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Journal of Micro/Nanopatterning, Materials, and Metrology最新文献

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Thoughts on Photomask Japan 关于日本光罩的想法
Journal of Micro/Nanopatterning, Materials, and Metrology Pub Date : 2024-06-11 DOI: 10.1117/1.jmm.23.2.020101
Harry Levinson
{"title":"Thoughts on Photomask Japan","authors":"Harry Levinson","doi":"10.1117/1.jmm.23.2.020101","DOIUrl":"https://doi.org/10.1117/1.jmm.23.2.020101","url":null,"abstract":"","PeriodicalId":505970,"journal":{"name":"Journal of Micro/Nanopatterning, Materials, and Metrology","volume":"15 23","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141357446","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Universal approach for process optimization of chemically amplified photoresists in electron beam lithography 电子束光刻技术中化学放大光刻胶工艺优化的通用方法
Journal of Micro/Nanopatterning, Materials, and Metrology Pub Date : 2024-05-20 DOI: 10.1117/1.jmm.23.2.024601
Markus Greul, Astrit Shoshi, Jan Klikovits, Stephan Martens, Ulrich Hofmann, Olga Barahona, Benyamin Shnirman, Leon Starz, Patrick Wintrich, Holger Sailer
{"title":"Universal approach for process optimization of chemically amplified photoresists in electron beam lithography","authors":"Markus Greul, Astrit Shoshi, Jan Klikovits, Stephan Martens, Ulrich Hofmann, Olga Barahona, Benyamin Shnirman, Leon Starz, Patrick Wintrich, Holger Sailer","doi":"10.1117/1.jmm.23.2.024601","DOIUrl":"https://doi.org/10.1117/1.jmm.23.2.024601","url":null,"abstract":"","PeriodicalId":505970,"journal":{"name":"Journal of Micro/Nanopatterning, Materials, and Metrology","volume":"14 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141119574","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Pushing the boundaries of patterning: a conversation with Tatiana Kovalevich 突破图案设计的界限：与塔蒂亚娜-科瓦列维奇的对话
Journal of Micro/Nanopatterning, Materials, and Metrology Pub Date : 2024-04-03 DOI: 10.1117/1.jmm.23.2.020701
Harry Levinson
{"title":"Pushing the boundaries of patterning: a conversation with Tatiana Kovalevich","authors":"Harry Levinson","doi":"10.1117/1.jmm.23.2.020701","DOIUrl":"https://doi.org/10.1117/1.jmm.23.2.020701","url":null,"abstract":"","PeriodicalId":505970,"journal":{"name":"Journal of Micro/Nanopatterning, Materials, and Metrology","volume":"9 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140747788","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Curvilinear data representation and its impact on file size and lithographic performance 曲线数据表示及其对文件大小和光刻性能的影响
Journal of Micro/Nanopatterning, Materials, and Metrology Pub Date : 2024-01-30 DOI: 10.1117/1.jmm.23.1.011204
Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, Jiyoon Chang, James Moon, Jun Ye
{"title":"Curvilinear data representation and its impact on file size and lithographic performance","authors":"Jiuning Hu, Adam Lyons, Chris Spence, Kurt Wampler, Mahmoud Mohsen, Yen-Wen Lu, Rachit Gupta, Youping Zhang, Rafael Howell, Jiyoon Chang, James Moon, Jun Ye","doi":"10.1117/1.jmm.23.1.011204","DOIUrl":"https://doi.org/10.1117/1.jmm.23.1.011204","url":null,"abstract":"","PeriodicalId":505970,"journal":{"name":"Journal of Micro/Nanopatterning, Materials, and Metrology","volume":"110 ","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140481598","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
SwinT-ILT: Swin Transformer embedding end-to-end mask optimization model SwinT-ILT：Swin 变换器嵌入端到端掩码优化模型
Journal of Micro/Nanopatterning, Materials, and Metrology Pub Date : 2024-01-30 DOI: 10.1117/1.jmm.23.1.013201
Hui Xu, Pan Qi, Fuxin Tang, Ru-Ru Ma, Huaguo Liang, Zhengfeng Huang, Xiaoqing Wen
{"title":"SwinT-ILT: Swin Transformer embedding end-to-end mask optimization model","authors":"Hui Xu, Pan Qi, Fuxin Tang, Ru-Ru Ma, Huaguo Liang, Zhengfeng Huang, Xiaoqing Wen","doi":"10.1117/1.jmm.23.1.013201","DOIUrl":"https://doi.org/10.1117/1.jmm.23.1.013201","url":null,"abstract":"","PeriodicalId":505970,"journal":{"name":"Journal of Micro/Nanopatterning, Materials, and Metrology","volume":"141 4","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-01-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140484677","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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