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Fabrication of Microstructure Arrays via Localized Electrochemical Deposition 通过局部电化学沉积制造微结构阵列
Nanomanufacturing and Metrology Pub Date : 2024-06-14 DOI: 10.1007/s41871-024-00236-7
Manfei Wang, Jinkai Xu, Wanfei Ren, Zhengyi Yang
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引用次数: 0
Super-Resolution by Localized Plasmonic Structured Illumination Microscopy Using Self-Assembled Nanoparticle Substrates 利用自组装纳米粒子基底的局部等离子体结构照明显微镜实现超分辨率
Nanomanufacturing and Metrology Pub Date : 2024-06-04 DOI: 10.1007/s41871-024-00233-w
Y. Guan, Shozo Masui, S. Kadoya, M. Michihata, Satoru Takahashi
{"title":"Super-Resolution by Localized Plasmonic Structured Illumination Microscopy Using Self-Assembled Nanoparticle Substrates","authors":"Y. Guan, Shozo Masui, S. Kadoya, M. Michihata, Satoru Takahashi","doi":"10.1007/s41871-024-00233-w","DOIUrl":"https://doi.org/10.1007/s41871-024-00233-w","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"81 8","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141268125","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fluorescence-Based Calibration Model for In-Situ Measurement of Micro-scaled Lubricant Thickness Distribution at Indentation Interface 基于荧光的原位测量压痕界面微尺度润滑剂厚度分布的校准模型
Nanomanufacturing and Metrology Pub Date : 2024-05-15 DOI: 10.1007/s41871-024-00232-x
Motoya Yoshikawa, Saeko Fujii, S. Kadoya, Tatsuya Sugihara, M. Michihata, Satoru Takahashi
{"title":"Fluorescence-Based Calibration Model for In-Situ Measurement of Micro-scaled Lubricant Thickness Distribution at Indentation Interface","authors":"Motoya Yoshikawa, Saeko Fujii, S. Kadoya, Tatsuya Sugihara, M. Michihata, Satoru Takahashi","doi":"10.1007/s41871-024-00232-x","DOIUrl":"https://doi.org/10.1007/s41871-024-00232-x","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"13 4","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-05-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140974395","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Experimental Study of Electrical-Assisted Nanomachining of Monocrystalline Copper Using Customized Tungsten Tip 使用定制钨针尖对单晶铜进行电辅助纳米加工的实验研究
Nanomanufacturing and Metrology Pub Date : 2024-04-18 DOI: 10.1007/s41871-024-00231-y
Tao Wang, Yanling Tian, Zhilai Lu, Weijie Wang, Zhao Zhang, Guangwei Zhu, Hui Tang, Dawei Zhang
{"title":"Experimental Study of Electrical-Assisted Nanomachining of Monocrystalline Copper Using Customized Tungsten Tip","authors":"Tao Wang, Yanling Tian, Zhilai Lu, Weijie Wang, Zhao Zhang, Guangwei Zhu, Hui Tang, Dawei Zhang","doi":"10.1007/s41871-024-00231-y","DOIUrl":"https://doi.org/10.1007/s41871-024-00231-y","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":" 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-04-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140687783","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A New Kind of Atomic Force Microscopy Scan Control Enabled by Artificial Intelligence: Concept for Achieving Tip and Sample Safety Through Asymmetric Control 人工智能支持的新型原子力显微镜扫描控制：通过不对称控制实现尖端和样品安全的概念
Nanomanufacturing and Metrology Pub Date : 2024-04-16 DOI: 10.1007/s41871-024-00229-6
Johannes Degenhardt, Mohammed Wassim Bounaim, Nan Deng, Rainer Tutsch, Gaoliang Dai
{"title":"A New Kind of Atomic Force Microscopy Scan Control Enabled by Artificial Intelligence: Concept for Achieving Tip and Sample Safety Through Asymmetric Control","authors":"Johannes Degenhardt, Mohammed Wassim Bounaim, Nan Deng, Rainer Tutsch, Gaoliang Dai","doi":"10.1007/s41871-024-00229-6","DOIUrl":"https://doi.org/10.1007/s41871-024-00229-6","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"101 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-04-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140698525","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Three-Dimensional Nano-displacement Measurement by Four-Beam Laser Interferometry 利用四束激光干涉仪进行三维纳米位移测量
