Devices and Methods of Measurements最新文献

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Structure of Silicon Wafers Planar Surface before and after Rapid Thermal Treatment 快速热处理前后硅晶片平面的结构
IF 0.2
Devices and Methods of Measurements Pub Date : 2024-07-23 DOI: 10.21122/2220-9506-2024-15-2-142-150
U. A. Pilipenko, A. A. Sergeichik, D. V. Shestovski, V. A. Solodukha
{"title":"Structure of Silicon Wafers Planar Surface before and after Rapid Thermal Treatment","authors":"U. A. Pilipenko, A. A. Sergeichik, D. V. Shestovski, V. A. Solodukha","doi":"10.21122/2220-9506-2024-15-2-142-150","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-2-142-150","url":null,"abstract":"Presently it is important to remove mechanically disturbed layer on wafer surface during creation of up-to-date microelectronic products. Rapid thermal treatment with optical pulses of second duration is one of the applicable methods for removing disturbances in crystal lattice emerging after ion implantation. However the crystal structure of mechanically disturbed layer on wafer planar side is still unclear. Researches by transmission electronic method, analysis of diffraction reflection curve and electronic Auger spectroscopy has failed to provide reliable data about the state of crystal lattice in surface layer of at least 30 nm thickness. Hence it was impossible to suggest a model of solid phase recrystallization and to present its mathematical description. The goals of the work were as follows: – identify of silicon crystal lattice state in surface layer of 30 nm thickness before and after rapid thermal treatment by backward reflected electrons diffraction method using raw Si wafers surface; – analysis of contamination element composition on the surface of raw silicon before and after rapid thermal treatment; – model development for solid phase recrystallization of surface disturbed layer after rapid thermal treatment and its mathematical description. Images of back ward reflected electrons diffraction using surface layer of raw silicon wafers' of 30 nm thickness and also the results of the planar surface of raw silicon wafers' cleaning from impurities are provided. Processes reducing the activating energy of mechanically disturbed silicon layer recrystallization process were suggested and its mathematical description was provided. Parameters of rapid thermal treatment mitigating the thermal impact on silicon wafer for recrystallization of mechanically disturbed layer on its planar surface ware defined.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.2,"publicationDate":"2024-07-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141810786","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Assessment of Surface Roughness of Non-Metallic Materials during Laser Processing 评估激光加工过程中非金属材料的表面粗糙度
IF 0.2
Devices and Methods of Measurements Pub Date : 2024-07-22 DOI: 10.21122/2220-9506-2024-15-2-131-141
V. A. Alekseev, A. V. Usoltseva, V. Usoltsev, S. I. Yuran
{"title":"Assessment of Surface Roughness of Non-Metallic Materials during Laser Processing","authors":"V. A. Alekseev, A. V. Usoltseva, V. Usoltsev, S. I. Yuran","doi":"10.21122/2220-9506-2024-15-2-131-141","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-2-131-141","url":null,"abstract":"Experimental studies of the surface of non-metallic materials have been carried out to determine the roughness parameters of materials such as leather, bone, wood, plastic after processing the surface of materials with a laser beam. To assess the quality of the surface layer of materials, the depth of penetration of laser radiation into the material, the average value of the micro unevenness, and the mean square deviation of the micro unevenness were used. To describe the changes in the values of the micro unevenness, graphs of the correlation of the parameters of the micro unevenness and the modulus of elasticity of the surface of various non-metallic materials were used. Approximating polynomials are used to describe the correlations with the representation in a computer. A regression model is proposed that relates the properties of the material to the magnitude of the micro unevenness. Data on the depth of ablation for wood, bone, leather, plexiglass are presented, graphs of the correlation between the amount of surface micro unevenness and the density of materials, between the amount of surface micro-roughness and the modulus of elasticity of materials, the correlation coefficient between the amount of surface micro unevenness and the ignition temperature of organic materials. The obtained models make it possible to implement the proposed principle of laser processing of non-metallic materials, which consists in measuring the modulus of elasticity of the surface of the material and, based on the measurements obtained, control the modes of laser processing of products. The installation of laser surface treatment of non-metallic materials with the implementation of the principle of control of processing modes depending on the measured values of the modulus of elasticity