{"title":"A new ID acquiring method for personal identification system with fingerprint","authors":"T. Fukuda, F. Arai, J. Tsuruno, K. Itoigawa","doi":"10.1109/MHS.1999.820007","DOIUrl":"https://doi.org/10.1109/MHS.1999.820007","url":null,"abstract":"More secure and convenient personal identification systems are needed in many places. Biometrics, such as a retina, voice, fingerprint etc., is a solution for these requests. We propose a new personal identification system, which uses fingerprint image and micromechanical key. This system provides a more convenient method for users and keeps high-level security. This paper describes the system structure and hardware specifications. Also, we explain a fabrication method of these system components by MEMS techniques. We simulated the fabrication processes to make components of the system. Then we made a prototype of the micromechanical key.","PeriodicalId":423453,"journal":{"name":"MHS'99. Proceedings of 1999 International Symposium on Micromechatronics and Human Science (Cat. No.99TH8478)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125757355","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
N. Nishi, T. Katoh, H. Ueno, S. Konishi, S. Sugiyama
{"title":"3-dimensional micromachining of PTFE using synchrotron radiation direct photo-etching","authors":"N. Nishi, T. Katoh, H. Ueno, S. Konishi, S. Sugiyama","doi":"10.1109/MHS.1999.819988","DOIUrl":"https://doi.org/10.1109/MHS.1999.819988","url":null,"abstract":"In order to fabricate highly functional microdevices for MEMS, three-dimensional (3D) micromachining that can form certain round or curved structures is required. Recently, a high aspect ratio micromachining process using synchrotron radiation (SR) direct photo-etching of polymers without any process gases, the so called TIEGA (Teflon included etching galvanicforming), has been developed. The etching rate is of the order of 10-100 /spl mu/m/min. Therefore, the processing for a 1000 /spl mu/m-depth microstructure takes about 10 minutes, much shorter than that required for the deep X-ray lithography (LIGA) process. Moreover, it is free from problems of sticking due to the surface tension of the developer, the rinsing process etc., as SR etching is a completely dry process. Due to the high processing speed and smoothness of the etched surfaces, SR etching might have a potential for 3D micromachining by combining a scanning stage with a high degree of freedom. It is expected that microstructures formed by SR etching will be applied not only to highly functional mircodevices, but also in the biomedical field, due to the material characters of PTFE. In this paper, we propose SR etching as a new approach to form 3D microstructures of PTFE and describe results of preliminary experiments for 3D micromachining.","PeriodicalId":423453,"journal":{"name":"MHS'99. Proceedings of 1999 International Symposium on Micromechatronics and Human Science (Cat. No.99TH8478)","volume":"68 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1999-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125903663","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}