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Atomic layer deposition of zirconium oxide on copper patterned silicon substrate 氧化锆在铜图案硅衬底上的原子层沉积
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2014-01-10 DOI: 10.5210/JUR.V7I1.7526
J. Parulekar, S. K. Selvaraj, C. Takoudis
{"title":"Atomic layer deposition of zirconium oxide on copper patterned silicon substrate","authors":"J. Parulekar, S. K. Selvaraj, C. Takoudis","doi":"10.5210/JUR.V7I1.7526","DOIUrl":"https://doi.org/10.5210/JUR.V7I1.7526","url":null,"abstract":"Atomic layer deposition (ALD) was performed on copper patterned silicon substrates using zirconium precursor and ethanol as both an oxygen source and reducing agent. Ethanol targeted copper oxide formed on the copper surface, reverting it back to metallic copper. Selective ALD (SALD) of metal oxides on silicon surfaces over copper surfaces has been demonstrated up to 2-3 nm, though the process seems to lose its selectivity afterwards. We strive to maintain selectivity to thicker films by stepping away from conventional ALD processes utilizing oxidants. From previous studies with HfO 2  and TiO 2  SALD, we speculate that the oxidation of copper to copper oxide spoils selectivity. In this present study, we carried out oxidant-free ALD by using ethanol as a co-reactant solely on the silicon portion of these substrates. This process will occur in-situ every 20-30 ALD cycles for ALD of ZrO 2 . As expected, reduced ALD growth rate was observed with ethanol compared to that of water or ozone, with a growth rate of about 0.04 nm/cycle on the silicon portion of the substrate.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2014-01-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126592198","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Transmission Infrared Spectroscopy of Ammonia Borane 氨硼烷的透射红外光谱
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2012-04-29 DOI: 10.5210/JUR.V5I1.7509
P. Jash, K. Meux, M. Trenary
{"title":"Transmission Infrared Spectroscopy of Ammonia Borane","authors":"P. Jash, K. Meux, M. Trenary","doi":"10.5210/JUR.V5I1.7509","DOIUrl":"https://doi.org/10.5210/JUR.V5I1.7509","url":null,"abstract":"Transmission infrared spectroscopy can potentially offer unique advantages in studying the mechanisms of hydrogen loss from complex hydrides that are being considered for use as hydrogen storage materials. An apparatus that permits infrared spectra to be obtained over a temperature range of 85 to 1200 K and under either an ambient pressure of selected gases or under vacuum has been designed and its performance characterized. While the method is capable of producing high quality spectra at room temperature and below, several difficulties arise as the sample temperature is increased to the point where hydrogen loss occurs. These challenges include reaction with the host matrix, reaction with residual water or oxygen in the system, and loss of transparency of the sample. The performance of the method is illustrated with spectra obtained for ammonia borane, NH 3 BH 3 .","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"74 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-04-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116638363","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Comparison of FEFF9 results of metallic niobium and niobium oxides to EELS 金属铌与氧化铌对EELS的FEFF9效果比较
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2012-03-31 DOI: 10.5210/JUR.V5I1.7508
A. Arnold, R. Tao, R. Klie
{"title":"Comparison of FEFF9 results of metallic niobium and niobium oxides to EELS","authors":"A. Arnold, R. Tao, R. Klie","doi":"10.5210/JUR.V5I1.7508","DOIUrl":"https://doi.org/10.5210/JUR.V5I1.7508","url":null,"abstract":"FEFF 9, using the full multiple scattering theory, is used in order to model electron energy-loss near-edge structure for Nb and the Nb oxides. This study explores the basic functions of FEFF 9 code, as well as some of its features including the concepts of convergence and the effect of core holes. It also goes on to show how the results of FEFF 9 compare with actual experimental EELS results. Although FEFF 9 is not as accurate as DFT calculations when used properly it can provide much faster results that are comparable to those obtained by DFT.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-03-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125720891","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Atomic Layer Deposition of Zirconium Oxide for Fuel Cell Applications 氧化锆原子层沉积技术在燃料电池中的应用
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2012-03-07 DOI: 10.5210/JUR.V5I1.7505
C. James, R. Xu, G. Jursich, C. Takoudis