of the surface of the material is proposed. To measure the elastic modulus of a material, a special sensor is used with indentation of the indenter and computer evaluation of the measurements obtained with the formation of solutions for controlling the modes of laser surface treatment of the material. The experimental results obtained made it possible to manufacture a number of products to ensure a given surface quality of non-metallic materials (a writing device, a gift for the newlyweds). Conducting experiments with changes in the power of laser radiation based on the results of measuring the modulus of elasticity of the surface of non-metallic materials has shown the effectiveness of operational setting of laser operating modes to ensure the quality of the surface of non-metallic materials.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.2,"publicationDate":"2024-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141814017","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Energy-Dispersive X-Ray Microanalysis – as a Method for Study the Aluminium-Polysilicon Interface after Exposure with Long-Term and Rapid Thermal Annealing 能量色散 X 射线显微分析--作为一种研究长期和快速热退火后铝-多晶硅界面的方法
IF 0.2
Devices and Methods of Measurements Pub Date : 2024-07-22 DOI: 10.21122/2220-9506-2024-15-2-104-109
U. A. Pilipenko, N. S. Kovalchuk, D. V. Shestovski, D. V. Zhyhulin
{"title":"Energy-Dispersive X-Ray Microanalysis – as a Method for Study the Aluminium-Polysilicon Interface after Exposure with Long-Term and Rapid Thermal Annealing","authors":"U. A. Pilipenko, N. S. Kovalchuk, D. V. Shestovski, D. V. Zhyhulin","doi":"10.21122/2220-9506-2024-15-2-104-109","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-2-104-109","url":null,"abstract":"Energy dispersive X-ray microanalysis is one of the main methods for determining the elemental composition of matter. Possessing high locality and a relatively shallow penetration depth of the electron beam (< 1 μm), this method has found wide application in the field of microelectronics, as the main method for analyzing the elemental composition of matter. The method allows to study the surface of a substance both pointwise and over an area with the construction of element distribution maps. In the paper we investigated the influence of long-term and rapid heat treatments on the formation of the aluminum-polysilicon interface in order to study the formation of ohmic contacts in the element base of integrated circuits. The aluminumpolysilicon interface was studied using energy-dispersive X-ray microanalysis. It has been established that during long-term thermal annealing (450 °C, 20 min) polysilicon is completely dissolved in aluminum followed by its segregation in the form of separate agglomerates in the aluminum film, which can lead to a complete failure of the integrated circuit. During rapid thermal annealing (450 °C, 7 s) such a phenomenon was not detected. Thus it is advisable to use rapid thermal annealing as an alternative to traditional long-term thermal annealing in microelectronics. This makes it possible to significantly reduce the dissolution of polysilicon in aluminum, avoid the destruction of ohmic contacts and increase the percentage of yield of workable 0products in the process of integrated circuits' manufacturing.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.2,"publicationDate":"2024-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141815005","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Morphological Approach to Development of a Process for Measurement Uncertainty Estimation 开发测量不确定性估算流程的形态学方法
IF 0.2
Devices and Methods of Measurements Pub Date : 2024-07-22 DOI: 10.21122/2220-9506-2024-15-2-110-119
P. Serenkov, V. Romanchak, A. V. Hrybkouski, Серенков П.С Белорусский, П.С. Серенков, В.М. Романчак, А.В. Грибковский
{"title":"A Morphological Approach to Development of a Process for Measurement Uncertainty Estimation","authors":"P. Serenkov, V. Romanchak, A. V. Hrybkouski, Серенков П.С Белорусский, П.С. Серенков, В.М. Романчак, А.В. Грибковский","doi":"10.21122/2220-9506-2024-15-2-110-119","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-2-110-119","url":null,"abstract":"The problem of increasing the reliability of uncertainty estimation of measurement results is considered. The purpose of this work was to justify the application of the process approach to the formation of the algorithm of uncertainty estimation on the basis of morphological analysis. It is theoretically substantiated that from the standpoint of the system approach to achieving an acceptable degree of reliability of measurement uncertainty estimates it is necessary to implement a process approach to the formation of the estimation method as an algorithm of actions. The main stages of the estimation process are defined. It is established that each stage of the estimation process can be realized by alternative methods. The morphological box method as a realization of morphological analysis is proposed as a basis for its solution. A morphological box design of the