International Journal of New Practices in Management and Engineering最新文献_第2页

Data Mining in Product Cycle Prediction of Company Mergers 公司并购产品周期预测中的数据挖掘

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-24 DOI: 10.17762/ijnpme.v10i03.127

Syed Nisar Hussain Bukhari

{"title":"Data Mining in Product Cycle Prediction of Company Mergers","authors":"Syed Nisar Hussain Bukhari","doi":"10.17762/ijnpme.v10i03.127","DOIUrl":"https://doi.org/10.17762/ijnpme.v10i03.127","url":null,"abstract":"The dynamic nature of business marketing in various parts of the world and industries is associated with a quest to achieve or attain and retain competitive advantages. With such advantages coming in the form of increased product user bases, a majority of the firms have ended up embracing business internationalization to stretch beyond local and regional borders within which they are based. With these efforts associated with improved company performances, Wal-Mart has been unexceptional. The effort to retain a competitive advantage and superior brand image across the world has been evidenced by its recent merger with Massmart, a South African company that owns brands such as Builder’s Warehouse, Makro, and Game. It is also worth highlighting that Massmart is South Africa’s second largest distributor of consumer goods and remains the largest retailer dealing in basic foods, liquor and home improvement equipment, and general merchandise. This paper examines the merger between Wal-Mart and Massmart, focusing on issues such as the international market analysis of the retail industry, aspects of product category and demand size, and competition analysis. In so doing, resultant recommendations might give an insight into current trends in business marketing strategies that embrace mergers, as well as lay an opportunity for improvement in the Walmart-Massmart merger and others at the intra-industry and inter-industry level.","PeriodicalId":297822,"journal":{"name":"International Journal of New Practices in Management and Engineering","volume":"50 3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131288045","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Gamification and Its Application in Social Network Implementation 游戏化及其在社交网络实施中的应用

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-24 DOI: 10.17762/ijnpme.v10i02.130

Ibrahim Omara

{"title":"Gamification and Its Application in Social Network Implementation","authors":"Ibrahim Omara","doi":"10.17762/ijnpme.v10i02.130","DOIUrl":"https://doi.org/10.17762/ijnpme.v10i02.130","url":null,"abstract":"In this communication strategy, ideal audiences that are perceived to yield an effective influence of the stakeholders include national security or intelligence groups, as well as external firms that engage in regular monitoring of user information systems in collaboration with Visa’s internal group of experts. Indeed, the role of the national intelligence group(s) lies in addressing potential legal liabilities that could arise from any customer complaints relating to communication failures or lapses when malicious activities are detected. Similarly, the national intelligence group acts as a regulator to check trends in Visa Inc.’s conformity to standards shaping the state of communication about user information (in terms of frequency) and advising about some of the emerging technologies or platforms that ought to be incorporated to foster inclusivity and reach out to as many customer bases as possible. On the other hand, external firms responsible for regular monitoring of user information will play the role of examining some of the strengths of the communication strategies outlined and advising about possible improvements that could be made to avoid lapses regarding the duration and frequency of updates to the customers. It is also worth noting that the general public forms another audience group that the formulated strategy seeks to involve because this group plays a significant role of airing views about possible improvements that could be made to the company’s current communication goals. An ideal communication platform through which views from members of the public could be received and enacted accordingly is the social media, a trend that prompts Visa to have open forums from which these members could be allowed to channel their views about the merits and demerits accruing from the communication goals and their eventual implementation.","PeriodicalId":297822,"journal":{"name":"International Journal of New Practices in Management and Engineering","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125721358","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Photolithography methods for 3D microstructures and 3D stacking devices 3D微结构的光刻方法和3D堆叠装置

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-20 DOI: 10.17762/ijnpme.v11i1s.120

M. H. Ahmed

引用次数: 0

Lithography Techniques for Optical Nanometric Materials and Nanowires 光学纳米材料和纳米线的光刻技术

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-20 DOI: 10.17762/ijnpme.v11i1s.119

