Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)最新文献_第2页

Electrical breakdown in atmospheric air between closely spaced (0.2 /spl mu/m-40 /spl mu/m) electrical contacts 在紧密间隔(0.2 /spl mu/m-40 /spl mu/m)的电触点之间的大气中发生电击穿

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953218

P. Slade, E. Taylor

{"title":"Electrical breakdown in atmospheric air between closely spaced (0.2 /spl mu/m-40 /spl mu/m) electrical contacts","authors":"P. Slade, E. Taylor","doi":"10.1109/HOLM.2001.953218","DOIUrl":"https://doi.org/10.1109/HOLM.2001.953218","url":null,"abstract":"The increasing importance of electrical contacts in air with micrometer spacing prompted recent experiments on the electrical breakdown behavior of these gaps. The electrical field between the contacts used in one of the experiments was analyzed, using finite element analysis to model the electric field. The experimental data on the electrical breakdown voltage could be divided into three regions as a function of the gap spacing. First, at close gap spacing (/spl les/4 /spl mu/m), both the breakdown voltages and the electrical fields at the cathode were similar to values measured during the breakdown of vacuum gaps of less than 200 /spl mu/m. Second, at larger gaps (>6 /spl mu/m), the breakdown voltages followed Paschen's curve for the Townsend electron avalanche process in air. Finally, in between these two regions, the breakdown values were below the expected values for purely vacuum breakdown or purely Townsend breakdown. The breakdown phenomena have been discussed in terms of field emission of electrons from the cathode and their effect on initiating the observed breakdown regimes.","PeriodicalId":136044,"journal":{"name":"Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2001-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116802182","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 176

High frequency considerations for multi-point contact interfaces 多点接触接口的高频考虑

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953207

R. Malucci, Molex

{"title":"High frequency considerations for multi-point contact interfaces","authors":"R. Malucci, Molex","doi":"10.1109/HOLM.2001.953207","DOIUrl":"https://doi.org/10.1109/HOLM.2001.953207","url":null,"abstract":"A statistical model based on random variations of surface features was used to estimate the resistance and capacitance of a typical multi-point contact interface. Values for clean and degraded contacts were calculated and show that, as a contact degrades, the resistance goes up and the capacitance initially rises and then falls as a film grows at the contact interface. Moreover, data were provided that show consistency with predictions from the statistical model. In addition, measurements of the skin effect on series resistance, including contact resistance, were conducted and show a power law frequency dependence of both bulk and contact resistance. While these data appear consistent with the analysis, it is believed that the measurement and analysis techniques can be improved to provide more accurate results. Moreover, the results reveal that high frequency data transmission can be affected by the impedance of a degraded contact interface. While the latter was not fully quantified, this study showed the levels where degradation may impact high frequency signal propagation. It is believed that further refinement of the techniques used in this study will help quantify high frequency effects from the impedance of a multi-point contact interface.","PeriodicalId":136044,"journal":{"name":"Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2001-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116849685","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 42

Volumetric erosion measurements of contacts tested in DC automotive relays 直流汽车继电器中测试触点的体积腐蚀测量

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953191

J. McBride, G. Witter, Z. Chen

{"title":"Volumetric erosion measurements of contacts tested in DC automotive relays","authors":"J. McBride, G. Witter, Z. Chen","doi":"10.1109/HOLM.2001.953191","DOIUrl":"https://doi.org/10.1109/HOLM.2001.953191","url":null,"abstract":"A new tool for measurement of contact arc erosion offers better means for improvement in relay and switch design. This paper presents an experimental study on the erosion of relay contacts tested in commercial devices under representative load conditions. The erosion measurement of relay contacts has been shown to be difficult since the standard method based on a mass change cannot be easily used in this type of device. The reason for this is that the contacts cannot be separated from the contact support. In the past, SEM studies have been used for rough estimates of erosion. More recently, noncontact laser measurement systems have been developed and used in this application for measurement of the volumetric erosion. In this study, using the method of \"design of experiments,\" a number of variables have been investigated, which include electrical current levels, material composition, and contact switching life. The objective of the study is to determine the volumetric erosion of contacts in actual automotive relays tested under a range of conditions. The study shows this technique offers a useful method for studying and improving both material and device design.","PeriodicalId":136044,"journal":{"name":"Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2001-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124025124","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 8

Precious metal-reduced contact materials in telecom- and signal relays 电信和信号继电器用贵金属减重触点材料

