Ultramicroscopy最新文献

{"title":"Point field emission electron source with a magnetically focused electron beam","authors":"Paweł Urbański, Piotr Szyszka, Marcin Białas, Tomasz Grzebyk","doi":"10.1016/j.ultramic.2023.113911","DOIUrl":"https://doi.org/10.1016/j.ultramic.2023.113911","url":null,"abstract":"<p>This paper presents a field emitter in the form of a silicon tip covered with a layer of carbon nanotubes. The emitted beam is focused with a set of two electrostatic lenses and – which is novelty in such structures – with a magnetic field. The presented approach gave very promising results. The field emitter was able to provide a high emission current (about 50 µA) and a beam with a small and homogeneous spot. Such electron sources are necessary components of many miniature MEMS and nanoelectronics devices. The presented source is dedicated especially for the use in currently developed MEMS X-ray sources and MEMS electron microscopes.</p>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139031305","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Point field emission electron source with a magnetically focused electron beam","authors":"Paweł Urbański,&nbsp;Piotr Szyszka,&nbsp;Marcin Białas,&nbsp;Tomasz Grzebyk","doi":"10.1016/j.ultramic.2023.113911","DOIUrl":"10.1016/j.ultramic.2023.113911","url":null,"abstract":"<div><p>This paper presents a field emitter in the form of a silicon tip covered with a layer of carbon nanotubes. The emitted beam is focused with a set of two electrostatic lenses and – which is novelty in such structures – with a magnetic field. The presented approach gave very promising results. The field emitter was able to provide a high emission current (about 50 µA) and a beam with a small and homogeneous spot. Such electron sources are necessary components of many miniature MEMS and nanoelectronics devices. The presented source is dedicated especially for the use in currently developed MEMS X-ray sources and MEMS electron microscopes.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139024565","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Generational assessment of EBSD detectors for cross-correlation-based analysis: From scintillators to direct detection","authors":"Josephine DeRonja ,&nbsp;Matthew Nowell ,&nbsp;Stuart Wright ,&nbsp;Josh Kacher","doi":"10.1016/j.ultramic.2023.113913","DOIUrl":"10.1016/j.ultramic.2023.113913","url":null,"abstract":"<div><p>Introduced over ten years ago, cross-correlation-based electron backscatter diffraction has enabled high precision measurements of crystallographic rotations and elastic strain gradients at high spatial resolution. Since that time, there have been remarkable improvements in electron detector technology, including the advent of ultra-high speed detectors and the commercialization of direct detectors. In this study, we assess the efficacy of multiple generations of electron detectors for cross-correlation-based analysis using a single crystal Si sample as a reference. We show that, while improvements in precision are modest, there have been significant gains in the rate at which high-quality diffraction patterns can be collected. This has important implications in the size of datasets that can be collected and reduces the impact of drift and sample contamination.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139031252","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Does the order of elastic and inelastic scattering affect an image or is there a top bottom effect from inelastic scattering?","authors":"Peter Rez","doi":"10.1016/j.ultramic.2023.113890","DOIUrl":"10.1016/j.ultramic.2023.113890","url":null,"abstract":"<div><p>Especially for light elements inelastic scattering is more probable than the elastic scattering that conveys the structural information. The question arises as to whether an image using inelastically scattered electrons is different depending on whether the elastic or inelastic scattering happens first, is there a top-bottom effect. We show that since inelastic scattering is concentrated in a narrow range of angles, much less than typical Bragg angles in light element materials, the inelastic and elastic processes are separable and, to a very good approximation, there is no top-bottom effect. For weakly scattering thin biological specimens that are phase objects the separation is exact and there can be no top-bottom effect.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138693087","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Correlative atomic force microscopy and scanning electron microscopy of bacteria-diamond-metal nanocomposites","authors":"David Rutherford ,&nbsp;Kateřina Kolářová ,&nbsp;Jaroslav Čech ,&nbsp;Petr Haušild ,&nbsp;Jaroslav Kuliček ,&nbsp;Egor Ukraintsev ,&nbsp;Štěpán Stehlík ,&nbsp;Radek Dao ,&nbsp;Jan Neuman ,&nbsp;Bohuslav Rezek","doi":"10.1016/j.ultramic.2023.113909","DOIUrl":"10.1016/j.ultramic.2023.113909","url":null,"abstract":"<div><p>Research investigating the interface between biological organisms and nanomaterials nowadays requires multi-faceted microscopic methods to elucidate the interaction mechanisms and effects. Here we describe a novel approach and methodology correlating data from an atomic force microscope inside a scanning electron microscope (AFM-in-SEM). This approach is demonstrated on