Digambar Jakkan

{"title":"Lithography Techniques for Optical Nanometric Materials and Nanowires","authors":"Digambar Jakkan","doi":"10.17762/ijnpme.v11i1s.119","DOIUrl":"https://doi.org/10.17762/ijnpme.v11i1s.119","url":null,"abstract":"Lithography is a basic advance to be taken in the creation procedure of coordinated circuits. There is an imperative job of nano and optical gadgets in the present and future applications. Subsequently, this work canter’s around cutting edge and improved lithography systems on those coordinated circuits. In NFO deposition, photograph separation can occur through non full conditions because of the inalienable properties of the optical nanometric field. Nano photolithography utilizing an Optical-Field Non resounding to electronic changeover method makes it conceivable to utilize different sources to store an assortment of nano metric materials. This impossible to miss photochemical response of an optical close to field can be applied to photochemical reaction. Nano manipulation is a significant innovation to create and amass nanostructures, particularly for the uneven structures. In the strategy, the organized plane of substrate was created by laser-intrusion lithography. Nano-wires were controlled on the organized surfaces through nano-opto grippers in material field. The technique utilizes an example to take care of the issue that a solitary nanowire is too little to even think about being gotten and controlled with nano grippers.","PeriodicalId":297822,"journal":{"name":"International Journal of New Practices in Management and Engineering","volume":"78 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124105287","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

GaN-based Semiconductor devices with Multichannel Structures 基于gan的多通道结构半导体器件

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-20 DOI: 10.17762/ijnpme.v11i1s.118

Snehal J. Koparde

{"title":"GaN-based Semiconductor devices with Multichannel Structures","authors":"Snehal J. Koparde","doi":"10.17762/ijnpme.v11i1s.118","DOIUrl":"https://doi.org/10.17762/ijnpme.v11i1s.118","url":null,"abstract":"Semiconductor junctions, for example, pn-intersection and Schottky intersection have been very significant as essential components for different semiconductor gadgets. The break-down voltage of the junction PN-intersection relies upon the polluting influence fixations in semiconductors. An opposite voltage is supported in the exhaustion layer thickness which is corresponding to the square of base voltage. The breakdown happens, when the electric field with an intersection arrives at the semiconductor regardless of whether the consumption layer can be extended substantially. To accomplish higher go down voltage, a wide band hole semiconductor, for example, silicon carbide has been examined. The electron gadgets utilizing silicon carbide may undergo serious issues. In any case, the breakdown system of the intersection utilizing silicon carbide is as yet equivalent to that of the conventional junctions. As of late, GaN utilized electron gadgets have developed as cutting-edge high force exchanging gadgets inferable from their high breakdown field. A few papers have revealed that GaN-based HFETs is directly expanded by expanding the junction dividing between the door and channel electrodes. This conduct is unique in relation to that of the customary junctions.","PeriodicalId":297822,"journal":{"name":"International Journal of New Practices in Management and Engineering","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125161688","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Review on Holographic Techniques for Photolithography 光刻全息技术综述

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-20 DOI: 10.17762/ijnpme.v11i1s.115

Dipannita Mondal

{"title":"Review on Holographic Techniques for Photolithography","authors":"Dipannita Mondal","doi":"10.17762/ijnpme.v11i1s.115","DOIUrl":"https://doi.org/10.17762/ijnpme.v11i1s.115","url":null,"abstract":"Holographic methods utilizing spatial modulators to supplant the covers in photolithographic process. PC produced 3D images got from two pictures with known measurements, reproducing a clear visible field Mask and dark prior mask. The reason for the proposal is to consider the potential outcomes of picture decrease, through a holographic based optical segment arrangement, produced by spatial modulators from a CGH (Computer-created Hologram). Comprehend the outcomes by decreasing the pictures and look at the outcomes acquired. Boundaries, for example, complexity, goal and least size of the pictures produced from the spatial modulators will be broke down so as to decide the conceivable outcomes of progress and the confinements of the procedure applied to photolithography. It is accepted that the uniform and dainty oppose film can be effectively kept on the filaments by utilizing the electro-shower covering innovation. Nonetheless, high electronic voltage and conductive surface are required with the goal that the current smaller scale structures are exposed to harm. The immediate splash covering is liberated from electronic and other harm to substrates yet it is influenced by numerous boundaries including the arrangement thickness and substrate temperature.","PeriodicalId":297822,"journal":{"name":"International Journal of New Practices in Management and Engineering","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131979726","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Role of Photolithographic Process in Semiconductor Manufacturing 光刻工艺在半导体制造中的作用

