Journal of Micro/Nanopatterning, Materials, and Metrology

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Journal of Micro/Nanopatterning, Materials, and Metrology - 最新文献

Thoughts on Photomask Japan

Pub Date : 2024-06-11 DOI: 10.1117/1.jmm.23.2.020101 Harry Levinson

Universal approach for process optimization of chemically amplified photoresists in electron beam lithography

Pub Date : 2024-05-20 DOI: 10.1117/1.jmm.23.2.024601 Markus Greul, Astrit Shoshi, Jan Klikovits, Stephan Martens, Ulrich Hofmann, Olga Barahona, Benyamin Shnirman, Leon Starz, Patrick Wintrich, Holger Sailer

Pushing the boundaries of patterning: a conversation with Tatiana Kovalevich

Pub Date : 2024-04-03 DOI: 10.1117/1.jmm.23.2.020701 Harry Levinson

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