Markus Greul, Astrit Shoshi, Jan Klikovits, Stephan Martens, Ulrich Hofmann, Olga Barahona, Benyamin Shnirman, Leon Starz, Patrick Wintrich, Holger Sailer
{"title":"Universal approach for process optimization of chemically amplified photoresists in electron beam lithography","authors":"Markus Greul, Astrit Shoshi, Jan Klikovits, Stephan Martens, Ulrich Hofmann, Olga Barahona, Benyamin Shnirman, Leon Starz, Patrick Wintrich, Holger Sailer","doi":"10.1117/1.jmm.23.2.024601","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":505970,"journal":{"name":"Journal of Micro/Nanopatterning, Materials, and Metrology","volume":"14 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-05-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micro/Nanopatterning, Materials, and Metrology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/1.jmm.23.2.024601","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}