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-20 DOI: 10.17762/ijnpme.v11i1s.117

Avinash Pawar

{"title":"Role of Photolithographic Process in Semiconductor Manufacturing","authors":"Avinash Pawar","doi":"10.17762/ijnpme.v11i1s.117","DOIUrl":"https://doi.org/10.17762/ijnpme.v11i1s.117","url":null,"abstract":"Semiconductor Fabrication is a business of high capital speculation and quick evolving nature. To be serious, the creation in a fabrication should be viably arranged and planned beginning from the inclining up stage, with the goal that the business objectives, for example, on-time conveyance, high yield volume and viable utilization of capital concentrated hardware can be accomplished. Reproduction gives a successful tool to characterizing the way from serious ideas to true arrangements. More consideration is presently being centred on the precision of information gathered, implies for separating and bringing in information to the models, and staying up to date with changes in the fabrication. The directors and architects are these days properly worried about whether the model is a decent portrayal of the fabrication, and whether the outcomes are right. This is tended to through check and approval. The re-enactment group does approval by looking at the spreadsheet models and fabrication information, however formal systems have not been applied with the end goal of approval. The check and approval techniques are not officially recorded either. Additionally, the administration chose to explore different avenues regarding new programming called Lucent AP.","PeriodicalId":297822,"journal":{"name":"International Journal of New Practices in Management and Engineering","volume":"63 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122892098","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Advanced Process Control and Critical Dimension Control in Photolithography Process 光刻工艺中的先进工艺控制与关键尺寸控制

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-20 DOI: 10.17762/ijnpme.v11i1s.139

Hamza Saghrouchni

引用次数: 0

Glimpses of 3D Vector based Membrane Photolithography 基于三维矢量膜光刻技术的一瞥

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-20 DOI: 10.17762/ijnpme.v11i1s.116

S. Patil

{"title":"Glimpses of 3D Vector based Membrane Photolithography","authors":"S. Patil","doi":"10.17762/ijnpme.v11i1s.116","DOIUrl":"https://doi.org/10.17762/ijnpme.v11i1s.116","url":null,"abstract":"In optical lithography, decline in the profundity of centre has become an intense issue, alongside the trouble in improving goal. In memory chip creation, the advancement of stage move cover (PSM) innovation is promising to conquer these issues. Notwithstanding PSM innovation, some super-goal lithographic applications have likewise been proposed. In the later methodology, no PSMs are required, in this manner a portion of the challenges concerning cover innovation can be maintained a strategic distance from. Be that as it may, it isn't in every case simple to apply PSM or super-goal advancements to muddled cover designs, for example, for ASIC, chip rationale IC's. For fine occasional examples, a high spatial frequency upgrading channel is utilized with annular enlightenment. With sideways occurrence enlightenments, light shafts which are significantly diffracted by veil examples can go through the viewpoint student, in this way, the band-width of the spatial frequency transmission qualities of the focal point framework is expanded. The student channel smothers the transmission of direct bars concerning the diffracted pillars, improving the picture differentiates in the high frequency locale. Thorough re-enactments run rapidly on a workstation for complex 20 customary and stage moving covers, substrate bleaching, and optical metrology and arrangement issues.","PeriodicalId":297822,"journal":{"name":"International Journal of New Practices in Management and Engineering","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132410838","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

A Simulation Approach to Semiconductor Scheduling Problem in Micro-Lithographic Process 微光刻过程中半导体调度问题的仿真方法

International Journal of New Practices in Management and Engineering Pub Date : 2022-01-20 DOI: 10.17762/ijnpme.v11i1s.138

S. Shafique

引用次数: 0