent Evaluation of Non-Uniform Stress Profiles and X-Ray Elastic Constants from X-ray Diffraction Experiments x射线衍射实验中非均匀应力剖面和x射线弹性常数的自洽评价
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022758
H. Wern, L. Suominen
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引用次数: 2
The Perspectives of High-Accuracy X-Ray Fluorescence Analysis - Some Fundamental Aspects and Applications 高精度x射线荧光分析的前景——一些基本方面和应用
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800023284
V. I. Smolniakov
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引用次数: 0
Multi-Capillary and Conic Optical Elements for Parallel Beam Production 用于平行光束生产的多毛细管和锥形光学元件
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022461
C. Dozier, D. Newman, M. I. Bell, Q. Xiao, S. Espy
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引用次数: 2
Measurement of Residual Stress Distribution of Ground Silicon Nitride by Glancing Incidence X-ray Diffraction Technique 掠射x射线衍射技术测量磨削氮化硅残余应力分布
Advances in x-ray analysis Pub Date : 1995-01-01 DOI: 10.1154/S0376030800022746
Y. Sakaida, Keisuke Tanaka, Shintaro Harada
{"title":"Measurement of Residual Stress Distribution of Ground Silicon Nitride by Glancing Incidence X-ray Diffraction Technique","authors":"Y. Sakaida, Keisuke Tanaka, Shintaro Harada","doi":"10.1154/S0376030800022746","DOIUrl":"https://doi.org/10.1154/S0376030800022746","url":null,"abstract":"","PeriodicalId":7518,"journal":{"name":"Advances in x-ray analysis","volume":"16 1","pages":"331-338"},"PeriodicalIF":0.0,"publicationDate":"1995-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84415498","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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