2018 International Conference on Radiation Effects of Electronic Devices (ICREED)最新文献

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Effect of Gamma Radiation on the electronic properties of PEDOT cathode tantalum capacitor 伽玛辐射对PEDOT阴极钽电容器电子性能的影响
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905083
Huanan Cui, Dayu Zhang, Yue Wang, Hongqi Zhang, M. Tang
{"title":"Effect of Gamma Radiation on the electronic properties of PEDOT cathode tantalum capacitor","authors":"Huanan Cui, Dayu Zhang, Yue Wang, Hongqi Zhang, M. Tang","doi":"10.1109/ICREED.2018.8905083","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905083","url":null,"abstract":"Gamma radiation induces surface defects in PEDOT which could recover under electric field, where gamma ray restricts the polarization of dipole. Parameters of PEDOT tantalum capacitor in space could be stable when resting and vary less when working. Gamma ray favors the use of PEDOT cathode tantalum capacitor in space.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124792395","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effects of 1MeV electron irradiation on the photoluminescence of GaInNAs/GaAs single quantum well structure 1MeV电子辐照对GaInNAs/GaAs单量子阱结构光致发光的影响
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905063
M. Sailai, Aierken Abuduwayiti, M. Heini, Zhao Xiaofan, Shen Xiaobao, Xu Yan, L. Haitao, Li Yudong, G. Qi
{"title":"Effects of 1MeV electron irradiation on the photoluminescence of GaInNAs/GaAs single quantum well structure","authors":"M. Sailai, Aierken Abuduwayiti, M. Heini, Zhao Xiaofan, Shen Xiaobao, Xu Yan, L. Haitao, Li Yudong, G. Qi","doi":"10.1109/ICREED.2018.8905063","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905063","url":null,"abstract":"Minimizing the impact of radiation-induced degradation in optoelectronic devices based dilute nitride is crucial in applications. The effects of 1MeV electron irradiation (1×1014 e/cm2 ~ 1×1016 e/cm2 range) on undoped GaInNAs/GaAs single quantum well (QW) structure has been studied by low temperature photoluminescence (PL). PL spectra of GaInNAs/GaAs QW are measured before and after electron irradiation. The results show a slight enhancement of the PL intensity in relatively low electron fluence, and then subsequent deterioration of PL with increase of cumulative electron fluence. The enhancement in PL intensity at low electron doses are explained by recombination-enhanced defect reaction model and the degradation at high electron doses are explained by irradiation induced defects in lattice.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125155684","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Impact of TID on the Transient Ionizing Irradiation Response of CMOS Circuits TID对CMOS电路瞬态电离辐射响应的影响
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905056
Li Ruibin, He Chao-hui, Chen Wei, L. Junlin, Wang Guizhen, Qi Chao, Yang Shanchao, W. Chenhui
{"title":"Impact of TID on the Transient Ionizing Irradiation Response of CMOS Circuits","authors":"Li Ruibin, He Chao-hui, Chen Wei, L. Junlin, Wang Guizhen, Qi Chao, Yang Shanchao, W. Chenhui","doi":"10.1109/ICREED.2018.8905056","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905056","url":null,"abstract":"Total ionizing dose (TID) can cause the threshold voltage of complementary metal oxide semiconductor (CMOS) transistors to shift backward and the current gain of the parasitic triode to degrade; these two factors will compete while devices accumulating TID expose to transient ionizing irradiation, and the data status depends on the dominant one. Micrometer (CD4007) and sub-micrometer (IDT71256) CMOS devices were investigated on the synergistic effects of TID and transient ionizing irradiation. The results reveal that the current gain degradation induced by TID, for CD4007, plays a significant role; whereas the shrink of the static noise margin (SNM) induced by TID, for IDT71256, is the dominant factor and the influence of the parasitic transistor can be ignored. The reasons are sub-micrometer devices have the thinner gate oxide, resulting in the current gain degradation induced by TID not evident; and the collection volume of photocurrent is too small to generate enough primary photocurrent for driving the parasitic transistor on. In sum, the synergistic effects of TID and transient ionizing irradiation are evident in large-scale devices, while not evident in small-scale devices.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134174701","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Displacement damage effects and anneal characteristic on InP/InGaAs DHBTs InP/InGaAs dhbt的位移损伤效应及退火特性
