Role of Photolithographic Process in Semiconductor Manufacturing

Avinash Pawar
{"title":"Role of Photolithographic Process in Semiconductor Manufacturing","authors":"Avinash Pawar","doi":"10.17762/ijnpme.v11i1s.117","DOIUrl":null,"url":null,"abstract":"Semiconductor Fabrication is a business of high capital speculation and quick evolving nature. To be serious, the creation in a fabrication should be viably arranged and planned beginning from the inclining up stage, with the goal that the business objectives, for example, on-time conveyance, high yield volume and viable utilization of capital concentrated hardware can be accomplished. Reproduction gives a successful tool to characterizing the way from serious ideas to true arrangements. More consideration is presently being centred on the precision of information gathered, implies for separating and bringing in information to the models, and staying up to date with changes in the fabrication. The directors and architects are these days properly worried about whether the model is a decent portrayal of the fabrication, and whether the outcomes are right. This is tended to through check and approval. The re-enactment group does approval by looking at the spreadsheet models and fabrication information, however formal systems have not been applied with the end goal of approval. The check and approval techniques are not officially recorded either. Additionally, the administration chose to explore different avenues regarding new programming called Lucent AP.","PeriodicalId":297822,"journal":{"name":"International Journal of New Practices in Management and Engineering","volume":"63 5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of New Practices in Management and Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.17762/ijnpme.v11i1s.117","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Semiconductor Fabrication is a business of high capital speculation and quick evolving nature. To be serious, the creation in a fabrication should be viably arranged and planned beginning from the inclining up stage, with the goal that the business objectives, for example, on-time conveyance, high yield volume and viable utilization of capital concentrated hardware can be accomplished. Reproduction gives a successful tool to characterizing the way from serious ideas to true arrangements. More consideration is presently being centred on the precision of information gathered, implies for separating and bringing in information to the models, and staying up to date with changes in the fabrication. The directors and architects are these days properly worried about whether the model is a decent portrayal of the fabrication, and whether the outcomes are right. This is tended to through check and approval. The re-enactment group does approval by looking at the spreadsheet models and fabrication information, however formal systems have not been applied with the end goal of approval. The check and approval techniques are not officially recorded either. Additionally, the administration chose to explore different avenues regarding new programming called Lucent AP.
光刻工艺在半导体制造中的作用
半导体制造是一个高资本投机和快速发展的行业。严肃地说,工厂的创造应该从倾斜上升阶段开始就进行可行的安排和计划,以实现商业目标,例如按时运输,高产量和可行地利用资本集中的硬件。复制提供了一个成功的工具来描述从严肃的想法到真正的安排的方式。目前更多的考虑集中在收集信息的准确性上,意味着将信息分离并引入模型,并与制造过程中的变化保持同步。这些天来,董事和建筑师们担心的是,这个模型是否恰当地描绘了建造过程,以及结果是否正确。这往往是通过检查和批准。re-enactment组通过查看电子表格模型和制作信息来进行批准,但是正式的系统并没有应用于最终的批准目标。审批技术也没有正式记录。此外,奥巴马政府还选择了探索名为朗讯AP的新项目的不同途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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