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953197

W. Johler

{"title":"Precious metal-reduced contact materials in telecom- and signal relays","authors":"W. Johler","doi":"10.1109/HOLM.2001.953197","DOIUrl":"https://doi.org/10.1109/HOLM.2001.953197","url":null,"abstract":"Palladium is the most frequently used contact material for telecommunication and signal relays, due to its good contact resistance stability and material transfer characteristics. The significant increase in the price of palladium in recent years has made it necessary to look for alternatives. The development of gastight plastic sealed relay housings, which keep the gas filling inside the relay for a long time, e.g. more than 10 years for nitrogen and more than 100 years for sulfur-hexafluoride, allows nonprecious metal contact materials to be used, as an inert atmosphere can be kept for the entire life of the relay. Tests were performed with gold covered tungsten and ruthenium contacts mounted in a standard telecom relay filled with N/sub 2/ or SF/sub 6/. Although the contact resistance was always measured with dry circuit conditions applied, no relevant increase was observed during all electrical endurance tests. The ruthenium as well as the tungsten layer with a thickness of only 5 /spl mu/m withstood endurance tests with maximum loads at 30 W. As only minimum contact erosion and material transfer occurred, no contact sticking or bridging was observed. Overall, the switching performance of tungsten and ruthenium is similar to that of PdRu10. As PdRu10 has superior performance, especially when operating in an SF/sub 6/ atmosphere, the properties of Ru and W in N/sub 2/ as well as in SF/sub 6/ are at least comparable with all contact materials in current use. Gastight plastic sealed relay housings offer the advantages of hermetically sealed housings at an affordable cost.","PeriodicalId":136044,"journal":{"name":"Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2001-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115352178","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 15

Performance of microcontacts tested with a novel MEMS device 用新型MEMS器件测试微触点性能

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953199

S. Bromley, B. Nelson

{"title":"Performance of microcontacts tested with a novel MEMS device","authors":"S. Bromley, B. Nelson","doi":"10.1109/HOLM.2001.953199","DOIUrl":"https://doi.org/10.1109/HOLM.2001.953199","url":null,"abstract":"Most practical MEMS actuators generate forces ranging from several micronewrons to one or two millinewtons. In order to explore the feasibility of low-resistance contacts for MEMS relays, we explored the force-resistance relationship for gold-gold microfabricated contacts. The effect of apparent contact area on resistance has also been examined for areas between 10 and 90,000 /spl mu/m/sup 2/. The force/resistance relationship of these fully-microfabricated flat microcontacts correlates well with traditional theory and previous experimental results. The average measured resistance varied between 20.5 m/spl Omega/ and 62.9 m/spl Omega/. Decreasing contact area and contact force lead to higher overall contact resistance. However, reducing the apparent contact area by orders of magnitude only had a marginal effect on the overall contact resistance, even when the apparent contact area was orders of magnitude less than the theoretical actual contact area (/spl pi/r/sub c//sup 2/). Furthermore, the force required for a stable microcontact was determined to be below 0.6 mN and therefore within the force range of a MEMS actuator.","PeriodicalId":136044,"journal":{"name":"Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)","volume":"04 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2001-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127265531","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 25

Current commutation in arcless interruptions with PTC (positive temperature coefficient resistivity) PTC(正温度系数电阻率)无弧中断中的电流换相

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953202

W.W. Chen

{"title":"Current commutation in arcless interruptions with PTC (positive temperature coefficient resistivity)","authors":"W.W. Chen","doi":"10.1109/HOLM.2001.953202","DOIUrl":"https://doi.org/10.1109/HOLM.2001.953202","url":null,"abstract":"In most existing current interruption devices, the current is interrupted using only separating contacts. By adding a ceramic PTC (CPTC) element in parallel with the contacts, 100% of the interruption energy can be converted to heat, eliminating the arc totally. The initial voltage across the contacts must be less than a predetermined value in order to shunt all of the current to the CPTC. The cold resistance of the CPTC is the main factor in determining the initial voltage across the contacts and the current at which the CPTC trips. A ceramic PTC device was tested with cold resistance of 14 /spl Omega/. At 300 V/sub DC/ and 1.0 A, 100% of the interruption energy was consumed by the CPTC. All the current commutated from the contacts to the CPTC within 0.2 /spl mu/s. At 300 V/sub DC/ and 0.5 A, the current commutated to the CPTC within only 0.1 /spl mu/s. A high speed video camera observed that current commutation was completed before the actual separation of the contacts. No arc was seen by the high speed video camera. No voltage spike was induced by the inductance. Due to the elimination of arcing, use of the CPTC in low current interruption devices will result in reduced contact size and increased operation cycles. It will also provide an arcless interruption for application in hazardous conditions, and can also be applied to 42 V automotive systems.","PeriodicalId":136044,"journal":{"name":"Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)","volume":"1887 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2001-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122167720","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Dielectric recovery characteristics of a high current arcing gap 大电流电弧间隙的介电恢复特性