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905072
Xing-yao Zhang, Yudong Li, Q. Guo, Bin Liao, Shi Yang, Zhongyue Yang, Cheng-fa He
{"title":"Displacement damage effects and anneal characteristic on InP/InGaAs DHBTs","authors":"Xing-yao Zhang, Yudong Li, Q. Guo, Bin Liao, Shi Yang, Zhongyue Yang, Cheng-fa He","doi":"10.1109/ICREED.2018.8905072","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905072","url":null,"abstract":"Our tests on InP/InGaAs double heterojunction bipolar transistors (DHBTs) aimed to establish the electrical properties at 120 keV, 3MeV and 10MeV proton irradiation. The DC and frequency characteristics of InP/InGaAs DHBTs are tested after radiation. Displacement damage effect and anneal characteristic are analyzed. The change of currents reflects that the keV-level proton have the greater influence on the DHBTs than MeV-level proton. It is indicated clearly that the degradation of DHBTs due to the radiation-induced trapping centers, where located in the neutral base region, the space charge region of base-emitter and base-collector junctions mainly. Most of characteristics of DHBTs are recovered because some the radiation-induced trapping centers occur anneal out at relatively high temperatures.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129920181","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Total Ionizing Dose Effect Induced Current Degradation for 300V SOI NLDMOS 总电离剂量效应诱导300V SOI NLDMOS电流降解
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905064
Xin Zhou, Zhangyi’an Yuan, Lei Shu, Zhenlin Lu, M. Qiao, Zhaoji Li, Bo Zhang
{"title":"Total Ionizing Dose Effect Induced Current Degradation for 300V SOI NLDMOS","authors":"Xin Zhou, Zhangyi’an Yuan, Lei Shu, Zhenlin Lu, M. Qiao, Zhaoji Li, Bo Zhang","doi":"10.1109/ICREED.2018.8905064","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905064","url":null,"abstract":"Total Ionizing dose effect induced current degradation for 300V SOI NLDMOS is investigated in this paper. The degradation mechanism of conduction drain current at on-state and leakage current at off-state is revealed by simulation and experiment. The conduction current increasing is ascribed to the reduction of the on-resistance by trapped charges in multiple interfaces. The leakage current increasing is ascribed to the weak inversion layer under filed oxide layer induced by trapped charges. Experiment result shows the annular termination structure benefits to suppress the degradation of leakage current.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122204740","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Au Nanoparticles-Decorated Ultraviolet Photodetector on Transparent Mica Substrate 透明云母基板上金纳米粒子修饰紫外探测器
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905076
Hainan Zhang, T. Ren, R. Liang, Yunfei Zhao, Yu-xing Li, Zhenyi Ju, Houfang Liu, D. Xie, H. Tian, Yezhou Yang
{"title":"Au Nanoparticles-Decorated Ultraviolet Photodetector on Transparent Mica Substrate","authors":"Hainan Zhang, T. Ren, R. Liang, Yunfei Zhao, Yu-xing Li, Zhenyi Ju, Houfang Liu, D. Xie, H. Tian, Yezhou Yang","doi":"10.1109/ICREED.2018.8905076","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905076","url":null,"abstract":"Hydrothermally processed ZnO nanorods decorated by Au nanoparticles have been demonstrated to exhibit extraordinary optoelectronic properties. With the introduction of Au nanoparticles modification, the ultraviolet responsivity has been greatly enhanced by approximately 200 times, up to 1244 A/W, compared with that of pristine ZnO. This work will be promising for designing high responsivity ZnO photodetector.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124174400","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of Single Event Effect Susceptibility of Inner Memory Blocks in 28 nm Xilinx SoC Using 239Pu 基于239Pu的28nm赛灵思SoC内存块单事件效应敏感性研究
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905095
L. Yonghong, Yang Weitao, He Chao-hui, Li Yang
{"title":"Investigation of Single Event Effect Susceptibility of Inner Memory Blocks in 28 nm Xilinx SoC Using 239Pu","authors":"L. Yonghong, Yang Weitao, He Chao-hui, Li Yang","doi":"10.1109/ICREED.2018.8905095","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905095","url":null,"abstract":"Single event upset (SEU) susceptibility of memory blocks in 28nm Xilinx Zynq-7000 All Programmable SoC was investigated using an alpha radioactive source 239Pu. The tested memory blocks included on chip memory (OCM), Register, D-Cache and BRAM. The upset addresses and bits were detected using our designed SEU test system, meanwhile, the upset data were recovered by this system. Results show that the upsets were single bit upset and the recovery rate achieved 100%. Moreover, the cross sections were obtained, at 10−7 cm2 level.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"67 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131720413","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A Novel SIT and VDMOS SEB Effects Contrastive Analysis by Numerical Simulation 一种新型SIT与VDMOS SEB效应的数值模拟对比分析
