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Low-Cost Shadow Mask Fabrication for Nanoelectronics 纳米电子学的低成本荫罩制造
Nanomanufacturing and Metrology Pub Date : 2023-08-16 DOI: 10.3390/nanomanufacturing3030022
T. Pucher, Pablo Bastante, Estrella Sánchez Viso, A. Castellanos-Gomez
{"title":"Low-Cost Shadow Mask Fabrication for Nanoelectronics","authors":"T. Pucher, Pablo Bastante, Estrella Sánchez Viso, A. Castellanos-Gomez","doi":"10.3390/nanomanufacturing3030022","DOIUrl":"https://doi.org/10.3390/nanomanufacturing3030022","url":null,"abstract":"We present two approaches for fabricating shadow masks for the evaporation of electrodes onto nanomaterials. In the first one, we combine the use of a commercial fiber laser engraving system with readily available aluminum foil. This method is suitable for fabricating shadow masks with line widths of 50 µm and minimum feature separation of 20 µm, and using it to create masks with complex patterns is very straightforward. In the second approach, we use a commercially available vinyl cutting machine to pattern a vinyl stencil mask, and we use a glass fiber to define the separation between the electrodes. With this approach, we achieve well-defined electrodes separated by 15 µm, but this technique is less versatile in creating complex masks as compared with the laser-based one. We demonstrate the potential of these techniques by fabricating field-effect transistor devices based on MoS2. Our approach is a cost-effective and easily accessible method for fabricating shadow masks with high resolution and accuracy, making it accessible to a wider range of laboratories.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"17 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-08-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83067222","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Nanomechanical Characterization of Bone Quality Depending on Tissue Age via Bimodal Atomic Force Microscopy 通过双峰原子力显微镜研究骨质量随组织年龄的纳米力学特征
Nanomanufacturing and Metrology Pub Date : 2023-08-11 DOI: 10.1007/s41871-023-00208-3
Jinha Kwon, Hanna Cho
{"title":"Nanomechanical Characterization of Bone Quality Depending on Tissue Age via Bimodal Atomic Force Microscopy","authors":"Jinha Kwon, Hanna Cho","doi":"10.1007/s41871-023-00208-3","DOIUrl":"https://doi.org/10.1007/s41871-023-00208-3","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"20 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-08-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77153572","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Effect of Refresh Time on XeF2 Gas-assisted FIB Milling of GaAs 刷新时间对XeF2气助FIB铣削砷化镓的影响
Nanomanufacturing and Metrology Pub Date : 2023-08-08 DOI: 10.1007/s41871-023-00209-2
Jining Sun, Lei Zhang, Yi Zhang, Yunlong Han, Lei Zhang
{"title":"Effect of Refresh Time on XeF2 Gas-assisted FIB Milling of GaAs","authors":"Jining Sun, Lei Zhang, Yi Zhang, Yunlong Han, Lei Zhang","doi":"10.1007/s41871-023-00209-2","DOIUrl":"https://doi.org/10.1007/s41871-023-00209-2","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"105 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-08-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89938216","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Self-Healing Cement: A Review 自愈水泥的研究进展
Nanomanufacturing and Metrology Pub Date : 2023-08-01 DOI: 10.3390/nanomanufacturing3030021
G. Kordas
{"title":"Self-Healing Cement: A Review","authors":"G. Kordas","doi":"10.3390/nanomanufacturing3030021","DOIUrl":"https://doi.org/10.3390/nanomanufacturing3030021","url":null,"abstract":"The self-healing of cementitious materials can be achieved by precipitation of calcium carbonate through the enzymatic hydrolysis of urea. When a crack appears in cement, the damage can be repaired by allowing bacteria to encounter the water seeping through the crack. This forms a calcium carbonate, which heals the cracks. This occurs because microorganisms begin metabolizing and precipitating the mineral, healing the damage caused by the crack. Then, bacteria are incorporated into various containers, which release microorganisms by crushing, leading to the precipitation of calcium carbonate. In addition, this paper references the superabsorbent polymers (SAP) used for self-healing and hybrid organic-inorganic core–shell SAPs, a recently developed, state-of-the-art self-healing technology for cementitious materials.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"14 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89847844","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Angle Measurement Based on Second Harmonic Generation Using Artificial Neural Network 基于二次谐波产生的人工神经网络角度测量
Nanomanufacturing and Metrology Pub Date : 2023-07-27 DOI: 10.1007/s41871-023-00206-5
Kuangyi Li, Zhi-Li Zhang, Jiahui Lin, R. Sato, H. Matsukuma, W. Gao
