2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)最新文献

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Cryogenic DC and RF characteristics of InP HEMTs with various drain-side recess lengths 不同漏侧凹槽长度InP hemt的低温直流和射频特性
A. Endoh, I. Watanabe, A. Kasamatsu, Tsuyoshi Takahashi, S. Shiba, Y. Nakasha, T. Iwai, T. Mimura
{"title":"Cryogenic DC and RF characteristics of InP HEMTs with various drain-side recess lengths","authors":"A. Endoh, I. Watanabe, A. Kasamatsu, Tsuyoshi Takahashi, S. Shiba, Y. Nakasha, T. Iwai, T. Mimura","doi":"10.1109/ICIPRM.2016.7528569","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528569","url":null,"abstract":"We measured the DC and RF characteristics of InP-based 75-nm-gate In<sub>0.52</sub>Al<sub>0.48</sub>As/In<sub>0.63</sub>Ga<sub>0.37</sub>As HEMTs with various drain-side recess lengths L<sub>rd</sub>'s at 300 and 16 K. The kink phenomenon was seen in the current-voltage (I-V) characteristics for all the measured HEMTs at 16 K. The peak cutoff frequency f<sub>T</sub> decreases with increasing L<sub>rd</sub> both at 300 and 16 K. On the other hand, the maximum oscillation frequency f<sub>max</sub> shows very complicated behavior both at 300 and 16 K. We found that there exists the most suitable L<sub>rd</sub> value to increase f<sub>max</sub> at each temperature and/or drain-source voltage V<sub>ds</sub>.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"267 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121998779","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Sheet electron density dependence of electron mobility anisotropy in In0.75Ga0.25As/InP two-dimensional electron gas In0.75Ga0.25As/InP二维电子气体中电子迁移率各向异性与片电子密度的关系
M. Akabori
{"title":"Sheet electron density dependence of electron mobility anisotropy in In0.75Ga0.25As/InP two-dimensional electron gas","authors":"M. Akabori","doi":"10.1109/ICIPRM.2016.7528650","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528650","url":null,"abstract":"Summary form only given. Electron mobility anisotropy in pseudomorphic In0.75Ga0.25As/InP two-dimensional electron gas has been investigated using gated Hall-bar devices with different current-flowing directions. Clear anisotropy can be seen at both liquid He (LHe) and liquid N2 (LN2) temperatures. By using Matthiesen-type equations, isotropic and anisotropic electron mobilities and their at LHe and LN2 temperatures, which almost monotonically increases with increasing sheet electron density. The present trends can be fitted to assumption of the random piezoelectric scattering. We also have calculated the anisotropy parameter dependence on sheet electron density have been extracted. We have found that similar trends of anisotropic electron mobility which is the ratio of isotropic and anisotropic electron mobilities. We have found that the anisotropy parameter decreases gradually with increasing sheet electron density at LN2 temperature, and it shows a significant peak at LHe temperature.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"215 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117106264","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of nonuniform current injection on electroluminescence spectra of InGaN-GaN blue-green light-emitting diode 非均匀电流注入对InGaN-GaN蓝绿发光二极管电致发光光谱的影响
I. Khmyrova, Yu. Kholopova, S. Larkin, V. Zemlyakov, B. Shevchenko, A. Tsatsul'nikov, S. Shapoval
{"title":"Effect of nonuniform current injection on electroluminescence spectra of InGaN-GaN blue-green light-emitting diode","authors":"I. Khmyrova, Yu. Kholopova, S. Larkin, V. Zemlyakov, B. Shevchenko, A. Tsatsul'nikov, S. Shapoval","doi":"10.1109/ICIPRM.2016.7528683","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528683","url":null,"abstract":"Blue-green InGaN/GaN light-emitting diodes (LEDs) with spatially nonuniform current injection were fabricated and tested. Broad electroluminescence (EL) spectra with equal peak intensities of blue and green emission lines and shallow trough between them were observed at elevated injected current. These features of EL-spectrum are believed to be caused by the mesh-like patterning of the electrode as it creates spatially nonuniform electric potential which provides spatial modulation of the injected current along the QW-planes. The latter results not only in spatial nonuniformity of intensity of generated light along the QW-planes but due to screening of polarization field in the QWs causes also position-dependent blue shift of EL. The observed phenomenon can be used to control the EL spectra of dual-wavelength LEDs by the patterned electrodes.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129815407","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Efficient use of uniform GaN HVLEDs for small-flicker general illumination applications with converter-free LED drivers 有效地使用均匀GaN hvled小闪烁一般照明应用与无转换器的LED驱动器
Yuefei Cai, Xinbo Zou, Yuan Gao, Lisong Li, P. Mok, K. Lau
