IEEE Photonics Technology Letters最新文献

筛选
英文 中文
High Performance Interband Cascade Lasers With Room Temperature Lasing Wavelengths Near 3.3 μm
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-28 DOI: 10.1109/LPT.2025.3535850
Yixuan Shen;Rui Q. Yang;Tetsuya D. Mishima;John D. Steward;Michael B. Santos;Xiaojun Wang
{"title":"High Performance Interband Cascade Lasers With Room Temperature Lasing Wavelengths Near 3.3 μm","authors":"Yixuan Shen;Rui Q. Yang;Tetsuya D. Mishima;John D. Steward;Michael B. Santos;Xiaojun Wang","doi":"10.1109/LPT.2025.3535850","DOIUrl":"https://doi.org/10.1109/LPT.2025.3535850","url":null,"abstract":"We report significant advancements of interband cascade lasers (ICLs) with hybrid cladding layers. These 6-stage hybrid-cladding ICLs were able to lase in pulsed modes at temperatures up to 421 K, the highest ever reported among ICLs. The lasing wavelength was near <inline-formula> <tex-math>$3.3~mu $ </tex-math></inline-formula>m at 300 K with a pulsed threshold current density of 114 A/cm2, the lowest for ICLs with similar wavelengths. Also, they achieved a high voltage efficiency of ~82% and a record-low threshold input power density of 312 W/cm2 at 300 K. Facet-uncoated narrow-ridge ICLs operated in continuous wave (CW) mode at temperatures up to 364 K (91°C), which is more than 20 K higher than the previous record for epi-up mounted ICLs. The obtained CW threshold current density of 205 A/cm2 at 300 K is similar to the previous record (~200 A/cm2 at 300 K) achieved by a superlattice-cladding 10-stage ICL with emission near the long-held optimal wavelength of ICLs at <inline-formula> <tex-math>$3.6~mu $ </tex-math></inline-formula>m. Also, these ICLs at 300 K delivered CW output power of 25 mW/facet at 160 mA with substantially improved external quantum efficiency over previous ICLs at similar wavelengths.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 4","pages":"243-246"},"PeriodicalIF":2.3,"publicationDate":"2025-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143105834","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High Performance ZnO CQDs/MoSe₂ Heterojunction UV-Visible Broadband Photodetector
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-28 DOI: 10.1109/LPT.2025.3535626
Shikha Singh;Abhinav Pratap Singh;Satyabrata Jit
{"title":"High Performance ZnO CQDs/MoSe₂ Heterojunction UV-Visible Broadband Photodetector","authors":"Shikha Singh;Abhinav Pratap Singh;Satyabrata Jit","doi":"10.1109/LPT.2025.3535626","DOIUrl":"https://doi.org/10.1109/LPT.2025.3535626","url":null,"abstract":"This letter reports an ITO/n-ZnO CQDs/n-MoSe2/Ag structure based ultraviolet-visible (UV-Vis) broadband photodetector where the n-n heterojunction between ZnO colloidal quantum dots (CQDs) and MoSe2 thin film fabricated on an Indium tin oxide (ITO) coated glass substrate forms the active region of the device. The ZnO CQDs synthesized by hot-injection method was spin-coated on the substrate while MoSe2 nano-powder synthesized by hydrothermal method was deposited on the ZnO CQDs layer by thermal evaporation method to obtain the ZnO CQDs/MoSe2 heterojunction. The heterojunction showed a broad absorption spectrum covering the UV-Vis region. Under applied bias voltage of 2 V, the proposed photodetector showed the maximum responsivity (R) of ~282 A/W, detectivity (D) of <inline-formula> <tex-math>$sim 9times 10 ^{12}$ </tex-math></inline-formula> Jones and external quantum efficiency (EQE) of ~90000% at 380 nm (with <inline-formula> <tex-math>$47~mu $ </tex-math></inline-formula>W/cm2 intensity) in the UV region whereas R ~16.15 A/W, D <inline-formula> <tex-math>$sim ~5.37times 10 ^{11}$ </tex-math></inline-formula> Jones, EQE ~3660% were measured at 550 nm (with 0.22 mW/cm2 intensity) in the visible region. The transient response analysis of the device showed a rise time (fall time) as 7.25 sec (2.25 sec) at 380 nm and 1.2 sec (2.2 sec) at 550 nm.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 4","pages":"247-250"},"PeriodicalIF":2.3,"publicationDate":"2025-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143184089","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of P-Electrode Area Ratio on Micro-LED Optoelectronic Performance
