{"title":"Thermal challenges in Photonic Integrated Circuits","authors":"J. Punch","doi":"10.1109/ESIME.2012.6191810","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191810","url":null,"abstract":"Photonics Integrated Circuits (PICs), a feature of contemporary optical communications technologies, can represent a stringent packaging challenge, particularly in terms of their requirements for thermal control. Devices such as laser arrays can demonstrate tight temperature limits, sub-ambient operating temperatures, moderate heat loads but high device-level heat fluxes. A key feature of many hybrid PICs is a multi-layer substrate which offers mechanical support, electrical interconnection and heat spreading for the devices that it carries; such substrates are typically mounted on a thermoelectric module (TEM) to achieve thermal control. This paper considers two thermal challenges associated with such PICs, in order to ensure their efficient operation: the requirement for aggressive heat sinking; and the imperative of adequate heat spreading within the substrate on the temperature controlled side of the TEM. To this end, a closed-form electrothermal model is developed for a representative PIC which captures the conductive heat transfer within the substrate, coupled with a constitutive representation of the TEM and its heat sink. An example of a laser array PIC is considered in order to illustrate the importance of heat sinking and spreading. This paper represents some initial results of an extensive programme of work on packaging-related aspects of next-generation PICs.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128502347","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Hongyu Tang, D. Yang, G. Zhang, Fengze Hou, M. Cai, Zaifu Cui
{"title":"Multi-physics simulation and reliability analysis for LED luminaires under step stress accelerated degradation test","authors":"Hongyu Tang, D. Yang, G. Zhang, Fengze Hou, M. Cai, Zaifu Cui","doi":"10.1109/ESIME.2012.6191774","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191774","url":null,"abstract":"In this paper, the 3D model of a LED luminaire is built using the software Pro/Engineer and then the model is transferred to ANSYS Workbench platform where the LED luminaire under the temperature and humidity conditions during step stress accelerated degradation test (SSADT) is simulated. The simulation results of temperature distribution, humidity distribution and stress distribution of the model at three levels of temperature (45°C, 65°C, 85°C) and 60% RH (Relative Humidity) are acquired using multi-physics approach. In the post-processing of temperature data, combining Yamaoshi?s optical power empirial formula of LED degradation with the junction temperature in simulation, the optical decay curves at each stage of the test are obtained. Then, the long-term life test (LTLT) at room temperature (25°C) and SSADT at three levels of temperature are performed to illustrate the validity of simulation. The lumen maintenance of 3 LED luminaires by LTLT and 5 samples by SSADT are analyzed to evaluate the luminous flux, optical decay rate and reliability under different working and ambient conditions. Finally, a comparison is made between the results of experiment and simulation. It is shown that the simulation results agree well with optical decay curves from the test, which indicates that the method can be used to predict the optical decay of LED luminaires.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131272607","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
G. Torri, X. Rottenberg, D. Karabacak, M. Vandecasteele, C. van Hoof, R. Puers, H. Tilmans
{"title":"Optimized design and placement of piezoelectric transducers for micromechanical structures subject to membrane stress","authors":"G. Torri, X. Rottenberg, D. Karabacak, M. Vandecasteele, C. van Hoof, R. Puers, H. Tilmans","doi":"10.1109/ESIME.2012.6191753","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191753","url":null,"abstract":"This paper reports on the optimization of the design of piezoelectric transducer elements integrated on doubly-clamped micro-beam resonators. We report and emphasize the often forgotten influence of membrane stresses on defining the dimensions and optimal position of the piezoelectric transducer patches. The study is based on the shift of the inflection line (i.e., points of zero curvature) of the fundamental mode of vibration as a result of (excessive) membrane-stresses. The above is analysed theoretically using numerical models and is confirmed by impedance measurements and optical measurements of fabricated doubly-clamped beam resonators.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"111 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131512085","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Thermal modeling of active embedded chip into high density electronic board","authors":"C. Dia, E. Monier-Vinard, V. Bissuel, O. Daniel","doi":"10.1109/ESIME.2012.6191720","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191720","url":null,"abstract":"The recent PWB embedding technology is an attractive packaging alternative that allows a very high degree of miniaturization by stacking multiple core layers of embedded chips, using copper filled micro-vias as interconnections to improve electrical performances. The adoption of disruptive technology in future PWB designs will further increase the thermal management challenges by concentrating heat dissipation at the heart of the organic substrate and exacerbate the need of adequate cooling. In order to allow the electronic designer to early analyse the limits of the power dissipation, depending on the embedded chip location inside the board, as well as the chip thermal interactions with other chips or SMD components, an analytic thermal modelling approach has been established. The presented work describes the comparison of the analytic model results with the numerical detailed models of various embedded chips, and debates about the need or not to simulate in full details the embedded chips as well as the surrounding layers and micro-via structures of the substrate. The thermal behaviour predictions of the analytic model, found to be within ±10% of relative error, demonstrate its relevance to model an embedded chip and its neighbouring heating chips or components. The proposed approach promotes a new practical solution to achieve a more efficient design and to early identify the potential issues of board cooling.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133205661","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Influence of the barrier properties on the mechanical stress and migration distribution in a copper metallization","authors":"J. Kludt, J. Ciptokusumo, K. Weide-Zaage","doi":"10.1109/ESIME.2012.6191701","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191701","url":null,"abstract":"An exemplified calculation of migration effects was carried out for a via structure of 32nm node dimensions with wide lines. In the mechanical simulation the process-induced stress was considered in the simulations. The mass flux divergence was determined using a user routine which allows the calculation of migration effects under EM and SM load. The investigated cases show a very good correlation between simulation and measurements from literature. Additional the influence of new barrier materials like Ruthenium, as well as different dielectrics on the thermal-electrical mechanical behaviour was investigated.