Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)最新文献

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Producing High Energy Photons Using Titanium Prs Loads 利用钛镨负载产生高能光子
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588963
J. Thornhill, K. Whitney
{"title":"Producing High Energy Photons Using Titanium Prs Loads","authors":"J. Thornhill, K. Whitney","doi":"10.1109/PLASMA.1994.588963","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588963","url":null,"abstract":"Because of the large amount of kinetic energy and mass needed for efficient production of K-shell emission from a high Z plasma, it is reasonable to assume that high Z experiments will take place at relatively low {eta} values, where {eta} is the ratio of the kinetic-energy-per-ion to the minimum amount of energy E{sub min} needed to ionize an atom to the K-shell in a thermal plasma. The earlier work made predictions for producing K-shell emission based on 1-D, radiative, magnetohydrodynamic, {eta} > 3, calculations. This has led them to perform similar 1-D calculations at {eta} values 4 keV photon yield obtained by recombination from high {eta} argon load implosions to that generated by K-shell emission from low {eta} titanium implosions.more » Again, these calculations are for an ACE IV class machine.« less","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133606367","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Evolution Of Circular Shear Layers 圆形剪切层的演化
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588698
J. Lynov, K. Bergeron, E. Coutsias, A. H. Nielsen
{"title":"Evolution Of Circular Shear Layers","authors":"J. Lynov, K. Bergeron, E. Coutsias, A. H. Nielsen","doi":"10.1109/PLASMA.1994.588698","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588698","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133625382","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Influence Of L-shell Dynamics On K-shell X-rays From A Krypton Gas Puff Z-pinch Plasma l壳层动力学对氪气泡缩z等离子体k壳层x射线的影响
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588965
J. Davis, J. Guiliani, M. Mulbrandon
{"title":"Influence Of L-shell Dynamics On K-shell X-rays From A Krypton Gas Puff Z-pinch Plasma","authors":"J. Davis, J. Guiliani, M. Mulbrandon","doi":"10.1109/PLASMA.1994.588965","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588965","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116656988","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Chemical Etching Of SiO/sub 2/ By CF/sub 4/ At Low Pressure- Does It Really Depend On The Plasma Chemistry? CF/sub / 4在低压下对SiO/sub / 2的化学蚀刻——它真的取决于等离子体化学吗?
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588793
N. Hershkowitz, J. Ding, J. Jenq
{"title":"Chemical Etching Of SiO/sub 2/ By CF/sub 4/ At Low Pressure- Does It Really Depend On The Plasma Chemistry?","authors":"N. Hershkowitz, J. Ding, J. Jenq","doi":"10.1109/PLASMA.1994.588793","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588793","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"74 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131068763","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Pulsedhollow Cathode Capillarydischarge 脉冲空心阴极毛细管放电
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588925
P. Choil, M. Favre, C. Dmnitrescu-Zoita
{"title":"Pulsedhollow Cathode Capillarydischarge","authors":"P. Choil, M. Favre, C. Dmnitrescu-Zoita","doi":"10.1109/PLASMA.1994.588925","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588925","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"123 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133714756","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Simulations Of Fast Magnetic Field Penetration Into A Plasma 快速磁场穿透等离子体的模拟
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.589002
W. Peter, A. Fruchtman, J. Gearyb, J. Grossman
{"title":"Simulations Of Fast Magnetic Field Penetration Into A Plasma","authors":"W. Peter, A. Fruchtman, J. Gearyb, J. Grossman","doi":"10.1109/PLASMA.1994.589002","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.589002","url":null,"abstract":"Fast magnetic field penetration into plasmas has been hypothesized as a possible explanation for the operation of plasma opening switches. The authors have begun an in-depth numerical study of the behavior of plasma opening switches (POS),a nd relevant experimental results. Simulations using the 2-1/2 dimensional PIC codes OOPIC, MAGIC, and ISIS are compared with theory. Because of the difficulty in applying and comparing PIC simulations to actual POS experiments, the numerical work is at present concerned with validating the more modest scenarios predicted by theory, e.g., the penetration skin depth of the magnetic field. The state-of-the-art graphical user interface of OOPIC is especially convenient for observing the field penetration as a real-time movie. A review of previous experiments (NRL, Weizmann, etc.) will be examined to indicate if the phenomenon of fast magnetic field penetration into plasmas can account for some experimental observations. Experimental scenarios, e.g., the direction of the density gradients, values of the plasma collision frequency, electron orbits, etc. in a typical POS are discussed.","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"445 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133929019","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Electrical Boundary Layer And Current Transfer Between A Thermal Plasma And A Plane Electrode 热等离子体与平面电极之间的电边界层与电流传递