{"title":"Efficient use of uniform GaN HVLEDs for small-flicker general illumination applications with converter-free LED drivers","authors":"Yuefei Cai, Xinbo Zou, Yuan Gao, Lisong Li, P. Mok, K. Lau","doi":"10.1109/ICIPRM.2016.7528729","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528729","url":null,"abstract":"GaN high voltage LED (HVLED) chips designed and fabricated for low-flicker converter-free LED drivers are reported. The HVLED chips show uniform electrical performance (forward voltage at 20 mA varies from 8.5 V to 8.7 V for 3-cell chips, 16.7 V to 17.4 V for 6-cell chips) and good linearity of output /input power up to 100W/cm2 input. Both features satisfy the demanding requirements of the novel quasi-constant power control scheme adopted in the converter-free LED driver circuit. After bonding a total of 60 LED cells (eight 6-cell chips and four 3-cell chips) and a converter-free LED driver on a silicon carrier, a compact and low-flicker lighting system integration is demonstrated.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128332694","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Output characteristics of GaAs photoconductive semiconductor switch at high bias voltages 高偏置电压下砷化镓光导半导体开关的输出特性
Yong-Pyo Kim, Jiheon Ryu, Sunghyun Baek, Sung-Min Hong, Sungbae Lee, Jae‐Hyung Jang
{"title":"Output characteristics of GaAs photoconductive semiconductor switch at high bias voltages","authors":"Yong-Pyo Kim, Jiheon Ryu, Sunghyun Baek, Sung-Min Hong, Sungbae Lee, Jae‐Hyung Jang","doi":"10.1109/ICIPRM.2016.7528616","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528616","url":null,"abstract":"A photoconductive semiconductor switch (PCSS) with a gap of 2 mm was fabricated on a semi-insulating GaAs substrate. The PCSS was excited by a 1064 nm wavelength pulse laser which has 700 ps pulse width (FWHM) and energy of 135 μJ. Output pulses of the PCSS were recorded at bias voltages from 100 V to 1.4 kV in fluorinert ambience which has high dielectric strength (Eb > 160 kV/cm). At bias voltages below 1 kV, the PCSS exhibited the linear operational mode, where the output pulse amplitude linearly increases with the increased bias voltage. When the bias voltage gets higher than 1 kV, the output pulse amplitude begin to increase more rapidly due to nonlinear optical process. The pulse width and fall time of the output pulses increased correspondingly.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128366502","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Ternary and quaternary wurtzite-type oxide semiconductors: β-CuGaO2 and its related materials 三元和四元纤锌矿型氧化物半导体:β-CuGaO2及其相关材料
T. Omata, Y. Mizuno, Issei Suzuki, Hiraku Nagatani, M. Kita
{"title":"Ternary and quaternary wurtzite-type oxide semiconductors: β-CuGaO2 and its related materials","authors":"T. Omata, Y. Mizuno, Issei Suzuki, Hiraku Nagatani, M. Kita","doi":"10.1109/ICIPRM.2016.7528739","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528739","url":null,"abstract":"β-NaFeO<sub>2</sub> structure is an orthorhombic and ternary wurtzite-derived structure. Recently, we found a new oxide semiconductor possessing this structure, β-CuGaO<sub>2</sub>, of which energy band gap is 1.47 eV, and it exhibits p-type electrical conduction. In this presentation, we introduce optical and electrical properties of β-CuGaO<sub>2</sub> and band gap engineering of this material by alloying with β-CuAlO<sub>2</sub> and β-LiGaO<sub>2</sub>. Wurtzite-type β-NaFeO<sub>2</sub>-type phases were obtained in 0<;under><;<;/under>x<;under><;<;/under>0.7 and the band gap was widened up to 2.1 eV in Cu(Ga<sub>1-x</sub>Al<sub>x</sub>)O<sub>2</sub> system. In (Cu<sub>1-x</sub>Li<sub>x</sub>)GaO<sub>2</sub> system, wurtzite-type phases were obtained in 0<;under><;<;/under>x<;under><;<;/under>1, and the band gap was adjustable between 1.47 and 5.6 eV. These new quaternary oxide semiconductors possessing wurtzite-derived structure expanded the energy region that the oxide semiconductors cover into visible and near-infrared region.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"120 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128562185","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
InP-based uni-traveling-carrier photodiodes (UTC-PDs) with 3-dB bandwidth over 135 GHz 3db带宽超过135ghz的基于inp的单行载流子光电二极管(utc - pd)
Q. Meng, Hong Wang, Chongyang Liu, Xin Guo, K. Ang
