International Symposium on Laser Metrology最新文献

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A low-cost antenna reflector shape and distortion measuring system with high accuracy 一种低成本、高精度的天线反射面形状和畸变测量系统
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814543
Xudong Li, Hongzhi Jiang, Jie Zhou, Dong Li, Huijie Zhao
{"title":"A low-cost antenna reflector shape and distortion measuring system with high accuracy","authors":"Xudong Li, Hongzhi Jiang, Jie Zhou, Dong Li, Huijie Zhao","doi":"10.1117/12.814543","DOIUrl":"https://doi.org/10.1117/12.814543","url":null,"abstract":"The antenna which is used in space for satellite control command communication and data transmission is a key unit for a satellite to work properly and accomplish the task successfully. Accurately measuring the antenna reflector shape and the reflector distortion shortly after the antenna manufacturing or assembling on the satellite is very important to ensure that the antenna functions well. Considering the constraints during the measurement, an antenna reflector shape and distortion measuring system, which is based on the close-range photogrammetry, is proposed. The system configuration, measuring principles, calibration and measuring procedures, data processing, experiment configuration and results as well as error analysis are discussed in the paper. The system was constructed and tested in the laboratory environment. The experiment results show that the system has the ability of accurately measuring the shape of the reflector. The distortion of the reflector surface can then be gained from the shape data. The average accuracy of measurement about 240 points on a 600mm antenna reflector is less than 0.015 mm (1σ).","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116829008","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Crack displacement sensing and measurement in concrete using circular grating moire fringes and pattern matching 基于圆光栅云纹条纹和模式匹配的混凝土裂缝位移传感与测量
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814583
H. Chan, K. Yen, M. Ratnam
{"title":"Crack displacement sensing and measurement in concrete using circular grating moire fringes and pattern matching","authors":"H. Chan, K. Yen, M. Ratnam","doi":"10.1117/12.814583","DOIUrl":"https://doi.org/10.1117/12.814583","url":null,"abstract":"The moire method has been extensively studied in the past and applied in various engineering applications. Several techniques are available for generating the moire fringes in these applications, which include moire interferometry, projection moire, shadow moire, moire deflectometry etc. Most of these methods use the superposition of linear gratings to generate the moire patterns. The use of non-linear gratings, such as circular, radial and elongated gratings has received less attention from the research community. The potential of non-linear gratings in engineering measurement has been realized in a limited number of applications, such as rotation measurement, measurement of linear displacement, measurement of expansion coefficients of materials and measurement of strain distribution. In this work, circular gratings of different pitch were applied to the sensing and measurement of crack displacement in concrete structures. Gratings of pitch 0.50 mm and 0.55 mm were generated using computer software and attached to two overlapping acrylic plates that were bonded to either side of the crack. The resulting moire patterns were captured using a standard digital camera and compared with a set of reference patterns generated using a precision positioning stage. Using several image pre-processing stages, such as filtering and morphological operations, and pattern matching the magnitude displacements along two orthogonal axes can be detected with a resolution of 0.05 mm.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117334032","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Temporal Paul wavelet analysis for phase retrieval using shadow moire technique 基于阴影云纹技术的时域保罗小波分析相位恢复
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814585
H. Niu, C. Quan, C. Tay
{"title":"Temporal Paul wavelet analysis for phase retrieval using shadow moire technique","authors":"H. Niu, C. Quan, C. Tay","doi":"10.1117/12.814585","DOIUrl":"https://doi.org/10.1117/12.814585","url":null,"abstract":"Temporal Paul wavelet analysis for instantaneous phase extraction using shadow moire technique is proposed. Unlike the Morlet wavelet, the Paul wavelet has less restriction on the adjustment of wavelet parameters and can provide an optimal time and frequency resolution for a particular application by selecting the proper parameters. The Paul wavelet is a complex wavelet and is suitable for processing the temporal intensity data obtained from the shadow moire technique for the phase retrieval. The proposed method can extract the phase information related to the state of the dynamic object at every instant in temporal domain. The phase information is associated to the displacement, three-dimensional (3D) surface-profile and the instantaneous state of the dynamic object. In addition, the instantaneous frequency of vibrating object can be obtained using the scale of the wavelet ridge by direct integration without temporal and spatial phase unwrapping. Thus the phase unwrapping error can be avoided. An experiment is conducted on the central loaded beam to demonstrate the validity of the proposed technique.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116697331","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High throughput measurement techniques for wafer level yield inspection of MEMS devices MEMS晶圆级良率检测的高通量测量技术
