Effects Of Selected Process Parameters The Properties Of TiN Coatings Produced Plasma-CVD

Abstract

A plasma-CVD reactor with parallel plate electrodes has been used to produce TLN coatings on three-dimensional substrates of simple geometry, using a mixture of Ha. N2 and Tic14 as reactive gases. The chemical and mechanical properties of the coatings have been determined as a function of selected parameters of the deposition process. The general characteristics of the plasma reactor and the obtained results are discussed. Krypton-fluoride laser ablation experiments have been performed on A I 2 0 3 (alumina) to investigate