2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)最新文献

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Joint Material for power semiconductors by Cu-Sn Intermetallic Compound (IMC) 用Cu-Sn金属间化合物(IMC)制备功率半导体接头材料
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/WiPDAAsia.2019.8760333
Hiroaki Ikeda, S. Sekine, Ryuji Kimura, Koichi Shimokawav, H. Shindo, T. Ooi, Rei Tamaki
{"title":"Joint Material for power semiconductors by Cu-Sn Intermetallic Compound (IMC)","authors":"Hiroaki Ikeda, S. Sekine, Ryuji Kimura, Koichi Shimokawav, H. Shindo, T. Ooi, Rei Tamaki","doi":"10.1109/WiPDAAsia.2019.8760333","DOIUrl":"https://doi.org/10.1109/WiPDAAsia.2019.8760333","url":null,"abstract":"This paper is an introduction of heat resistant joint material only using base metals (Cu and Sn) mainly for power semiconductors’ assembly. By sophisticated control of Cu-Sn Intermetallic Compound (IMC) forming procedure, the joint region after sintering has IMC skeleton structure to provide robust and stable joint characteristics. The key components of the developed material are fine particles of Cu source and IMC source. The IMC source contains 8wt% Cu and 92wt% Sn. Remelting point of the joint material (preform-sheet and paste) can be above the sintering temperature. Even using Sn rich component (IMC source), the evaluation indicated no whisker in joint area after TCT 1,000cycles (−55~+175°C) and no allotropic transformation of Sn (between α-phase and β-phase). The joint test using IGBT, SiC and GaN, we confirmed the joint structure keeps its initial condition even after 1,000 cycles TCT without critical cracks/delamination/voids. The joint material is not only for power semiconductor die attach but also for MEMS device encapsulation.","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115750071","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Linearity of AlGaN/GaN HEMTs with Different Gate-to-Source Length 不同栅源长度AlGaN/GaN hemt的线性关系
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/WiPDAAsia.2019.8760307
Yi-nan Zhong, Y. Hsin
{"title":"Linearity of AlGaN/GaN HEMTs with Different Gate-to-Source Length","authors":"Yi-nan Zhong, Y. Hsin","doi":"10.1109/WiPDAAsia.2019.8760307","DOIUrl":"https://doi.org/10.1109/WiPDAAsia.2019.8760307","url":null,"abstract":"In this paper, the performance of AlGaN/GaN HEMTs with different gate-to-source length (L<inf>GS</inf>) and with a fixed distance of drain-to-source (L<inf>DS</inf>) is presented. The increase in L<inf>GS</inf> makes the source resistance (R<inf>S</inf>) increase. In general, the larger the resistance, the better the linearity and stability in the power amplifier, thereby these devices were used to study and compare the device characteristics. According to output 3<inf>rd</inf> order intercept (OIP3), there is no linear trend in the linearity with related to the L<inf>GS</inf> and R<inf>S</inf>. The optimal layout for the different geometry in this study is the device with gate width of 250 μm and L<inf>GS</inf> of 1.325 μm.","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131242902","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Energy Saving in Smart Grid 智能电网的节能
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/WiPDAAsia.2019.8760321
Yi-Kuan Ke, Chia-Ching Li, Yi-Han Liao
{"title":"Energy Saving in Smart Grid","authors":"Yi-Kuan Ke, Chia-Ching Li, Yi-Han Liao","doi":"10.1109/WiPDAAsia.2019.8760321","DOIUrl":"https://doi.org/10.1109/WiPDAAsia.2019.8760321","url":null,"abstract":"Power demand is increasing gradually and micro-grid dispatch is the important scheme to stable grid operation. It is not easy to build or extend unclear energy in Taiwan and there are the challenges about the pollution issues when making lots of thermal power generations, such as coal-fired power plants, will have carbon emission pollution problems. For increasing power generations, renewable power and hydroelectric power are increased to supply power to grid for dispatching due to concerning pollution reason and supply power shortage in peak time. In smart grid, energy saving is the key point about energy policy. Therefore, advanced metering infrastructure, smart meter, is the core competence to smart grid in energy saving and power dispatch. Smart meter solution with time of use rates, demand response, and aggregator with load shedding applications can help grid dispatch in power forecast precisely and avoid peak time power demand shortage. Energy saving definitely is the development target in the world trend about power system, so smart grid in energy saving analysis is this paper contribution to comprehend and enhance grid stability and reliability.","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"64 2","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114109536","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Research of PCB Parasitic Inductance in the GaN Transistor Power Loop GaN晶体管功率环中PCB寄生电感的研究
