Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176最新文献_第6页

Microflex: a new technique for hybrid integration for microsystems Microflex:微系统混合集成的新技术

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659773

H. Beutel, T. Stieglitz, J. Meyer

{"title":"Microflex: a new technique for hybrid integration for microsystems","authors":"H. Beutel, T. Stieglitz, J. Meyer","doi":"10.1109/MEMSYS.1998.659773","DOIUrl":"https://doi.org/10.1109/MEMSYS.1998.659773","url":null,"abstract":"This paper describes a new interconnection wire method which allows versatile multiple strand connections between microsensors: sensor arrays and integrated circuits (IC). The interconnection method is termed Micro Flex Interconnects (MFI). One example for this technology is the connection of implantable, highly flexible neural micro devices to electronics for interfacing to the external world. The interconnection technique is based on a novel multilayer process using polyimide (Du Pont PI 2611). The thickness of the polyimide structure ranges from 5 to 15 /spl mu/m including the insulation layers. Several metallization layers can be embedded in the material. This approach exhibits same advantages. The involved material is non-toxic and the ICs do not need any additional bond pad metallization. The MFI technique has been proven long-term stable. The metallization material can be chosen accordingly for electrodes, conducting lines, and connection pads. An commercial ball wedge bonder is the only equipment needed to perform the MFI method.","PeriodicalId":340972,"journal":{"name":"Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176","volume":"97 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1998-01-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133485010","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 9

Closed loop controlled, large throw, magnetic linear microactuator with 1000 /spl mu/m structural height 闭环控制，大抛距，结构高度1000 /spl mu/m的磁性直线微驱动器

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659792

H. Guckel, K. Fischer, E. Stiers

引用次数: 24

Fully packaged CMOS current monitor using lead-on-chip technology 采用片上引线技术的全封装CMOS电流监视器

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659826

R. Steiner, M. Schneider, F. Mayer, U. Munch, T. Mayer, H. Baltes

引用次数: 9

Anisotropic etching rates of single-crystal silicon for TMAH water solution as a function of crystallographic orientation 单晶硅在TMAH水溶液中的各向异性刻蚀速率与晶体取向的关系

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659818

Kazuo Sato, M. Shikida, T. Yamashiro, K. Asaumi, Y. Iriye, M. Yamamoto

引用次数: 168

Shape effect on mechanical quality factor of micro-resonator 形状对微谐振器机械品质因子的影响

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659753

S. Kobayashi, Y. Konaka, K. Ohwada

引用次数: 1

Microsystems for measurement and dosage of volatile anesthetics and respirative gases in anesthetic equipment 麻醉设备中挥发性麻醉剂和呼吸气体的测量和剂量用微系统

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659810

E. Burte, Kerstin Rintelmann, G. Temmel

{"title":"Microsystems for measurement and dosage of volatile anesthetics and respirative gases in anesthetic equipment","authors":"E. Burte, Kerstin Rintelmann, G. Temmel","doi":"10.1109/MEMSYS.1998.659810","DOIUrl":"https://doi.org/10.1109/MEMSYS.1998.659810","url":null,"abstract":"The state-of-the art in an anesthetic equipment uses a minimal flow concept to optimize anesthetic liquid consumption to cut costs and to protect the environment from anesthetic gases obtaining fluorine chlorine carbon compounds. In this work, a multi-channel sensing system is presented, which is capable of measuring the concentration of anesthetic gases in the mainstream of a respiratory circle. This system is based on non-dispersive infrared absorption spectroscopy and measures the concentration of carbon dioxide, nitrous oxide and any composition containing two of the following volatile anesthetics: Enfluran, Isofluran and Halothan. Furthermore, a microdosage system consisting of a micropump and a micronebulizer was developed. Both components are based on silicon technology. This system allows to adjust the anesthetic liquid mass flow from about 4 /spl mu/J/min up to about 1000 /spl mu/l/min. Both systems were tested as subsystems of the anesthetic apparatus Physioflex.","PeriodicalId":340972,"journal":{"name":"Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176","volume":"63 1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1998-01-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115325817","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Fabrication of microstructures using aluminum anodization techniques 用铝阳极氧化技术制备微结构

