Nanomanufacturing and Metrology最新文献_第4页

Nanomechanical Characterization of Bone Quality Depending on Tissue Age via Bimodal Atomic Force Microscopy 通过双峰原子力显微镜研究骨质量随组织年龄的纳米力学特征

Nanomanufacturing and Metrology Pub Date : 2023-08-11 DOI: 10.1007/s41871-023-00208-3

Jinha Kwon, Hanna Cho

引用次数: 1

Effect of Refresh Time on XeF2 Gas-assisted FIB Milling of GaAs 刷新时间对XeF2气助FIB铣削砷化镓的影响

Nanomanufacturing and Metrology Pub Date : 2023-08-08 DOI: 10.1007/s41871-023-00209-2

Jining Sun, Lei Zhang, Yi Zhang, Yunlong Han, Lei Zhang

引用次数: 0

Self-Healing Cement: A Review 自愈水泥的研究进展

Nanomanufacturing and Metrology Pub Date : 2023-08-01 DOI: 10.3390/nanomanufacturing3030021

G. Kordas

引用次数: 0

Angle Measurement Based on Second Harmonic Generation Using Artificial Neural Network 基于二次谐波产生的人工神经网络角度测量

Nanomanufacturing and Metrology Pub Date : 2023-07-27 DOI: 10.1007/s41871-023-00206-5

Kuangyi Li, Zhi-Li Zhang, Jiahui Lin, R. Sato, H. Matsukuma, W. Gao

引用次数: 0

Calculation Model for the Steady-State Vibration Amplitude of a New Type of Cascaded Composite Structure-Based Ultrasonic Transducer 一种新型级联复合结构超声换能器稳态振幅计算模型

Nanomanufacturing and Metrology Pub Date : 2023-07-24 DOI: 10.1007/s41871-023-00204-7

Hongjie Zhang, Xinyue Gao, Xiaochen Liu, Junqiang Wu

引用次数: 0

Bridging the Divide Between Iterative Optical Polishing and Automation 跨越迭代光学抛光和自动化之间的鸿沟

Nanomanufacturing and Metrology Pub Date : 2023-07-21 DOI: 10.1007/s41871-023-00197-3

David Walker, J. I. Ahuir-Torres, Yasemin Akar, Paul A. Bingham, Xun Chen, Michal Darowski, O. Fähnle, Philippe Gambron, Frankie F. Jackson, Hongyu Li, Luke Mason, Rakesh Mishra, Abdullah Shahjalal, Guoyu Yu

引用次数: 1

Effect of Textured Glasses on Conversion Efficiency in Dye-Sensitized Solar Cells 纹理玻璃对染料敏化太阳能电池转换效率的影响

Nanomanufacturing and Metrology Pub Date : 2023-07-05 DOI: 10.3390/nanomanufacturing3030020

Ryutaro Kimura, Yuji Nishiyasu, C. Oka, S. Hata, J. Sakurai

{"title":"Effect of Textured Glasses on Conversion Efficiency in Dye-Sensitized Solar Cells","authors":"Ryutaro Kimura, Yuji Nishiyasu, C. Oka, S. Hata, J. Sakurai","doi":"10.3390/nanomanufacturing3030020","DOIUrl":"https://doi.org/10.3390/nanomanufacturing3030020","url":null,"abstract":"In this paper, three types of optical textured glass substrates were prepared at the glass/transparent conductive oxide interface using polydimethylsiloxane nanoimprint lithography to increase the conversion efficiency of dye-sensitized solar cells (DSSCs). There were three types of textures: nanotexture, microtexture, and micro/nano double texture. In terms of optical characteristics, it was confirmed that the reflectance of all of the textured glass substrates was lower than that of flat glass in the mean value of the 400–800 nm wavelength band. Further, the diffuse transmittance was higher than that of flat glass for all of the textured glass substrates, and the D-Tx was particularly high. DSSCs were fabricated using N749 and N719 dyes; their size was 6 mm2. The conversion efficiencies of the N749 DSSCs were improved by 11% for the N-Tx (η of 2.41%) and 10% for the D-Tx (η of 2.38%) compared with flat glass (η of 2.17%) DSSCs. On the other hand, the M-Tx did not improve it. The conversion efficiencies of the N719 DSSCs with textured glass substrates were improved by 7.5% for the M-Tx (η of 2.74%), 18% for the N-Tx (η of 3.01%), and 26% for the D-Tx (η of 3.22%) compared with flat glass (η of 2.55%) DSSCs.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"129 10 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77527626","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Area-Specific Positioning of Metallic Glass Nanowires on Si Substrate 金属玻璃纳米线在Si衬底上的区域定位

Nanomanufacturing and Metrology Pub Date : 2023-07-05 DOI: 10.1007/s41871-023-00205-6

S. Theeda, G. Kumar

引用次数: 0

Effect of Probe Lifting Height in Jumping Mode AFM for Living Cell Imaging 跳模AFM中探针升降高度对活细胞成像的影响

Nanomanufacturing and Metrology Pub Date : 2023-07-03 DOI: 10.1007/s41871-023-00196-4

Can Cheng, Xingyue Wang, Jianjun Dong, Zuobin Wang

引用次数: 0

Thermodynamic Theory of Phase Separation in Nonstoichiometric Si Oxide Films Induced by High-Temperature Anneals 高温退火诱导非化学计量氧化硅膜相分离的热力学理论

Nanomanufacturing and Metrology Pub Date : 2023-07-03 DOI: 10.3390/nanomanufacturing3030019

A. Sarikov

{"title":"Thermodynamic Theory of Phase Separation in Nonstoichiometric Si Oxide Films Induced by High-Temperature Anneals","authors":"A. Sarikov","doi":"10.3390/nanomanufacturing3030019","DOIUrl":"https://doi.org/10.3390/nanomanufacturing3030019","url":null,"abstract":"High-temperature anneals of nonstoichiometric Si oxide (SiOx, x < 2) films induce phase separation in them, with the formation of composite structures containing amorphous or crystalline Si nanoinclusions embedded in the Si oxide matrix. In this paper, a thermodynamic theory of the phase separation process in SiOx films is proposed. The theory is based on the thermodynamic models addressing various aspects of this process which we previously developed. A review of these models is provided, including: (i) the derivation of the expressions for the Gibbs free energy of Si oxides and Si/Si oxide systems, (ii) the identification of the phase separation driving forces and counteracting mechanisms, and (iii) the crystallization behavior of amorphous Si nanoinclusions in the Si oxide matrix. A general description of the phase separation process is presented. A number of characteristic features of the nano-Si/Si oxide composites formed by SiOx decomposition, such as the local separation of Si nanoinclusions surrounded by the Si oxide matrix; the dependence of the amount of separated Si and the equilibrium matrix composition on the initial Si oxide stoichiometry and annealing temperature; and the correlation of the presence of amorphous and crystalline Si nanoinclusions with the presence of SiOx (x < 2) and SiO2 phase, respectively, in the Si oxide matrix, are explained.","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"32 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76482587","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1