Misuk Bae, Ralu Divan, Kamlesh J Suthar, Derrick C Mancini, Richard A Gemeinhart
{"title":"Fabrication of Poly(ethylene glycol) Hydrogel Structures for Pharmaceutical Applications using Electron beam and Optical Lithography.","authors":"Misuk Bae, Ralu Divan, Kamlesh J Suthar, Derrick C Mancini, Richard A Gemeinhart","doi":"10.1116/1.3517716","DOIUrl":"10.1116/1.3517716","url":null,"abstract":"<p><p>Soft-polymer based microparticles are currently being applied in many biomedical applications, ranging from bioimaging and bioassays to drug delivery carriers. As one class of soft-polymers, hydrogels are materials, which can be used for delivering drug cargoes and can be fabricated in controlled sizes. Among the various hydrogel-forming polymers, poly(ethylene glycol) (PEG) based hydrogel systems are widely used due to their negligible toxicity and limited immunogenic recognition. Physical and chemical properties of particles (i.e., particle size, shape, surface charge, and hydrophobicity) are known to play an important role in cell-particle recognition and response. To understand the role of physicochemical properties of PEG-based hydrogel structures on cells, it is important to have geometrically precise and uniform hydrogel structures. To fabricate geometrically uniform structures, we have employed electron beam lithography (EBL) and ultra-violet optical lithography (UVL) using PEG or PEG diacrylate polymers. These hydrogel structures have been characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), optical microscopy, and attenuated total reflection Fourier-transform infrared spectroscopy (ATR-FTIR) confirming control of chemistry, size, and shape.</p>","PeriodicalId":38110,"journal":{"name":"Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics","volume":"28 6","pages":"C6P24-C6P29"},"PeriodicalIF":1.5,"publicationDate":"2010-12-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC3060791/pdf/nihms277969.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"29757348","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Bernadeta R Srijanto, Scott T Retterer, Jason D Fowlkes, Mitchel J Doktycz
{"title":"Nanostructured silicon membranes for control of molecular transport.","authors":"Bernadeta R Srijanto, Scott T Retterer, Jason D Fowlkes, Mitchel J Doktycz","doi":"10.1116/1.3518911","DOIUrl":"https://doi.org/10.1116/1.3518911","url":null,"abstract":"<p><p>A membrane that allows selective transport of molecular species requires precise engineering on the nanoscale. Membrane permeability can be tuned by controlling the physical structure and surface chemistry of the pores. Here, a combination of electron beam and optical lithography, along with cryogenic deep reactive ion etching, has been used to fabricate silicon membranes that are physically robust, have uniform pore sizes, and are directly integrated into a microfluidic network. Additional reductions in pore size were achieved using plasma enhanced chemical vapor deposition and atomic layer deposition of silicon dioxide to coat membrane surfaces. Cross sectioning of the membranes using focused ion beam milling was used to determine the physical shape of the membrane pores before and after coating. Functional characterization of the membranes was performed by using quantitative fluorescence microscopy to document the transport of molecular species across the membrane.</p>","PeriodicalId":38110,"journal":{"name":"Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics","volume":"28 6","pages":"C6PC6P48-C6PC6P52"},"PeriodicalIF":0.0,"publicationDate":"2010-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1116/1.3518911","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"32427585","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A Siber, R F Rajter, R H French, W Y Ching, V A Parsegian, R Podgornik
{"title":"Optically anisotropic infinite cylinder above an optically anisotropic half space: Dispersion interaction of a single-walled carbon nanotube with a substrate.","authors":"A Siber, R F Rajter, R H French, W Y Ching, V A Parsegian, R Podgornik","doi":"10.1116/1.3416904","DOIUrl":"https://doi.org/10.1116/1.3416904","url":null,"abstract":"<p><p>A complete form of the van der Waals dispersion interaction between an infinitely long anisotropic semiconducting/insulating thin cylinder and an anisotropic half space is derived for all separations between the cylinder and the half space. The derivation proceeds from the theory of dispersion interactions between two anisotropic infinite half spaces as formulated in Phys. Rev. A 71, 042102 (2005). The approach is valid in the retarded as well as nonretarded regimes of the interaction and is coupled with the recently evaluated <i>ab initio</i> dielectric response functions of various semiconducting/insulating single wall carbon nanotubes, enables the authors to evaluate the strength of the van der Waals dispersion interaction for all orientation angles and separations between a thin cylindrical nanotube and the half space. The possibility of repulsive and/or nonmonotonic dispersion interactions is examined in detail.</p>","PeriodicalId":38110,"journal":{"name":"Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics","volume":"28 3","pages":"C4AC4A17-C4AC4A24"},"PeriodicalIF":0.0,"publicationDate":"2010-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1116/1.3416904","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"32427584","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Huilan Han, Abhinav Bhushan, Frank Yaghmaie, Cristina E Davis
{"title":"Direct thermal-UV nanoimprint of an iron-containing organometallic hybrid film.","authors":"Huilan Han, Abhinav Bhushan, Frank Yaghmaie, Cristina E Davis","doi":"10.1116/1.3271337","DOIUrl":"https://doi.org/10.1116/1.3271337","url":null,"abstract":"<p><p>Direct thermal-UV nanoimprinting of an organometallic hybrid film has been demonstrated to fabricate nanoscale features into a novel organic-inorganic solution containing selected metals. The film can be patterned at low temperature and pressure, and requires only a short processing time. When analyzed by energy dispersion X-ray spectroscopy, the authors observe both organic and metal content in the final patterned features. They have also observed that film thermal stability increases after UV and oxygen plasma treatments, which may lead to devices that perform well across a wide spectrum of temperatures.</p>","PeriodicalId":38110,"journal":{"name":"Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics","volume":"28 1","pages":"78-81"},"PeriodicalIF":0.0,"publicationDate":"2010-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1116/1.3271337","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"32427583","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}