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814724
O. Varela Pedreira, T. Lauwagie, J. de Coster, L. Haspeslagh, A. Witvrouw, I. De Wolf
{"title":"High throughput measurement techniques for wafer level yield inspection of MEMS devices","authors":"O. Varela Pedreira, T. Lauwagie, J. de Coster, L. Haspeslagh, A. Witvrouw, I. De Wolf","doi":"10.1117/12.814724","DOIUrl":"https://doi.org/10.1117/12.814724","url":null,"abstract":"This paper presents two distinct measurement systems that were custom-built for the parametric and functional yield inspection of MEMS devices on wafer-level. Throughput as well as accuracy was optimized by using automatic feature detection and data segmentation algorithms. Inaccuracies in stage positioning during scanning are compensated for by a grid detection algorithm. The analysis of the measurement data is performed in parallel with the ongoing measurements. The data analysis includes the detection, parameter extraction, analysis of failures or damage of a single device and the final stitching of the results in order to obtain a visual mapping of the measured arrays. The performance of both systems has been demonstrated using arrays of micromirrors as test vehicles.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"216 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130115430","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Frequency-shifting method for phase retrieval from fringe patterns 从条纹图中提取相位的移频方法
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814522
Haixia Wang, K. Qian, Wenjing Gao
{"title":"Frequency-shifting method for phase retrieval from fringe patterns","authors":"Haixia Wang, K. Qian, Wenjing Gao","doi":"10.1117/12.814522","DOIUrl":"https://doi.org/10.1117/12.814522","url":null,"abstract":"A novel frequency-shifting method for phase retrieval from fringe patterns is proposed. It needs two fringe patterns. In the second fringe pattern, a low frequency carrier is introduced. The low carrier frequency is used to open only fringe patches near critical points rather than the whole fringe pattern. The windowed Fourier ridges algorithm is used to retrieve the phase, which is able to characterize the density of the fringe patterns so that critical points can be recognized. The method is verified by a simulation example.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"615 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131779602","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Optical bi-sensorial measurement system for production control of extruded profiles 用于挤压型材生产控制的光学双传感器测量系统
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814567
A. Weckenmann, J. Bernstein
{"title":"Optical bi-sensorial measurement system for production control of extruded profiles","authors":"A. Weckenmann, J. Bernstein","doi":"10.1117/12.814567","DOIUrl":"https://doi.org/10.1117/12.814567","url":null,"abstract":"Extruded profiles are semi-finished products (made out of steel, brass, aluminum, synthetics...) which are appointed for wide applications in manufacturing of technical products. As yet used optical sensors in process control working to the shading technology detect the object's shadow orthographically to the axis of illumination. As a consequence they record it unattached by the profiles coat in measurement range at any point of the measured profile with high precision. As a matter of fact, concave zones cannot be captured. Alternatively the measurement of concave zones can be arranged by light-section systems. These do not comply with the required accuracy, are comparatively slow and moreover affected by dislocations of the section of the profile. A measurement system including a light-section and a shading system combines the advantages of both optical systems. It is to serve with a reliable conception for the assembly of a bi-sensorial measurement system consisting of both systems as well as suitable methods of analysis for the in-line inspection of concave profiles. As a result it contains conclusions concerning requirements of the light source, the arrangement of this source and the cameras, obtainable precision and sampling rate as well as the essential synchronization of both systems. After designing an appropriate prototype, the selected light-section system and the shading system will be synchronized and aligned. Therefore, the metered geometrical data will be merged for the evaluation of form deviation. So, developed and adapted software supports and contains proposals to the uncertainty after successful tests. The system and a calibration method will be proved in production where robustness will be a most critical despite of heat, dust and vibrations. The target uncertainty of less than 0.1 mm at every section of the profiles coat has to be met.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129375177","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
New simplified measuring method for distributed low-level birefringence 分布式低能级双折射的一种简化测量方法
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814536
K. Gomi, Tomoyuki Suzuki, Y. Niitsu, K. Ichinose