{"title":"InP-based uni-traveling-carrier photodiodes (UTC-PDs) with 3-dB bandwidth over 135 GHz","authors":"Q. Meng, Hong Wang, Chongyang Liu, Xin Guo, K. Ang","doi":"10.1109/ICIPRM.2016.7528580","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528580","url":null,"abstract":"Summary form only given. In this paper, we report high-performance InP-based UTC-PDs with dipole-doped structure at 1.55 μm wavelength. It is experimentally demonstrated that UTC-PD can achieve both a high photocurrent and a fast photoresponse with high 3-dB bandwidth over 40 GHz by inserting a dipole-doped structure at the InGaAs/InP absorption/collection interface to suppress the current blocking. In addition, in order to predict the 3-dB bandwidth of high-photocurrent and high-speed UTC-PD with dipole-doped structure and to extract model parameters accurately and conveniently, an equivalent circuit and a semi-analytical parameter extraction method are employed in this work. An 18-μm-diameter UTC-PD has yielded a maximum 3-dB bandwidth result over 135 GHz.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129000596","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Hydrophilic graphene film by molecular functionalization 分子功能化的亲水石墨烯薄膜
Y. Taniguchi, T. Miki, Takanori Mitsuno, Y. Ohno, M. Nagase, K. Minagawa, M. Yasuzawa
{"title":"Hydrophilic graphene film by molecular functionalization","authors":"Y. Taniguchi, T. Miki, Takanori Mitsuno, Y. Ohno, M. Nagase, K. Minagawa, M. Yasuzawa","doi":"10.1109/ICIPRM.2016.7528699","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528699","url":null,"abstract":"Hydrophilic graphene film by molecular functionalization was investigated. In order to realize the hydrophilic graphene film without introducing defects, the pyrene derivative with a phosphorylcholine group was synthesized. Functionalization time dependences on contact angle and 4-terminal resistivity were measured using SiC epitaxial graphene. Contact angle was almost constant (76°) at first, and then, suddenly decreased (59°) at 3 min. On the other hand, resistivity was gradually increased (0.6 to 2.4 μΩm), and saturated after 5 min, indicates that this functionalization process does not break the graphene structure. These results indicate that hydrophilic graphene film was successfully fabricated by molecular functionalization.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124613884","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Critical heterostructure design for low on-resistance normally-off double-channel MOS-HEMT 低导通电阻常关双通道MOS-HEMT关键异质结构设计
Jin Wei, Sheng-gen Liu, Baikui Li, Xi Tang, Gaofei Tang, Zhaofu Zhang, K. J. Chen
{"title":"Critical heterostructure design for low on-resistance normally-off double-channel MOS-HEMT","authors":"Jin Wei, Sheng-gen Liu, Baikui Li, Xi Tang, Gaofei Tang, Zhaofu Zhang, K. J. Chen","doi":"10.1109/ICIPRM.2016.7528768","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528768","url":null,"abstract":"Summary form only given. A normally-off gate-recessed double-channel MOS-HEMT (DC-MOS-HEMT) has been recently demonstrated with the advantages of (1) low on-resistance and (2) low sensitivity of threshold voltage on recess depth. A critical design parameter for achieving a low overall ON-resistance is identified to be the separation of the two heterojunction channels that determines the strength of electrical coupling between the two channels. When the coupling is weak as a result of a larger separation, the upper channel in the access region is electrically isolated from the gate-controlled lower channel and cannot contribute to lowering the access resistance. When the coupling is strong as a result of a smaller separation, the upper and lower channels are electrically “merged” so that both the upper and lower heterojunction channels in the access region are effectively connected to the lower heterojunction channel controlled by the gate, enabling a low ON-resistance.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130105091","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Transmission performance improvement of semiconductor lasers by hybrid modulation scheme 混合调制方案对半导体激光器传输性能的改善
S. Mieda, N. Yokota, W. Kobayashi, H. Yasaka
{"title":"Transmission performance improvement of semiconductor lasers by hybrid modulation scheme","authors":"S. Mieda, N. Yokota, W. Kobayashi, H. Yasaka","doi":"10.1109/ICIPRM.2016.7528755","DOIUrl":"https://doi.org/10.1109/ICIPRM.2016.7528755","url":null,"abstract":"We propose a hybrid modulation scheme which has a wider 3-dB bandwidth and higher dispersion tolerance compared with a direct current modulation (DM) scheme. Frequency responses and eye diagrams are calculated by using rate equations. The calculated frequency response shows that the hybrid modulation scheme improves modulation sensitivity degradation at a high-frequency region and enhances 3-dB bandwidth of a semiconductor laser. Comparison of the eye diagrams between DM and hybrid modulation schemes shows that the hybrid modulation scheme has a good dispersion tolerance compared with the DM scheme thanks to its negative chirp property.","PeriodicalId":357009,"journal":{"name":"2016 Compound Semiconductor Week (CSW) [Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2016-06-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121483329","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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