uncertainty estimation process with an open architecture is presented, based only on commonly accepted methods and approaches for realizing each step of the process. Two aspects of the application of the morphological box method are identified. On the one hand, the morphological box allows to form an algorithm of the uncertainty assessment process, maximally acceptable for the laboratory conditions, as a combination of process steps, based on the task at hand, combining different variants of realization of these steps. On the other hand, the morphological box acts as a tool for development of new methods of realization of various stages of the uncertainty assessment process. Examples of using the morphological box method to develop alternative algorithms of the uncertainty estimation process of the same measurement method and to develop new methods of realization of different stages of the estimation process are considered.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.2,"publicationDate":"2024-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141814487","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Hands-on Experience of THERMO FITNESS TESTING Device Use for Thermoelectric Evaluation of Metallic Materials 在金属材料热电评估中使用 THERMO FITNESS TESTING 设备的实践经验
IF 0.2
Devices and Methods of Measurements Pub Date : 2024-07-22 DOI: 10.21122/2220-9506-2024-15-2-87-94
A. Soldatov, A. Soldatov, M. Kostina, A. Abouellail, Костина М.А Национальный исследовательский Томский, А.И. Солдатов, А.А. Солдатов, М.А. Костина, А.А. Абуеллаиль
{"title":"Hands-on Experience of THERMO FITNESS TESTING Device Use for Thermoelectric Evaluation of Metallic Materials","authors":"A. Soldatov, A. Soldatov, M. Kostina, A. Abouellail, Костина М.А Национальный исследовательский Томский, А.И. Солдатов, А.А. Солдатов, М.А. Костина, А.А. Абуеллаиль","doi":"10.21122/2220-9506-2024-15-2-87-94","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-2-87-94","url":null,"abstract":"The article describes experience of practical application of the differential thermoelectric tester \"THERMO FITNESS TESTING\". Description of the sensor design and results of differential thermoelectromotive force measurement for a large group of metals widely used in Russia are given. Usage of the \"THERMO FITNESS TESTING\" device to test the quality of R6M5 steel heat treatment is described. Dependence of thermoelectromotive force on the heating temperature which can be used for practical purposes was obtained. Usage the \"THERMO FITNESS TESTING\" to measure the thickness of a cemented (carburized) layer of 12KH2N4А steel is considered. Dependence of the thermoelectromotive force on the thickness of the cementation layer was also obtained.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.2,"publicationDate":"2024-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141816701","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Bifacial Photovоltaic Sensor for Insolation Energy Resource Monitoring 用于日照能源监测的双面光电传感器
IF 0.2
Devices and Methods of Measurements Pub Date : 2024-07-22 DOI: 10.21122/2220-9506-2024-15-2-95-103
V. Vasilevich, M. Y. Zbyshinskaya
{"title":"Bifacial Photovоltaic Sensor for Insolation Energy Resource Monitoring","authors":"V. Vasilevich, M. Y. Zbyshinskaya","doi":"10.21122/2220-9506-2024-15-2-95-103","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-2-95-103","url":null,"abstract":"Accurate and reliable measurements of the total solar radiation flux make it possible to evaluate the efficiency of using stand-alone photovaltaic systems in various meteorological conditions. These measurements allow more accurately predict in time the energy production volume, accumulator and capacitive storage devices parameters and the payback period. Research purpose was to study the possibility of creating a photoelectric sensor and a method of uninterrupted measurement based on this sensor which allows to measure total solar radiation flux including its direct, diffused and reflected components simultaneously. The photovaltaic sensor with bifacial photosensitivity was manufactured and applied, which is low-inertia comparing to traditional thermoelectric pyranometers, and its spectral sensitivity is quite close to the same parameter of photovoltaic power supply system. It creates the possibility to estimate the insolation level capable to be completely converted into electrical energy without an ineffective heat-generating long-wavelength part of the solar spectrum. A laboratory measuring stand was made to test the sensor's operability. Modeling and experiments’ the sensor parameters were carried out and confirmed its operability. The bifacial photosensitivity sensor allows to control simultaneously direct, diffused and reflected from the earth's surface components of solar radiation, what gives more complete information about the energy potential of the photovoltaic power supply system location.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.2,"publicationDate":"2024-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141814391","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of Criteria for Comparing of Natural and LED Radiation Spectral Distribution 自然辐射与 LED 辐射光谱分布比较标准研究
