Physics of X-Ray Multilayer Structures最新文献_第5页

Ion-Assisted Sputter Deposition of Mo-Si Multilayers 离子辅助溅射沉积Mo-Si多层膜

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.md4

S. Vernon, D. Stearns, R. S. Rosen

引用次数: 0

Growth and Epitaxy of Materials for Multilayer X-ray Optics 多层x射线光学材料的生长与外延

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.wa2

J. Slaughter, P. Kearney, J. A. Ruffner, C. Falco

引用次数: 0

In-Situ Grazing Incidence X-Ray Diffraction During Sputter Deposition 溅射沉积过程中的原位掠入射x射线衍射

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.wa4

B. Clemens, A. Payne, T. Hufnagel, J. Bain, S. Brennan

{"title":"In-Situ Grazing Incidence X-Ray Diffraction During Sputter Deposition","authors":"B. Clemens, A. Payne, T. Hufnagel, J. Bain, S. Brennan","doi":"10.1364/pxrayms.1992.wa4","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.wa4","url":null,"abstract":"Many aspects of thin film growth can be studied most directly using in-situ techniques. These include a host of critical phenomena which are only observed for very thin layers and are no longer available for study if the film is grown to bulk levels. Although sputter deposition is a very widely used deposition technique both in research and industry, in-situ studies of film growth during sputter deposition are rare. This is primarily because the sputtering gas precludes the use of conventional electron diffraction techniques. Photon based diffraction techniques, on the other hand, are immune to the deleterious effects of the argon sputtering gas and offer a powerful method for investigating film structure provided a source of sufficient brightness is used. We recently performed experiments in which grazing incidence x-ray scattering (GIXS)[1] using synchrotron radiation was implemented in-situ to study film growth by sputter deposition . A special UHV deposition chamber was developed with appropriate x-ray windows and precision sample positioning mechanisms needed in performing a diffraction experiment [2]. During the initial test of this new technique and apparatus, we examined two metal/metal systems: gadolinium/cobalt and molybdenum/nickel.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124107898","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Effects of Fresnel Fringes on TEM Images of Interfaces in X-Ray Multilayers 菲涅耳条纹对x射线多层膜界面TEM图像的影响

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-02 DOI: 10.1364/pxrayms.1992.tub2

T. Nguyen, M. O'Keefe, R. Kilaas, R. Gronsky, J. Kortright

{"title":"Effects of Fresnel Fringes on TEM Images of Interfaces in X-Ray Multilayers","authors":"T. Nguyen, M. O'Keefe, R. Kilaas, R. Gronsky, J. Kortright","doi":"10.1364/pxrayms.1992.tub2","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.tub2","url":null,"abstract":"Cross-sectional High-Resolution Transmission Electron Microscopy (HRTEM) has been widely used to examine the structure and morphology at multilayer interfaces at an atomic scale. Assessment of the interfacial structures quantitatively from these TEM images however is difficult due to the Fresnel fringe effects, which produce different apparent structures with defocus values in the images. These fringes result from the electrons experiencing an abrupt change in the scattering potential parallel to the electron beam path. Imaging of multilayers in cross-section, in which the electrons travel parallel to the interfaces between the two layer materials, always results in such fringes. X-ray multilayers having alternating layers of very different atomic numbers or scattering powers are more prone to these fringes than the heterostructures having less contrast layers. The visibility of the fringes increases with increasing defocus away from the minimum contrast, while optimum resolution in bright-field imaging is obtained at the Scherzer defocus, which is about 100 nm from the minimum contrast for most high resolution microscopes. Fresnel fringes are thus present when imaging at optimum defocus. The effects of these fringes have been commonly overlooked in efforts of making quantitative interpretation of interfacial profiles. They however have also been employed to characterize the structures and compositional roughness at interfaces.1-3 In this report, we present the observations of the Fresnel fringes in nanometer period Mo/Si, W/C, and WC/C multilayers in through-focus-series TEM images. Calculation of the Fresnel fringes of a Mo/Si multilayer using charge density approximation is used to illustrate the characteristics of the fringes from different interfacial structures.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"278 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134401592","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Simulation of Mixing at Mo/Si Interfaces Mo/Si界面混合的模拟

