Optics and Laser Technology最新文献_第8页

Method for improving illumination uniformity of a digital mask-less scanning lithography system

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-12 DOI: 10.1016/j.optlastec.2025.112595

Chunbo Lin , Wenbin Xu , Bochao Liu , He Wang , Qiang Sun , Chengyong Shi , Taisheng Wang , Hongxin Zhang , Zhankun Weng , Jia Xu

{"title":"Method for improving illumination uniformity of a digital mask-less scanning lithography system","authors":"Chunbo Lin , Wenbin Xu , Bochao Liu , He Wang , Qiang Sun , Chengyong Shi , Taisheng Wang , Hongxin Zhang , Zhankun Weng , Jia Xu","doi":"10.1016/j.optlastec.2025.112595","DOIUrl":"10.1016/j.optlastec.2025.112595","url":null,"abstract":"<div><div>To face the challenge of the highly complex illumination system resulting in extremely high hardware costs in mask and mask-less lithography, we propose a novel, simple, and low-cost DMD-based mask-less lithography method to improve illumination uniformity during continuous scanning patterning by using oblique scanning processes and DMD modulation. By loading a digital mask generated by DMD modulation and selectively turning off micromirror arrays on the DMD surface during oblique scanning, the light intensity distribution within the scanning exposure field is reconfigured, achieving 96 % illumination uniformity. Furthermore, the dimensional difference was reduced from 2.5 μm to 0.3 μm for a two-dimensional grating on a 3-inch substrate. Finally, a novel DMD-based mask-less lithography method was explored with significant improvements in both cost efficiency and patterning precision, making it a promising solution for future lithographic application<strong>s.</strong></div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112595"},"PeriodicalIF":4.6,"publicationDate":"2025-02-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143388481","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Effect of Cu interlayers on element diffusion and properties of laser welded Ti6Al4V/Inconel 718 dissimilar joints

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-12 DOI: 10.1016/j.optlastec.2025.112535

Qi’an Yin , Wenjie Ren , Gang Mou , Shanglu Yang

{"title":"Effect of Cu interlayers on element diffusion and properties of laser welded Ti6Al4V/Inconel 718 dissimilar joints","authors":"Qi’an Yin , Wenjie Ren , Gang Mou , Shanglu Yang","doi":"10.1016/j.optlastec.2025.112535","DOIUrl":"10.1016/j.optlastec.2025.112535","url":null,"abstract":"<div><div>The dissimilar joints of TC4 and IN718 were successfully welded by using a fiber laser and Cu interlayer with varying thicknesses. This research focused on the interface on the TC4 side, where two transition layers were identified: a Ti-rich layer and a Ti-poor layer. The Ti-rich layer primarily consisted of Ti<sub>2</sub>Cu and Ti<sub>2</sub>Ni. Meanwhile, the Ti-poor layer contained a range of harder and more brittle intermetallic compounds (IMCs), such as TiNiCu, TiCr<sub>2</sub> and TiFe<sub>2</sub>, with the thickness increasing as the interlayer thickness increased. The fracture of all the joints occurred at the interface on the TC4 side. Insufficient Cu introduction tended to cause the penetration of Ti into Layer B, reacting with elements such as Fe and Cr to form more brittle and hard IMCs. Conversely, excess Cu in the molten pool, resulting from the introduction of a 0.4 mm Cu interlayer could lead to the formation of much (Cu, Ni), which caused softening and a deterioration in the tensile strength of the joint. When a 0.3 mm Cu interlayer was employed, the diffusion of Ti and Cu reached equilibrium, resulting in an average tensile strength of 319 MPa for the obtained joint, which was 28 % higher than that of the joint with a 0.4 mm interlayer.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112535"},"PeriodicalIF":4.6,"publicationDate":"2025-02-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143388482","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Research advances of femtosecond laser drilling microholes in hard and brittle materials

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-11 DOI: 10.1016/j.optlastec.2025.112572

