{"title":"Multilayer Coated Echelle Gratings for Soft X-rays","authors":"J. Underwood, C. Malek, E. Gullikson, M. Krumrey","doi":"10.1063/1.1145754","DOIUrl":"https://doi.org/10.1063/1.1145754","url":null,"abstract":"Recently there have been many experimental and theoretical studies of diffraction gratings coated with short-period multilayers to enhance their reflectivity in the extreme ultraviolet and x-ray regions. Much of this work has been focussed on lamellar gratings, but there is also considerable interest in multilayer coated blazed gratings. Until now, these blazed gratings have been made by traditional ruling. In an interferometrically controlled ruling engine this leads to very accurate groove placement, but the quality of the groove surfaces may be poor because the grooves are burnished into a soft material such as gold. This leads to low multilayer reflectivity because the substrate roughness (in this case the groove surface) is an important factor in determining its performance. In addition the gratings can be used only in low orders, since operation in higher orders requires excellent groove profile.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"251 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121367213","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Modeling of x-ray diffraction by multilayer mirrors, gratings and zone plates","authors":"A. Sammar, B. Pardo, J. Andre","doi":"10.1364/pxrayms.1992.mc9","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.mc9","url":null,"abstract":"The diffraction problem consists in solving the Helmholtz equation for the tangential electric field component φ in the TE polarization case. The equation is: where k is the wavenumber, ε(R) is the complex dielectric constant and R is the position vector.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126739559","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Dennis B. Brown, J. Gilfrich, R. K. Freitag, H. B. Rosenstock, J. Konnert
{"title":"Experimental and Theoretical Soft X-Ray Reflectivities for Mo-B4C Multilayer Structures","authors":"Dennis B. Brown, J. Gilfrich, R. K. Freitag, H. B. Rosenstock, J. Konnert","doi":"10.1364/pxrayms.1992.wb4","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.wb4","url":null,"abstract":"The use of artificial multilayer structures (MLS) as wavelength dispersive elements has proven of great importance in soft x-ray (2 to 15 nm) spectroscopy. Much of the early work in this field has concentrated on structures consisting of alternating layers of a pair of materials, one of high atomic number (most commonly tungsten) and one of low atomic number (most commonly carbon). Although the ideal performance of multilayer pairs can be calculated,1 the performance of a MLS can be substantially degraded by imperfections introduced in their manufacture. In particular, it has become clear that optimum performance of MLS is strongly dependent upon the quality of the interfaces (roughness, interdiffusion, etc.) between the two materials. These interface properties are dependent upon the chemical-metallurgical properties of the materials chosen. Since such properties are typically not amenable to theoretical prediction, the choice of good layer pairs is typically an Edisonian process. The purpose of this paper is to explore the soft x-ray diffracting properties of the material pair Mo-B4C. We will concentrate on the ways in which the measured diffraction behavior deviates from ideality and, especially, possible reasons for this non-ideality.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"72 4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114937791","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Surface Roughness and X-Ray Scattering","authors":"E. Church, P. Takacs","doi":"10.1364/pxrayms.1992.tuc1","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.tuc1","url":null,"abstract":"Interface roughness and diffusion limit the performance of x-ray multilayer (ML) stacks by generating unwanted scattering and reducing their efficiencies.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"98 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116240873","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Observation of nuclear diffraction from multilayers containing 57Fe","authors":"R. Röhlsberger, E. Witthoff, E. Lüken, E. Gerdau","doi":"10.1364/pxrayms.1992.thb3","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.thb3","url":null,"abstract":"The small resonance width Г0 of Mößbauer transitions allows monochromatization of synchrotron radiation down to a bandwidth of 10-7 - 10-9 eV by nuclear resonant diffraction. Up to now, the Mößbauer isotopes 57Fe ( E0 = 14.4 keV, Г0 = 4.7 • 10-9 eV) and 169Tm ( E0 = 8.4 keV, Г0 = 1.2•10-7 eV) have been used in this field [ 1-5 ]. In order to observe nuclear resonant diffraction, the competing contribution of electronic scattering with a bandpass of at least a few meV has to be strongly reduced. Precise determinations of hyperfine interactions can be made by observation of quantum beats in the collective decay of the nuclei excited by synchrotron pulses. Most of the experiments have been done with single crystals which have a pure nuclear reflection. In these cases the structure factor for the electronic reflection is zero because of the symmetry of the crystal. The structure factor for the nuclear reflection is nonzero, because subgroups of the Mößbauer nuclei are distinguished by a symmetry breaking hyperfine interaction or by isotopic arrangement [6]. In a layered crystal of 56Fe and 57Fe atoms obviously the electronic and nuclear lattice constant differ by a factor of two, so that a superstructure appears with a pure nuclear reflection. Such a crystal has not been grown up to now, since the preparational requirements are very hard to meet. However, an isotopic superstructure can easily be realized in a multilayer, which need not be a single crystal. Alternating layers containing 56Fe and 57Fe give rise to a multilayer Bragg peak of pure nuclear origin. Such a multilayer will be described here.