Physics of X-Ray Multilayer Structures Pub Date : 1991-12-01 DOI: 10.1364/pxrayms.1992.md5

D. B. Boercker, W. Morgan

引用次数: 1

Stability Of Metallic Superlattices 金属超晶格的稳定性

Physics of X-Ray Multilayer Structures Pub Date : 1991-11-08 DOI: 10.1364/pxrayms.1992.wa5

P. Turchi, M. Sluiter

引用次数: 0

X-ray Supermirrors: Novel multilayer structures for broad band hard X-ray applications x射线超镜:用于宽带硬x射线应用的新型多层结构

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tha.3

K. Joensen, P. Gorenstein, P. Høghøj, F. Christensen

{"title":"X-ray Supermirrors: Novel multilayer structures for broad band hard X-ray applications","authors":"K. Joensen, P. Gorenstein, P. Høghøj, F. Christensen","doi":"10.1364/pxrayms.1994.tha.3","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.tha.3","url":null,"abstract":"With the increased availability of hard X-ray (≥ 20 keV) synchrotron sources and a concurrent wish for hard X-ray telescopes. the need for hard X-ray optics has become considerable. For some applications crystals and periodic multilayers are desirable; for others the bandwidth of these may be too narrow. A wider bandwidth can be obtained by using total reflection from heavy elements. This approach. however, is impractical for harder X-rays since it is limited by the inverse proportionality between the critical angle of total reflection and the energy. One solution to this broad-band reflection problem may be the supermirror: a multilayer structure where the bi-layer thickness is gradually changed from top to bottom. In such a structure radiation with different wavelengths will have the criteria for constructive interference fulfilled at different depths in the multilayer. If the bi-layer thicknesses are changed sufficiently slowly. simultaneous diffraction of a continuum of X-ray energies can be obtained. The multilayered supermirror was originally designed for neutron applications1 such as increasing the throughput of guide-tubes. For neutrons, where absorption is extremely low for most materials. reflectivities up to95 can be obtained in a continuous band up to 3 times the critical angle or energy2. For X-rays. the absorption is considerably larger and this strongly influences the performance of the X-ray supermirror.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115487235","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Optimization of Growth Conditions of Vapor Deposited Mo/Si Multilayers 气相沉积Mo/Si多层膜生长条件的优化

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1063/1.350735

M. Stearns, C. Chang, D. Stearns

{"title":"Optimization of Growth Conditions of Vapor Deposited Mo/Si Multilayers","authors":"M. Stearns, C. Chang, D. Stearns","doi":"10.1063/1.350735","DOIUrl":"https://doi.org/10.1063/1.350735","url":null,"abstract":"The dependence of the layer structure and interfaces of e-beam deposited Mo/Si multilayers (ML) on the growth conditions has been studied. The substrate temperature was varied over a range of 300-600°K at deposition rates of 1 and 3 Å/sec. The structure of the ML was determined using small-angle x-ray scattering, large-angle x-ray scattering, and cross-sectional high-resolution electron microscopy. The variation of the normal incidence reflectivity was measured as a function of soft x-ray wavelength using synchrotron radiation. We found that the ML structure has a strong dependence on the substrate temperature and a lesser dependence on the deposition rate. ML grown at a substrate temperature of 300°K have Mo layers composed of small crystallites and exhibit significant short wavelength roughness. The lateral extent of the Mo crystallites increases and the interfacial roughness decreases with increasing substrate temperature up to 525-550°K. We attribute the larger Mo crystallites, improved texture and suppression of columnar growth observed at higher substrate temperatures to the increased surface mobility of the adatoms. The optimum conditions to obtain smooth layers by e-beam deposition were found to be a substrate temperature of ~525°K and a deposition rate of ~1 Å/sec. Thus to a great extent the smaller adatom energies of e-beam deposition can be compensated for by increasing the substrate temperature. Above TS~575°K interdiffusion is observed to significantly degrade the ML structure.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115608922","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 70

Glancing-Incidence X-ray Analysis of multilayer structures 多层结构的扫射x射线分析

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tua.2

D. D. de Boer, A. Leenaers, W. van den Hoogenhof

引用次数: 0

Studies of multi-layers for short period X-ray mirrors 多层短周期x射线反射镜的研究

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.ma.3

R. Somekh, M. M. Hasan

引用次数: 0