Qiaosha Zou, J. Zhan, Fen Ge, Matthew Poremba, Yuan Xie
{"title":"Designing vertical bandwidth reconfigurable 3D NoCs for many core systems","authors":"Qiaosha Zou, J. Zhan, Fen Ge, Matthew Poremba, Yuan Xie","doi":"10.1109/3DIC.2014.7152186","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152186","url":null,"abstract":"As the number of processing elements increases in a single chip, the interconnect backbone becomes more and more stressed when serving frequent memory and cache accesses. Network-on-Chip (NoC) has emerged as a potential solution to provide a flexible and scalable interconnect in a planar platform. In the mean time, three-dimensional (3D) integration technology pushes circuit design beyond Moore's law and provides short vertical connections between different layers. As a result, the innovative solution that combines 3D integrations and NoC designs can further enhance the system performance. However, due to the unpredictable workload characteristics, NoC may suffer from intermittent congestions and channel overflows, especially when the network bandwidth is limited by the area and energy budget. In this work, we explore the performance bottlenecks in 3D NoC, and then leverage redundant TSVs, which are conventionally used for fault tolerance only, as vertical links to provide additional channel bandwidth for instant throughput improvement. Moreover, these shared redundant links can be dynamically allocated to the stressed routers for congestion alleviation. Experimental results show that our proposed NoC design can provide up to 40% performance improvement, with less than 1.5% area overhead.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116781589","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Substrate monitoring system for inspecting defects in TSV-based data buses","authors":"Y. Araga, K. Kikuchi, M. Aoyagi","doi":"10.1109/3DIC.2014.7152179","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152179","url":null,"abstract":"Three dimensional ICs are expected to bring about a new generation of integration by allowing for a smaller footprint, faster operation, and lower energy consumption. Manufacturing defects in through-silicon via (TSV) and disconnection defects among tiers are concerns in this new technology. To prevent yield loss from these defects, confirming known-good-die (KGD) and known-good-stacks (KGS) by test is a critical issue. In this paper, embedded test circuitry is proposed to guarantee KGD and KGS by measuring noise on the silicon substrate. The proposed test circuit consists of simple circuitry and potentially can test multiple TSVs with just a single channel of test circuitry. Testing by using substrate noise measurements does not require direct electrical connections. Hence, the proposed test structure does not invade the original circuit design. An analytical model is created to indicate effectivity of the test structure. Analytical result shows a single channel of test circuitry can test 72 TSVs of the same pitch, such as would be encountered in Wide-I/O. Use of the test structure both during initial calibration and then during actual product use are discussed.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124271005","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
D. N. Wright, M. Taklo, Astrid-Sofie B. Vardøy, H. Kristiansen
{"title":"Metal coated polymer spheres for compliant fine pitch ball grid arrays","authors":"D. N. Wright, M. Taklo, Astrid-Sofie B. Vardøy, H. Kristiansen","doi":"10.1109/3DIC.2014.7152177","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152177","url":null,"abstract":"The further development of heterogeneous 3D integration involving electrical connections between layers of various materials demand compliant fine pitch interconnects to allow for the varying expansion as a function of temperature of the different materials involved. However, most available fine pitch interconnects, like micro bumps and copper pillars, are not particularly compliant whereas available compliant interconnects, like plastic core solder balls, are not fine pitch. In this work we present a novel process for achieving a fine pitch ball grid array comprised of compliant interconnects using singular 30 μm metal coated polymer spheres (MPS) in conjunction with nano-particle silver conductive ink. Results show that when an MPS attached to a chip is flip chip assembled onto a substrate with a 1.3 μm thick layer of wet conductive ink, the ink is drawn up along the MPS surface to such an extent that it a forms a bonding neck between the MPS and the chip surface. It also created a coating up to 1.5 μm on the MPS. Shear testing of the assembly gave values of up to 0.67 grams per MPS. This strength can be increased further by optimizing the process and to utilize such an interconnect in combination with underfill can result in sufficient reliability for several applications. The volume of ink required to form such bonds is in the same range as industrial ink jet nozzles can deliver. MPS was applied onto a substrate which had been jetted with a regular pattern of ink droplets. It was found that the MPS were observed to have had a certain extent of self-alignment along the jetted pattern.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123296301","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Chaoqi Zhang, Paragkumar Thadesar, Muneeb Zia, Thomas E. Sarvey, M. Bakir