IF 0.2
Devices and Methods of Measurements Pub Date : 2024-07-22 DOI: 10.21122/2220-9506-2024-15-2-120-130
P. Bogdan, E. Zaytseva, A. I. Stepanenko
{"title":"Investigation of Criteria for Comparing of Natural and LED Radiation Spectral Distribution","authors":"P. Bogdan, E. Zaytseva, A. I. Stepanenko","doi":"10.21122/2220-9506-2024-15-2-120-130","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-2-120-130","url":null,"abstract":"The difference in the spectral composition of artificial and natural lighting can negatively affect health, as well as lead to a distorted perception of the color of surrounding objects. At the same time, a certain correction of the spectral composition of visible radiation in medical institutions and workplaces has a positive effect on human health, while can be carried lighting control out taking into account the data of personal sensor devices that determine the human condition. The purpose of the research was to select criteria for comparing natural and LED optical and visible radiation by spectral composition and by the visibility of color differences in natural and LED lighting. The effectiveness of the application of known and developed criteria for assessing the difference in the spectral composition of optical and visible radiation from natural and LED sources was investigated, as well as for the visibility of color differences in natural and LED lighting. To minimize the values of criteria are proposed additive and subtractive methods for calculating LED parameters. Their comparison allowed us to conclude that a more complex calculation algorithm, but higher performance for an additive technique than for a subtractive one with the same minimization results.It was found that to simulate the spectral composition of natural radiation using LEDs, it is most effective to use the criteria \"standard deviations of the relative differences between the optical and visible spectral components of natural and LED radiation\". A comparison of the criteria for the visibility of color differences in natural and LED lighting showed approximately the same effectiveness of using the criteria \"small color differences\" and \"standard deviation by photoreceptors\" at the present stage and the prospects for applying the second criterion, provided that its acceptable values are established.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.2,"publicationDate":"2024-07-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141816704","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Gas-Sensitive Characteristics of Low-Power Semiconductor Gas Sensors to CO and H2 低功耗半导体气体传感器对 CO 和 H2 的气敏特性
IF 0.4
Devices and Methods of Measurements Pub Date : 2024-04-12 DOI: 10.21122/2220-9506-2024-15-1-18-29
I. A. Taratyn, O. Reutskaya, G. G. Gorokh, I. V. Serdyuk, V. S. Fedosenko
{"title":"Gas-Sensitive Characteristics of Low-Power Semiconductor Gas Sensors to CO and H2","authors":"I. A. Taratyn, O. Reutskaya, G. G. Gorokh, I. V. Serdyuk, V. S. Fedosenko","doi":"10.21122/2220-9506-2024-15-1-18-29","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-1-18-29","url":null,"abstract":"Strict requirements for determining of gases concentration in the working environment it is relevant to develop of semiconductor sensors which provide rapid response and safety of personnel in industrial and domestic premises. The aim of the work was to study gas-sensitive and dynamic characteristics of high-sensitive low-power sensors made on thin nanoporous substrates with gas-sensitive layers of semiconductor metal oxides. The low-power semiconductor gas sensor on the anodic alumina substrate has been developed. Sensors with gas-sensitive semiconductor metal oxide layers based on In2O3+Ga2O3, In2O3+SnO2 and SnO2+Pd deposited from aqueous solutions with subsequent firing on sensor information electrodes are manufactured. Studies of gas-sensitive characteristics have shown that sensors with SnO2 films with the addition of Pd nanoparticles have maximum sensitivity of about 85 % and high response rate to 10 ppm H2 at 410 °C. The maximum sensitivity of 250 % to 10 ppm CO at 220 °C was shown by films based on In2O3+SnO2, the response time τ90 was 5 s, while the sensitivity of In2O3+Ga2O3 and SnO2+Pd was 30–50 % at 410–420 ºC. Semiconducting metal oxides In2O3+Ga2O3 (70 % at 420 °C) and In2O3+SnO2 (30 % at 250 °C) showed lower sensitivity to hydrogen, with response time τ90 = 20 s. The sensors power consumption in all measurements was 28–60 mW. Semiconductor gas sensors with low energy consumption can be used in the systems development that monitor the carbon monoxide concentration in the work area, as well as detect ignition's early stages.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2024-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140711628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Determination of Crack Resistance of the Cover and Slide Glass by Indentation Method with the Visualization Using Atomic Force Microscopy 用原子力显微镜观察压痕法测定盖板和滑动玻璃的抗裂性能
