Advanced Materials Interfaces最新文献_第2页

Graphene Decorated With Mo3S7 Clusters for Sensing CO2 (Adv. Mater. Interfaces 36/2024) 石墨烯修饰Mo3S7簇传感CO2（Adv）板牙。接口36/2024)

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-12-19 DOI: 10.1002/admi.202470087

Juan Casanova-Chafer, Eduard Llobet, Marta Feliz

引用次数: 0

Deconvoluting Effects of Lithium Morphology and SEI Stability at Moderate Current Density Using Interface Engineering (Adv. Mater. Interfaces 36/2024) 应用界面工程研究中等电流密度下锂形态和SEI稳定性的反卷积效应。接口36/2024)

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-12-19 DOI: 10.1002/admi.202470090

Sanzeeda Baig Shuchi, Solomon T. Oyakhire, Wenbo Zhang, Philaphon Sayavong, Yusheng Ye, Yuelang Chen, Zhiao Yu, Yi Cui, Stacey F. Bent

引用次数: 0

Masthead: (Adv. Mater. Interfaces 36/2024) 报头：（Adv. Mater）接口36/2024)

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-12-19 DOI: 10.1002/admi.202470089

引用次数: 0

Design and Preparation of Activated Carbon with High Specific Surface Area and Porosity Through an Organic Activator Coupled with CO2 Activation

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-12-16 DOI: 10.1002/admi.202400450

Yizhong Li, Xiaoqing Yan, Zhi Cui, Jingkang Yuan, Baorong Xu, Guidong Yang

{"title":"Design and Preparation of Activated Carbon with High Specific Surface Area and Porosity Through an Organic Activator Coupled with CO2 Activation","authors":"Yizhong Li, Xiaoqing Yan, Zhi Cui, Jingkang Yuan, Baorong Xu, Guidong Yang","doi":"10.1002/admi.202400450","DOIUrl":"https://doi.org/10.1002/admi.202400450","url":null,"abstract":"The advancement of effective techniques for the production of activated carbon has been a prominent focus of research. Herein, this work designs and successfully prepares a nontoxic, environmentally friendly organic activator on the surface of carbon materials through in situ organic fermentation treatment method. The production of activated carbon via this novel organic activator is at a temperature of 850 °C under CO2 atmosphere for an activation time of 90 min, showing a specific surface area (SBET) of 1354 m2 g−1, an adsorption capacity of iodine (QI) of 1195 mg g−1, and a total pore volume (Vtot) of 0.855 cm3 g−1. Compared to the activated carbon prepared at high temperature under pure CO2, these results represent increases of 69.67%, 53.01%, and 93.44% in SBET, QI, and Vtot values, respectively. By means of thermogravimetric (TG) analysis and simultaneous thermal analysis-Fourier transform infrared spectroscopy-gas chromatography/mass spectrometry a suggested activation process and mechanism of the novel organic activators is proposed. This organic activator is not only used for semi-coke (SC) based activated carbon preparation and saturated activated carbon (SAC) regeneration, but also attracts other industrial activated carbon production.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 3","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400450","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143115620","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

FACS-Sortable Triple Emulsion Picoreactors for Screening Reactions in Biphasic Environments

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-12-04 DOI: 10.1002/admi.202400403

Samuel Thompson, Yanrong Zhang, Zijian Yang, Lisa Nichols, Polly M. Fordyce

{"title":"FACS-Sortable Triple Emulsion Picoreactors for Screening Reactions in Biphasic Environments","authors":"Samuel Thompson, Yanrong Zhang, Zijian Yang, Lisa Nichols, Polly M. Fordyce","doi":"10.1002/admi.202400403","DOIUrl":"https://doi.org/10.1002/admi.202400403","url":null,"abstract":"Biphasic environments can enable successful chemical reactions where any single solvent results in poor substrate solubility or poor catalyst reactivity. For screening biphasic reactions at high throughput, a platform based on microfluidic double emulsions can use widely available FACS (Fluorescence Activated Cell Sorting) machines to screen millions of picoliter reactors in a few hours. However, encapsulating biphasic reactions within double emulsions to form FACS-sortable droplet picoreactors requires optimized solvent phases and surfactants to produce triple emulsion droplets that are stable over multi-hour assays and compatible with desired reaction conditions. This work demonstrates such FACS-sortable triple emulsion picoreactors with a fluorocarbon shell and biphasic octanol-in-water core. First, surfactants are screened to stabilize octanol-in-water emulsions for the picoreactor core. With these optimized conditions, stable triple emulsion picoreactors (>70% of droplets survived to 24 hr), produced protein in the biphasic core via cell-free protein synthesis are generated, and sorted these triple emulsions based on fluorescence using a commercial FACS sorter at >100 Hz with 75–80% of droplets recovered. Finally, an in-droplet lipase assay with a fluorogenic resorufin substrate that partitions into octanol is demonstrated. These triple emulsion picoreactors have the potential for future screening bead-encoded catalyst libraries, including enzymes such as lipases for biofuel production.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 3","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-12-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400403","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143111853","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Masthead: (Adv. Mater. Interfaces 34/2024) 报头：（Adv. Mater）接口34/2024)

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-12-02 DOI: 10.1002/admi.202470083