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953204

J. Shea

{"title":"Dielectric recovery characteristics of a high current arcing gap","authors":"J. Shea","doi":"10.1109/HOLM.2001.953204","DOIUrl":"https://doi.org/10.1109/HOLM.2001.953204","url":null,"abstract":"Experimental measurements of the dielectric breakdown strength of an arcing gap after current zero were made to determine the effects of arc chamber venting on the reverse recovery voltage needed to break down a recovering gap. The recovery conditions applied closely matched those created in a molded case circuit breaker under power line fault conditions. Three different vent sizes were used to determine the effect of gas pressure on the recovery characteristics of the plasma with recovery time between 170 /spl mu/s to 280 /spl mu/s, and currents from 3 kA/sub p/ to 15 kA/sub p/. Larger venting, providing increased cooling of the plasma, resulted in increased breakdown strength over the full range of currents. Based on the approximation that the recovering plasma breakdown strength is inversely proportional to plasma thermal temperature, breakdown voltage values were fitted to an exponential model to obtain plasma time constants and the initial hold-off voltage. Comparing these results to curve fits of E/p values showed E/p was a more accurate representation of the data. It is proposed to use E/p values when there is significant post current-zero chamber pressure. These results could be used as a guide to predicting molded case breaker interruption performance, especially for small arc chambers and short gaps.","PeriodicalId":136044,"journal":{"name":"Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2001-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131314311","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 13

A commutation performance and wear of carbon-fiber brush in gasoline 碳纤维刷在汽油中的换向性能及磨损

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953188

M. Takaoka, T. Aso, K. Sawa

引用次数: 2

Constriction resistance at high signal frequencies 高信号频率下的收缩阻力

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953206

J. Lavers, R. Timsit

{"title":"Constriction resistance at high signal frequencies","authors":"J. Lavers, R. Timsit","doi":"10.1109/HOLM.2001.953206","DOIUrl":"https://doi.org/10.1109/HOLM.2001.953206","url":null,"abstract":"Constriction resistance arises in practical electrical interfaces because contact is made at discrete spots as defined by the surface roughness and contact pressure. This paper describes the dependence of constriction resistance on signal frequency. This dependence was calculated for circular constrictions ranging in diameter from 10 to 100 /spl mu/m, and for frequencies ranging from DC to 1 GHz. The results indicate that the magnitude of constriction resistance does not deviate appreciably from values predicted by Helm's classical analytical expression, as long as the skin depth is large compared with the constriction radius. For skin depths that are much smaller than the constriction radius, constriction resistance decreases with increasing frequency to an apparent limiting value independent of the constriction radius. At high frequencies, constriction resistance constitutes only one of two components of the total connection resistance measured in practice. The second component of connection resistance is determined by details of the geometry and dimensions of the contact interface, and increases with signal frequency.","PeriodicalId":136044,"journal":{"name":"Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2001-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125655526","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 52

Analyses on thin film between contacts by using third harmonic distortion 用三次谐波畸变分析薄膜接触面

Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192) Pub Date : 2001-09-10 DOI: 10.1109/HOLM.2001.953209

E. Takano

{"title":"Analyses on thin film between contacts by using third harmonic distortion","authors":"E. Takano","doi":"10.1109/HOLM.2001.953209","DOIUrl":"https://doi.org/10.1109/HOLM.2001.953209","url":null,"abstract":"This paper describes a graphic method to evaluate the effective physical parameters (potential barrier height and film thickness) of a thin insulating film for the tunnel current. The theoretical third harmonic distortion (THD) of the terminal contact current due to the tunnel effect is expressed as a function of the tunnel resistivity and illustrated in a graph, which makes it possible to determine the physical parameters. Experimental results, using Au vs. Au 0.5%Co alloy contacts at very small contact loads (<1 mN), show that the THD and the contact resistance are very high when the contacts are contaminated with an organic vapor from practical soldering. By making use of these results, the effective potential barrier height for electron emission from the contact metal into the organic film is evaluated at voltages of less than 0.3 eV and film thicknesses of 0.5-0.7 nm. It is possible to estimate the large THD using the voltage-tunnel resistance characteristics without measuring the third harmonic. The electric current due to the field emission through the film is theoretically evaluated to be much less than the tunnel current at low applied voltages.","PeriodicalId":136044,"journal":{"name":"Proceedings of the Forth-Seventh IEEE Holm Conference on Electrical Contacts (IEEE Cat. No.01CH37192)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2001-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132582579","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 5