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129398340","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Increasing the robustness for reliable packages by prediction of delamination by cohesive zone element simulation","authors":"R. Pufall, M. Goroll, W. Kanert, R. Dudek","doi":"10.1109/ESIME.2012.6191748","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191748","url":null,"abstract":"Robustness of a package is often proven by performing temperature cycling tests. Thermo-mechanical stress caused by the mismatch of coefficients of thermal expansion (CTE) and temperature variations remains a major concern for the reliability of semiconductor components. This issue is usually addressed by exposing the component to a certain number of cycles, followed by e.g. scanning acoustic microscopy (SAM) to investigate delamination. Discussions about specific cycling conditions, e.g. using -65°C/+175°C instead of -55°C/+150°C for the minimum and maximum temperatures of the cycles or even using liquid-liquid cycling instead of air to air to speed up investigations [1], are often moot, because no real understanding of the effect of the cycling conditions on the component is available. Introducing the parameter adhesion allows the prediction of the delamination behaviour and the possibility to identify critical locations. Furthermore, it seems to be feasible to distinguish between two different failure mechanisms (interface crack propagation and crack initiation) leading to the same failure mode (delamination). Furthermore, it is almost a truism that testing alone does not suffice to ensure the reliability of a component. Reliability has to be built into the components from the beginning. As a consequence, the question should be turned around: It is not enough to look at delamination after a certain number of cycles in a stress test, the questions rather are, how the component should be designed and how the materials should be chosen to prevent delamination. Thus, the focus is changed from measuring delamination to measuring adhesion.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"54 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116202278","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Anisotropic strain-field-induced change of the electronic conductivity of graphene sheets and carbon nanotubes","authors":"M. Ohnishi, K. Suzuki, H. Miura","doi":"10.1109/ESIME.2012.6191706","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191706","url":null,"abstract":"Both a molecular dynamics analysis and the first principle calculation were applied to the explication of the relationship between the three-dimensional deformation of a CNT and a graphene sheet and their electronic conductivity,. In this study, various combinations of double-walled carbon nanotube structures were modeled for the analyses. The change of the resistivity of multi-walled carbon nanotubes (MWCNTs) under uni-axial strain was analyzed by applying the abinitio calculation based on density functional theory. Since a CNT consists of a six-membered carbon ring, the change of the band structure of a graphene sheet was also analyzed by applying the abinitio calculation based on density functional theory.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125203313","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Residual stresses in isotropic conductive adhesives with nano-Ag particles","authors":"M. Erinc, M. van Dijk, V. Kouznetsova","doi":"10.1109/ESIME.2012.6191707","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191707","url":null,"abstract":"Residual stresses that develop in a nano-Ag ICA interconnect during the assembly of a flip-chip pin grid array are investigated. A multiscale modeling framework is adopted to link the nano-sized particles to the interconnect level. This is achieved by the numerical analysis of the mechanical response during the curing process through the computational homogenization approach, in which two boundary value problems, one at each scale are formulated and solved in a concurrent, fully nested manner. The mechanical response of the interconnect is analyzed with respect to the particle volume fraction and distribution properties. It is shown that, although the overall residual stresses at the interconnect scale decrease with increasing filler fraction, at the particle scale local stress concentrations increase, indicating the possibility of damage and decohesion that might compromise mechanical integrity and interrupt the conductive path.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127255321","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
E. Marcault, D. Weidmann, A. Bourennane, M. Breil, L. Charpiot
{"title":"3D deformation FEM simulations and measurement during VDMOS transistor operation","authors":"E. Marcault, D. Weidmann, A. Bourennane, M. Breil, L. Charpiot","doi":"10.1109/ESIME.2012.6191781","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191781","url":null,"abstract":"This paper deals with the reliability of power device assembly. We make use of 3D electro-thermo-mechanical simulations tools to highlight the power chip deformation during its conducting state. Moreover, we carry out experimental deformation measurement using a T.D.M® (Topography and Deformation Measurement) equipment. These simulations and measurements could allow to evaluate the reached mechanical stress level in a power assembly (in the different materials and at the different interfaces) during power device operation.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121731927","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
E. Matsuura, K. Sawada, H. Mukaida, H. Aoki, F. Minami
{"title":"Evaluation of adhesion strength of semiconductor package with the Weibull stress","authors":"E. Matsuura, K. Sawada, H. Mukaida, H. Aoki, F. Minami","doi":"10.1109/ESIME.2012.6191696","DOIUrl":"https://doi.org/10.1109/ESIME.2012.6191696","url":null,"abstract":"The idea of the Weibull stress, which is based on the “local approach”, has been applied to delamination failure analyses of semiconductor packages. Interface fracture strengths between package mold resin and 42 alloy lead frame are obtained by a conventional shear test with three resin sizes and two shear heights. Six different facture strengths are converted to a same adhesion strength value which is expressed in terms of the critical Weibull stress. The Weibull stress can be used as non-relative indices of adhesion strengths unaffected by testing conditions. Delamination failures in a TSOP (Thin Small Outline Package) which occur during reflow soldering have been analyzed with the Weibull stress. The Weibull stresses of molded resin in the package at the temperature of reflow soldering are estimated on several spots where either delaminated area or non-delaminated area is distinguished by SAT (Scanning Acoustic Tomograph). Evaluated Weibull stress parameters at delaminated spots exceed the critical Weibull stress which is obtained by the shear test at 240°C. The result is opposite at points where delaminations are not observed. They are smaller than the critical value. This approach can be expected to predict delamination failures in semiconductor packages.","PeriodicalId":319207,"journal":{"name":"2012 13th International Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130716893","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}