ACS Applied Materials & Interfaces最新文献

筛选
英文 中文
Tuning the Formation and Growth of Platinum Nanoparticles Using Surfactant: In Situ SAXS Study of the Aggregative Growth Mechanism. 表面活性剂调控铂纳米颗粒的形成和生长:聚集生长机理的原位SAXS研究。
IF 9.5 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02 DOI: 10.1021/acsami.5c05268
Rodolfo Fini,Marina Magnani,Celso V Santilli,Sandra H Pulcinelli
{"title":"Tuning the Formation and Growth of Platinum Nanoparticles Using Surfactant: In Situ SAXS Study of the Aggregative Growth Mechanism.","authors":"Rodolfo Fini,Marina Magnani,Celso V Santilli,Sandra H Pulcinelli","doi":"10.1021/acsami.5c05268","DOIUrl":"https://doi.org/10.1021/acsami.5c05268","url":null,"abstract":"The synthesis of platinum nanoparticles (Pt NP) via chemical reduction with ascorbic acid (AA) and kinetic stabilization with the cationic surfactant tetradecyltrimethylammonium bromide (TTAB) was investigated, with emphasis on the influence of the TTAB/Pt2+ ratio on particle size and growth behavior. Based on small-angle X-ray scattering (SAXS), ultraviolet-visible (UV-vis), and transmission electron microscopy (TEM) analyses, a four-stage mechanism was proposed for Pt NP formation, starting from nucleation and initial growth of primary nanoparticles (NPp), followed by a hierarchical aggregation process governed by the interplay between attractive and repulsive forces. While the ascorbic acid governs the reduction pathway and remains central to defining the morphology of Pt NP, the addition of TTAB was found to significantly modulate aggregation kinetics and structural organization, even though it does not act as a direct shape-directing agent. The higher the TTAB concentrations, the smaller and more monodisperse the primary NP, the enhanced the electrosteric stabilization, and the denser the aggregates with lower porosity. These changes were closely correlated with a decrease in the aggregation rate and an increase in the activation barrier for aggregation. This work advances the understanding of how cationic surfactants, even when not acting as shape-directing agents, can critically influence the assembly and final architecture of Pt nanostructures, providing valuable insights into the rational design of nanoparticle-based materials.","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"7 1","pages":""},"PeriodicalIF":9.5,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144533595","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IF 8.3 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02
Bin Guan*, Stuart Mills, Tesi Liu, Chih-Tsung Yang and Craig Priest*, 
{"title":"","authors":"Bin Guan*, Stuart Mills, Tesi Liu, Chih-Tsung Yang and Craig Priest*, ","doi":"","DOIUrl":"","url":null,"abstract":"","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 26","pages":"XXX-XXX 962–968"},"PeriodicalIF":8.3,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsami.5c05826","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144521717","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IF 8.3 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02
Qiang Wang, Chenghan Chang, Yujuan Li, Dongqing Zuo, Xuran Xu*, Jingyi Zhang, Tiancai Zhang*, Zilong Cao, Yongqiang Jia, Jianhua Xu* and Jiajun Fu*, 
{"title":"","authors":"Qiang Wang, Chenghan Chang, Yujuan Li, Dongqing Zuo, Xuran Xu*, Jingyi Zhang, Tiancai Zhang*, Zilong Cao, Yongqiang Jia, Jianhua Xu* and Jiajun Fu*, ","doi":"","DOIUrl":"","url":null,"abstract":"","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 26","pages":"XXX-XXX 962–968"},"PeriodicalIF":8.3,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsami.5c07687","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144521726","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IF 8.3 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02
Hailin Lei, Weihua Yan, Fan He* and Min Zhang, 
{"title":"","authors":"Hailin Lei, Weihua Yan, Fan He* and Min Zhang, ","doi":"","DOIUrl":"","url":null,"abstract":"","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 26","pages":"XXX-XXX 962–968"},"PeriodicalIF":8.3,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsami.4c22025","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144521728","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IF 8.3 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02
Shu-Fan Lv, Xiao-Qiang Li, Yi-Ran Du*, Rui Wang, Zhao-Rong Yan, Jia-Ni Li, Rui Zhang* and Bao-Hua Xu*, 
{"title":"","authors":"Shu-Fan Lv, Xiao-Qiang Li, Yi-Ran Du*, Rui Wang, Zhao-Rong Yan, Jia-Ni Li, Rui Zhang* and Bao-Hua Xu*, ","doi":"","DOIUrl":"","url":null,"abstract":"","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 26","pages":"XXX-XXX 962–968"},"PeriodicalIF":8.3,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsami.5c06177","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144521792","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IF 8.3 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02