Zi-Qi Tang , Yun-Fei Li , Gong Wang , Yu Yu , He Cao , Li-Fang Li , Zhong-Shan Jin , Yu-Lei Wang , Zhiwei Lu

{"title":"Research advances of femtosecond laser drilling microholes in hard and brittle materials","authors":"Zi-Qi Tang , Yun-Fei Li , Gong Wang , Yu Yu , He Cao , Li-Fang Li , Zhong-Shan Jin , Yu-Lei Wang , Zhiwei Lu","doi":"10.1016/j.optlastec.2025.112572","DOIUrl":"10.1016/j.optlastec.2025.112572","url":null,"abstract":"<div><div>The current demand for device miniaturization and high-density interconnections prompts high-precision microholes machining as a promising direction. Several applications employing microholes machining have been established that have given more attention to chip cooling, sensor diaphragm preparation, particle filtration, etc. Femtosecond laser drilling microholes technology has distinguished itself from other traditional laser processing methods due to its high precision, low thermal damage and controllable processing path. Currently, femtosecond laser drilling technology has made significant progress in the micro/nanoholes on hard and brittle materials. This paper reviews the mechanism and research progress in preparing microholes on different hard and brittle materials using femtosecond lasers. The effect of laser processing parameters on the quality of microholes processing is summarized and other impact factors such as different types machining strategies and auxiliary methods are assessed. The current limitations of femtosecond laser drilling on hard and brittle materials and its application in sensing, heat dissipation, and other fields are discussed.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112572"},"PeriodicalIF":4.6,"publicationDate":"2025-02-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143388484","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Optical nonlinearities and ultrafast absorption dynamics in structurally tunable a:SiNx thin films

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-11 DOI: 10.1016/j.optlastec.2025.112589

Albin Kuriakose , Jitendra Nath Acharyya , Mohammad Adnan , Pankaj Srivastava , Venugopal Rao Soma , G. Vijaya Prakash

{"title":"Optical nonlinearities and ultrafast absorption dynamics in structurally tunable a:SiNx thin films","authors":"Albin Kuriakose , Jitendra Nath Acharyya , Mohammad Adnan , Pankaj Srivastava , Venugopal Rao Soma , G. Vijaya Prakash","doi":"10.1016/j.optlastec.2025.112589","DOIUrl":"10.1016/j.optlastec.2025.112589","url":null,"abstract":"<div><div>Amorphous non-stoichiometric silicon nitride (a:SiN<sub>x</sub>) has a wide and diverse range of optical and structural characteristic features based on the stoichiometric variation of silicon/nitrogen content. Such unique features are widely utilized in photonic and optoelectronic coatings and device concepts. Here we provide a comprehensive study of various silicon rich a:SiN<sub>x</sub> thin films (R = [N]/[Si] from 0.22 to 1.16) from structural, linear and nonlinear optical properties and ultrafast absorption dynamics using diverse experimental approaches. While X-ray photoelectron spectroscopy provides a comprehensive understanding of Si/N chemical compositional variation, the linear optical studies confirm the stoichiometric dependency. Ultrafast pump–probe (transient absorption) spectroscopy was utilised to analyse the excited state dynamics, which shows a significant correlation with the optical bandgap variation due to the stoichiometric composition. The extensive study of femtosecond laser-based third-order nonlinear investigations with varied laser intensities and excitation wavelengths provide in-depth information related to nonlinear absorption and bandgap/ molecular polarisation dependency. The studies also witnessed a strong correlation of third-order nonlinearities with linear refractive index and optical bandgap. The significant structural dependent linear and nonlinear optical features and the understanding of excited state dynamics could be highly useful for many new ideas for photonic and optoelectronic novel device concepts.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112589"},"PeriodicalIF":4.6,"publicationDate":"2025-02-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143378922","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Investigations on 355 nm nanosecond-picosecond dual-pulse laser enhanced ablation of carbon fiber reinforced polymer