{"title":"Angle Measurement Based on Second Harmonic Generation Using Artificial Neural Network","authors":"Kuangyi Li, Zhi-Li Zhang, Jiahui Lin, R. Sato, H. Matsukuma, W. Gao","doi":"10.1007/s41871-023-00206-5","DOIUrl":"https://doi.org/10.1007/s41871-023-00206-5","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"170 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76763869","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Calculation Model for the Steady-State Vibration Amplitude of a New Type of Cascaded Composite Structure-Based Ultrasonic Transducer 一种新型级联复合结构超声换能器稳态振幅计算模型
Nanomanufacturing and Metrology Pub Date : 2023-07-24 DOI: 10.1007/s41871-023-00204-7
Hongjie Zhang, Xinyue Gao, Xiaochen Liu, Junqiang Wu
{"title":"Calculation Model for the Steady-State Vibration Amplitude of a New Type of Cascaded Composite Structure-Based Ultrasonic Transducer","authors":"Hongjie Zhang, Xinyue Gao, Xiaochen Liu, Junqiang Wu","doi":"10.1007/s41871-023-00204-7","DOIUrl":"https://doi.org/10.1007/s41871-023-00204-7","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"10 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74949095","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Bridging the Divide Between Iterative Optical Polishing and Automation 跨越迭代光学抛光和自动化之间的鸿沟
Nanomanufacturing and Metrology Pub Date : 2023-07-21 DOI: 10.1007/s41871-023-00197-3
David Walker, J. I. Ahuir-Torres, Yasemin Akar, Paul A. Bingham, Xun Chen, Michal Darowski, O. Fähnle, Philippe Gambron, Frankie F. Jackson, Hongyu Li, Luke Mason, Rakesh Mishra, Abdullah Shahjalal, Guoyu Yu
{"title":"Bridging the Divide Between Iterative Optical Polishing and Automation","authors":"David Walker, J. I. Ahuir-Torres, Yasemin Akar, Paul A. Bingham, Xun Chen, Michal Darowski, O. Fähnle, Philippe Gambron, Frankie F. Jackson, Hongyu Li, Luke Mason, Rakesh Mishra, Abdullah Shahjalal, Guoyu Yu","doi":"10.1007/s41871-023-00197-3","DOIUrl":"https://doi.org/10.1007/s41871-023-00197-3","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"70 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84448545","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Effect of Textured Glasses on Conversion Efficiency in Dye-Sensitized Solar Cells 纹理玻璃对染料敏化太阳能电池转换效率的影响
Nanomanufacturing and Metrology Pub Date : 2023-07-05 DOI: 10.3390/nanomanufacturing3030020
Ryutaro Kimura, Yuji Nishiyasu, C. Oka, S. Hata, J. Sakurai
{"title":"Effect of Textured Glasses on Conversion Efficiency in Dye-Sensitized Solar Cells","authors":"Ryutaro Kimura, Yuji Nishiyasu, C. Oka, S. Hata, J. Sakurai","doi":"10.3390/nanomanufacturing3030020","DOIUrl":"https://doi.org/10.3390/nanomanufacturing3030020","url":null,"abstract":"In this paper, three types of optical textured glass substrates were prepared at the glass/transparent conductive oxide interface using polydimethylsiloxane nanoimprint lithography to increase the conversion efficiency of dye-sensitized solar cells (DSSCs). There were three types of textures: nanotexture, microtexture, and micro/nano double texture. In terms of optical characteristics, it was confirmed that the reflectance of all of the textured glass substrates was lower than that of flat glass in the mean value of the 400–800 nm wavelength band. Further, the diffuse transmittance was higher than that of flat glass for all of the textured glass substrates, and the D-Tx was particularly high. DSSCs were fabricated using N749 and N719 dyes; their size was 6 mm2. The conversion efficiencies of the N749 DSSCs were improved by 11% for the N-Tx (η of 2.41%) and 10% for the D-Tx (η of 2.38%) compared with flat glass (η of 2.17%) DSSCs. On the other hand, the M-Tx did not improve it. The conversion efficiencies of the N719 DSSCs with textured glass substrates were improved by 7.5% for the M-Tx (η of 2.74%), 18% for the N-Tx (η of 3.01%), and 26% for the D-Tx (η of 3.22%) compared with flat glass (η of 2.55%) DSSCs.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"129 10 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77527626","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Area-Specific Positioning of Metallic Glass Nanowires on Si Substrate 金属玻璃纳米线在Si衬底上的区域定位
Nanomanufacturing and Metrology Pub Date : 2023-07-05 DOI: 10.1007/s41871-023-00205-6
S. Theeda, G. Kumar
{"title":"Area-Specific Positioning of Metallic Glass Nanowires on Si Substrate","authors":"S. Theeda, G. Kumar","doi":"10.1007/s41871-023-00205-6","DOIUrl":"https://doi.org/10.1007/s41871-023-00205-6","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"58 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76071141","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of Probe Lifting Height in Jumping Mode AFM for Living Cell Imaging 跳模AFM中探针升降高度对活细胞成像的影响
Nanomanufacturing and Metrology Pub Date : 2023-07-03 DOI: 10.1007/s41871-023-00196-4
Can Cheng, Xingyue Wang, Jianjun Dong, Zuobin Wang
{"title":"Effect of Probe Lifting Height in Jumping Mode AFM for Living Cell Imaging","authors":"Can Cheng, Xingyue Wang, Jianjun Dong, Zuobin Wang","doi":"10.1007/s41871-023-00196-4","DOIUrl":"https://doi.org/10.1007/s41871-023-00196-4","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"5 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84618238","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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