{"title":"Au-NiW Mechanically Flexible Interconnects (MFIs) and TSV integration for 3D interconnects","authors":"Chaoqi Zhang, Paragkumar Thadesar, Muneeb Zia, Thomas E. Sarvey, M. Bakir","doi":"10.1109/3DIC.2014.7152166","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152166","url":null,"abstract":"Mechanically Flexible Interconnects (MFIs) with a pitch of 50 μm and a standoff height of 65 μm are reported. Mechanical characterization of the MFIs using indentation demonstrates elastic deformation and the feasibility of temporary interconnection. The integration of MFIs and TSVs is also reported along with electrical testing for interposer and 3D IC applications.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126455755","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Jonghoon J. Kim, Bumhee Bae, Sukjin Kim, Sunkyu Kong, Heegon Kim, D. Jung, Joungho Kim
{"title":"Magnetically-coupled current probing structure consisting of TSVs and RDLs in 2.5D and 3D ICs","authors":"Jonghoon J. Kim, Bumhee Bae, Sukjin Kim, Sunkyu Kong, Heegon Kim, D. Jung, Joungho Kim","doi":"10.1109/3DIC.2014.7152151","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152151","url":null,"abstract":"Simultaneous switching current (SSC) drawn by integrated circuits (ICs) creates simultaneous switching noise (SSN) on power nets, which causes a number of SI/PI problems, such as reduced noise margin and eye opening with increased SSN. Analyzing the effects of SSC and SSN is especially important for ICs targeted for mobile applications whose operating frequency keeps on increasing with decreasing operating voltage. Therefore, it is of utmost importance to measure SSCs for a thorough analysis of high-speed systems. In this paper, a magnetically-coupled current probing structure consisting of TSVs and RDLs, namely TSV-based Current Probe (TCP), is proposed for measuring the SSC resulting from the logical activity of the I/O buffers in 2.5D and 3D-ICs. SSCs are found by capturing the magnetic flux induced by the SSC of interest with the proposed current probing structure, and then reconstructing the original current waveform using the transfer impedance profile. Through a series of simulation in frequency and time domains, we verified the performance of the proposed probing structure consisting of TSVs and RDLs and proved it can effectively measure the SSC. Lastly, a test vehicle is fabricated on package level for experimental verification of the proposed probing structure.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"9 2","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120897018","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
T. Bieniek, G. Janczyk, M. Ekwinska, T. Budzynski, P. Gluszko, P. Grabiec, A. Kociubiński
{"title":"Novel methodology for 3D MEMS-IC design and co-simulation on MEMS microphone smart system example","authors":"T. Bieniek, G. Janczyk, M. Ekwinska, T. Budzynski, P. Gluszko, P. Grabiec, A. Kociubiński","doi":"10.1109/3DIC.2014.7152184","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152184","url":null,"abstract":"The fundamental principle of complex systems development consists in integration of a range of design activities related to a set technological processes into the advanced, multistage, time consuming product development chain. The most representative sample smart system includes at least micro-electro-mechanical module (MEMS) assisted by the dedicated readout circuitry (IC) supporting specific signal conversion and data processing capabilities. Communication modules can be integrated in the IC or belong to particular application environment scheme.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"43 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122017583","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
K. Lee, C. Nagai, A. Nakamura, J. Bea, M. Murugesan, T. Fukushima, Tanaka Tanaka, M. Koyanagi