{"title":"Atomic Layer Deposition of Zirconium Oxide for Fuel Cell Applications","authors":"C. James, R. Xu, G. Jursich, C. Takoudis","doi":"10.5210/JUR.V5I1.7505","DOIUrl":"https://doi.org/10.5210/JUR.V5I1.7505","url":null,"abstract":"Solid oxide fuel cells (SOFCs) are an intriguing renewable energy source. Most SOFCs operate at high temperatures, around 1000 °C. One of the problems with them operating at lower temperatures is that it increases the resistance in the electrolyte layer. The focus of this project is to increase the efficiency of the electrolyte layer at the lower temperatures by decreasing the thickness of the electrolyte layer, in order to decrease the ionic resistance. Atomic layer deposition (ALD) was used to deposit zirconium oxide, which is one of the promising components of electrolytes in small length scale fuel cells; the zirconium precursor was Tris(dimethylamino)cyclopentadienylZirconium (ZyALD) and the oxidant was 0.1 % O 3  in O 2 . Spectroscopic ellipsometry was used to measure the thickness of the samples was. This paper also describes how ALD was used to vary the thickness from 32 A to 135 A. Our results showed that there was a constant growth rate of 0.87 ± 0.04 A/cycle, which can be used to control the film thickness. The error was calculated by taking the standard deviation of the growth rates for a varied number of cycles that were run.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134420345","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Greener Solvent Selection and Solvent Recycling for Carbon Dioxide Capture 二氧化碳捕集的绿色溶剂选择和溶剂回收
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2012-03-07 DOI: 10.5210/JUR.V5I1.7506
G. Hachem, J. Salazar, U. Dixekar
{"title":"Greener Solvent Selection and Solvent Recycling for Carbon Dioxide Capture","authors":"G. Hachem, J. Salazar, U. Dixekar","doi":"10.5210/JUR.V5I1.7506","DOIUrl":"https://doi.org/10.5210/JUR.V5I1.7506","url":null,"abstract":"Carbon capture and storage (CCS) constitutes an extremely important technology that is constantly being improved to minimize the amounts of carbon dioxide (CO 2 ) entering the atmosphere. According to the Global CCS Institute, there are more than 320 worldwide CCS projects at different phases of progress. However, current CCS processes are accompanied with a large energy and efficiency penalty. This paper models and simulates a post-combustion carbon capture system, that uses absorption as a method of separation, in Aspen Plus V7.2. Moreover, the CAPE-OPEN Simulated Annealing (SA) Capability is implemented to minimize the energy consumed by this system, and allow coal-fired power plants to use similar carbon capture systems without losing 20 to 40 % of the plant's output.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130993233","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Effect of Nanofiber Mats on Dropwise Condensation 纳米纤维垫对水滴凝结的影响
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2012-03-07 DOI: 10.5210/JUR.V5I1.7503
J. Kraus, S. Sinha-Ray, A. Yarin
{"title":"The Effect of Nanofiber Mats on Dropwise Condensation","authors":"J. Kraus, S. Sinha-Ray, A. Yarin","doi":"10.5210/JUR.V5I1.7503","DOIUrl":"https://doi.org/10.5210/JUR.V5I1.7503","url":null,"abstract":"In this work, condensation characteristics of water droplet on metallized nanofibers mat on short time scale has been studied. It has been shown that condensation of water droplet on copper nanofibers mat is delayed to a great extent in comparison to condensation on bare copper. It has been observed that on copper nanofibers mat the number of water droplets is much less than on bare copper and did not cause film as on bare coppers. At the end theoretical analysis showed that such behavior can be explained by Kelvin effect.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123639301","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimization of Protein Immobilization in Microfludic Devices for Circulating Tumor Cell Capture 循环肿瘤细胞捕获微流体装置中蛋白质固定的优化
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2012-03-07 DOI: 10.5210/JUR.V5I1.7504
M. Gaskill, C. Launiere, D. Eddington
{"title":"Optimization of Protein Immobilization in Microfludic Devices for Circulating Tumor Cell Capture","authors":"M. Gaskill, C. Launiere, D. Eddington","doi":"10.5210/JUR.V5I1.7504","DOIUrl":"https://doi.org/10.5210/JUR.V5I1.7504","url":null,"abstract":"The isolation of metastatic circulating tumor cells (CTCs) within the blood using microfluidic devices is a promising method for the detection of cancer. In this study, protein patterning of endothelial-leukocyte adhesion molecule-1 (E-selectin) and anti-epitheal-cell-adhesion-molecule (Anti-EpCAM) within microfluidic channels is utilized to improve the capture efficiency. To create this protein patterning the protein immobilization method must first be optimized to allow for maximum capture of CTCs and minimal increase in the flow rate of cells through the device due to added coating thickness. Proteins are immobilized in alternating regions using photo-initiated graft polymerization of polyacrylic acid (PAA) and a silanization reaction. Using interferometer measurements and fluorescent tagging, PAA height was minimized and protein immobilization was optimized.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"56 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128510390","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Selective Atomic Layer Deposition of TiO2 on Silicon/Copper-patterned Substrates 二氧化钛在硅/铜图案衬底上的选择性原子层沉积
