Physics of X-Ray Multilayer Structures最新文献_第6页

Epitaxial Growth of Be(0001) on Ge(111) and Ge(111) on Be(0001) Be(0001)在Ge(111)和Ge(111)上的外延生长

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.thb.2

J. Eickmann, J. Slaughter, C. Falco

引用次数: 0

X-Ray, HRTEM and AFM Analysis of Thick and Thin Ni/C Multilayers 厚/薄Ni/C多层膜的x射线、HRTEM和AFM分析

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.mc.7

S. Abdali, F. Christensen, K. Joensen, K. Mogensen, L. Gerward, J. Garnæs

{"title":"X-Ray, HRTEM and AFM Analysis of Thick and Thin Ni/C Multilayers","authors":"S. Abdali, F. Christensen, K. Joensen, K. Mogensen, L. Gerward, J. Garnæs","doi":"10.1364/pxrayms.1994.mc.7","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.mc.7","url":null,"abstract":"The evaluation of interface roughness as a function of the film thickness (100-500 layers) have been studied. The combination of X-ray reflectivity, High Resolution Transmission Electron Microscopy (HREM) and Atomic Force Microscopy (AFM) has provided detailed information about the structure of the deposited multilayers. Here we demonstrate the results and a comparison of these methods on three Ni/C multilayers of comparable periods (39Å<d<45Å) on Si single crystal substrates. The HREM investigation, using a cross-section technique, has shown interesting results, in that the Ni layers contained nanocrystalized particles. A diffraction pattern from such a sample revealed superlattice Bragg diffraction of the multilayer structure, the (110) diffraction pattern of the silicon substrate and diffuse rings of the amorphous carbon. No rings were observed for the crystalline Ni. Graded d-spacing multilayers were also investigated. The same preparation technique, used for HREM analysis, was employed for the AFM, not to study the surface of the multilayers but in order to make further characterization of the interface roughness of the multilayers. Comparisons of the results obtained by X-ray reflectivity and high resolution microscopy are reported.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126892022","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Multilayer Growth Dynamics: Experimental Optimization of Interface Structures 多层生长动力学:界面结构的实验优化

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.mb.2

D. E. Savage

引用次数: 0

Evolution of Roughness with Polishing at Fused Silica Surfaces 熔融石英表面抛光粗糙度的演变

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.wc.8

J. Kortright

引用次数: 0

Microstructure, Stress and Optical Properties of Ge/C Multilayers Ge/C多层膜的微观结构、应力和光学性能

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tuc.7

Xiang Lu, T. Nguyen, R. Soufli, E. Gullikson, J. Underwood

{"title":"Microstructure, Stress and Optical Properties of Ge/C Multilayers","authors":"Xiang Lu, T. Nguyen, R. Soufli, E. Gullikson, J. Underwood","doi":"10.1364/pxrayms.1994.tuc.7","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.tuc.7","url":null,"abstract":"Recent studies of x-ray multilayers have focused on understanding and controlling the roughness at the interfaces to achieve high reflectivity. In general, the structure at the interfaces depends on the microstructure inside the layers, and on the interactions between the layer materials. Presumably, in systems in which the components do not react with each other, such as Ru/C and Ge/C, minimum intermixing and diffusion should allow relatively sharp and well-defined interfaces. For this reason, the germanium and carbon pair is studied as a potential candidate for the x-ray multilayer mirrors. Some early materials studies showed that no compounds of Ge and C were detected up to 3170 °C [1]. Early measurements also indicated virtual insolubility of C in Ge, or Ge in graphite [2]. These materials science properties suggest that Ge/C may be able to form sharp multilayer interfaces and hence may provide significant specular x-ray reflectance, especially at wavelengths just above the carbon K edge (4.4 nm), where interfacial microstructure and morphology play a critical role in the determination of reflectivity. In this paper, we present results from a systematic study of the microstructure, stress, and optical properties of as-prepared and annealed Ge/C multilayers having periods and relative individual layer thicknesses typical for soft x-ray applications.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116176784","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Characterization of interface structure in multilayers using specular x-ray reflectance 利用镜面x射线反射率表征多层界面结构

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tua.1

E. Fullerton

{"title":"Characterization of interface structure in multilayers using specular x-ray reflectance","authors":"E. Fullerton","doi":"10.1364/pxrayms.1994.tua.1","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.tua.1","url":null,"abstract":"X-ray reflectivity measurements are commonly used to characterize the structure and morphology of surfaces, thin films and multilayers.1-3 In most reflectivity measurements the scattering vector q is much smaller than the characteristic length scale for diffraction =2n/d, where d is the crystal lattice spacing. Therefore, the reflectivity measurements are insensitive to the crystal structure of the layers; the scattered intensity for multilayers occurs predominantly from the interfaces. It is this sensitivity to the interfacial structure that makes reflectivity measurements complementary to diffraction4 for characterizing multilayers. Nb/Si multilayers provides an instructive case because extremely smooth, as will as conformal and cumulative roughness cases can be realized by adjusting the sputtering conditions.5 We will discuss the quantitative analysis of the specular reflectivity from a series of Nb/Si multilayers sputtered at various Ar pressures. The multilayers were grown by dc magnetron sputtering onto sapphire substrates at ambient temperatures. The target-substrate distance was fixed at 9 cm and the Argon sputtering pressure was varied from 3 to 15 mTorr. This spans the range from high kinetic energy to nearly thermalized deposited atoms. The expected pressure for thermalization is ≈9 mTorr.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123956157","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Beamsplitting and Polarization Properties of Cr/C Transmission Multilayers close to the Carbon K-edge 靠近碳k边的Cr/C透射多层膜的分束和极化特性

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tha.2

F. Schäfers, A. Furuzawa, K. Yamashita, M. Watanabe, J. Underwood

引用次数: 0

W/C Multilayer Mirrors for 4.47nm X-Ray 用于4.47nm x射线的W/C多层反射镜

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.mc.4

J. Shao, Z. Fan, Gongjie Yin, Kui Yi, Lixiang Yuan

引用次数: 0

Determining the vertical correlation of interfacial roughness in multilayer films using x-ray scattering* 用x射线散射测定多层膜界面粗糙度的垂直相关性*

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tuc.6

Y. Phang, D. Savage, Z. Y. Zhang, M. Lagally

引用次数: 0

Epitaxial Growth with Dissimilar Materials: Basic Concepts 异种材料外延生长:基本概念

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.mb.1

A. Zangwill

引用次数: 0