Applied Surface Science Advances最新文献

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Performance analysis of turning operation parameters empirically on Delrin 根据经验对 Delrin 车削操作参数进行性能分析
IF 7.5
Applied Surface Science Advances Pub Date : 2024-11-01 DOI: 10.1016/j.apsadv.2024.100652
{"title":"Performance analysis of turning operation parameters empirically on Delrin","authors":"","doi":"10.1016/j.apsadv.2024.100652","DOIUrl":"10.1016/j.apsadv.2024.100652","url":null,"abstract":"<div><div>Delrin is the best additional material for metals because of its inherent qualities, such as great wear resistance and tensile strength. The main aim of this work is to investigate how independent variables like feed rate, spindle speed, and depth of cut are significant for dependent variables such as surface roughness, temperature, stresses, and material removal rate on novel material Delrin. The independent variable ranges are selected based on tool and workpiece material combinations and machine tool specification as spindle speed 230 – 844 rpm, feed rate 0.5 – 1.5 mm/rev, and depth of cut 1 – 3 mm. Based on the L27 orthogonal array experimental plan 27 numbers of experiments are conducted by the design of experiment concepts. The theoretical investigation through response surface methodology is also conducted to establish how independent variables affected dependent variables when Delrin was being machined. The independent variable's significance is determined by the ANOVA table for all the considered responses. In addition to the considered flow of work, the experiential model is developed by the utilization of regression analysis. The developed models are confirmed by experimental data and the models have the best validation results with the experimental results.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142571493","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Surface Engineered 2D Materials based Platforms for Advanced Technologies 基于表面工程二维材料的先进技术平台
IF 7.5
Applied Surface Science Advances Pub Date : 2024-11-01 DOI: 10.1016/j.apsadv.2024.100654
{"title":"Surface Engineered 2D Materials based Platforms for Advanced Technologies","authors":"","doi":"10.1016/j.apsadv.2024.100654","DOIUrl":"10.1016/j.apsadv.2024.100654","url":null,"abstract":"","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142571494","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The essential synergy between experiments and theory in applied surface science 应用表面科学中实验与理论的重要协同作用
IF 7.5
Applied Surface Science Advances Pub Date : 2024-10-30 DOI: 10.1016/j.apsadv.2024.100651
{"title":"The essential synergy between experiments and theory in applied surface science","authors":"","doi":"10.1016/j.apsadv.2024.100651","DOIUrl":"10.1016/j.apsadv.2024.100651","url":null,"abstract":"","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-10-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142554620","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Manufacturing and properties characterization of Ti patterned coatings for water electrolyzers by CSAM 利用 CSAM 分析水电解槽钛花纹涂层的制造和性能特征
IF 7.5
Applied Surface Science Advances Pub Date : 2024-10-25 DOI: 10.1016/j.apsadv.2024.100649
{"title":"Manufacturing and properties characterization of Ti patterned coatings for water electrolyzers by CSAM","authors":"","doi":"10.1016/j.apsadv.2024.100649","DOIUrl":"10.1016/j.apsadv.2024.100649","url":null,"abstract":"<div><div>This work investigates the microstructure and manufacturing control of the masked Cold Spray Additive Manufacturing (CSAM) strategy for producing of new bipolar plates (BPPs) for Proton Exchange Membrane (PEM) electrolyzers, using low-cost, lightweight, and machinable materials. CSAM is a solid-state process capable of fabricating 3D patterned parts based on a bottom-up approach using masks with a desired pattern. This study focuses on the dimensional and microstructural characteristics of pin fins fabricated with spherical (Ti-S) and irregular (Ti-I) Ti powders using the masked CSAM technology. Additionally, the performance of both Ti parts for its application in PEM electrolyzers was evaluated in terms of corrosion resistance and interfacial contact resistance (ICR). The results demonstrated that the masked CSAM technology allowed precise control and customization of the dimensions of the 3D-printed pin fins, obtaining porosity values of 6 ± 1 % for Ti-S and 4 ± 1 % for Ti-I. The evaluation of the corrosion resistance of the CSAM Ti patterned parts showed that for both Ti-S and Ti-I powders a stable oxide film at the typical operation potential (1.8 V vs Ag/AgCl) of a PEM water electrolyzer was formed without signs of pitting corrosion. Finally, at a compaction pressure of 150 N/cm<sup>2</sup> ICR values of 42 ± 19, 40 ± 13, and 24 ± 7 mΩ·cm<sup>2</sup> were obtained for Ti-I, Ti-S, and standard Ti Bulk, respectively. The results suggest than the masked CSAM technology shows great potential for the fabrication of Ti BPPs.