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"116 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121998230","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"A Soft X-ray and Extreme U.V. Reflectometer Using a Laser Produced Plasma Source and a High Throughput Monochromator","authors":"E. Gullikson, J. Underwood, P. Batson, V. Nikitin","doi":"10.1364/pxrayms.1992.wb2","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.wb2","url":null,"abstract":"Measurements in the soft x-ray and extreme ultaraviolet regions of the spectrum have historically been hampered by the lack of a bright, tunable source. Although synchrotron radiation sources are gradually filling this need, such facilities are not sufficiently compact and inexpensive to be within the reach of an average laboratory. The commercial availability of compact, inexpensive pulsed lasers has changed this picture. The high temperature plasma produced when the light from such a laser is focused upon a suitable metal or dielectric target emits x-rays and extreme ultraviolet radiation that can either be a rich line spectrum or a smooth and intense continuum, depending upon the target material. Such a source needs only monochromatization to make it useful for a wide variety of measurements and calibrations.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114627506","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
S. Sinha, M. Sanyal, S. Satija, C. Majkrzak, I. Schuller
{"title":"X-ray Scattering Studies of Correlated Interface Roughness in Multilayers","authors":"S. Sinha, M. Sanyal, S. Satija, C. Majkrzak, I. Schuller","doi":"10.1364/pxrayms.1992.tua2","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.tua2","url":null,"abstract":"The specular and off-specular reflectivity of radiation from single surfaces possessing roughness has been extensively discussed both within the framework of the Born Approximation and the Distorted Wave Born Approximation (DWBA). The same ideas can be generalized to reflectivities from multilayer structures. An Interesting effect arises due to the fact that the interface fluctuations between layers are usually highly correlated. This is shown to lead to structure in the off-specular reflectivity which mimics the structure found in the true specular reflectivity (e.g., Bragg peaks, etc.). In fact, such structure can persist due to interlayer height correlations for qz values where the true specular Bragg peaks have vanished due to large global roughness.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"15 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127930882","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Interface Roughness And Void Formation In Si Deposition At Low Temperatures","authors":"D. Eaglesham, D. Windt","doi":"10.1364/pxrayms.1992.wa3","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.wa3","url":null,"abstract":"X-ray scattering from multilayers (such as Mo-Si) is to a large extent controlled by interface quality, which in turn is frequently controlled by surface morphology. Here we present a study of interface and surface morphology in both crystalline and amorphous Si layers deposited by evaporation in UHV at low substrate temperatures. For simplicity, the interfaces investigated are single monolayers of Ge, so that chemical effects are avoided. Amorphous Si films undergo morphological roughening and void formation, leading to apparent Si-Ge interface widths ≈5nm. In crystalline Si grown at the same temperature and deposition rate the roughness is considerably less marked, although localised void formation still occurs. Both the void density and the apparent interface width of single monolayers of Ge appears under these conditions to be linked to the thickness of crystalline Si deposited.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130256487","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
E. Alp, E. Witthoff, T. Mooney, H. Homma, M. Kentjana
{"title":"Layered Optics for Nuclear Monochromatization of Synchrotron Radiation","authors":"E. Alp, E. Witthoff, T. Mooney, H. Homma, M. Kentjana","doi":"10.1364/pxrayms.1992.mc12","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.mc12","url":null,"abstract":"The insertion device based third generation synchrotron radiation sources currently under construction in Europe, USA, and Japan brings new opportunities and challenges in the design and manufacturing of x-ray optics. These high brightness sources demand more stringent parameters on the quality of multilayered optics in terms of size, uniformity, and surface and interface roughness.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129627473","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
H. Kimura, Masaki Yamamoto, H. Nomura, K. Mayama, M. Yanagihara
{"title":"A multilayer quarter-wave plate of transmission type at a wavelength of 12.4nm","authors":"H. Kimura, Masaki Yamamoto, H. Nomura, K. Mayama, M. Yanagihara","doi":"10.1364/pxrayms.1992.thb2","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.thb2","url":null,"abstract":"In order to measure or to transform the polarization state in the soft x-ray region, we need a suitable quarter-wave plate. Kortright and Underwood[1] have shown theoretically that the transmission type multilayer has a good potential for a quarter-wave plate in the soft x-ray region. They demonstrated as a good example, the Mo/Si multilayer which has a periodicity of 9.0 nm and 20 periods at the wavelength of 13.8 nm, has the retardation Δp-Δs=86°, the polarizance (Ts-Tp)/(Ts+Tp) =42% and the throughput for s-component of 39% at the incident angle of 39.7° measured from the sample normal. The best quarter-wave plate should have the retardation equal to ±90°, the polarizance close to zero, and the high throughput over 50%. The multilayer designs presented here achieve these conditions necessary for good and useful quarter-wave plates.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130504810","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}