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/WiPDAAsia.2019.8760312
B. Sun, Zhe Zhang, M. Andersen
{"title":"Research of PCB Parasitic Inductance in the GaN Transistor Power Loop","authors":"B. Sun, Zhe Zhang, M. Andersen","doi":"10.1109/WiPDAAsia.2019.8760312","DOIUrl":"https://doi.org/10.1109/WiPDAAsia.2019.8760312","url":null,"abstract":"Gallium Nitride (GaN) transistor in the high power density converter application is widely researched nowadays. High frequency switching largely reduces the volume of passive components and also leads to challenges in the PCB layout. Parasitic inductance within the critical power loop should be minimized to fully harness the potential of GaN transistor fast switching capability. This paper provides a numerical method for the power loop inductance quantification. Experimental results on the synchronous buck converter are given to validate the estimation accuracy.","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116607091","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Study of Passivation Layer on Bevel Edge Termination for SiC RSD SiC RSD斜角端端钝化层的研究
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/WiPDAAsia.2019.8760331
Ziyue Wang, Lin Liang, Ludan Zhang
{"title":"Study of Passivation Layer on Bevel Edge Termination for SiC RSD","authors":"Ziyue Wang, Lin Liang, Ludan Zhang","doi":"10.1109/WiPDAAsia.2019.8760331","DOIUrl":"https://doi.org/10.1109/WiPDAAsia.2019.8760331","url":null,"abstract":"The passivation technology for the bevel edge termination of SiC RSD(reversely switched dynistor) is studied in this paper. The influence of SiO2 passivation layer on electrical characteristics of SiC RSD is analyzed. The relationship between interface charges and blocking voltage is simulated. The feasibility of depositing a passivation layer on the bevel is verified. Several processes are conducted in order to reduce the interface charges and the I-V measurement shows that thermal oxidation and SiO2 layer deposition by PECVD can reduce the leakage current while annealing in N2 atmosphere has no apparent effect.","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132683808","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
WiPDA Asia 2019 Keynotes WiPDA亚洲2019主题演讲
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/wipdaasia.2019.8760337
{"title":"WiPDA Asia 2019 Keynotes","authors":"","doi":"10.1109/wipdaasia.2019.8760337","DOIUrl":"https://doi.org/10.1109/wipdaasia.2019.8760337","url":null,"abstract":"","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130762537","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimizing performance of a pulsed laser diode driver based on a GaN FET 基于氮化镓场效应管的脉冲激光二极管驱动器的性能优化
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/WiPDAAsia.2019.8760309
J. Glaser
{"title":"Optimizing performance of a pulsed laser diode driver based on a GaN FET","authors":"J. Glaser","doi":"10.1109/WiPDAAsia.2019.8760309","DOIUrl":"https://doi.org/10.1109/WiPDAAsia.2019.8760309","url":null,"abstract":"Lidar optical time-of-flight distance measurement has become a primary method to make distance measurements of remote targets. Lidar applications such as 3-D continuous mapping for autonomous vehicles demand both accuracy, precision, and high measurement frame rates. The optical transmitter must be able to generate high power pulses of very short duration, typically accomplished by driving a laser diode with very short, high current pulses. It has been shown that gallium nitride (GaN) power transistors are the primary choice for this application due to the large improvements in switching speed over silicon MOSFETs. However, the pressure to improve performance further still remains. This paper shows how to optimize layout to improve laser driver performance. It is shown that simply by changing the layout, that large improvements can be made in peak current and pulse width, as well as improved gate voltage waveforms.","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"482 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123560119","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Development of a Novel Battery-Powered DC-AC System 新型电池供电直流-交流系统的研制
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/WiPDAAsia.2019.8760330
Ching-Ming Lai, J. Teh, Yuan-Chih Lin, C. Hsu