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-10-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142528419","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Exploring the role of edges in surface functionalization and stability of plasma-modified carbon materials: Experimental and DFT insights 探索边缘在等离子体改性碳材料的表面功能化和稳定性中的作用:实验和 DFT 见解
IF 7.5
Applied Surface Science Advances Pub Date : 2024-10-23 DOI: 10.1016/j.apsadv.2024.100648
{"title":"Exploring the role of edges in surface functionalization and stability of plasma-modified carbon materials: Experimental and DFT insights","authors":"","doi":"10.1016/j.apsadv.2024.100648","DOIUrl":"10.1016/j.apsadv.2024.100648","url":null,"abstract":"<div><div>Effective surface functionalization of carbon nanomaterials plays a crucial role in various applications. We investigated the impact of edges on surface functionalization and stability of oxygen-modified carbon materials using a combination of experimental techniques and Density Functional Theory (DFT) insights. Graphenic paper, highly oriented pyrolytic graphite (HOPG), and graphenic flakes were employed as model systems, with oxygen plasma treatment (generator power 100 W, oxygen pressure 0.2 mbar, exposure time 6 – 300 s) serving as the modification method. Surface morphology and chemical composition were characterized using scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and Raman spectroscopy. The results revealed the introduction of oxygen functional groups on the investigated carbon surfaces (up to 20 at % by XPS) whereas; the structural integrity of the materials remained intact upon plasma modification (SEM, Raman). Work function was used as a sensitive parameter for monitoring the surface changes (increase by ∼1.4 eV, 1.3 eV, and 1 eV for graphenic paper, HOPG, and graphenic flakes, respectively) while time-dependent measurements revealed distinct kinetic processes governing the decay of functionalization, highlighting the role of surface defects in post-plasma processes. DFT calculations provided molecular-level insights into the surface processes, elucidating the mechanisms underlying the diffusion of hydroxyls, their recombination, and water desorption. Since the calculated activation barrier for recombination on basal graphenic planes (∼1.0 eV) and edges (∼5.5 eV) are distinctly different, it can be thus concluded that the persistent functionalization is due to the surface edges. Our findings contribute to a deeper understanding of surface modification processes of carbon materials and offer rationales for the design of advanced functional nanomaterials with tailored surface properties.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-10-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142528418","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Multidimensional woodchips-like Mn-metal-organic framework for asymmetric supercapacitor devices 用于不对称超级电容器设备的多维木片状锰金属有机框架
IF 7.5
Applied Surface Science Advances Pub Date : 2024-10-21 DOI: 10.1016/j.apsadv.2024.100650
{"title":"Multidimensional woodchips-like Mn-metal-organic framework for asymmetric supercapacitor devices","authors":"","doi":"10.1016/j.apsadv.2024.100650","DOIUrl":"10.1016/j.apsadv.2024.100650","url":null,"abstract":"<div><div>Multidimensional manganese-metal organic frameworks (Mn-MOF) are synthesized using 1,2,4,5-Benzene tetracarboxylic acid (BTTC) at various temperatures (100–160 °C). The Fourier-transform infrared spectroscopy (FT-IR) and X-ray diffraction (XRD) techniques successfully confirm the formation of Mn-MOF. Among the various temperatures, the Mn-MOF synthesized at 140 °C (Mn-MOF@BTTC-140) is remarkable because it has excellent crystallinity and a unique morphology, i.e., woodchips-like structure. The synthesized Mn-MOF@BTTC materials are used in supercapacitor applications. In comparison to all materials, Mn-MOF@BTTC-140 revealed the maximum specific capacitance (Cs) of 627 F g<sup>-1</sup> @ 1 A g<sup>-1</sup>, and it displayed 91 % capacitance retention even after the 6000 cycles at a current density of 10 A g<sup>-1</sup>. Furthermore, the supercapacitor device (SD) constructed using carbon nanofibers (CNF) as the negative electrode and Mn-MOF@BTTC-140 as the positive electrode delivered an energy density of 25 W h kg<sup>-1</sup> at a power density of 532 W kg<sup>-1</sup>. Ultimately, LED lighting demonstrates that our fabricated materials suit practical applications.