IEEE/SEMI International Symposium on Semiconductor Manufacturing Science最新文献_第2页

Workload regulating wafer release in a GaAs fab facility 在砷化镓晶圆厂设施中调节晶圆释放的工作量

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66125

J.W. Lawton, A. Drake, R. Henderson, L.M. Wein, R. Whitney, D. Zuanich

引用次数: 23

Use of influence diagrams and neural networks in modeling LPCVD 影响图和神经网络在LPCVD建模中的应用

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66120

F. Nadi, A. Agogino, D. Hodges

引用次数: 2

Experience in simulating wafer fabs in the USA and Japan 有模拟美国和日本晶圆厂的经验

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66128

A. Matsuyama, R. Atherton

引用次数: 7

Functional and operational differences in the decision making process for manufacturing in Japan and in America 日本和美国制造业在决策过程中的功能和操作差异

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66107

W. Matthews

引用次数: 0

Managing manufacturing improvement using computer integrated manufacturing methods 使用计算机集成制造方法管理生产改进

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66111

M. Adams, B. Smoak

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引用次数: 2

Knowledge extraction techniques for expert system assisted wafer screening 专家系统辅助晶圆筛选的知识提取技术

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66127

D. Khera, M. Cresswell, L. W. Linholm, G. Ramanathan, J. Buzzeo, A. Nagarajan

引用次数: 4

Comparison of integrated in situ RIE preclean processes for CVD tungsten silicide deposition done in a cluster tool 在群集工具中沉积CVD硅化钨的集成原位RIE预清洁工艺的比较

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66115

R. S. Nowicki, C. Fuhs, P. Geraghty

引用次数: 0

Neural network computing applied in design for manufacturability 神经网络计算在可制造性设计中的应用

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66119

L. Liu, G.H. Liu

{"title":"Neural network computing applied in design for manufacturability","authors":"L. Liu, G.H. Liu","doi":"10.1109/ISMSS.1990.66119","DOIUrl":"https://doi.org/10.1109/ISMSS.1990.66119","url":null,"abstract":"A DFM (design for manufacturability) method that applies artificial intelligence techniques and robust design ideas and can be used in many semiconductor design and manufacturing areas is described. The method includes both controllable design and uncontrollable variation factors early in the design stage. It uses neural network computing techniques to find an optimal design for controllable design factors of maximizing the yield of the semiconductor product design and manufacturing process. The controllable design factors include the device component values, device physical variables, and fabrication parameters such as deposition time, rate, and doses. The uncontrollable factors are environmental condition variations such as temperature and humidity, as well as fabrication inaccuracies in alignment and diffusion. The method consists of sample, relate, and optimize (SR) stages. At the sample stage, a set of confined random design points are chosen from an initial design space. At the relate stage, the relationship between these points and their responses are used to train an artificial neural network (NN) based on a backpropagation model. At the optimize stage, acceptable inputs can be predicted and therefore the manufacturing yield increased by using this NN computational scheme. This method, when applied to a semiconductor processing-dependent IC design example, showed satisfactory results.<<ETX>>","PeriodicalId":398535,"journal":{"name":"IEEE/SEMI International Symposium on Semiconductor Manufacturing Science","volume":"151 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1990-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122448368","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 6

Practical aspects of the GEM model for factory automation 工厂自动化GEM模型的实践方面

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66105

J. Ghiselli, B. Rathbun

引用次数: 3

Automated on-line optimization of an epitaxial process 外延工艺的自动在线优化

IEEE/SEMI International Symposium on Semiconductor Manufacturing Science Pub Date : 1990-05-21 DOI: 10.1109/ISMSS.1990.66116

E. Sachs, S. Ha, A. Hu, W. Metz

引用次数: 3