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2012-02-27 DOI: 10.5210/JUR.V5I1.7500
A. Jablansky, I. A. J. Rossero, G. Jursich, C. Takoudis
{"title":"Selective Atomic Layer Deposition of TiO2 on Silicon/Copper-patterned Substrates","authors":"A. Jablansky, I. A. J. Rossero, G. Jursich, C. Takoudis","doi":"10.5210/JUR.V5I1.7500","DOIUrl":"https://doi.org/10.5210/JUR.V5I1.7500","url":null,"abstract":"As microelectronic devices shrink, thinner diffusion barrier layers are needed to separate the copper and silicon substrates while leaving the copper vias open for conduction. Selective atomic layer deposition (ALD) of titanium dioxide(TiO 2 ), a good barrier layer, onto silicon was studied by minimizing the exposure time to air of these substrates immediately before deposition. The minimized exposure time mimicked industrial conditions, where waiting before deposition is costly. Tetrakis(diethylamido)titanium (TDEAT) was used as the precursor, and water was the oxidizing agent. TDEAT was first deposited on silicon wafers using ALD to verify a steady, linear growth rate reported in the literature, and the measured rate of 0.9 ± 0.1 A/cycle is consistent with values previously reported. Minimized exposure to air had no effect on the growth rate of TiO 2  on silicon, and the effect on copper has yet to be determined.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-02-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124522973","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Percolation Effects on Electrical Resistivity and Electron Mobility 渗透对电阻率和电子迁移率的影响
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2012-02-27 DOI: 10.5210/JUR.V5I1.7502
J. Weddell, A. Feinerman
{"title":"Percolation Effects on Electrical Resistivity and Electron Mobility","authors":"J. Weddell, A. Feinerman","doi":"10.5210/JUR.V5I1.7502","DOIUrl":"https://doi.org/10.5210/JUR.V5I1.7502","url":null,"abstract":"Percolation, defined as the study of transport across a porous material, can be used to determine transport quantities of a material such as electrical and thermal conductivity. Observing the way electrons flow across a porous conductive sheet is a common way that percolation studies are performed, and has many practical applications in electronics. This study determines how elliptical pores cut into a conductive sheet affect the percolation threshold; the remaining area of the conductive sheet when the current across it first becomes zero. Past research has been performed on this topic which yielded theoretical results of the percolation thresholds, and this study aims to verify those results experimentally. This study shows that as the aspect ratio of an ellipse approaches zero, the percolation threshold approaches one. This report also establishes a novel experimental method of studying percolating networks.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-02-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127764218","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
Methods in Characterizing the SrTiO3/GaAs Interface SrTiO3/GaAs界面表征方法
The Journal of Undergraduate Research at the University of Illinois at Chicago Pub Date : 2012-02-27 DOI: 10.5210/JUR.V5I1.7501
T. Cooper, Q. Qiao, R. Klie
{"title":"Methods in Characterizing the SrTiO3/GaAs Interface","authors":"T. Cooper, Q. Qiao, R. Klie","doi":"10.5210/JUR.V5I1.7501","DOIUrl":"https://doi.org/10.5210/JUR.V5I1.7501","url":null,"abstract":"Characterizing the interface that occurs between a thin-film deposition of SrTiO 3  on a GaAs substrate is of significant interest in order to determine the electrical capabilities that may be possible with this type of system. Imaging the interface by using transmission electron microscopy as well as determining important chemical and electrical information by using Electron Energy Loss Spectroscopy (EELS) are critical in determining if the system is actually appropriate for the desired applications. In addition to these experimental calculations, however, it may be useful to determine theoretical calculations in order to confirm and interpret the results. In particular, these may be determined for EELS by using a simulation program called FEFF9, which employs use of full multiple scattering calculations in order to produce these theoretical results.","PeriodicalId":426348,"journal":{"name":"The Journal of Undergraduate Research at the University of Illinois at Chicago","volume":"142 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-02-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115256803","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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