2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)最新文献_第7页

Optical comparator based on FLC LCOS technology 基于FLC LCOS技术的光学比较器

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869686

T. Wilkinson, N. New, W. Crossland

引用次数: 1

Application of CW-CRDS to monitor and control chemical vapor deposition CW-CRDS在化学气相沉积监测控制中的应用

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869712

D. Green, J. Looney, G. Rubloff

引用次数: 1

Design of a smart pixel multispectral imaging array using 3D stacked thin film detectors on Si CMOS circuits 基于Si CMOS电路的三维堆叠薄膜探测器的智能像素多光谱成像阵列设计

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869697

K. Lee, S. Seo, S. Huang, Y. Joo, W. Doolittle, S. Fike, N. Jokerst, M. Brooke, A. Brown

引用次数: 4

Optical monitoring techniques for WDM networks WDM网络的光监控技术

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869759

Y. Chung

引用次数: 21

Wavefront compensation using liquid crystal spatial light modulators-scaling issues 液晶空间光调制器的波前补偿——缩放问题

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869734

D. Guthals, D. Sox, M. Joswick, P. Rodney

引用次数: 0

Integrated opto-VLSI mobile multimedia communicator 集成光vlsi移动多媒体通信器

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869684

K. Eshraghian

{"title":"Integrated opto-VLSI mobile multimedia communicator","authors":"K. Eshraghian","doi":"10.1109/LEOSST.2000.869684","DOIUrl":"https://doi.org/10.1109/LEOSST.2000.869684","url":null,"abstract":"The new generation of personal interactive mobile multimedia mobile communication (M/sup 3/C) demand highly compact low power devices capable of image capture and display as well as low bit rate coding and transmission. The new design concept based upon integration of optics with that of electronics has facilitated the realisation of a novel intelligent pixel array architecture to create a real-time implementation of forward and inverse wavelet transform for image capture, in-situ processing and display. The processor consists of an array of intelligent pixel (IP) processing elements. Each element of the array incorporates three components: (a) a photodetector with associated analogue to digital converter for the conversion of the incident light; (b) embedded processor for implementation of parallel video codec algorithm; (c) a liquid crystal display for the conversion of the decoded incoming video stream to an optical output for display. To carry out the required video coding the IP array is used to emulate a mesh network of processing elements such that the inherent parallelism and interconnectivity of the architecture is fully exploited.","PeriodicalId":415720,"journal":{"name":"2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114922124","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Accuracy and precision of scatterometer measurements relative to conventional CD metrology 散射计测量相对于传统CD测量的准确度和精密度

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869723

T. Hayes, R. Bowley, M. Littau, C. Raymond

{"title":"Accuracy and precision of scatterometer measurements relative to conventional CD metrology","authors":"T. Hayes, R. Bowley, M. Littau, C. Raymond","doi":"10.1109/LEOSST.2000.869723","DOIUrl":"https://doi.org/10.1109/LEOSST.2000.869723","url":null,"abstract":"Scatterometry is an emerging metrology technique for measuring critical dimensions (CD), profiles, and thicknesses within diffraction gratings printed on semiconductor film stacks. A 2/spl theta/ scatterometer was used to measure diffraction gratings on two film stacks: (1) front end of line logic gate stack, and (2) resist on anti-reflective coating (ARC) on silicon. The CD measurements of the scatterometer were compared to critical dimension scanning electron microscope (CD-SEM), atomic force microscope (AFM), and cross-section scanning electron microscope (X-SEM) measurements. The correlation between scatterometer and CD-SEM measurements was analyzed using the Mandel technique of Archie and Banke where AFM and X-SEM measurements were used to characterize the \"real\" properties of the grating. Initial results indicated that the measured CD value by scatterometer and CD-SEM were linearly correlated with a sizeable offset. Further analysis of the correlation shows that the offset was pronounced at grating sidewall angles approaching 90/spl deg/. The effect of sidewall angle on CD-SEM to scatterometer correlation and results for precision and accuracy on the scatterometer are discussed relative to in-line stepper focus control.","PeriodicalId":415720,"journal":{"name":"2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129826262","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Perfectly synchronized bit-parallel WDM data transmission over a single optical fiber 完全同步的位并行WDM数据传输在一个单一的光纤

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869767

D. Zhou, R.C. Wang, R. Runser, I. Glesk, P. Prucnal

引用次数: 0

A partitioning scheme for optoelectronic neural networks 一种光电神经网络分区方案

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869703

T. D. Wagner, D.A. Nash, J. Blair, E. Ressler, B. Shoop

引用次数: 2

Plasma diagnostics for semiconductor processing 用于半导体加工的等离子体诊断

2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497) Pub Date : 2000-07-24 DOI: 10.1109/LEOSST.2000.869713

H. Anderson

{"title":"Plasma diagnostics for semiconductor processing","authors":"H. Anderson","doi":"10.1109/LEOSST.2000.869713","DOIUrl":"https://doi.org/10.1109/LEOSST.2000.869713","url":null,"abstract":"Frequency-modulated infrared diode laser absorption spectroscopy (IRLAS) and full-spectrum CCD-based optical emission spectroscopy (OES) are two powerful new tools for plasma diagnostics. This presentation focuses on the use of these diagnostics in plasma etch processing used for semiconductor manufacturing. In particular, IRLAS is finding extensive use in measuring absolute concentrations of gas phase radicals formed in the oxide etch process performed with fluorocarbon high-density plasma discharges. Knowledge of the absolute concentrations of reactant and product species formed in trace amounts during etching of oxide substrates is important for predicting the behavior of this complex plasma-surface interaction. These measurements are a critical element in a program for plasma etch model development, and are intended for validating computer simulation models of this complex process. Full-spectrum OES on the other hand is a more mature technology that is finding application in day-to-day semiconductor fab plasma processing operations like end-point and fault detection. With the development of CCD sensors and micromachined diffraction gratings, it has been possible to build miniaturized spectrometers mounted on computer boards that allow rapid acquisition of the complete UV-visible optical emission spectrum of the plasma. Chemometric multivariate statistical analysis of this full-spectrum database in real time is made possible by integrating the spectrometer with a fast portable computer. In combination, these techniques have been shown to provide superior sensitivity for detecting process end-point in real-time and information for process fault detection.","PeriodicalId":415720,"journal":{"name":"2000 Digest of the LEOS Summer Topical Meetings. Electronic-Enhanced Optics. Optical Sensing in Semiconductor Manufacturing. Electro-Optics in Space. Broadband Optical Networks (Cat. No.00TH8497)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-07-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128598136","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 6