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-27 DOI: 10.1109/LPT.2025.3534203
Shi-Biao Liu;Wen-An Guo;You-Cai Deng;Ming-He Wan;Mai-Jia Lin;Tao-Ming Liu;Yue-Lin;Hao-Chung Kuo;Yi-Jun Lu;Zhong Chen;Ting-Zhu Wu
{"title":"Effect of P-Electrode Area Ratio on Micro-LED Optoelectronic Performance","authors":"Shi-Biao Liu;Wen-An Guo;You-Cai Deng;Ming-He Wan;Mai-Jia Lin;Tao-Ming Liu;Yue-Lin;Hao-Chung Kuo;Yi-Jun Lu;Zhong Chen;Ting-Zhu Wu","doi":"10.1109/LPT.2025.3534203","DOIUrl":"https://doi.org/10.1109/LPT.2025.3534203","url":null,"abstract":"The P-electrode is essential for achieving uniform current distribution within the chip, which directly affects the device optoelectronic performance. In this study, micro-LEDs of varying sizes (22, 34, and <inline-formula> <tex-math>$46~mu $ </tex-math></inline-formula>m) and P-electrode area ratios (20%, 30%, and 40%) were fabricated and analyzed. The findings reveal that the optoelectronic performance of micro-LEDs smaller than <inline-formula> <tex-math>$50~mu $ </tex-math></inline-formula>m is significantly affected by different P-electrode area ratios under low current density conditions. This effect primarily results from the combined influence of current distribution and the light-blocking properties of the P-electrode metal. To characterize the performance of these micro-LEDs, hyperspectral imaging and COMSOL simulations were employed. The insights gained from these results provide valuable guidance for the design and fabrication of micro-LEDs optimized for low current density operation.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 4","pages":"239-242"},"PeriodicalIF":2.3,"publicationDate":"2025-01-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143105838","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High-Speed Planar InGaAs/InAlAs Avalanche Photodiode
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-27 DOI: 10.1109/LPT.2025.3534294
Shuai Wang;Han Ye;Liyan Geng;Yimiao Chu;Yu Zheng;Qin Han
{"title":"High-Speed Planar InGaAs/InAlAs Avalanche Photodiode","authors":"Shuai Wang;Han Ye;Liyan Geng;Yimiao Chu;Yu Zheng;Qin Han","doi":"10.1109/LPT.2025.3534294","DOIUrl":"https://doi.org/10.1109/LPT.2025.3534294","url":null,"abstract":"This letter describes a planar avalanche photodiode (APD) with 3dB bandwidth of 40 GHz at gain of 2.5, which is the highest bandwidth among reported vertical planar InAlAs APD. The APD adopts selective Zn diffusion to form the planar structure. Scale of the APD can be easily reduced to meet the needs of high-speed operation. The added p/n double charge layers can accurately adjust the electric field distribution inside the APD. By optimizing the thickness of the absorption and the transit layers, a compromise can be determined between carrier transport time and capacitance to achieve high bandwidth. An equivalent circuit of planar APD was established, laying the foundation for characteristics performance optimization. The fabricated APD uses 90 nm InAlAs as the multiplication layer and the dark current is <inline-formula> <tex-math>$1~{mu } $ </tex-math></inline-formula>A. The responsivity of the top-incidence APD without anti-reflection is 0.15 A/W at <inline-formula> <tex-math>$1.55~{mu } $ </tex-math></inline-formula>m. The gain reaches 45 when the incident light intensity is <inline-formula> <tex-math>$10~{mu } $ </tex-math></inline-formula>W.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 4","pages":"235-238"},"PeriodicalIF":2.3,"publicationDate":"2025-01-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143105835","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
2024 Index IEEE Photonics Technology Letters Vol. 36
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-23 DOI: 10.1109/LPT.2025.3532136
