International Symposium on Laser Metrology最新文献_第3页

Robust isoclinic calculation for automatic analysis of photoelastic fringe patterns 用于光弹性条纹图自动分析的鲁棒等斜计算

International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814610

J. A. Quiroga, E. Pascual, J. Villa-Hernández

引用次数: 2

Stabilization of semiconductor lasers by fiber Bragg gratings 光纤布拉格光栅稳定半导体激光器

International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814603

B. Mikel, R. Helan, O. Cíp, P. Jedlicka

引用次数: 8

Complete deformation analysis of transparent samples using digital shearography and holography 利用数字剪切术和全息术完成透明样品的变形分析

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814616

F. C. Catalan, R. D. Santos, P. Almoro

{"title":"Complete deformation analysis of transparent samples using digital shearography and holography","authors":"F. C. Catalan, R. D. Santos, P. Almoro","doi":"10.1117/12.814616","DOIUrl":"https://doi.org/10.1117/12.814616","url":null,"abstract":"Digital shearography is an optical technique that allows direct measurement of strain in deforming samples and detection of surface and sub-surface defects. Because of its simple set-up and insensitivity to rigid body translations, the method has gained considerable importance in nondestructive testing in an industrial environment. Despite of its advantages, however, its application remains limited to highly scattering opaque samples due to its high dependence on the quality of speckles. This study demonstrates the suitability of digital shearography in the strain analysis of acrylic glass, a transparent sample, under sub-surface compaction loading. To generate the speckles, nominal roughness is induced at the front surface of the glass. As compared to the polariscope, digital shearography is shown to be able to resolve microscopic displacements that may not be evident as birefringence. Microscopic strain induced in the sample in the order of 60 microstrains is resolved using the shearographic set-up. For a more complete investigation of the deformation in the sample, the sub-surface displacements in the material are also mapped using Fourier digital holography to complement the shearographic results. The technique can be applied to fluid flow visualization and evaluation of polymers and other transparent materials.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"96 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115672003","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Enhanced resolution methods in shearography and holography for time-average vibration measurement 用于时间平均振动测量的剪切和全息增强分辨率方法

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814697

D. Borza

{"title":"Enhanced resolution methods in shearography and holography for time-average vibration measurement","authors":"D. Borza","doi":"10.1117/12.814697","DOIUrl":"https://doi.org/10.1117/12.814697","url":null,"abstract":"Vibration measurement by time-average methods of different full-field techniques like speckle interferometry, digital holography or analog, optical holography is a powerful technique, able to provide vibration amplitude maps of high spatial resolution. The essential characteristic of full-field techniques is the simultaneous acquisition of data for all object points. Quantitative data processing aiming to obtain the full-field amplitude map is affected by several difficulties. The most important are the weak contrast of Bessel-type fringes and the speckle noise. The greatest obstacle in achieving complete amplitude field estimation comes from the orthogonal components of time-averaged interferograms, where the multiplicative, high-frequency phase noise covers the deterministic, vibration-related phase. Several researchers studied these problems in relation with the double-exposure method. In the present paper, the author presents in a single, unifying approach, these methods, common to all full-field interferometric techniques. An important reduction of multiplicative high-frequency phase noise allows obtaining fringe-averaged patterns whose intensity noise is much lower than in classical methods. The analysis leads to lower noise of the fringe patterns and extended measurement range, and also to a method of vibration-related phase estimation based on the mathematical inversion of the Bessel function, which may include in some stages subpixel precision.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125176889","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Research of the automatic imaging focusing measurement for off-axis Fresnel digital holography 离轴菲涅耳数字全息成像自动聚焦测量研究

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814613

Xun Yu, Liang Nie, Fang Wang, Xu Jiang

引用次数: 0

The comparison of different temporal phase analysis algorithms in optical dynamic measurement 光学动态测量中不同时间相位分析算法的比较

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814544

H. Miao, Y. Fu

引用次数: 2

Reduction of speckle noise in digital holographic images using wavelet transform 用小波变换降低数字全息图像中的斑点噪声

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814558

A. Sharma, G. Sheoran, Z. Jaffery, Moinuddin

引用次数: 4

Reduction of speckle noise by multi-kinoforms in holographic three-dimensional display 全息三维显示中多图像形式对散斑噪声的抑制

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814510

Hua-Dong Zheng, Yingjie Yu, Haiyan Qian, A. Asundi

引用次数: 9

The characterization of the double fiber Bragg grating fiber ring laser and its applications in a real time fiber sensing system 双光纤布拉格光栅光纤环形激光器的特性及其在实时光纤传感系统中的应用

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814559

C. Ko, C. Yang, K. Huang, M. Shih

引用次数: 0

Development of a metrological atomic force microscope for nano-scale standards calibration 用于纳米尺度标准物标定的计量原子力显微镜的研制

International Symposium on Laser Metrology Pub Date : 2008-09-29 DOI: 10.1117/12.814517

S. H. Wang, G. Xu, S. L. Tan

{"title":"Development of a metrological atomic force microscope for nano-scale standards calibration","authors":"S. H. Wang, G. Xu, S. L. Tan","doi":"10.1117/12.814517","DOIUrl":"https://doi.org/10.1117/12.814517","url":null,"abstract":"The rapid advancement of nanotechnology is increasingly demanding measurements carried out at nano-scale be more accurate, comparable and traceable to the international standards of units (the SI). The Atomic Force Microscope (AFM) is a very powerful tool for the measurement of surface texture and micro-/nano-structures, with wide applications in nanotechnology. However, the traceability and accuracy of quantitative measurements made by commercial AFMs are often questionable and large discrepancies among them have been reported. This paper describes a metrological AFM developed at the National Metrology Centre (NMC) which has a very large scanning range with nanometre uncertainty. In order to achieve direct traceability to the SI, the system was constructed by integrating an AFM probe with a 3-axis nano-translation stage furnished with high performance autocollimators and laser interferometers along its X, Y and Z axes on a metrological frame. The large scanning range (25 mm × 25 mm × 5 mm) enables the system to be used for surface inspection on much larger samples than those allowed in normal commercial AFMs. Details of the system design and operation will be described in the paper. The uncertainty evaluation was done using certified step height, 1D/2D lateral pitch gratings. The experimental results show that the system is capable of achieving an uncertainty in the order of a few nanometres, which demonstrates that the system is suitable for providing traceability to commercial scanning probe microscopes (SPMs) including AFMs through calibrated transfer artefacts.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"10 12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124516442","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 8