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.589052
E. Meeks, M. Cappelli
{"title":"The Electrical Boundary Layer And Current Transfer Between A Thermal Plasma And A Plane Electrode","authors":"E. Meeks, M. Cappelli","doi":"10.1109/PLASMA.1994.589052","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.589052","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123912857","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Two Dimensional Time Dependent Modeling Of Optically Switched GaAs 光开关砷化镓的二维时间相关建模
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.589053
P. Stout, M. Kushner
{"title":"Two Dimensional Time Dependent Modeling Of Optically Switched GaAs","authors":"P. Stout, M. Kushner","doi":"10.1109/PLASMA.1994.589053","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.589053","url":null,"abstract":"The advantages of high power photoconductive semiconductor switches (PCSS) such as high hold-off voltage and fast rise times have motivated significant development efforts. However, observations of lock-on, non-uniformities in the electric field, and filamentation of current flow across the device when switching at high fields have raised concerns about the scaling of PCSS to higher currents. To investigate these issues, a two dimensional time dependent computer model of GaAs PCSS has been developed with the motivation of understanding filament formation. The model solves the continuity equations for electrons and holes, conservation equations for trapping sites, the energy equation for the lattice. Poisson`s equation, and a circuit equation. Physical effects in the model include band-to-band impact ionization, trap impact ionization, photoionization, and negative differential resistance. The physical devices investigated with the model are based on the Bulk Optical Semiconductor Switch (BOSS) developed by Schoenbach. In this talk a description of the model will be presented followed by consequences of switch geometries, gain mechanisms, and non-uniform injection and illumination on the operation of the device.","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128930248","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Three Dimensional Simulations Of The Lanl Large Orbit Gyrotron Using Isis On The Connection Machine 利用Isis在连接机上对Lanl大轨道回旋管进行三维仿真
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.589076
R. Kares, V. Thomas, M.E. Jones
{"title":"Three Dimensional Simulations Of The Lanl Large Orbit Gyrotron Using Isis On The Connection Machine","authors":"R. Kares, V. Thomas, M.E. Jones","doi":"10.1109/PLASMA.1994.589076","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.589076","url":null,"abstract":"The fully three dimensional electromagnetic curvilinear PIC code ISIS is used on the CM5 supercomputer to simulate the operation of the Large Orbit Gyrotron (LOG) high power microwave source which is current under development at Los Alamos. This source consists of a vane resonator magnetron-type geometry with a rotating annular electron beam in a cusp magnetic field and represents a formidable intrinsically three dimensional computational problem. Animations of beam dynamics and microwave generation in the device will be presented. Comparison with results from the LANL LOG experiment will also be discussed.","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128413507","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation 等离子体源离子注入在玻璃和硅中形成埋藏陶瓷层
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588985
J. Booske, L. Zhan, R. Cooper, J. Shohet, K. Shenai, D. Dallman, M.J. Goeckner, R. Breun, W. Hitchon, E. Wickesberg, R. Speth, J. Jacobs, G. Was
{"title":"Buried Ceramic Layer Formation In Glass And Silicon Using Plasma Source Ion Implantation","authors":"J. Booske, L. Zhan, R. Cooper, J. Shohet, K. Shenai, D. Dallman, M.J. Goeckner, R. Breun, W. Hitchon, E. Wickesberg, R. Speth, J. Jacobs, G. Was","doi":"10.1109/PLASMA.1994.588985","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588985","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116011070","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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