Nanomanufacturing and Metrology Pub Date : 2024-04-12 DOI: 10.1007/s41871-024-00230-z
Xu Zhang, Zi Wang, Mengnan Liu, Zhengxun Song, Zuobin Wang, Litong Dong
{"title":"Three-Dimensional Nano-displacement Measurement by Four-Beam Laser Interferometry","authors":"Xu Zhang, Zi Wang, Mengnan Liu, Zhengxun Song, Zuobin Wang, Litong Dong","doi":"10.1007/s41871-024-00230-z","DOIUrl":"https://doi.org/10.1007/s41871-024-00230-z","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"115 9","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140709215","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of Film Thickness on Nanofabrication of Graphene Oxide 薄膜厚度对氧化石墨烯纳米加工的影响
Nanomanufacturing and Metrology Pub Date : 2024-04-03 DOI: 10.1007/s41871-024-00226-9
Chuan Tang, Lei Chen, Linmao Qian
{"title":"Influence of Film Thickness on Nanofabrication of Graphene Oxide","authors":"Chuan Tang, Lei Chen, Linmao Qian","doi":"10.1007/s41871-024-00226-9","DOIUrl":"https://doi.org/10.1007/s41871-024-00226-9","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"7 2","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140748258","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Sensitivity Improvements for Picosecond Ultrasonic Thickness Measurements in Gold and Tungsten Nanoscale Films 提高皮秒超声波测量金和钨纳米薄膜厚度的灵敏度
Nanomanufacturing and Metrology Pub Date : 2024-03-26 DOI: 10.1007/s41871-024-00228-7
Jiaqi Dong, Chengyuan Yao, Yuanhao Zhu, Shaojie Li, Bowen Liu, Jintao Fan, Chunguang Hu, Youjian Song, Minglie Hu
{"title":"Sensitivity Improvements for Picosecond Ultrasonic Thickness Measurements in Gold and Tungsten Nanoscale Films","authors":"Jiaqi Dong, Chengyuan Yao, Yuanhao Zhu, Shaojie Li, Bowen Liu, Jintao Fan, Chunguang Hu, Youjian Song, Minglie Hu","doi":"10.1007/s41871-024-00228-7","DOIUrl":"https://doi.org/10.1007/s41871-024-00228-7","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"118 33","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-03-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140380097","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Systematic Radio Telescope Alignment Using Portable Fringe Projection Profilometry 利用便携式条纹投影轮廓测量法进行系统的射电望远镜校准
Nanomanufacturing and Metrology Pub Date : 2024-03-15 DOI: 10.1007/s41871-024-00225-w
Joel Berkson, J. Hyatt, Nathan Julicher, Byeongjoon Jeong, Isaac Pimienta, Rachel Ball, Wyatt Ellis, Jason Voris, Diego Torres-Barajas, Daewook Kim
{"title":"Systematic Radio Telescope Alignment Using Portable Fringe Projection Profilometry","authors":"Joel Berkson, J. Hyatt, Nathan Julicher, Byeongjoon Jeong, Isaac Pimienta, Rachel Ball, Wyatt Ellis, Jason Voris, Diego Torres-Barajas, Daewook Kim","doi":"10.1007/s41871-024-00225-w","DOIUrl":"https://doi.org/10.1007/s41871-024-00225-w","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"95 2","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140239649","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electrolyte Effect on Photoetching of Gallium Nitride 电解质对氮化镓光刻的影响
Nanomanufacturing and Metrology Pub Date : 2024-03-06 DOI: 10.1007/s41871-024-00224-x
Huiqiang Liang, Zhenghao Wei, Jiongchong Fang, Yanming Li, Changli Li, Zhirun Xie, Yun Hau Ng, Guosong Zeng
{"title":"Electrolyte Effect on Photoetching of Gallium Nitride","authors":"Huiqiang Liang, Zhenghao Wei, Jiongchong Fang, Yanming Li, Changli Li, Zhirun Xie, Yun Hau Ng, Guosong Zeng","doi":"10.1007/s41871-024-00224-x","DOIUrl":"https://doi.org/10.1007/s41871-024-00224-x","url":null,"abstract":"","PeriodicalId":52345,"journal":{"name":"Nanomanufacturing and Metrology","volume":"138 35","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-03-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140078341","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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