{"title":"2024 Index IEEE Photonics Technology Letters Vol. 36","authors":"","doi":"10.1109/LPT.2025.3532136","DOIUrl":"https://doi.org/10.1109/LPT.2025.3532136","url":null,"abstract":"","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"36 24","pages":"1-71"},"PeriodicalIF":2.3,"publicationDate":"2025-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10851471","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143106053","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Error Probability of MPSK With Phase Errors in Dual-Hop FSO Communication Systems
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-20 DOI: 10.1109/LPT.2025.3531792
Jiashun Hu;Weiqiang Wu;Sunan Wang;Yuexiang Wu;Zaichen Zhang
{"title":"Error Probability of MPSK With Phase Errors in Dual-Hop FSO Communication Systems","authors":"Jiashun Hu;Weiqiang Wu;Sunan Wang;Yuexiang Wu;Zaichen Zhang","doi":"10.1109/LPT.2025.3531792","DOIUrl":"https://doi.org/10.1109/LPT.2025.3531792","url":null,"abstract":"In this letter, we investigate the average symbol error rate (SER) performance of M-ary phase-shift keying (MPSK) with Tikhonov-distributed phase errors, under both intensity modulation with direct detection and heterodyne detection, in dual-hop free space optical (FSO) communication systems with fixed-gain amplify-and-forward relaying. We assume the FSO channel experiences Málaga fading with pointing errors. We derive the probability distribution function (PDF) for the end-to-end signal-to-noise ratio and use this PDF to obtain novel analytical expressions for the average SER of MPSK. Numerical results and Monte Carlo simulations validate the accuracy of these newly obtained expressions.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 4","pages":"231-234"},"PeriodicalIF":2.3,"publicationDate":"2025-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143105839","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Compact Broadband Edge Coupler Based on Trident Gratings for Silica Platform
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-20 DOI: 10.1109/LPT.2025.3532408
Manzhuo Wang;Yu Xin;Zhentao Yao;Tingyu Liu;Jimin Fang;Xiaoqiang Sun;Yuanda Wu;Daming Zhang
{"title":"Compact Broadband Edge Coupler Based on Trident Gratings for Silica Platform","authors":"Manzhuo Wang;Yu Xin;Zhentao Yao;Tingyu Liu;Jimin Fang;Xiaoqiang Sun;Yuanda Wu;Daming Zhang","doi":"10.1109/LPT.2025.3532408","DOIUrl":"https://doi.org/10.1109/LPT.2025.3532408","url":null,"abstract":"The silica platform offers large-scale, low-cost fabrication for planar lightwave circuits (PLC). The broadband and compact fiber-to-chip edge coupler is essential for high performance PLC chips. Here, a silica trident gratings-based edge coupler is theoretically designed and experimentally demonstrated. By CMOS compatible fabrication, the prepared coupler presents the fiber-to-chip coupling loss of 0.95 and 0.93 dB/facet at the optical wavelength 1310 and 1550 nm, respectively. The coupling loss varies from 0.41 to 1.36 dB/facet over the wavelength range from 1264 to 1620 nm. Specifically, the edge coupler features the large alignment tolerance of <inline-formula> <tex-math>$pm 3mu $ </tex-math></inline-formula> m and <inline-formula> <tex-math>$pm 3.5mu $ </tex-math></inline-formula> m for a 1-dB penalty along directions of waveguide width and height, respectively. The small footprint of <inline-formula> <tex-math>$8.6~mu $ </tex-math></inline-formula> m <inline-formula> <tex-math>$times 83.2~mu $ </tex-math></inline-formula> m offers the coupler potentials in compact PLC applications.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 4","pages":"227-230"},"PeriodicalIF":2.3,"publicationDate":"2025-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143105840","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Distributed Axial Strain Sensitivity in Fibers With Different Germanium Concentrations
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-17 DOI: 10.1109/LPT.2025.3531207