{"title":"New simplified measuring method for distributed low-level birefringence","authors":"K. Gomi, Tomoyuki Suzuki, Y. Niitsu, K. Ichinose","doi":"10.1117/12.814536","DOIUrl":"https://doi.org/10.1117/12.814536","url":null,"abstract":"This paper introduces the principle and execution of a new method for measuring of distributed minute birefringence based on simple polarimetry with phase-shifting method. The new method requires only three stepped photoelastic data although conventional phase-stepping methods require four or more. To evaluate the new method experimentally, two precise crystal wave plates having nominal retardation ± tolerance of 79.1±3.5 and 10.0±4.7 nanometers were used as specimens. The experimental averages of the distributed retardation in the specimens with standard deviations were found to be 80.2±15.0 and 18.8±7.06 nanometers. To estimate the measurement accuracy of the angular orientations of the distributed birefringence in the specimens, the angular positions of the rotation stage for the specimens were rotated intermittently 45 or 30 degrees at a time during the experiment. As a result, the averages of measured offsets of the angular orientations were found to be 30.1±8.14 for the specimen of 79.1 nanometers with standard deviations. It is concluded that the new method has potential of measuring for distributed minute birefringence.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132810992","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Microlens testing: an application 微透镜测试:一个应用
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814595
Hooi Leng Ng-Lee, S. C. Goh, C. Ranjit, .. Maryanto, Jie Ying Sarah Ng, A. Asundi
{"title":"Microlens testing: an application","authors":"Hooi Leng Ng-Lee, S. C. Goh, C. Ranjit, .. Maryanto, Jie Ying Sarah Ng, A. Asundi","doi":"10.1117/12.814595","DOIUrl":"https://doi.org/10.1117/12.814595","url":null,"abstract":"A measurement system for measuring effective focal length of a microlens is presented. The system consists of a microprocessor controlled 3-axis stage with an optical system which provides 500 times magnification for focal length and diameter measurement. The focal length testing is carried out by single pass (transmission) approach. A point source from halogen white light is used as the object for the measurement. A CCD camera displays the magnified image on a computer. Focusing is performed by moving the microlens along the principal axis by manual control of a stepper motor and observation of the image on the computer. Similarly, moving the microlens along its substrate plane and capturing three points on its circumference gives its diameter. The co-ordinates of the 3-axis stage and diameter are displayed separately on dot-matrix LCD panel. Anti-backlash mechanisms are employed on all axes, each with a positioning resolution of 1 μm.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128024116","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Processing of digital holograms for size measurements of microparticlese 微粒子尺寸测量用数字全息图的处理
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814578
E. Darakis, Taslima Khanam, A. Rajendran, V. Kariwala, A. Asundi, T. Naughton
{"title":"Processing of digital holograms for size measurements of microparticlese","authors":"E. Darakis, Taslima Khanam, A. Rajendran, V. Kariwala, A. Asundi, T. Naughton","doi":"10.1117/12.814578","DOIUrl":"https://doi.org/10.1117/12.814578","url":null,"abstract":"Digital holography has been reported as an effective tool for particle analysis. Other image-based techniques have small depth of focus allowing only 2D analysis at microscopic level. On the other hand, digital holography offers the ability to study volume samples from a single recording as reconstructions at different depths can be obtained. This paper focuses on the processing of the digital hologram that follows its recording in order to obtain particle size. We present a stepwise processing procedure with discussion on aspects such as reconstruction, background correction, segmentation, focusing, magnification and particles' feature extraction. Solutions to common obstacles faced during particle analysis which include ways to obtain fixed size reconstructions, automatically determine the threshold value, calculate magnification, and locate particles' depth position using effective focusing metrics are highlighted. Real holograms of microparticles are used to illustrate and explain the different stages of the procedure. Experimental results show that the proposed algorithm can effectively extract particle size information from recorded digital holograms.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"80 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126386912","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
Hardware-based error compensation in 3D optical metrology systems 基于硬件的三维光学测量系统误差补偿
International Symposium on Laser Metrology Pub Date : 2008-10-03 DOI: 10.1117/12.814693
K. Harding
{"title":"Hardware-based error compensation in 3D optical metrology systems","authors":"K. Harding","doi":"10.1117/12.814693","DOIUrl":"https://doi.org/10.1117/12.814693","url":null,"abstract":"Laser Metrology as a tool for 3D measurements is seeing increased use in industrial applications. With advances in computer processing power, there have been many publications on new algorithms to correct distortions, speckle and other problems affecting the errors in such systems. But there have also been many advances in the hardware tools, including specialty lenses, light sources, and feedback systems that offer many initial corrections than can be employed before any computer analysis is even attempted. This paper will discuss the tradeoff of hardware and software corrections, the primary sources of hardware based errors, and new methods to realize these corrections in the hardware.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129857971","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
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