A Simulation Approach to Semiconductor Scheduling Problem in Micro-Lithographic Process

Abstract

In this write up, a scheduling issue and FDC in photolithographic process of semiconductor manufacturing are thought of. By and large, the photolithographic progression is viewed as the most significant processes since it might influence the creation profitability because of its different mechanical traits. Truly, the photolithography hardware comprises of three fundamental parts which are intended to process various sorts of items as a machine for universally useful. Be that as it may, in current semiconductor creation system, a similar kind of item is processed so as to diminish formula change time brought about by changing veils in scanner module. Also, FDC can quickly distinguish strange circumstance of activity machine, in order to improve the yield rate. Along these lines, in this examination, the multi-item creation case with various plans is considered in micro-lithographic process in regards to scheduling issue, and a FDC system is built up that comprising of fluffy deduction system and decision tree to screen and break down warming bend of delicate prepare in micro-lithographic process.