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-11 DOI: 10.1016/j.optlastec.2025.112576

Jingyi Li , Ye Ding , Yanchao Guan , Lianfu Wang , Hui Xie , Yang Wang , Lijun Yang

{"title":"Investigations on 355 nm nanosecond-picosecond dual-pulse laser enhanced ablation of carbon fiber reinforced polymer","authors":"Jingyi Li , Ye Ding , Yanchao Guan , Lianfu Wang , Hui Xie , Yang Wang , Lijun Yang","doi":"10.1016/j.optlastec.2025.112576","DOIUrl":"10.1016/j.optlastec.2025.112576","url":null,"abstract":"<div><div>Carbon fiber reinforced polymer (CFRP) composites find extensive utilization in aerospace applications due to its exceptional structural and mechanical properties. However, the inherent characteristics of CFRP composites pose challenges for conventional machining techniques to achieve efficient and high-quality processing. This work proposed a nanosecond (ns)-picosecond (ps) dual-pulse laser processing method. A theoretical model of ns-ps double-pulse laser enhanced ablation was established. The impact of the free electron density evolution process on the energy absorption process was analyzed. The temporal and spatial distributions of temperatures in the ablation region under diverse laser irradiations were compared. The evolution mechanism of ablation morphology was thus characterized. Based on numerical simulations and experiments, the effects of time delay and pulse energy ratio on the depth and morphology of ns-ps double-pulse laser processing were determined. Through-hole processing experiments were conducted on CFRP composites with a thickness of 2 mm. The experimental results show that employing a time delay of 0 and the ps-ns pulse energy ratio of 1:4 results in a small taper. Additionally, no visible damage, such as fiber delamination or resin decomposition, was observed. Excellent through-hole quality was obtained while achieving high processing efficiency. These theoretical and experimental findings establish a robust foundation for efficient and high-quality processing of CFRP composites and other composite materials.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112576"},"PeriodicalIF":4.6,"publicationDate":"2025-02-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143388483","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Adaptive optics aided OAM modes generation in modulating retroreflector free-space optical systems

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-10 DOI: 10.1016/j.optlastec.2025.112593

Zhiyu Yuan, Guowei Yang, Jiapeng Yang, Xuefang Zhou, Meihua Bi, Miao Hu

{"title":"Adaptive optics aided OAM modes generation in modulating retroreflector free-space optical systems","authors":"Zhiyu Yuan, Guowei Yang, Jiapeng Yang, Xuefang Zhou, Meihua Bi, Miao Hu","doi":"10.1016/j.optlastec.2025.112593","DOIUrl":"10.1016/j.optlastec.2025.112593","url":null,"abstract":"<div><div>Modulating retroreflector (MRR) free-space optical (FSO) communication systems have attracted attentions in asymmetric optical wireless communication applications. However, the double-pass atmospheric propagation and the planar modulator in the MRR FSO communication system led to relatively large turbulence-induced fading and relatively low modulation efficiency. This work combines an adaptive optics phase compensation method with an orbital angular momentum (OAM) generation method at the MRR terminal by using a spatial light modulator with optical retroreflectors to achieve the fading mitigation and the OAM transmission. The adaptive optics aided OAM generation approach is carried out in wave-optics simulation and the simulation results show that the approach provides a significant phase compensation effect and an improved OAM mode purity at the transceiver. It is evident that the proposed approach could considerably reduce the impact of atmospheric turbulence on OAM wavefront and promote the application of OAM modes in MRR FSO communication systems.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112593"},"PeriodicalIF":4.6,"publicationDate":"2025-02-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143377034","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Enhanced analysis of H62 brass thin plates using integrated LIBS and laser ultrasonic Lamb wave for composition and flaw detection

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-10 DOI: 10.1016/j.optlastec.2025.112525

Xinhao Wang , Yu Gong , Zhaojiong Zhu , Sizhe He , Yali Tian , Guqing Guo , Yueting Zhou , Xiaocong Sun , Ting Gong , Xuanbing Qiu , Xiaohu He , Huiqin Chen , Lei Zhang , Chuanliang Li

