{"title":"Multilayer X-Ray Mirror Absolute reflectivity, Energy Band Pass and Overlapping Order Determination Using an X-Ray tube and a SI(LI) Detector","authors":"P. Dhez, H. Duval, J. C. Malaurent","doi":"10.1364/pxrayms.1992.wb1","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.wb1","url":null,"abstract":"X-ray interference mirrors are a particular case of artificial multilayered media for which the wanted property is a high intensity of the diffraction phenomena itself. For such applications one needs to know the performance of the mirrors at different wavelengths. We would like to demonstrate here how such X-ray reflectivity tests can be achieved on a laboratory apparatus to get absolute reflectivity and without the need of a synchrotron source.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125857859","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Effects of Sputtering Pressure on Roughness and Resputtering of Multilayers","authors":"M. M. Hasan, R. Highmore, R. Somekh","doi":"10.1364/pxrayms.1992.mb2","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.mb2","url":null,"abstract":"This summary outlines studies of W-Si and Co-Cu multilayers. We recognize that W-Si is unlikely to make optimal x-ray mirrors, because Si is more strongly absorbing than, say, carbon for most radiation wavelengths, and because the known propensity of metal-silicon couples to interdiffuse to form silicides suggests that interfaces’are unlikely to be very sharp. W-Si is, though, a useful model system. A more extensive account of our work with W-Si and related systems is contained in [1]. Interfacial roughness is important in determining the properties not only of x-ray mirrors, but also of multilayer systems which exhibit so-called \"giant magnetoresistance\". We are using Co-Cu as a model system with which to study this phenomenon.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121414829","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
D. Eder, B. MacGowan, L. DaSilva, S. Mrowka, T. Barbee
{"title":"Modeling of Multilayer Mirror Damage by a Short Pulse of X-Rays","authors":"D. Eder, B. MacGowan, L. DaSilva, S. Mrowka, T. Barbee","doi":"10.1364/pxrayms.1992.tha5","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.tha5","url":null,"abstract":"Multilayer mirrors can have a dramatic reduction in reflectivity as a result of large optical and x-ray fluxes incident on the surface of the mirror. We consider the effect of a short pulse of x-rays on the reflectivity of a variety of mirrors including W/C, WC/C, Cr3C2/C, Mo/Si, and MoSi2/Si multilayers. We use the measured x-ray spectrum from a gold target heated by a 0.5 ns laser for the case of no filter between the gold and the mirror and when various low energy filters are used. One tool we use to determine the reduction in reflectivity is a multilayer damage code ROMULS.1 We have modified the code to allow non-normal incidence and for a spectrum of x rays In the figure we show the calculated normal incidence reflectivity of a W/C multilayer mirror at 44.8 Å. The x-ray flux from the gold target is incident at 50° from normal and we show the reflectivity for three values of integrated fluence. The temporal dependence of the x-ray flux used in the calculation is shown. Two of the curves use an x-ray spectrum measured with no filter and one uses the spectrum after passing through a low energy filter. In all cases, the calculated reflectivity is reduced dramatically during the x-ray pulse. The calculated reflectivities with no damage are approximately a factor of four larger than measured. The calculation assumes smooth layers and no diffusion between the layers. We will discuss the reduction of reflectivity as a result of rough surfaces and diffusion between layers. Our modeling results will be compared with recent experiments that measured the reflectivity both temporally and spectrally.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"286 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133975882","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
J. Seely, M. Kowalski, T. Barbee, J. Rife, W. Hunter
{"title":"Interfacial Roughness and Interdiffusion Derived from a Comparison of the Measured and Calculated Reflectances of Mo/Si Multilayer Coatings","authors":"J. Seely, M. Kowalski, T. Barbee, J. Rife, W. Hunter","doi":"10.1364/pxrayms.1992.mc4","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.mc4","url":null,"abstract":"Mo/Si multilayer coatings were fabricated at LLNL and were characterized using the Grating/Crystal Monochromator and Reflectometer attached to the Naval Research Laboratory beamline X24C at the National Synchrotron Light Source. The reflectances were measured at several angles of incidence and for both s and p polarizations. The measured reflectances were compared to calculations that included the effects of interdiffusion layers and of roughness at each interface and that were based on Henke's optical constants.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132002200","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"High Resolution Electron Microscope Imaging and Quantification of Interface Structure in X-Ray Multilayers","authors":"R. Hull, D. Windt, R. Kola, W. Waskiewicz","doi":"10.1364/pxrayms.1992.tub1","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.tub1","url":null,"abstract":"We discuss the applications and limits of high resolution electron microscopy (HREM) to quantifying atomic-scale structure in X-Ray mirror multilayer (XMM) structures. It is shown how detailed processing of HREM images can yield quantitative measurements of interface planarity and diffuseness, which are critical parameters in determining the reflectivity of XMM structures.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122563114","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