Seonmyeong Yu, Hyeyun Kim, Jaeho Shin, Junsu Kim, Won Il Kim, Hyungyu Cho, Sohyun Heo, Chun-Jae Yoo, Wooseok Yang, Hyesung Cho, Kwang Ho Kim*, Ho Seok Park* and Kahyun Hur*, 
{"title":"","authors":"Seonmyeong Yu, Hyeyun Kim, Jaeho Shin, Junsu Kim, Won Il Kim, Hyungyu Cho, Sohyun Heo, Chun-Jae Yoo, Wooseok Yang, Hyesung Cho, Kwang Ho Kim*, Ho Seok Park* and Kahyun Hur*, ","doi":"","DOIUrl":"","url":null,"abstract":"","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 26","pages":"XXX-XXX 962–968"},"PeriodicalIF":8.3,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsami.5c07304","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144521795","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IF 8.3 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02
Yueyun Yu, Qing Chen*, Bomou Ma, Rong Zheng, Dahua Shou* and Jintu Fan*, 
{"title":"","authors":"Yueyun Yu, Qing Chen*, Bomou Ma, Rong Zheng, Dahua Shou* and Jintu Fan*, ","doi":"","DOIUrl":"","url":null,"abstract":"","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 26","pages":"XXX-XXX 962–968"},"PeriodicalIF":8.3,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsami.5c03087","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144521800","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IF 8.3 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02
Jing Li, Wei Dong, Zhijian Li, Mingxu Zhang, Jianxun Wang, Wenxu Yin*, Xiaoliang Zhang, Zeke Liu, William W. Yu, Xiaoyu Zhang* and Weitao Zheng, 
{"title":"","authors":"Jing Li, Wei Dong, Zhijian Li, Mingxu Zhang, Jianxun Wang, Wenxu Yin*, Xiaoliang Zhang, Zeke Liu, William W. Yu, Xiaoyu Zhang* and Weitao Zheng, ","doi":"","DOIUrl":"","url":null,"abstract":"","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 26","pages":"XXX-XXX 962–968"},"PeriodicalIF":8.3,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsami.5c09493","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144521821","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Making Use of Si Contaminants during Chemical Vapor Deposition of Graphene on Cu: Synthesis of a Stable Material with the Textbook-like Band Structure of Free-Standing Graphene. 石墨烯在Cu上化学气相沉积过程中硅污染物的利用:一种具有教科书式独立石墨烯带结构的稳定材料的合成。
IF 9.5 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02 DOI: 10.1021/acsami.5c06939
Tim Kratky,Jürgen Kraus,Paul M Leidinger,Patrick Zeller,Francesca Genuzio,Alessandro Sala,Tevfik Onur Menteş,Andrea Locatelli,Sebastian Günther
{"title":"Making Use of Si Contaminants during Chemical Vapor Deposition of Graphene on Cu: Synthesis of a Stable Material with the Textbook-like Band Structure of Free-Standing Graphene.","authors":"Tim Kratky,Jürgen Kraus,Paul M Leidinger,Patrick Zeller,Francesca Genuzio,Alessandro Sala,Tevfik Onur Menteş,Andrea Locatelli,Sebastian Günther","doi":"10.1021/acsami.5c06939","DOIUrl":"https://doi.org/10.1021/acsami.5c06939","url":null,"abstract":"We report on a gentle procedure for the complete electronic decoupling of graphene from Cu. The procedure can be added to the growth protocol of graphene synthesis by chemical vapor deposition making use of the widely unnoticed silicon release from hot wall quartz tube reactors. So far, Si release was observed if the effect was large, so that it deteriorates the grown graphene. However, the effect can also be used to turn the electronic band structure of CVD-grown graphene on Cu into that of free-standing graphene as shown in a combined spectroscopic photoelectron and low energy electron microscopy study. Adding a foil pretreatment to the synthesis protocol in the reactor turns the polycrystalline foil into (111)-textured Cu, and the electronic band structure of CVD-grown graphene on Cu(111) is achieved with n-doping by -0.4 eV and band gap formation of 0.3 eV. If, however, graphene is synthesized on a Si-loaded Cu foil, subsequent oxygen exposure in the reactor segregates the dissolved Si to the surface and converts it to intercalated silica without destroying the covering graphene. The graphene decouples electronically, and the textbook-like electronic band structure of free-standing graphene emerges. The alternating stacking of 30°-rotated layers in thicker graphene leads to electronically noninteracting layers. Moreover, in angle-resolved photoemission, replica bands due to Umklapp processes emerge without the opening of an energy gap.","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"47 1","pages":""},"PeriodicalIF":9.5,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144533592","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IF 8.3 2区 材料科学
ACS Applied Materials & Interfaces Pub Date : 2025-07-02
Xiang Yu, Chunzheng Yu and Jian Zhao*, 
{"title":"","authors":"Xiang Yu, Chunzheng Yu and Jian Zhao*, ","doi":"","DOIUrl":"","url":null,"abstract":"","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"17 26","pages":"XXX-XXX 962–968"},"PeriodicalIF":8.3,"publicationDate":"2025-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/pdf/10.1021/acsami.5c07546","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"144521711","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信