Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)最新文献

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Direct patterning on low dielectric constant materials with electron beam lithography 低介电常数材料的电子束光刻直接图案化
Ben-Chang Chen, Yee-Kai Lai, F. Ko, C. Chou, Hsuen‐Li Chen
{"title":"Direct patterning on low dielectric constant materials with electron beam lithography","authors":"Ben-Chang Chen, Yee-Kai Lai, F. Ko, C. Chou, Hsuen‐Li Chen","doi":"10.1109/IMNC.2001.984143","DOIUrl":"https://doi.org/10.1109/IMNC.2001.984143","url":null,"abstract":"Electron beam (EB) lithography and direct patterning of low-dielectric-constant (low-k) materials are two crucial issues of nanofabrication technologies. In this paper, we propose direct patterning of negative tone hydrogen silsesquioxane (HSQ) film of which can replace the use of resist processes including resist coating and stripping.","PeriodicalId":202620,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133058296","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Room temperature nanoimprint technology 室温纳米压印技术
Y. Igaku, S. Matsui, H. Ishigaki, J. Fujita, M. Ishida, Y. Ochiai, M. Komuro, H. Hiroshima, H. Namatsu
{"title":"Room temperature nanoimprint technology","authors":"Y. Igaku, S. Matsui, H. Ishigaki, J. Fujita, M. Ishida, Y. Ochiai, M. Komuro, H. Hiroshima, H. Namatsu","doi":"10.1109/IMNC.2001.984111","DOIUrl":"https://doi.org/10.1109/IMNC.2001.984111","url":null,"abstract":"Nano-imprint-lithography (NIL) (Chou et al, 1997), in which resist patterns are fabricated by deforming the resist physical shape through embossing with a mold, is a very useful technique to make nanostructure devices and various nanostructure devices such as a quantized magnetic disk (Wu et al, 1998) have been demonstrated by this method. It has excellent features with sub-10 nm feature size over a large area with high throughput and low cost. However, as a conventional NIL process has to heat a resist above the glass transition temperature to deform the resist physical shape with a mold pattern, the heating process causes serious problems for pattern accuracy. To overcome this problem, room-temperature replication into SOG (spin-on-glass) and HSQ (hydrogen silsesquioxane) (Namatsu et al, 1998) has been proposed and experiments have been conducted. In this paper, we describe a room-temperature replication into SOG/HSQ and a pattern transfer to a metal pattern and a substrate by using lift-off and RIE processes.","PeriodicalId":202620,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125934991","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of bio-MEMS devices for single cell expression analysis 用于单细胞表达分析的生物mems器件的开发
T. Ichiki, T. Hara, T. Ujiie, Y. Horiike, K. Yasuda
{"title":"Development of bio-MEMS devices for single cell expression analysis","authors":"T. Ichiki, T. Hara, T. Ujiie, Y. Horiike, K. Yasuda","doi":"10.1109/IMNC.2001.984154","DOIUrl":"https://doi.org/10.1109/IMNC.2001.984154","url":null,"abstract":"In order to provide total systems for single cell expression analysis, we have been developing a set of technology including cell cultivation, cell sorting, gene analysis from a specific cell, etc., using microfabrication technology. In this paper, we present the development of a cell sorter chip used as the core technology for establishing the cell sorting system that can separate and collect an individual cell according to its biological or biochemical information.","PeriodicalId":202620,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126922818","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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