International Symposium on Laser Metrology最新文献_第4页

Defect inspection by an active 3D multiresolution technique 主动三维多分辨率缺陷检测技术

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814516

J. Vargas, J. A. Quiroga

{"title":"Defect inspection by an active 3D multiresolution technique","authors":"J. Vargas, J. A. Quiroga","doi":"10.1117/12.814516","DOIUrl":"https://doi.org/10.1117/12.814516","url":null,"abstract":"Reliable inspection of large surfaces with low depth recovery error is needed in a wide variety of industrial applications, for example in external defect inspection in aeronautical surfaces. Active triangulation measurement systems with a rigid geometrical configuration are inappropriate for scanning large objects with low measuring tolerances due to the fixed ratio between the depth recovery error and the lateral extension. Therefore, with a rigid triangulation setup, if we are interested in defect inspection over extended surfaces then we have to assume errors proportional to the field of view that can preclude a precise local defect measurement. This problem can be solved by the use of multiresolution techniques. In this work we demonstrate the application of an active triangulation multiresolution method for defect inspection of large aeronautical panels. The technique is based on a standard camera-projector system used together with a second auxiliary camera that can move freely. The result is a global measurement with a superposed local measurement without any optimization, explicit registration or recalibration process. The presented results show that the depth recovery error of the local measurement permits the local defects measurement together with a wide-area inspection.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126460267","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Fast wavefront estimation using multiple directional derivatives and quadrature transform 使用多重方向导数和正交变换的快速波前估计

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814611

R. Legarda-Sáenz

引用次数: 0

On-line digital holographic measurement of size and shape of microparticles for crystallization processes 在线数字全息测量结晶过程中微粒的尺寸和形状

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814557

Taslima Khanam, E. Darakis, A. Rajendran, V. Kariwala, A. Asundi, T. Naughton

引用次数: 20

High-power laser diode array system for optical pumping of Rb 用于Rb光泵浦的大功率激光二极管阵列系统

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814598

Z. Buchta, O. Cíp, J. Rychnovský, J. Lazar

引用次数: 2

Design of laser source for fiber point diffraction interferometer 光纤点衍射干涉仪激光源设计

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814602

Xun Yu, Liang Nie, Jun Han, B. Liu, Xu Jiang

{"title":"Design of laser source for fiber point diffraction interferometer","authors":"Xun Yu, Liang Nie, Jun Han, B. Liu, Xu Jiang","doi":"10.1117/12.814602","DOIUrl":"https://doi.org/10.1117/12.814602","url":null,"abstract":"The fiber point-diffraction interferometer is introduced for measuring spherical surface with high precision. The interferometer must use special laser source, the coherence length of which is no more than 10 cm. The laser source at present can not meet the demand and the research of laser source design is performed in this paper. The coherence length of laser source in experiment is inconsistent with that computed with general theory, which restrict the research progress. In this paper, Mutual Coherence Function is introduced to describe the coherence of optical field. Based on the spectral characteristic of laser source, the mode of Multi-Longitudinal Mode laser is built. Through numerical calculation, it is discussed that how coherence degree is related with Longitudinal Mode number, spectral half width and resonant cavity length. Some important conclusions are draw. For example, Multi-Longitudinal Mode laser source has periodic coherence degree no matter how many longitudinal modes it contains, and the period of laser coherence degree is always double resonant cavity length. The method for designing short coherence length laser is put forward based on the conclusions and its coherence is measured in experiment. The result shows that the coherence length reaches 5 cm and meets the need of the interferometer.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132739740","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Detection and active stabilization of beams position at a high-resolution laser interferometer 高分辨率激光干涉仪中光束位置的探测和主动稳定

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814533

O. Cíp, Z. Buchta, M. Čížek, R. Smíd, J. Lazar

{"title":"Detection and active stabilization of beams position at a high-resolution laser interferometer","authors":"O. Cíp, Z. Buchta, M. Čížek, R. Smíd, J. Lazar","doi":"10.1117/12.814533","DOIUrl":"https://doi.org/10.1117/12.814533","url":null,"abstract":"In metrology applications of laser interferometers like a scale calibration of capacitive or inductive sensors, strictly linear positioning of the measuring mirror of the interferometer is necessary. It is maintained usually by a stage, which is based on principle of linear guide ways with ball carrier bearings. But possible imperfection of guides of the travel stage can cause deviations of the mirror plane from the right angle to the axis of traveling. Mentioned angle deviations lead to distortion of interference fringes in the output of the interferometer and by other words it causes non-linearity of the interferometer scale. Because the phenomenon is very random for this type of the travel stage the uncertainty of calibration of sensors is higher. In the work we present a method, which eliminates this usual problem by two ways. The first of them utilizes a special configuration of the laser interferometer where possible angle deviation of the mirror plane is compensated by second pass of the laser beam in the measuring arm of the interferometer. The next way is based on continual monitoring of spatial position of laser beams in the interferometer when the measuring mirror is positioned. It works with condition that the mirror can be slightly tilted by piezoelectric actuators in servo-loop mode with respect to detected spatial position.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133104646","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Some answers to new challenges in optical metrology 对光学计量新挑战的几点回答