Jacek Olszewski;Marta Bernaś;Przemysław Chmielowski;Paweł Mergo;Waclaw Urbanczyk;Gabriela Statkiewicz-Barabach
{"title":"Distributed Axial Strain Sensitivity in Fibers With Different Germanium Concentrations","authors":"Jacek Olszewski;Marta Bernaś;Przemysław Chmielowski;Paweł Mergo;Waclaw Urbanczyk;Gabriela Statkiewicz-Barabach","doi":"10.1109/LPT.2025.3531207","DOIUrl":"https://doi.org/10.1109/LPT.2025.3531207","url":null,"abstract":"We examined the influence of germanium concentration in fiber core on distributed axial strain sensitivity in optical frequency-domain reflectometry based on Rayleigh scattering for single-mode step-index fibers differing in the level of germanium concentration (from 3.6 to 40.6 mol%). We observed a monotonically decreasing dependence of axial strain sensitivity on germanium concentration within a range of 0–3.5 mstrain for uncoated fibers. The lowest axial strain sensitivity of 0.7422 1/strain was obtained for fiber doped with 40.6 mol% GeO2 (UHNA7), compared to 0.7859 1/strain for fiber with 3.6 mol% GeO2 content (SMF-28). We also derived an analytical formula for strain sensitivity in optical frequency-domain reflectometry, explaining the experimental results.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 4","pages":"223-226"},"PeriodicalIF":2.3,"publicationDate":"2025-01-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10844327","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143105836","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Focal-Length Measurement of Multifocal Metalens by Using Far-Field Imaging
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-17 DOI: 10.1109/LPT.2025.3531044
Ming Zhou;Dengyu Shan;Jiaheng Gong;Haiyang Huang;Wei Li
{"title":"Focal-Length Measurement of Multifocal Metalens by Using Far-Field Imaging","authors":"Ming Zhou;Dengyu Shan;Jiaheng Gong;Haiyang Huang;Wei Li","doi":"10.1109/LPT.2025.3531044","DOIUrl":"https://doi.org/10.1109/LPT.2025.3531044","url":null,"abstract":"This article used far-field light source to investigate the focal length of the short focal length, multifocal metalens. The feasibility of the scheme was analyzed by using imaging simulation. In addition, the relative error between far-field imaging method and collimated laser measurement was analyzed. The data results show that the relative error is 0.49%, as the point light source located 2000mm away, for ideal test lens with focal length of 10mm. An optical system composed of double lenses was constructed to measure the focal length of a metasurface with four focal points. The experimental results show that the system can determine the focal position within a step of 0.1mm.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 4","pages":"219-222"},"PeriodicalIF":2.3,"publicationDate":"2025-01-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143105837","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Corrections to “Neural Network Ensemble for Precise Laser Spot Position Determination on a Quadrant Detector” 对“四象限探测器激光光斑精确定位的神经网络集成”的修正
IF 2.3 3区 工程技术
IEEE Photonics Technology Letters Pub Date : 2025-01-15 DOI: 10.1109/LPT.2025.3525856
Micah Baleya;Hossam Shalaby;Kazutoshi Kato;Maha Elsabrouty
{"title":"Corrections to “Neural Network Ensemble for Precise Laser Spot Position Determination on a Quadrant Detector”","authors":"Micah Baleya;Hossam Shalaby;Kazutoshi Kato;Maha Elsabrouty","doi":"10.1109/LPT.2025.3525856","DOIUrl":"https://doi.org/10.1109/LPT.2025.3525856","url":null,"abstract":"Presents corrections to the paper, Neural Network Ensemble for Precise Laser Spot Position Determination on a Quadrant Detector.","PeriodicalId":13065,"journal":{"name":"IEEE Photonics Technology Letters","volume":"37 3","pages":"181-181"},"PeriodicalIF":2.3,"publicationDate":"2025-01-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10842273","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142992952","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信