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IEEE Photonics Technology Letters最新文献

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Random Forest Regression for Improving the Measurement Range of a Temperature Interferometric Sensor 随机森林回归提高温度干涉传感器测量范围
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-13 DOI: 10.1109/LPT.2024.3517424
Juan J. Paniagua-Medina;Everardo Vargas-Rodriguez;Ana Dinora Guzman-Chavez;Jose Carmen Morales-Castro;Roberto J. Correa-Jurado
{"title":"Random Forest Regression for Improving the Measurement Range of a Temperature Interferometric Sensor","authors":"Juan J. Paniagua-Medina;Everardo Vargas-Rodriguez;Ana Dinora Guzman-Chavez;Jose Carmen Morales-Castro;Roberto J. Correa-Jurado","doi":"10.1109/LPT.2024.3517424","DOIUrl":"https://doi.org/10.1109/LPT.2024.3517424","url":null,"abstract":"In this work, a random forest regression was used to predict the temperature of an interferometric optical sensor over a wide measurement range, overcoming several times the \u0000<inline-formula> <tex-math>$2pi $ </tex-math></inline-formula>\u0000 ambiguities. In particular, in the Fabry-Perot interferometer, this phenomenon is related to the free spectral range (FSR) of the fringes. Additionally, spectral features such as wavelength and amplitude of fringe peaks usually present nonlinear relationships with the target physical variable, in this case temperature. Here, it is shown that by using a random forest (RF) regression it is possible to overcome several FSR ambiguities, to widen the measurement range by a factor of 8 from 5.2 to 49.6 °C, with a RMSE of 0.04554 °C and a MAE of 0.0317 °C.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 2","pages":"101-104"},"PeriodicalIF":2.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142858985","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improvement of Antistatic Discharge Performance of 1.3-μm AlGaInAs/InP Semiconductor Lasers 1.3-μm AlGaInAs/InP半导体激光器抗静电放电性能的改进
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-13 DOI: 10.1109/LPT.2024.3517423
Mingjun Dai;Hui Lv;Chao Niu;Yunlong Du
{"title":"Improvement of Antistatic Discharge Performance of 1.3-μm AlGaInAs/InP Semiconductor Lasers","authors":"Mingjun Dai;Hui Lv;Chao Niu;Yunlong Du","doi":"10.1109/LPT.2024.3517423","DOIUrl":"https://doi.org/10.1109/LPT.2024.3517423","url":null,"abstract":"Electrostatic discharge (ESD) failure is a reliability concern for InP-based semiconductor lasers. An analysis of ESD-induced failures in AlGaInAs/InP-based DFB semiconductor lasers reveals that the primary degradation mechanism is optical absorption in the active layer at the laser facet. XPS results demonstrate that device failures caused by ESD can be effectively mitigated through surface cleaning and passivation, with this effect attributed to a reduction in non-radiative recombination at the facet.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 3","pages":"129-132"},"PeriodicalIF":2.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142905833","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IEEE Photonics Technology Letters Information for Authors IEEE Photonics Technology Letters 为作者提供的信息
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-13 DOI: 10.1109/LPT.2024.3488227
{"title":"IEEE Photonics Technology Letters Information for Authors","authors":"","doi":"10.1109/LPT.2024.3488227","DOIUrl":"https://doi.org/10.1109/LPT.2024.3488227","url":null,"abstract":"","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"36 23","pages":"C3-C3"},"PeriodicalIF":2.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10799139","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142821241","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IEEE Photonics Technology Letters publication information IEEE Photonics Technology Letters 出版信息
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-13 DOI: 10.1109/LPT.2024.3488235
{"title":"IEEE Photonics Technology Letters publication information","authors":"","doi":"10.1109/LPT.2024.3488235","DOIUrl":"https://doi.org/10.1109/LPT.2024.3488235","url":null,"abstract":"","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"36 24","pages":"C2-C2"},"PeriodicalIF":2.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10799122","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142825878","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Blank Page 空白页
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-13 DOI: 10.1109/LPT.2024.3469009
{"title":"Blank Page","authors":"","doi":"10.1109/LPT.2024.3469009","DOIUrl":"https://doi.org/10.1109/LPT.2024.3469009","url":null,"abstract":"","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"36 21","pages":"C4-C4"},"PeriodicalIF":2.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10799110","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142821178","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IEEE Photonics Technology Letters publication information IEEE Photonics Technology Letters出版信息
