Physics of X-Ray Multilayer Structures最新文献_第2页

Comparison of Microstructure and Thermal Stability of Short Period X-Ray Multilayers 短周期x射线多层膜的微观结构和热稳定性比较

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.tha3

T. Nguyen, R. Gronsky, J. Kortright

引用次数: 0

Limits to Ion Beam etching of Mo / Si multilayer coatings Mo / Si多层涂层离子束腐蚀的限制

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.pd6

R. Schlatmann, C. Lu, J. Verhoeven, E. Puik, M. J. V. Wiel

引用次数: 1

X-Ray and TEM Analysis of small period W-Si and W-B4C multilayers 小周期W-Si和W-B4C多层膜的x射线和透射电镜分析

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.mc10

J. Wood, K. Parker, James Scholhamer, J. Mansfield

引用次数: 0

Stability of the Long Period Modulated Structures in Ordering Systems 有序系统中长周期调制结构的稳定性

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.mc7

S. Andreev, N. I. Polushkin, N. Salashchenko, S. I. Shinkarev

引用次数: 0

Diffusion Behavior of Metal-Carbon Multilayers 金属-碳多层膜的扩散行为

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.mc3

A. Akhsakhalyan, A. Fraerman, Y. Platonov, N. Polushkin, N. Salashchenko

引用次数: 0

Interdiffusion Kinetics in Mo/Si Multilayers Mo/Si多层膜的相互扩散动力学

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.tha2

R. S. Rosen, D. Stearns, Viliardos, M. E. Kassner, S. Vernon

{"title":"Interdiffusion Kinetics in Mo/Si Multilayers","authors":"R. S. Rosen, D. Stearns, Viliardos, M. E. Kassner, S. Vernon","doi":"10.1364/pxrayms.1992.tha2","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.tha2","url":null,"abstract":"Mo/Si multilayers (ML's) are attractive for x-ray optics due to the relatively high associated reflectivity. However, the reflectivity is known to decrease with the formation of diffuse interlayer regions resulting from interdiffusion at the Mo-Si interfaces [1-2]. Most of the previous studies have reported interdiffusion coefficients [1-5] and effective activation energies [2-4] over a range of temperature assuming that the interdiffusion coefficient is invariant with annealing time. At temperatures of 560-580 °C, hexagonal molybdenum-disilicide (h-MoSi2) grows with a square-root time dependence at the Mo-Si interface [6]. This suggests diffusion-limited growth with a time-invariant interdiffusion coefficient. However, at temperatures of 300-400 °C, the interlayer structure is known to change with annealing time from amorphous to crystalline [1-3], suggesting the possibility that the rate-controlling mechanism(s) for interdiffusion may also change with annealing time and/or temperature. Therefore, it is the objective of this study to perform a series of annealing treatments of Mo/Si ML's at temperatures lower than those previously reported to determine the Mo-Si interdiffusion kinetics as a function of time.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133867058","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Study of ultra-thin films in multilayer structures by standing -waves and small- angle x-ray scattering techniques 用驻波和小角x射线散射技术研究多层结构中的超薄膜

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.mc8

S. Zheludeva, M. Kovalchuk, N. Novikova, I. Bashelhanov, A. V. Shubnikov

引用次数: 0

Characterization of Etched Laminar Multilayer Amplitude Gratings in the Soft X-Ray Region 软x射线区刻蚀层流多层振幅光栅的表征

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.pd2

P. Troussel, D. Schirmann, S. Bac, R. Barchewitz, P. Boher

引用次数: 0

Stress, Morphology, and Optical Properties of Mo/Si X-Ray Multilayers Mo/Si x射线多层膜的应力、形貌和光学性质

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.mb3

D. Windt, R. Kola, W. Waskiewicz, R. Hull, J. Griffith

{"title":"Stress, Morphology, and Optical Properties of Mo/Si X-Ray Multilayers","authors":"D. Windt, R. Kola, W. Waskiewicz, R. Hull, J. Griffith","doi":"10.1364/pxrayms.1992.mb3","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.mb3","url":null,"abstract":"Due to its high X-ray reflectance (~60%) for wavelengths longer than the Si-L absorption edge near 125 Å, the Mo/Si X-ray multilayer (XML) system is now used in a diverse range of advanced applications, including soft X-ray projection lithography and X-ray astronomy. Consequently, the stability and the structural and optical properties of this system have been extensively studied [1-7]. High resolution transmission electron microscopy (HRTEM) of sputter-deposited Mo/Si XMLs reveals that the Mo layers are polycrystalline, the Si layers amorphous, and the interface region composed of an amorphous mixture of Mo and Si. Further investigations have indicated that this interlayer material is, in fact, amorphous MoSi2. Thermal anneal studies have revealed the absence of solid-state amorphization, in spite of the presence of the amorphous alloy interfacial layers. Instead, the amorphous interlayers crystallize, and growth of the crystalline product, MoSi2 proceeds in the temperature range 275-550°C. At higher temperatures (600°C), the Mo5Si3 phase appears as well. However, at lower temperatures (<200°C), no structural or optical changes have thus far been reported.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"79 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116071827","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

XUV Mo/Si Multilayer Mirrors Deposited by RF Magnetron Sputtering 射频磁控溅射沉积XUV Mo/Si多层反射镜

Physics of X-Ray Multilayer Structures Pub Date : 1992-03-05 DOI: 10.1364/pxrayms.1992.mc11

C. Montcalm, B. Sullivan, H. Pépin, J. Dobrowolski

引用次数: 1