{"title":"Enhanced analysis of H62 brass thin plates using integrated LIBS and laser ultrasonic Lamb wave for composition and flaw detection","authors":"Xinhao Wang , Yu Gong , Zhaojiong Zhu , Sizhe He , Yali Tian , Guqing Guo , Yueting Zhou , Xiaocong Sun , Ting Gong , Xuanbing Qiu , Xiaohu He , Huiqin Chen , Lei Zhang , Chuanliang Li","doi":"10.1016/j.optlastec.2025.112525","DOIUrl":"10.1016/j.optlastec.2025.112525","url":null,"abstract":"<div><div>The concentration of compositions and the presence of defects can dominate the properties and behavior of brass thin plates. Therefore, it is crucial to simultaneously detect their compositions and defects, particularly during the manufacturing process. In this work, we propose an integrated system using Laser-Induced Breakdown Spectroscopy (LIBS) and laser ultrasonic Lamb wave (LW) systems to identify elemental concentrations and locate flaws in H62 brass thin plates. The first weaker pulse (1.5 GW/mm<sup>2</sup>) is utilized for determining main elemental compositions by calibration-free (CF)-LIBS. The second stronger pulse (14 GW/mm<sup>2</sup>) is employed to qualitatively detect trace elements and generates strong laser ultrasonic LW. An all-fiber laser heterodyne interferometer is applied for measuring ultrasonic signals, enhancing the system’s flexibility and efficiency. A triple-point receiver has been implemented to determine the location of defects. Additionally, a continuous wavelet transform is applied to analyze the ultrasonic wave at a center frequency of 370 kHz for flaw echo detection. The results demonstrate an error of 3.03 % in the determination of major composition concentrations (Cu, Zn, Fe, Pb), and observe the trace elements (Sn, Ni, Na, Al, Ca) with concentrations lower than 0.01 %. The flaw position is determined by using the four-point arc method, with a relative error of 1.2 % for a circular flaw with a diameter of 2 mm. Therefore, this non-contact measurement technique offers a promising approach for the simultaneous online detection of elemental concentrations and flaws in brass thin plates during manufacturing processes.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112525"},"PeriodicalIF":4.6,"publicationDate":"2025-02-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143377032","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Theoretical study on modulation of filamentation patterns by crystal orientation and polarization structure

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-10 DOI: 10.1016/j.optlastec.2025.112570

Dan Wang , Hui Feng , Rui-Wei Li , Pei-Yuan Sun , Xin Zhang , Fan Feng , Lin Lu , Wei-Chao Wang , Biao Feng , Shao-Ding Liu

{"title":"Theoretical study on modulation of filamentation patterns by crystal orientation and polarization structure","authors":"Dan Wang , Hui Feng , Rui-Wei Li , Pei-Yuan Sun , Xin Zhang , Fan Feng , Lin Lu , Wei-Chao Wang , Biao Feng , Shao-Ding Liu","doi":"10.1016/j.optlastec.2025.112570","DOIUrl":"10.1016/j.optlastec.2025.112570","url":null,"abstract":"<div><div>The anisotropic Kerr media with complex structure offers a new paradigm to forming diverse filamentation patterns. A great challenge and expectation is to flexibly modulate the distribution of filaments. Herein, we propose and demonstrate that controllable filamentation patterns in cubic crystals can be achieved by the synergy of crystal orientation and polarization structure. The results reveal that the self-focusing patterns exhibit high symmetry when the vector optical fields (VOFs) are incident along the crystal’s principal axis. Interestingly, once the incident orientation is changed, the filament intervals will be unevenly distributed. Additionally, the synergy of crystal orientation and polarization structure actively breaks the symmetry, making the resulting collapse patterns nearly immune to the extra random noise. Finally, we derive the analytical solution for the positions of the filaments and elucidate the underlying physical mechanisms. The findings may have potential in micro–nano fabrication, wave-guides, and other related applications.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112570"},"PeriodicalIF":4.6,"publicationDate":"2025-02-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143377033","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