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-10-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142528417","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Designing g-C3N4/NiFe2O4 S-scheme heterojunctions for efficient photocatalytic degradation of Rhodamine B and tetracycline hydrochloride 设计用于高效光催化降解罗丹明 B 和盐酸四环素的 g-C3N4/NiFe2O4 S 型异质结
IF 7.5
Applied Surface Science Advances Pub Date : 2024-10-20 DOI: 10.1016/j.apsadv.2024.100647
{"title":"Designing g-C3N4/NiFe2O4 S-scheme heterojunctions for efficient photocatalytic degradation of Rhodamine B and tetracycline hydrochloride","authors":"","doi":"10.1016/j.apsadv.2024.100647","DOIUrl":"10.1016/j.apsadv.2024.100647","url":null,"abstract":"<div><div>Semiconductor based photocatalysis is considered as an effective and sustainable approach for the efficient treatment of effluents containing organic dyes and pharmaceuticals. Herein, visible light responsive g-C<sub>3</sub>N<sub>4</sub>/ NiFe<sub>2</sub>O<sub>4</sub> (CN/NF) composite photocatalysts were designed by sol-gel auto-combustion assisted calcination method using ethylene glycol (EG) as a chelating agent. Bidentate nature and lower molecular weight of EG favour slow hydrolysis of Ni<sup>2+</sup> and Fe<sup>3+</sup> ions followed by formation of homogenous gel phase which under auto-combustion produced NF precursors. Calcination of the mixture of dicyandiamide (DCDA) and predetermined amount of NF precursors at 550 °C for 4 h resulted in the formation of CN/NF nanocomposites in which NF nanoparticles are anchored on thick plates of porous CN. The construction of CN/NF S-scheme heterojunctions was established through XPS studies and scavenging tests. The 10CN/NF nanocomposite exhibited superior photocatalytic Rhodamine B (RhB) degradation efficiency (98.6 %) which is 2.7 and 3.1 folds superior than that of pure NF and CN respectively. Additionally, the photocatalytic performance of 10CN/NF for tetracycline hydrochloride (TCH) degradation was found to be 84.32 %. The degradation efficiency was around 1.75 and 2.6 times higher than that was observed for pristine NF and CN correspondingly. The current study will bring fresh insights into the synthesis of CN/NF heterojunctions with an S-scheme charge transfer channel for the efficient treatment of waste waters containing dyes and antibiotics.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-10-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142528413","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
First-Principle Calculations of Interfacial Resistance between Nickel Silicide and Hyperdoped Silicon with N-Type Dopants Arsenic, Phosphorus, Antimony, Selenium and Tellurium 硅化镍与含有 N 型掺杂剂砷、磷、锑、硒和碲的高掺杂硅之间界面电阻的第一原理计算
IF 7.5
Applied Surface Science Advances Pub Date : 2024-10-12 DOI: 10.1016/j.apsadv.2024.100646
{"title":"First-Principle Calculations of Interfacial Resistance between Nickel Silicide and Hyperdoped Silicon with N-Type Dopants Arsenic, Phosphorus, Antimony, Selenium and Tellurium","authors":"","doi":"10.1016/j.apsadv.2024.100646","DOIUrl":"10.1016/j.apsadv.2024.100646","url":null,"abstract":"<div><div>The interfacial resistance between NiSi<sub>2</sub> and n-type doped Si was investigated using density functional theory calculations with hybrid functionals. We explored the resistance of Si at different doping concentrations by assigning an effective potential to each Si atom. Then, the valley filtering effect at the NiSi<sub>2</sub>/Si interface was estimated by comparing the transmission spectra of NiSi<sub>2</sub> and Si. We also examined the interfacial resistance between NiSi<sub>2</sub> and hyperdoped Si with substitutional n-type dopants, including pnictogen (P, As and Sb) and chalcogen (Se and Te) atoms. Two types of substitutional dopant structures (a single dopant and a dopant dimer) were considered. The formation and binding energies of a single P/Te and a P/Te dimer were investigated to understand the stability in Si. The resistances of Si with a single dopant and with a dopant dimer at high doping concentrations were