引用次数: 0

Enhancing Photoswitchable Wetting Properties of Hydrophobic Porous Spiropyran Copolymer Surfaces Through Surface Roughness Engineering (Adv. Mater. Interfaces 34/2024) 通过表面粗糙度工程提高疏水螺吡喃多孔共聚物表面的光开关润湿性能。接口34/2024)

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-12-02 DOI: 10.1002/admi.202470084

Niloofar Nekoonam, Franziska Dreher, Fadoua Mayoussi, Pang Zhu, Ralf Thomann, Ramin Montazeri, Sagar Bhagwat, Leonhard Hambitzer, Dorothea Helmer

引用次数: 0

Factors Shaping the Morphology in Sol-Gel Derived Mesoporous Zinc Titanate Films: Unveiling the Role of Precursor Competition and Concentration (Adv. Mater. Interfaces 34/2024) 溶胶-凝胶法制备钛酸锌介孔膜形态的影响因素：揭示前驱体竞争和浓度的作用。接口34/2024)

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-12-02 DOI: 10.1002/admi.202470082

Yanan Li, Nian Li, Constantin Harder, Shanshan Yin, Yusuf Bulut, Apostolos Vagias, Peter M. Schneider, Wei Chen, Stephan V. Roth, Aliaksandr S. Bandarenka, Peter Müller-Buschbaum

引用次数: 0

Investigating Impacts of Local Pressure and Temperature on CVD Growth of Hexagonal Boron Nitride on Ge(001)/Si

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-11-28 DOI: 10.1002/admi.202400467

Max Franck, Jarek Dabrowski, Markus Andreas Schubert, Dominique Vignaud, Mohamed Achehboune, Jean-François Colomer, Luc Henrard, Christian Wenger, Mindaugas Lukosius

{"title":"Investigating Impacts of Local Pressure and Temperature on CVD Growth of Hexagonal Boron Nitride on Ge(001)/Si","authors":"Max Franck, Jarek Dabrowski, Markus Andreas Schubert, Dominique Vignaud, Mohamed Achehboune, Jean-François Colomer, Luc Henrard, Christian Wenger, Mindaugas Lukosius","doi":"10.1002/admi.202400467","DOIUrl":"https://doi.org/10.1002/admi.202400467","url":null,"abstract":"The chemical vapor deposition (CVD) growth of hexagonal boron nitride (hBN) on Ge substrates is a promising pathway to high-quality hBN thin films without metal contaminations for microelectronic applications, but the effect of CVD process parameters on the hBN properties is not well understood yet. The influence of local changes in pressure and temperature due to different reactor configurations on the structure and quality of hBN films grown on Ge(001)/Si is studied. Injection of the borazine precursor close to the sample surface results in an inhomogeneous film thickness, attributed to an inhomogeneous pressure distribution at the surface, as shown by computational fluid dynamics simulations. The additional formation of nanocrystalline islands is attributed to unfavorable gas phase reactions due to the radiative heating of the injector. Both issues are mitigated by increasing the injector-sample distance, leading to an 86% reduction in pressure variability on the sample surface and a 200 °C reduction in precursor temperature. The resulting hBN films exhibit no nanocrystalline islands, improved thickness homogeneity, and high crystalline quality (Raman FWHM = 23 cm−1). This is competitive with hBN films grown on other non-metal substrates but achieved at lower temperature and with a low thickness of only a few nanometers.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 1","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400467","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143120308","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Your Clean Graphene is Still Not Clean

IF 4.3 3区材料科学

Advanced Materials Interfaces Pub Date : 2024-11-27 DOI: 10.1002/admi.202400598

Ondrej Dyck, Aisha Okmi, Kai Xiao, Sidong Lei, Andrew R. Lupini, Stephen Jesse

{"title":"Your Clean Graphene is Still Not Clean","authors":"Ondrej Dyck, Aisha Okmi, Kai Xiao, Sidong Lei, Andrew R. Lupini, Stephen Jesse","doi":"10.1002/admi.202400598","DOIUrl":"https://doi.org/10.1002/admi.202400598","url":null,"abstract":"Researchers working with thin samples, such as monolayer graphene, are consistently struggling against contamination. Indeed, the problem of hydrocarbon contamination is known from the earliest days of electron microscopy and efforts to reduce this problem are ubiquitous to almost all high-vacuum experiments. Accurate knowledge of the behavior of such contamination is essential for electron beam (e-beam) based atomic fabrication, where it is aspired to select and control matter on an atom-by-atom basis. Here, the vexing question of hydrocarbon contamination on graphene is taken up. Image intensity is used to directly reveal the presence of diffusing hydrocarbons on ostensibly clean graphene. These diffusing hydrocarbons are previously inferred but not directly observed. Surprising dynamic variations of the concentration of these hydrocarbons impels questions about their origin. Here, some possible explanations are presented and some tentative conclusions are drawn. This work updates the conceptual model of “clean graphene” and offers refinements to the description of e-beam induced hydrocarbon deposition.","PeriodicalId":115,"journal":{"name":"Advanced Materials Interfaces","volume":"12 1","pages":""},"PeriodicalIF":4.3,"publicationDate":"2024-11-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://onlinelibrary.wiley.com/doi/epdf/10.1002/admi.202400598","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143119710","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0