等离子体离心机作为一种紧凑、低成本、稳定同位素分离器的研究

Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS) Pub Date : 1994-06-06 DOI:10.1109/PLASMA.1994.588758

N. Qi, P. Greene, R. Prasad, M. Krishnan

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引用次数: 0

摘要

采用平行板电极的等离子体- cvd反应器在简单几何形状的三维基底上使用Ha混合物制备TLN涂层。N2和Tic14作为反应气体。涂层的化学和机械性能被确定为沉积过程中选定参数的函数。讨论了等离子体反应器的一般特性和实验结果。采用氟化氪激光烧蚀法对氧化铝进行了实验研究

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Study Of The Plasma Centrifuge As A Compact, Low Cost, Stable Isotope Separator

A plasma-CVD reactor with parallel plate electrodes has been used to produce TLN coatings on three-dimensional substrates of simple geometry, using a mixture of Ha. N2 and Tic14 as reactive gases. The chemical and mechanical properties of the coatings have been determined as a function of selected parameters of the deposition process. The general characteristics of the plasma reactor and the obtained results are discussed. Krypton-fluoride laser ablation experiments have been performed on A I 2 0 3 (alumina) to investigate

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Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)

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