bacteria-diamond-metal nanocomposite samples relevant in current life science research. We describe a procedure for preparing such multi-component test samples containing <em>E. coli</em> bacteria and chitosan-coated hydrogenated nanodiamonds decorated with silver nanoparticles on a carbon-coated gold grid. Microscopic topography information (AFM) is combined with chemical, material, and morphological information (SEM using SE and BSE at varied acceleration voltages) from the same region of interest and processed to create 3D correlative probe-electron microscopy (CPEM) images. We also establish a novel 3D RGB color image algorithm for merging multiple SE/BSE data from SEM with the AFM surface topography data which provides additional information about microscopic interaction of the diamond-metal nanocomposite with bacteria, not achievable by individual analyses. The methodology of CPEM data interpretation is independently corroborated by further <em>in-situ</em> (EDS) and <em>ex-situ</em> (micro-Raman) chemical characterization as well as by force volume AFM analysis. We also discuss the broader applicability and benefits of the methodology for life science research.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138631652","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Design and optimization of a conical electrostatic objective lens of a low-voltage scanning electron microscope for surface imaging and analysis in ultra-high-vacuum environment","authors":"Jeong-Woong Lee ,&nbsp;In-Yong Park ,&nbsp;Takashi Ogawa","doi":"10.1016/j.ultramic.2023.113908","DOIUrl":"10.1016/j.ultramic.2023.113908","url":null,"abstract":"<div><p>Low-voltage scanning electron microscopy (LV-SEM) with landing energies below 5 keV has been widely used due to its advantages in mitigating the damage and charging effects to a specimen and enhancing surface information due to small interaction volume of electrons inside a specimen. Additionally, for elemental analysis of the surfaces of bulk specimens with Auger electron spectroscopy (AES) or electron energy loss spectroscopy (EELS), ultra-high-vacuum (UHV) environment is essential to maintain clean surfaces without the absorption of gas molecules during the electron beam irradiation for the acquisition of spectral data. In this study, we propose the optimal design and condition of a conical Electrostatic Objective Lens (EOL) for a UHV LV-SEM to achieve the high spatial resolution and secondary electron (SE) detection efficiency. The EOL is composed of only the three electrodes (retarding, focusing and booster electrodes) and the insulators, which is suitable for maintaining a UHV environment with less out-gassing. The cone angle of the EOL is determined as 60° to integrate a spectrometer in the UHV LV-SEM and in a large size and a higher tilt angle of the sample. Through the optimization with the simulations, the EOL achieves the minimized spherical and chromatic aberration coefficients of 0.05 and 0.03 mm at the sample side, respectively, at the landing energy of 50 eV and the shortest working distance (WD) of 1 mm for high-resolution imaging. In addition, the probe diameter of the optimized EOL is 2.3 nm at 1 keV and 5.7 nm at 50 eV with a WD of 1 mm and a probe current of 10 pA, which are comparable to previously studied compound objective lenses with magnetic and electrostatic lenses. Using a longer WD of 4 mm for analysis, the probe diameter was 5.4 nm at 1 keV and the SE detection efficiency was 83.3 % owing to the separated scintillator detector structure from the booster electrode.</p><p>These results imply that the optimized EOL has the potential to be applied to a high-performance UHV LV-SEM for the surface imaging and analysis with a simple system configuration.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399123002255/pdfft?md5=ee2a1dfc31900e3dae27b5f667d8081b&pid=1-s2.0-S0304399123002255-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138632033","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Programmable comprehensive controller for multi-color 3D confocal spinning-disk image scanning microscope","authors":"Eli Flaxer ,&nbsp;Lanna Bram ,&nbsp;Alona Flaxer ,&nbsp;Yael Roichman ,&nbsp;Yuval Ebenstein","doi":"10.1016/j.ultramic.2023.113888","DOIUrl":"10.1016/j.ultramic.2023.113888","url":null,"abstract":"<div><p>This paper introduces a compact, portable, and highly accurate triggering control system for a 3D confocal spinning-disk image scanning microscope (CSD-ISM). Building upon on our previously published research, we expanded the hardware of the controller and synchronized it with a sub-micron translator which scans the object in the z-direction. As well as expanding the hardware, the software also was extended from previously published work similarly as it is stated for hardware while allowing full control over the 3D movement. We showed a clear and smooth 3D image made up of a collection of 2D images at different heights.