{"title":"Effects of electro-less Ni layer as barrier/seed layers for high reliable and low cost Cu TSV","authors":"K. Lee, C. Nagai, A. Nakamura, J. Bea, M. Murugesan, T. Fukushima, Tanaka Tanaka, M. Koyanagi","doi":"10.1109/3DIC.2014.7152153","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152153","url":null,"abstract":"Effects of electro-less Ni layer as barrier/seed layers were evaluated for high reliable and low cost Cu TSVs. To electrically characterize the effectiveness of a Ni layer as barrier/seed layers for TSV application, we fabricated the trench MOS capacitor with 5μm dia. and 50μm depth TSV array. Via holes were successfully filled by Cu electro-plating by using Ni seed layer. To characterize the blocking property of the Ni layer to Cu diffusion, Cu atoms were intentionally diffused from Cu TSV by annealing at 300°C and 400°C. X-ray spectrometer (EDX) and C-t analysis results shows that Cu atoms not diffuse into t h e Si substrate via the Ni layer even after annealing at 400°C. The Ni barrier layer has good blocking properties compared to a PVD barrier layer.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129822298","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Youngwoo Kim, Jonghyun Cho, Kiyeong Kim, Heegon Kim, Joungho Kim, S. Sitaraman, V. Sundaram, R. Tummala
{"title":"Analysis and optimization of a power distribution network in 2.5D IC with glass interposer","authors":"Youngwoo Kim, Jonghyun Cho, Kiyeong Kim, Heegon Kim, Joungho Kim, S. Sitaraman, V. Sundaram, R. Tummala","doi":"10.1109/3DIC.2014.7152180","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152180","url":null,"abstract":"2.5D integration based on interposer technologies provides high density integration and high system bandwidth. Among many materials for the interposer substrate, glass could be a promising material since it provides low signal loss and its ultra-thin thickness. When chips are stacked on the glass interposer, power distribution network impedance of 2.5D IC must be estimated, analyzed and optimized since it directly affects chips performance and signal integrity. In this paper, we modeled 2.5D-power distribution network using a segmentation method and verified with 3D-EM simulation. With verified model, power distribution network impedance of 2.5D IC with glass interposer was estimated and analyzed. Also modeled 2.5D-power distribution network was optimized with decoupling capacitors. Optimization was based on the target impedance derived from the current spectrum of switching I/O. Target impedance based on the current spectrum allowed more flexible power distribution network design compared to the conventional target impedance.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125538612","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
F. Inoue, H. Philipsen, M. V. Veen, K. Vandersmissen, S. V. Huylenbroeck, H. Struyf, Tetsu Tanaka
{"title":"Cu seeding using electroless deposition on Ru liner for high aspect ratio through-Si vias","authors":"F. Inoue, H. Philipsen, M. V. Veen, K. Vandersmissen, S. V. Huylenbroeck, H. Struyf, Tetsu Tanaka","doi":"10.1109/3DIC.2014.7152147","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152147","url":null,"abstract":"High aspect ratio through-Si vias (AR=16.7) filling has been achieved by using non-PVD seed metallization approach. We demonstrate the formation of conformal and thin electroless deposited Cu seed on Ru liner. The optimized ELD Cu process was conducted at room temperature on activated Ru surface, which can improve the ELD bath life time. The deposited Cu with 2,2' bipyridyl shows smoother and higher purity inside the Cu film.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127810113","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Manufacturing and test assistance for 3D-Integrated heterogeneous systems","authors":"A. Grünewald, M. Wahl, R. Brück","doi":"10.1109/3DIC.2014.7152171","DOIUrl":"https://doi.org/10.1109/3DIC.2014.7152171","url":null,"abstract":"Developing 3D systems is still not matured yet in semiconductor industry. Next to several open questions regarding the selection of a suitable technology, test has gained much significance, since several new test moments are involved. In this paper the different domains of the development process of a 3D-integrated heterogeneous system are analyzed. Finally, a tool will be presented which on one hand covers the process modeling for a set of dies and the required interconnects, on the other hand the test flow and the test cost for the complete stack. This tool is able to drastically reduce the effort of the system/process engineer in finding a feasible process and test flow.","PeriodicalId":231905,"journal":{"name":"2014 International 3D Systems Integration Conference (3DIC)","volume":"124 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124502020","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}