High performance 716 nm actively Q-switched Pr:ZBLAN fiber lasers

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-09 DOI: 10.1016/j.optlastec.2025.112587

Bo Xiao, Ziang Xiong, Yue Wu, Xiaoliang Liu, Canlin Jiang, Zhuang Li, Huiying Xu, Zhiping Cai

{"title":"High performance 716 nm actively Q-switched Pr:ZBLAN fiber lasers","authors":"Bo Xiao, Ziang Xiong, Yue Wu, Xiaoliang Liu, Canlin Jiang, Zhuang Li, Huiying Xu, Zhiping Cai","doi":"10.1016/j.optlastec.2025.112587","DOIUrl":"10.1016/j.optlastec.2025.112587","url":null,"abstract":"<div><div>Direct generation of deep-red lasers while preserving high output performance has become increasingly important for the applications in scientific research and industry. In this study, the efficient deep-red laser operation of a Pr<sup>3+</sup>-doped fluoride fiber directly pumped by a commercial blue laser diode (LD) is experimentally investigated at two different active fiber lengths. In the free-running cavity structure, we achieved a maximum continuous-wave (CW) output power of 185 mW at 716 nm with a slope efficiency of 54.57 %, which represents the highest direct output power recorded in a single clad Pr:ZBLAN fiber. Moreover, by utilizing an AOM, stable actively Q-switched lasers are successfully generated. Under the 1 kHz repetition rate, the pulse has a duration of 40 ns, a single-pulse energy of 40 μJ, and a peak power of 1 kW. To the best of our knowledge, this is the first demonstration of an actively Q-switched laser at a deep-red wavelength of 716 nm. We believe that this work could provide an appreciable alternative for the next generation of pulsed deep-red laser sources.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112587"},"PeriodicalIF":4.6,"publicationDate":"2025-02-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143376560","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Tilt-corrected reflective ptychography based on automatic differentiation

IF 4.6 2区物理与天体物理

Optics and Laser Technology Pub Date : 2025-02-09 DOI: 10.1016/j.optlastec.2025.112419

Wen Cao , Ling Bai , Siwei Tao , Zonghan Tian , Yueshu Xu , Cuifang Kuang , Xu Liu

{"title":"Tilt-corrected reflective ptychography based on automatic differentiation","authors":"Wen Cao , Ling Bai , Siwei Tao , Zonghan Tian , Yueshu Xu , Cuifang Kuang , Xu Liu","doi":"10.1016/j.optlastec.2025.112419","DOIUrl":"10.1016/j.optlastec.2025.112419","url":null,"abstract":"<div><div>As a lensless computational imaging technology, reflective ptychography detects the reflected diffraction field of multiple overlapping areas and reconstruct the complex amplitude effectively. However, in reflective ptychography system, the existing of reflection angle will hamper the reconstruction results due to the reflective diffraction distortion and overlapping inconsistency, especially under large angle condition. In this paper, we interpret the transformation formula between tilted and non-tilted diffraction patterns as the combination of rotation and translation, and propose a tilt correction method based on automatic differentiation, eliminating the need for accurate prior knowledge about tilt angle and the need for interpolation operation. Specifically, this approach enhances the reconstruction quality under large angle reflection effectively. A series of simulations and experiments are conducted compared with traditional interpolation tilt correction method. The results indicate that our method will enable more accurate and effective correction of tilted diffraction patterns, thereby improving overall reflective ptychography reconstruction quality. The potential application of such a strategy can be expanded to other reflective imaging systems with large reflection angle, such as scenes measuring samples by using transparent substrate and simultaneously requiring large angle reflection to ensure high reflectivity.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"185 ","pages":"Article 112419"},"PeriodicalIF":4.6,"publicationDate":"2025-02-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143376558","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0