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138563933","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"The target region focused imaging method for scanning ion conductance microscopy","authors":"Shengbo Gu ,&nbsp;Jian Zhuang ,&nbsp;Tianying Wang ,&nbsp;Shiting Hu ,&nbsp;Weilun Song ,&nbsp;Xiaobo Liao","doi":"10.1016/j.ultramic.2023.113910","DOIUrl":"10.1016/j.ultramic.2023.113910","url":null,"abstract":"<div><p>Scanning ion conductance microscopy (SICM) has developed rapidly and has wide applications in biomedicine, single-cell science and other fields. SICM scanning speed is limited by the conventional raster-type scanning method, which spends most of time on imaging the substrate and does not focus enough on the target area. In order to solve this problem, a target region focused (TRF) method is proposed, which can effectively avoid the scanning of unnecessary substrate areas and enables SICM to image the target area only to achieve high-speed and effective local scanning. TRF method and conventional hopping mode scanning method are compared in the experiments using breast cancer cells and rat basophilic leukemia cells as experimental materials. It was demonstrated that our method can reduce the scanning time for a single sample image significantly without losing scanning information or compromising the quality of imaging. The TRF method developed in this paper can provide an efficient and fast scanning strategy for improving the imaging performance of SICM systems, which can be applied to the dynamic features of cell samples in the fields of biology and pharmacology analysis.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138563822","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Multi-exposure diffraction pattern fusion applied to enable wider-angle transmission Kikuchi diffraction with direct electron detectors","authors":"Tianbi Zhang,&nbsp;T．Ben Britton","doi":"10.1016/j.ultramic.2023.113902","DOIUrl":"10.1016/j.ultramic.2023.113902","url":null,"abstract":"<div><p><span>Diffraction pattern<span> analysis can be used to reveal the crystalline structure of materials, and this information is used to nano- and micro-structure of advanced engineering materials that enable modern life. For nano-structured materials typically diffraction pattern analysis is performed in the transmission </span></span>electron microscope<span> (TEM) and TEM diffraction patterns typically have a limited angular range (less than a few degrees) due to the long camera length, and this requires analysis of multiple patterns to probe a unit cell. As a different approach, wide angle Kikuchi patterns can be captured using an on-axis detector in the scanning electron microscope (SEM) with a shorter camera length. These ‘transmission Kikuchi diffraction’ (TKD) patterns present a direct projection of the unit cell and can be routinely analysed using EBSD-based methods and dynamical diffraction theory. In the present work, we enhance this analysis significantly and present a multi-exposure diffraction pattern fusion method that increases the dynamic range of the detected patterns captured with a Timepix3-based direct electron detector (DED). This method uses an easy-to-apply exposure fusion routine to collect data and extend the dynamic range, as well as normalise the intensity distribution within these very wide (&gt;95°) angle patterns. The potential of this method is demonstrated with full diffraction sphere reprojection and highlight potential of the approach to rapidly probe the structure of nano-structured materials in the scanning electron microscope.</span></p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138545190","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Exploration of fs-laser ablation parameter space for 2D/3D imaging of soft and hard materials by tri-beam microscopy","authors":"A. Gholinia ,&nbsp;J. Donoghue ,&nbsp;A. Garner ,&nbsp;M. Curd ,&nbsp;M.J. Lawson ,&nbsp;B. Winiarski ,&nbsp;R. Geurts ,&nbsp;P.J. Withers ,&nbsp;T.L. Burnett","doi":"10.1016/j.ultramic.2023.113903","DOIUrl":"10.1016/j.ultramic.2023.113903","url":null,"abstract":"<div><p>Tri-beam microscopes comprising a fs-laser beam, a Xe+ plasma focused ion beam (PFIB) and an electron beam all in one chamber open up exciting opportunities for site-specific correlative microscopy. They offer the possibility of rapid ablation and material removal by fs-laser, subsequent polishing by Xe-PFIB milling and electron imaging of the same area. While tri-beam systems are capable of probing large (mm) volumes providing high resolution microscopical characterisation of 2D and 3D images across exceptionally wide range of materials and biomaterials applications, presenting high quality/low damage surfaces to the electron beam can present a significant challenge, especially given the large parameter space for optimisation. Here the optimal conditions and artefacts associated with large scale volume milling, mini test piece manufacture, serial sectioning and surface polishing are investigated, both in terms of surface roughness and surface quality for metallic, ceramic, mixed complex phase, carbonaceous, and biological materials. This provides a good starting place for those wishing to examine large areas or volumes by tri-beam microscopy across a range of materials.</p></div>","PeriodicalId":23439,"journal":{"name":"Ultramicroscopy","volume":null,"pages":null},"PeriodicalIF":2.2,"publicationDate":"2023-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S0304399123002206/pdfft?md5=ef1794713bfe58475b5fe9964d85cb18&pid=1-s2.0-S0304399123002206-main.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"138531067","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}