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905070
K. Tan, Dong Huang, Xia Zhang, Zhaohuan Tang, Xue Wu, Tian Xiao, Bin Wang, K. Zhu, Wensuo Chen, Jing Zhang
{"title":"A Novel SIT and VDMOS SEB Effects Contrastive Analysis by Numerical Simulation","authors":"K. Tan, Dong Huang, Xia Zhang, Zhaohuan Tang, Xue Wu, Tian Xiao, Bin Wang, K. Zhu, Wensuo Chen, Jing Zhang","doi":"10.1109/ICREED.2018.8905070","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905070","url":null,"abstract":"SEB characters of a novel SIT and VDMOS were contrastively analyzed by pulse light irradiation numerical simulation. Simulation result indicated that SIT’s SEB trigger intensity (Equivalent threshold Charges or LET) is 52 times as VDMOS, and SEB trigger threshold current is 18 times as VDMOS, none of which has been reported.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133562789","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Kinetic Monte Carlo Simulation of Electron-Induced Point Defects Annealing in Gallium Nitride 氮化镓中电子诱导点缺陷退火的动力学蒙特卡罗模拟
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905084
Chengliang Huang, Chaohui He, Huan He, A. Hussain, Weitao Yang
{"title":"Kinetic Monte Carlo Simulation of Electron-Induced Point Defects Annealing in Gallium Nitride","authors":"Chengliang Huang, Chaohui He, Huan He, A. Hussain, Weitao Yang","doi":"10.1109/ICREED.2018.8905084","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905084","url":null,"abstract":"Isochronal and isothermal annealing simulation of electron-induced point defects in Gallium Nitride were conducted with Object Kinetic Monte Carlo. Two annealing stages different from annealing in metals were observed and the mechanism of annealing was analyzed. The results are helpful for modeling micro-structural evolution for Gallium Nitride material and Gallium Nitride based devices.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"361 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115960780","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design of a Transient Ionizing Dose-rate Radiation Hardened LDO 瞬态电离剂量率辐射强化LDO的设计
2018 International Conference on Radiation Effects of Electronic Devices (ICREED) Pub Date : 2018-05-01 DOI: 10.1109/ICREED.2018.8905065
Liu Zhi, Zhang Qiang, Jiang Hongyu, G. Mei
{"title":"Design of a Transient Ionizing Dose-rate Radiation Hardened LDO","authors":"Liu Zhi, Zhang Qiang, Jiang Hongyu, G. Mei","doi":"10.1109/ICREED.2018.8905065","DOIUrl":"https://doi.org/10.1109/ICREED.2018.8905065","url":null,"abstract":"The transient ionizing dose-rate radiation hardened design of a low-dropout regulator (LDO) is presented in this paper. It is mainly used to harden the LDO to improve the ionizing radiation dose rate of the circuit from the two aspects of circuit level hardened and device level hardened. A double-loop feedback method is proposed for circuit-level hardened. The loop 1 is the conventional feedback loop of LDO, and the loop 2 is introduced to enhance the LDO circuit immunity to the ionizing radiation dose rate effects. By directly detecting the changes in the output voltage of the LDO, the loop 2 feedbacks this change fastest to the output driver. This not only improves response speed of the LDO to the changes of the output voltage, which are caused by instantaneous radiation, but also improves the radiation ability of the LDO anti gamma instantaneous ionizing dose rate effects. The hardened level of the device is mainly based on the poly-silicon emitter NPN transistor, the gate control PNP transistor and other traditional effective layout hardened techniques, which are minimized to reduce photocurrents level. The hardened LDO has been implemented in a 0.35-μm BiCMOS process. The transient gamma dose rate irradiation experiment results show that the circuit survived 1×109Gy(Si)/s and that the recovery-time is less than 100us. The experimental results are of great significance to provide reference for improving LDO anti-transient ionization radiation level.","PeriodicalId":347783,"journal":{"name":"2018 International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"56 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114251092","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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