IF 0.4
Devices and Methods of Measurements Pub Date : 2024-04-12 DOI: 10.21122/2220-9506-2024-15-1-60-67
V. Lapitskaya, T. Kuznetsova, S. Chizhik
{"title":"Determination of Crack Resistance of the Cover and Slide Glass by Indentation Method with the Visualization Using Atomic Force Microscopy","authors":"V. Lapitskaya, T. Kuznetsova, S. Chizhik","doi":"10.21122/2220-9506-2024-15-1-60-67","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-1-60-67","url":null,"abstract":"Crack resistance of two types of glass was studied – cover glass (0.17 mm thick) and slide glass (2 mm thick) using an improved technique through the use of the probe methods, which makes it possible to increase the accuracy of determining the crack resistance of glass. Colorless silicate glass was used. Crack resistance was determined by the Vickers pyramid indentation method. Microstructure of glasses surface and deformation region after indentation were studied using an atomic force microscope. Mechanical properties of glasses were determined by nanoindentation. Surface relief of a glass slide is rougher than that one of a cover glass. Roughness Rz for a cover glass is less than for a slide glass. Specific surface energy value of 0.26 N/m is higher for the slide glass compared to the coverslip. One elastic modulus value E of the cover glass is 48 GPa, and that one of the slide glass is 58 GPa. The microhardness value H is almost the same for by the glasses and amounts to 6.7 GPa for a slide glass and 6.4 GPa for a cover glass. Atomic force microscope images of deformation region after indentation with a Vickers pyramid show that the first cracks appear at a load of 1 N on the slide glass, and at 2 N on the cover glass. At a load of 3 N, the cover glass is destroyed. Based on the results of crack resistance calculations it was found that critical stress intensity coefficient KIC values are 1.42 MPa∙m1/2 for a glass slide, and 1.10 MPa∙m1/2 for a cover glass.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2024-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140710979","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Determination of the Concentration of Tm3+ and Ho3+ Ions in the Glass and Crystalline Phases in Oxyfluoride Glass Ceramics by Absorption Spectra Analysis 利用吸收光谱分析确定氟化氧玻璃陶瓷的玻璃相和晶体相中的 Tm3+ 和 Ho3+ 离子浓度
IF 0.4
Devices and Methods of Measurements Pub Date : 2024-04-12 DOI: 10.21122/2220-9506-2024-15-1-50-59
A. Yasukevich, V. Kisel, E. Trusova, G. E. Rachkovskaya, G. B. Zakharevich, K. B. Podbolotov, V. S. Gurin
{"title":"Determination of the Concentration of Tm3+ and Ho3+ Ions in the Glass and Crystalline Phases in Oxyfluoride Glass Ceramics by Absorption Spectra Analysis","authors":"A. Yasukevich, V. Kisel, E. Trusova, G. E. Rachkovskaya, G. B. Zakharevich, K. B. Podbolotov, V. S. Gurin","doi":"10.21122/2220-9506-2024-15-1-50-59","DOIUrl":"https://doi.org/10.21122/2220-9506-2024-15-1-50-59","url":null,"abstract":"Optical glass ceramics based on oxyfluoride glasses activated by rare earth ions have attractive properties for development of lasers and near-infrared amplifiers, since they combine properties of fluoride crystals with low phonon frequencies and chemical and mechanical properties of oxide matrices. Spectroscopic properties of activator ions in crystalline and glass phases of glass-ceramics can differ significantly. Thus, it is possible to determine impurity ions’ distribution between these phases by means of absorption or luminescence spectra analysis. The main goal of this work was to develop a method for determining the concentration of Tm3+ and Ho3+ ions in the crystalline, PbF2 and glassy phases of glass ceramics after secondary thermal treatment of thulium-doped and thulium-holmium co-doped oxyfluoride glasses. Spectroscopic characteristics of oxyfluoride glasses activated by Tm3+ ions and co-activated by Tm3+ and Ho3+ ions, as well as glass ceramics obtained from the original glasses as a result of secondary heat treatment were studied. It was established by X-ray phase analysis method that under certain heat treatment conditions crystalline β-PbF2 phase is formed in those glasses. Absorption and luminescence spectra of Tm3+ and Ho3+ impurity ions in the original glass and in β-PbF2 crystals were compared with their ones in glass ceramics. A method for determining the concentration of ions in the crystalline and glass phases of glass ceramics was proposed on the basis of this comparison. Dependence of Tm3+ and Ho3+ ions distribution between the glass and crystalline phases on different regime of glasses' secondary heat treatment was studied.","PeriodicalId":41798,"journal":{"name":"Devices and Methods of Measurements","volume":null,"pages":null},"PeriodicalIF":0.4,"publicationDate":"2024-04-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140710600","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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