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Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)最新文献

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Oscillation Of The Current Sheet Velocity In Plasma Focus Discharges 等离子体聚焦放电中电流片速度的振荡
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588864
K. Melzacki, V. Nardi
{"title":"Oscillation Of The Current Sheet Velocity In Plasma Focus Discharges","authors":"K. Melzacki, V. Nardi","doi":"10.1109/PLASMA.1994.588864","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588864","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122837839","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An Evaluation Of an End Excited Electron Cyclotron Resonance Plasma Source 末端激发电子回旋共振等离子体源的评价
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588708
P. Mak, J. Asmussen
{"title":"An Evaluation Of an End Excited Electron Cyclotron Resonance Plasma Source","authors":"P. Mak, J. Asmussen","doi":"10.1109/PLASMA.1994.588708","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588708","url":null,"abstract":"In this paper, the experimental performance of several different multipolar ECR plasma source configuration will be compared using an argon gas input and measuring: 1) impressed electric field, 2) plasma source output species densities, 3) electron and ion energy distribution functions, input and pressure. Meanwhile, the evaluation of each reactor configuration will also investigate the output performance as the excitation is varied through several different electromagnetic modes. The evaluation is done by comparing output density uniformity, ion production power cost in eV/ion, microwave coupling efficiency and absorbed microwave power density in Watts/cm.","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"66 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114572617","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Frequency Independence Of Helicon Discharges 频率无关的螺旋放电
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588750
D. Blackwell, I.D. Sudit, M. E. Light, F.F. Chen
{"title":"Frequency Independence Of Helicon Discharges","authors":"D. Blackwell, I.D. Sudit, M. E. Light, F.F. Chen","doi":"10.1109/PLASMA.1994.588750","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588750","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128973993","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Azimuthal Anisotropy In The Distribution Of Fusion Products And Fast Ion Emission In Plasma Focus Discharges 聚变产物分布的方位各向异性和等离子体聚焦放电中的快离子发射
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588866
J.S. Brzosko, V. Nardi, D. Goldstein, J.R. Brzosko
{"title":"Azimuthal Anisotropy In The Distribution Of Fusion Products And Fast Ion Emission In Plasma Focus Discharges","authors":"J.S. Brzosko, V. Nardi, D. Goldstein, J.R. Brzosko","doi":"10.1109/PLASMA.1994.588866","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588866","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"101 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129315710","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis And Simulation Of Vircators With Step Circular Waveguides 阶跃圆波导矢量分析与仿真
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.589072
Y. Hu, Y. Lan
{"title":"Analysis And Simulation Of Vircators With Step Circular Waveguides","authors":"Y. Hu, Y. Lan","doi":"10.1109/PLASMA.1994.589072","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.589072","url":null,"abstract":"It has been previously shown that higher-power microwaves can be generated from vircators with an abrupt discontinuity in circular waveguides. In this paper the authors investigate the effects of the distance of the waveguide step from the anode on the microwave output and the dominant microwave frequency via the two-dimensional, relativistic, electromagnetic, particle-in-cell code. The parameters of the vircator in this simulation study are: a negative constant voltage of 270 kV applied to the cathode, a constant injection current of 7.3 kA at the cathode surface, 0.46 cm for the cathode to anode distance, 1.3 cm cathode radius, 12.5 cm for the drift tube length, and the radii of the front and the rear section of the drift tube are 4 and 5 cm, respectively. Simulation results show that the dominant microwave frequencies are concentrated in two bands centered roughly at 8.24 and 11 GHz. As the distance of the waveguide step from the anode increases from 0 to 7 cm, the dominant microwave frequency hops between lower- and higher-frequency bands. Among each band, the frequency gradually decreases with increasing distance of the waveguide step. They have demonstrated qualitatively, through time-domain analysis of open cavities containing no sources, the dependencemore » of the dominant microwave frequency on the distance of the waveguide step. The output powers observed in the simulation are greatly enhanced at the waveguide steps of, roughly, 0.8, 1.7, 3.7--4.3, and 7.0 cm from the anode with respective dominant-mode excitation of TM{sub 01}, TM{sub 02}, TM{sub 03}, and TM{sub 04}.« less","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129035254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Cryogenic High Current Discharges 低温大电流放电
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588917
B.E. Meirovich
{"title":"Cryogenic High Current Discharges","authors":"B.E. Meirovich","doi":"10.1109/PLASMA.1994.588917","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588917","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124235754","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Measurement Of Electromagnetic Wave Structure In Novel Geometry Heiicon Source. 新型几何震源中电磁波结构的测量。
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588884
R. Jewett, H. Anderson
{"title":"Measurement Of Electromagnetic Wave Structure In Novel Geometry Heiicon Source.","authors":"R. Jewett, H. Anderson","doi":"10.1109/PLASMA.1994.588884","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588884","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123662897","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Study Of The Plasma Centrifuge As A Compact, Low Cost, Stable Isotope Separator 等离子体离心机作为一种紧凑、低成本、稳定同位素分离器的研究
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588758
N. Qi, P. Greene, R. Prasad, M. Krishnan
{"title":"Study Of The Plasma Centrifuge As A Compact, Low Cost, Stable Isotope Separator","authors":"N. Qi, P. Greene, R. Prasad, M. Krishnan","doi":"10.1109/PLASMA.1994.588758","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588758","url":null,"abstract":"A plasma-CVD reactor with parallel plate electrodes has been used to produce TLN coatings on three-dimensional substrates of simple geometry, using a mixture of Ha. N2 and Tic14 as reactive gases. The chemical and mechanical properties of the coatings have been determined as a function of selected parameters of the deposition process. The general characteristics of the plasma reactor and the obtained results are discussed. Krypton-fluoride laser ablation experiments have been performed on A I 2 0 3 (alumina) to investigate","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121195428","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effects Of Selected Process Parameters The Properties Of TiN Coatings Produced Plasma-CVD 工艺参数对等离子体cvd TiN涂层性能的影响
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588760
C. Lasorsa, M. Shimozuma, A. Rodrigo
{"title":"Effects Of Selected Process Parameters The Properties Of TiN Coatings Produced Plasma-CVD","authors":"C. Lasorsa, M. Shimozuma, A. Rodrigo","doi":"10.1109/PLASMA.1994.588760","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588760","url":null,"abstract":"A plasma-CVD reactor with parallel plate electrodes has been used to produce TLN coatings on three-dimensional substrates of simple geometry, using a mixture of Ha. N2 and Tic14 as reactive gases. The chemical and mechanical properties of the coatings have been determined as a function of selected parameters of the deposition process. The general characteristics of the plasma reactor and the obtained results are discussed. Krypton-fluoride laser ablation experiments have been performed on A I 2 0 3 (alumina) to investigate","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"153 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121396689","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effects Of A Transverse-magnetic Field On A Laser-ablation-assisted-plasma Discharge Ion Source 横向磁场对激光烧蚀辅助等离子体放电离子源的影响
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.589010
J. Lash, R. Gilgenbach, C. H. Ching
{"title":"Effects Of A Transverse-magnetic Field On A Laser-ablation-assisted-plasma Discharge Ion Source","authors":"J. Lash, R. Gilgenbach, C. H. Ching","doi":"10.1109/PLASMA.1994.589010","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.589010","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"146 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116504633","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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