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814687

W. Osten

{"title":"Some answers to new challenges in optical metrology","authors":"W. Osten","doi":"10.1117/12.814687","DOIUrl":"https://doi.org/10.1117/12.814687","url":null,"abstract":"The visible trend in the implementation of new technologies and creation of new products is the continuous reduction of feature sizes. However, in the same way as the feature sizes are decreasing, the theoretical and practical constraints of making them and ensuring their quality are increasing. Consequently, modern production and inspection technologies are confronted with a bundle of challenges. An important barrier for optical imaging and sensing is the diffraction limited lateral resolution. The observation of this physical limitation is of increasing importance, not only for microscopic techniques but also for the application of 3D-measurement techniques on wafer scale level. A further challenge is the reliable detection of imperfections and material faults within the production chain. This means in-line metrology/defectoscopy is a must for future production systems. Only the real-time feedback of the inspection results into the production process can contribute to a consistent quality assurance in processes with high cost risk. Moreover the reliable measurement of free form surfaces, both technical and optical, the assurance of the traceability and the certified assessment of the uncertainty of the measurement results are ongoing challenges. The challenges and the physical limitations are addressed here by new approaches for testing semiconductor structures with enhanced resolution, the measurement of aspheric lenses with increased flexibility and the inspection of micro components with improved traceability.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128891856","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 8

Error analysis of frequency mixing on heterodyne interferometry detecting device for superfinish surface scratch 超精表面划伤外差干涉检测装置混频误差分析

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814599

H. Lin, Yuhe Li, Dongsheng Wang, Mei Liu

{"title":"Error analysis of frequency mixing on heterodyne interferometry detecting device for superfinish surface scratch","authors":"H. Lin, Yuhe Li, Dongsheng Wang, Mei Liu","doi":"10.1117/12.814599","DOIUrl":"https://doi.org/10.1117/12.814599","url":null,"abstract":"The precision measurement on surperfinish surface scratch has been currently paid much attention to on electronic products. To meet these demands, a novel method has been proposed which is based on heterodyne interferometry that utilizes birefringent lens as beam splitter and cantilever tip as scanning probe to get the measurement values of sample topography. But the optical nonlinear errors affect the measurement precision of the system. In this paper, we adopt the Jones matrix to analyze the elliptic polarization caused by the three factors existing at the same time, which are polarization ellipticity of laser source, installation orientation error and phase retardation of birefringent lens. The measurement errors of frequency mixing about these elliptic polarization beams arriving at the photodiode detecter are studied by vector theory. The results show that the measurement errors are periodic errors, and they will change from 1.24nm to 3.94 nm when the magnitude of orientation error of birefringent lens changes from 1°to 5°. Also, the methods of reducing measurement errors according to the numerical results in the system are suggested. The measurement precision will be improved by reducing the orientation error or choosing high performance laser source.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133748181","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Influence of TFT-LCD pixel structure on holographic representation TFT-LCD像素结构对全息表示的影响

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814612

Hongjun Wang, Zhao Wang, A. Tian, Bingcai Liu

{"title":"Influence of TFT-LCD pixel structure on holographic representation","authors":"Hongjun Wang, Zhao Wang, A. Tian, Bingcai Liu","doi":"10.1117/12.814612","DOIUrl":"https://doi.org/10.1117/12.814612","url":null,"abstract":"As a new holographic display device, TFT-LCD (Thin Film Transistor Liquid Crystal Displays) is key technical component of holographic representation for easy controlled by computer. With the development of exquisite processing technology, that it instead of the traditional holographic plate become historical necessity and would be the development direction of holographic optics. Based on principles of holography and display character of LCD, the property which the LCD was used as a holographic plate was analyzed. The emphasis on discuss influence of LCD black matrix on holographic representation. First, analyzed on LCD pixel structure, the LCD pixel structure mathematical model was established. LCD was character representation by pixel structure parameters. Then, the influence of LCD pixels structure on holographic representation was analyzed by computer simulation. Meanwhile, the SONY LCX023 was chosen for holographic plate, the He-Ne laser which the wavelength is 0.6328um was holographic representation light source. The holographic representation system was established for test influence of LCD on holographic representation. Final, compared between computer simulations and optical experimental results, the mathematical model of LCD was proved to be true. When aperture ratio is 0.625, the holographic representation wouldn't be distinguished between representation images. At the same time, some useful results was acquired for improve application effects of LCD in holographic representation.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"59 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115436536","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Power loss due to beam splitter cascade in the simultaneous sampling of a volume speckle field for phase retrieval 分束器级联在体积散斑场同步采样中引起的功率损失

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814556

A. Maallo, P. Almoro

引用次数: 0