calculated to show that the resistance as low as ∼ <span><math><mrow><mn>4</mn><mspace></mspace><mo>×</mo><msup><mrow><mn>10</mn></mrow><mrow><mo>−</mo><mn>11</mn></mrow></msup><mspace></mspace><mstyle><mi>Ω</mi></mstyle><mo>·</mo><mi>c</mi><msup><mrow><mi>m</mi></mrow><mn>2</mn></msup></mrow></math></span> can be achieved with a single dopant (P, As and Sb). However, at high doping concentration where a dopant dimer forms, a P dimer cannot effectively donate electrons, resulting in high resistance, while a Te dimer can still provide electrons, achieving a resistance of ∼ <span><math><mrow><mn>2</mn><mspace></mspace><mo>×</mo><msup><mrow><mn>10</mn></mrow><mrow><mo>−</mo><mn>10</mn></mrow></msup><mspace></mspace><mstyle><mi>Ω</mi></mstyle><mo>·</mo><mi>c</mi><msup><mrow><mi>m</mi></mrow><mn>2</mn></msup></mrow></math></span>. Therefore, the chalcogen deep donor atoms (Se and Te) can be effective n-type donors and lower the silicide contact resistance at the interface where Si is extremely highly n-type doped.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-10-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142418740","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Strain-oxygen vacancies coupling in topotactic (La,Sr)Co3-δ thin films 拓扑结构(La,Sr)Co3-δ 薄膜中的应变-氧空位耦合
IF 7.5
Applied Surface Science Advances Pub Date : 2024-09-28 DOI: 10.1016/j.apsadv.2024.100644
{"title":"Strain-oxygen vacancies coupling in topotactic (La,Sr)Co3-δ thin films","authors":"","doi":"10.1016/j.apsadv.2024.100644","DOIUrl":"10.1016/j.apsadv.2024.100644","url":null,"abstract":"<div><div>Oxygen defect engineering is a widely used approach for tuning physical properties in oxides. Multivalent transition metal oxide La<sub>0.7</sub>Sr<sub>0.3</sub>CoO<sub>3-δ</sub> (LSCO) shows oxygen vacancy-driven metal-to-insulator transition (MIT) due to topotactic phase transition and its high oxygen vacancy tolerance. Here, we introduce strain as a new degree of freedom to study the strain-oxygen vacancy coupling effects and elucidate its impact on the electronic property in oxygen-deficient LSCO epitaxial thin films grown on SrTiO<sub>3</sub> (100) single crystal. By combining the experimental results with density functional theory plus U (DFT+U) calculations, we reveal that 2.1 % <em>in-plane</em> tensile strain can stabilize the insulating state of LSCO with a surprisingly low concentration of oxygen vacancies, &lt;0.5 %. This study reveals that the MIT in LSCO is governed by the combination of oxygen vacancies and strain, offering the potential for additional tuning knob of the material's electronic properties.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142358740","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fluorine-free superhydrophobic surfaces by atmospheric pressure plasma deposition of silazane-based suspensions 通过常压等离子体沉积硅烷基悬浮液实现无氟超疏水性表面
IF 7.5
Applied Surface Science Advances Pub Date : 2024-09-27 DOI: 10.1016/j.apsadv.2024.100645
{"title":"Fluorine-free superhydrophobic surfaces by atmospheric pressure plasma deposition of silazane-based suspensions","authors":"","doi":"10.1016/j.apsadv.2024.100645","DOIUrl":"10.1016/j.apsadv.2024.100645","url":null,"abstract":"<div><div>Atmospheric plasma is used to deposit superhydrophobic fluorine-free thin films onto a substrate. In this process, a suspension of micron size silica particles in a silazane based precursor is deposited in a single step using a dielectric barrier discharge plasma jet moving above the substrate. Thanks to an optimized configuration between the suspension injection and the plasma jet, the silazane precursor can be polymerized on the substrate surface but also, on silica particles to form additional micro size particles. The experimental parameters for optimal deposition are discussed, with emphasis on those leading to the formation of this dual roughness surface caused by the arrangement of both silica particles and particles generated from the precursor plasma polymerization. The combination of these two different length scales for the roughness leads to a decreased wettability of the coated substrate and a water contact angle larger than 150°.</div></div>","PeriodicalId":34303,"journal":{"name":"Applied Surface Science Advances","volume":null,"pages":null},"PeriodicalIF":7.5,"publicationDate":"2024-09-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142322329","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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