B. MacGowan, S. Mrowka, T. Barbee, L. D. Silva, D. Eder
{"title":"Investigation of the effect of large x-ray fluences on multilayer structures","authors":"B. MacGowan, S. Mrowka, T. Barbee, L. D. Silva, D. Eder","doi":"10.1364/pxrayms.1992.mc1","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.mc1","url":null,"abstract":"The use of multilayer mirrors in x-ray laser cavities is complicated by extremely intense optical and x-ray pulses that damage the multilayer mirror before it has done its job. The issue of damage of the mirror by x-ray emission from the plasma amplifier has been studied experimentally using short duration (500 psec) bursts of soft x-rays from a laser produced Au plasma. Different damage/failure mechanisms have been observed and identified for Mo/Si, MoSi2/Si, W/C, WC/C and Cr3C2/C multilayers and damage thresholds quantified. The effect of the x-ray flux on the peak mirror reflectivity together with the position and shape of the bandpass has been resolved both temporally and spectrally. The shape of the bandpass has been fitted to solutions to the Fresnel equations for aperiodic stacks in order to infer the time history of the stack. Rapid diffusion of Mo into Si in Mo/Si multilayers has been observed to occur in time scales of order 70 psec.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116247226","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Substrate effects on x-ray specular reflectance and non-specular scattering from x-ray multilayers","authors":"J. Kortright, T. D. Nguyen, I. Tidswell, C. Lucas","doi":"10.1364/pxrayms.1992.tuc2","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.tuc2","url":null,"abstract":"It is common knowledge that substrate roughness plays an important role in limiting the specular reflectance of x-ray multilayers. However, there have been relatively few systematic experimental studies of the effects of substrate roughness on x-ray multilayer reflectivity. We have begun to investigate these effects by measuring the specular and off-specular scattering from a set of substrates with different roughness and from tungsten/carbon multilayers deposited simultaneously onto an identical set of substrates.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129945831","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Atomic Layer Epitaxy of Tungsten and Boron for Multilayer X-ray Optics","authors":"J. K. Shurtleff, J. Phillips","doi":"10.1364/pxrayms.1992.pd1","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.pd1","url":null,"abstract":"The demand for high quality multilayer x-ray optics (MXOs) has increased as x-ray imaging applications have developed. MXOs must be uniform and smooth with precise periods. The period of the MXO determines the angle and wavelength of the x-ray which can be reflected. Current preparation techniques are limited to a period of approximately 40 Å. To reflect harder x-rays at near normal incidence, smaller periods must be achieved.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133547412","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Imaging X-Ray Multilayer Structures with Cross-Sectional HREM","authors":"Y. Cheng, M. Stearns, David J. Smith, D. Stearns","doi":"10.1364/pxrayms.1992.pd5","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.pd5","url":null,"abstract":"High-resolution electron microscopy (HREM), with a resolution below 2Å, is the best tool for observing the actual detailed structure for ML. This gives direct atomic scale information about the film structure, including the bilayer thickness, the crystalline structure and the roughness of the individual layers and the interlayers.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"110 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114925963","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
B. Vidal, M. Brunel, A. Erko, D. Rochtchoupkine, J. Susini
{"title":"Bragg-Fresnel Multilayer Optics for X-ray Microscopy and Spectroscopy","authors":"B. Vidal, M. Brunel, A. Erko, D. Rochtchoupkine, J. Susini","doi":"10.1364/pxrayms.1992.thb1","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.thb1","url":null,"abstract":"Application of metallic multilayer mirrors for construction of different components of x-ray optical schemes became more and more frequent. Number of publications gives an examples of objective lenses, monochromators, focusing and imaging devices, based on figured multilayer mirrors. One of the most exited application of such optics in future can be projection X-ray lithography and local analyses of microstructures with submicron resolution for microelectronics technology.\u0000 Recently, focusing and imaging by the use of some kinds of \"grooved\" diffraction optics on flat surfaces instead of the curved substrate had been reported in several papers. This optics is now known as Bragg-Fresnel Multilayer Optics (BFMO) [1,2]. Compared to grazing incidence optics and figured multi-layers optics, BFMO can provide higher spatial and spectral resolutions. That is say, till to spot value up to 0.1μ spatial resolution of BFMO is limited only by the flatness of the plane substrate and accuracy of the lithographic process [3]. In principle BFMO combines the high spatial resolution of Fresnel zone plates and the high radiation stability of multi-layer X-ray mirrors.\u0000 This report gives an examples of fabrication, computer simulation and tests for two kind of BFMO: Lamellar Multilayer Gratings (LMG) and Linear Bragg-Fresnel Multilayer Lenses (LBFML). LMG, used here as the first step for the understanding of diffraction property of LBFML, can be very interesting themselves as by spectroscopic instruments with relatively high dispersion and efficiency.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1992-03-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129548107","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}