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-13 DOI: 10.1109/LPT.2024.3488215
{"title":"IEEE Photonics Technology Letters publication information","authors":"","doi":"10.1109/LPT.2024.3488215","DOIUrl":"https://doi.org/10.1109/LPT.2024.3488215","url":null,"abstract":"","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"36 22","pages":"C2-C2"},"PeriodicalIF":2.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10799115","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142821296","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IEEE Photonics Technology Letters Information for Authors IEEE Photonics Technology Letters for Authors
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-13 DOI: 10.1109/LPT.2024.3488237
{"title":"IEEE Photonics Technology Letters Information for Authors","authors":"","doi":"10.1109/LPT.2024.3488237","DOIUrl":"https://doi.org/10.1109/LPT.2024.3488237","url":null,"abstract":"","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"36 24","pages":"C3-C3"},"PeriodicalIF":2.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10799112","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142821181","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Blank Page 空白页
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-13 DOI: 10.1109/LPT.2024.3488243
{"title":"Blank Page","authors":"","doi":"10.1109/LPT.2024.3488243","DOIUrl":"https://doi.org/10.1109/LPT.2024.3488243","url":null,"abstract":"","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"36 24","pages":"C4-C4"},"PeriodicalIF":2.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10799121","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142821268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
IEEE Photonics Technology Letters publication information IEEE Photonics Technology Letters出版信息
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-13 DOI: 10.1109/LPT.2024.3469011
{"title":"IEEE Photonics Technology Letters publication information","authors":"","doi":"10.1109/LPT.2024.3469011","DOIUrl":"https://doi.org/10.1109/LPT.2024.3469011","url":null,"abstract":"","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"36 21","pages":"C2-C2"},"PeriodicalIF":2.3,"publicationDate":"2024-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10799149","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142821179","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Hybrid Polymer Waveguide With Large Refractive Index Contrast for High-Density Optical Interconnects 用于高密度光互连的大折射率混合聚合物波导
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2024-12-12 DOI: 10.1109/LPT.2024.3516365
Xu Liu;Lin Ma;Yijun Yu;Qiancheng Yu;Jinhua Wu;Zuyuan He
{"title":"Hybrid Polymer Waveguide With Large Refractive Index Contrast for High-Density Optical Interconnects","authors":"Xu Liu;Lin Ma;Yijun Yu;Qiancheng Yu;Jinhua Wu;Zuyuan He","doi":"10.1109/LPT.2024.3516365","DOIUrl":"https://doi.org/10.1109/LPT.2024.3516365","url":null,"abstract":"We propose polymer waveguides with large refractive index contrast by adopting organic-inorganic hybrid resin and fluorinated acrylate resin as core and cladding materials, respectively. Both types of polymer materials are UV-curable and exhibit excellent compatibility throughout the fabrication process. The fabricated hybrid waveguides show good stabilities and the additional loss due to the adoption of two types of materials is negligible. In the experiment, we succeeded in the design and fabrication of hybrid polymer waveguides with a relative refractive index contrast (\u0000<inline-formula> <tex-math>$Delta $ </tex-math></inline-formula>\u0000) as high as 7.7%. The measured bending loss of the waveguide is about 0.1 dB/90° turning under a bending radius of 1 mm at a wavelength of 1310 nm which is critical in realizing waveguide with complex topology and ultra-high density. The core dimension of the waveguide is \u0000<inline-formula> <tex-math>$4.5 times ; 4.5 ; mu $ </tex-math></inline-formula>\u0000m2 which guarantees low-loss interconnection with a typical silicon chip. The proposed method is useful in tuning the refractive index of waveguides in a wide range and the fabricated waveguide is promising for high-density optical interconnects application.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 3","pages":"125-128"},"PeriodicalIF":2.3,"publicationDate":"2024-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142905832","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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