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659767

A. Nadeem, M. Mescher, K. Rebello, L. Weiss, C. Wu, M. Feldman, M. L. Reed

{"title":"Fabrication of microstructures using aluminum anodization techniques","authors":"A. Nadeem, M. Mescher, K. Rebello, L. Weiss, C. Wu, M. Feldman, M. L. Reed","doi":"10.1109/MEMSYS.1998.659767","DOIUrl":"https://doi.org/10.1109/MEMSYS.1998.659767","url":null,"abstract":"A promising technique for the fabrication of high-aspect-ratio microstructures, presented by Tan et. al. at MEMS-95, takes advantage of the highly ordered pore structure of anodic metal oxides. In this work, we have extended and simplified this method. This process is capable of producing high-aspect-ratio microstructures oriented normal to a nonplanar substrate. Unlike the original process in which the aluminum substrate was anodized to the desired depth, masked and subsequently etched, the modified process involves performing the masking lithography prior to anodization. Patterned areas of an aluminum substrate are masked with a 0.6/spl mu/m layer of sputtered silicon dioxide. The SiO/sub 2/ layer prevents anodization in masked areas while the oxide grows in unmasked areas. In this paper, we present preliminary results using this local anodization process on aluminum substrates and discuss the use of the process for fabricating structures on nonplanar substrates.","PeriodicalId":340972,"journal":{"name":"Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1998-01-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115330147","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 12

Operation and testing of electrostatic microactuators and micromachined sound detectors for active control of high speed flows 用于主动控制高速流的静电微致动器和微机械声探测器的操作和测试

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659733

C. Huang, K. Najafi, E. Alnajjar, C. Christophorou, A. Naguib, H. Nagib

{"title":"Operation and testing of electrostatic microactuators and micromachined sound detectors for active control of high speed flows","authors":"C. Huang, K. Najafi, E. Alnajjar, C. Christophorou, A. Naguib, H. Nagib","doi":"10.1109/MEMSYS.1998.659733","DOIUrl":"https://doi.org/10.1109/MEMSYS.1998.659733","url":null,"abstract":"The operation and testing of a combined microactuator/microsensor system for use in a high speed jet are presented. Electrostatic actuators have been fabricated using a bulk-silicon dissolved-wafer process, and are more than 12 /spl mu/m in thickness to achieve a large stiffness in the z-direction. The \"micro\" actuators resonate at a frequency of 5 kHz/14 kHz and an amplitude of >70 /spl mu/m peak-peak, generate significant disturbances into the \"macro\" scale jet flow, and survive operation at speeds of >210 m/s. An array of micromachined sound detectors for the detection of onset of jet screech has also been fabricated. The detectors use stress compensated PECVD silicon nitride/oxide membranes together with monocrystalline ion-implanted p/sup ++/ silicon piezoresistors to achieve high sensitivity. They have a static sensitivity of 1.1 /spl mu/V/V/spl middot/Pa with a 2% nonlinearity over an operating pressure range of 10 kPa.","PeriodicalId":340972,"journal":{"name":"Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176","volume":"73 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1998-01-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128363543","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 11

Simulation of gas damping in microstructures with nontrivial geometries 非平凡几何微结构中气体阻尼的模拟

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659749

J. Mehner, S. Kurth, D. Billep, C. Kaufmann, K. Kehr, W. Dotzel

引用次数: 50

MAMOS-a novel displacement sensitive transducer for fully digital integrated ac accelerometer mamos是一种新型位移敏感传感器，用于全数字集成交流加速度计

Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176 Pub Date : 1998-01-25 DOI: 10.1109/MEMSYS.1998.659780

Y. Yee, M. Park, S. Lee, S. Lee, K. Chun, Y. Kim, D. Cho

{"title":"MAMOS-a novel displacement sensitive transducer for fully digital integrated ac accelerometer","authors":"Y. Yee, M. Park, S. Lee, S. Lee, K. Chun, Y. Kim, D. Cho","doi":"10.1109/MEMSYS.1998.659780","DOIUrl":"https://doi.org/10.1109/MEMSYS.1998.659780","url":null,"abstract":"A fully digital integrated accelerometer was designed and fabricated based on CMOS and micromachining technologies. The sensing elements of this accelerometer are floating gated n-type MOSFETs with the variable airgap proportional to applied acceleration as gate insulator. The change of this air-gap distance alters the drain current of the sensing MOSFET (metal air-gap MOSFET: MAMOS). Current controlled oscillator converts the change of the drain current of MAMOS to frequency output. Twenty-bit synchronous binary counter is integrated to digitize the frequency output. CMOS compatible doping and annealing process for 2-/spl mu/m-thick polysilicon used as suspension springs is developed to optimize the trade-off between the mechanical properties and the electrical requirements. Through the slightly modified 1.5 /spl mu/m CMOS integrated circuit process followed by anisotropic silicon etch, integrated silicon digital accelerometer was fabricated.","PeriodicalId":340972,"journal":{"name":"Proceedings MEMS 98. IEEE. Eleventh Annual International Workshop on Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems (Cat. No.98CH36176","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1998-01-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128117359","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 4