{"title":"Development of a Novel Battery-Powered DC-AC System","authors":"Ching-Ming Lai, J. Teh, Yuan-Chih Lin, C. Hsu","doi":"10.1109/WiPDAAsia.2019.8760330","DOIUrl":"https://doi.org/10.1109/WiPDAAsia.2019.8760330","url":null,"abstract":"We introduce a novel DC-AC system to interface the battery power to emerging load such as household appliances. Conventional methods, in which using non-isolated cascade DC-DC converters as a front-end of the DC-AC system can achieve high voltage gain but compromise efficiency, while the situation of employing isolated converters is just opposite. To combine the merits of these two type converters and overcome the disadvantages, a novel isolated push-pull LLC resonant DC-DC converter is developed. To cover the wide input voltage range in battery-powered systems, this converter, besides possessing all advantages of conventional LLC converters, the secondary-side resonant operation emerges as a higher efficiency can be achieved for the low battery capacity condition. Then the low side gate driving merit of the conventional push-pull converter endows simplification of circuit and ability of cost-effective. Therefore, the proposed front-end converter is very suitable for step-up conversion in DC-AC systems. Furthermore, a full-bridge sinusoidal pulse-width modulated (SPWM) inverter is also implemented as a back-end stage to produce the pure sinusoidal AC waveform with low total harmonic distortion (THD). The operation principle and analysis of the proposed system are presented and the validity and applicability are also verified by a power rating of 500W hardware prototype.","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"329 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122844456","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Oxide Breakdown Reliability of SiC MOSFET SiC MOSFET的氧化物击穿可靠性
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/WiPDAAsia.2019.8760324
C. Yen, H. Lee, C. Hung, C. Y. Lee, L. Lee, F. Hsu, K. Chu
{"title":"Oxide Breakdown Reliability of SiC MOSFET","authors":"C. Yen, H. Lee, C. Hung, C. Y. Lee, L. Lee, F. Hsu, K. Chu","doi":"10.1109/WiPDAAsia.2019.8760324","DOIUrl":"https://doi.org/10.1109/WiPDAAsia.2019.8760324","url":null,"abstract":"The gate oxide of SiC MOSFET has been confirmed to exhibit enough intrinsic lifetime at high temperatures. The real problem of gate oxide in SiC MOSFET is nevertheless the abundant extrinsic defects which may result in early failures and need to be addressed. A “Lucky Defect Model” was proposed to explain the early failures of gate oxide in SiC MOSFET, arguing that enhanced trap-assisted tunneling current led by the point defects grown into the gate oxide of SiC MOSFET, instead of the conventional contamination induced local-thinning theory, is the origin of observed extrinsic failures. However, in this paper, we will provide evidences showing that local-thinning, or more precisely, locally enhanced electric field, can still be an important contributor to the extrinsic failures and requires continuous improvement.","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"70 10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116425890","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 13
Study and Analysis of Robust Control Technology and Wide Bandgap Power Device-Based Power Converters 鲁棒控制技术及基于宽带隙功率器件的功率变换器的研究与分析
2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia) Pub Date : 2019-05-01 DOI: 10.1109/WiPDAAsia.2019.8760334
E. Chang, Chenxi Meng
{"title":"Study and Analysis of Robust Control Technology and Wide Bandgap Power Device-Based Power Converters","authors":"E. Chang, Chenxi Meng","doi":"10.1109/WiPDAAsia.2019.8760334","DOIUrl":"https://doi.org/10.1109/WiPDAAsia.2019.8760334","url":null,"abstract":"In this paper, a robust control technology is proposed, and applied to wide bandgap power device-based power converters. The proposed robust control technology combines the excellences of a fast finite-time sliding mode (FTTSM) and a fuzzy tuning. The FTTSM can enforce system trajectory to the equilibrium within a short time. Nevertheless, the chattering exists in sliding surface of the FTTSM. The chattering may damage converter components, and cause high voltage harmonics. To reduce the chattering, the sliding surface is smoothed by the use of the fuzzy tuning. With the presented robust control technology, a high performance wide bandgap power device-based power converter with low total harmonic distortion and fast transient response yields, even in the presence of nonlinear loading. The classic power converter experimental results and the proposed power converter simulated results are compared, verifying the efficacy of the proposed robust control technology.","PeriodicalId":302736,"journal":{"name":"2019 IEEE Workshop on Wide Bandgap Power Devices and Applications in Asia (WiPDA Asia)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128517602","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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