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Ion Beam Modification of Materials最新文献

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Characterization of a Hafnium and Nitrogen Implanted Titanium Alloy 铪氮注入钛合金的表征
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50204-5
D. Rück, H. Schmidt, N. Angert, O. Yoda, Y. Aoki, H. Naramoto
{"title":"Characterization of a Hafnium and Nitrogen Implanted Titanium Alloy","authors":"D. Rück, H. Schmidt, N. Angert, O. Yoda, Y. Aoki, H. Naramoto","doi":"10.1016/B978-0-444-82334-2.50204-5","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50204-5","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"629 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133152535","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
A study of ion implantation induced variation of crystalline phase of boron nitride 离子注入诱导氮化硼晶相变化的研究
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50219-7
M. Kumagai, M. Ohkubo, K. Ogata, K. Higeta, Y. Shimoitani, Y. Shimizu, M. Satou, Y. Setsuhara, S. Miyake
{"title":"A study of ion implantation induced variation of crystalline phase of boron nitride","authors":"M. Kumagai, M. Ohkubo, K. Ogata, K. Higeta, Y. Shimoitani, Y. Shimizu, M. Satou, Y. Setsuhara, S. Miyake","doi":"10.1016/B978-0-444-82334-2.50219-7","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50219-7","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"334 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114809157","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Investigation of thermodesorption processes of H 2 , CO and CO 2 from stainless steels modified by implantation of hydrogen and oxygen ions 氢氧离子注入改性不锈钢中h2、CO和co2的热解吸过程研究
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50150-7
T. Radjabov, R. Mukhamadiev, A. Sharudo
{"title":"Investigation of thermodesorption processes of H 2 , CO and CO 2 from stainless steels modified by implantation of hydrogen and oxygen ions","authors":"T. Radjabov, R. Mukhamadiev, A. Sharudo","doi":"10.1016/B978-0-444-82334-2.50150-7","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50150-7","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115048322","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Radiation effects of 20-100 keV deuterium ions in silicon 20-100 keV氘离子在硅中的辐射效应
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50162-3
Y. Tagishi, T. Katabuchi, H. Kishita, K. Mizukoshi, Y. Mukouhara, N. Yamada
{"title":"Radiation effects of 20-100 keV deuterium ions in silicon","authors":"Y. Tagishi, T. Katabuchi, H. Kishita, K. Mizukoshi, Y. Mukouhara, N. Yamada","doi":"10.1016/B978-0-444-82334-2.50162-3","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50162-3","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131846451","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Wear-resistance improvement of steel surface by Ti+C ion implantation Ti+C离子注入提高钢表面耐磨性
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50203-3
Ichiko Osami, Kazunori Hayashi, J. Sasaki, K. Sugiyama, Y. Hashiguchi
{"title":"Wear-resistance improvement of steel surface by Ti+C ion implantation","authors":"Ichiko Osami, Kazunori Hayashi, J. Sasaki, K. Sugiyama, Y. Hashiguchi","doi":"10.1016/B978-0-444-82334-2.50203-3","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50203-3","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134403952","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Crystal defects production in silicon by molecular beam implantation 分子束注入在硅中产生晶体缺陷
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50159-3
E. Kótai, N. Q. Khánh, J. Gyulai
{"title":"Crystal defects production in silicon by molecular beam implantation","authors":"E. Kótai, N. Q. Khánh, J. Gyulai","doi":"10.1016/B978-0-444-82334-2.50159-3","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50159-3","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134455718","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Optical and structural properties of β-FeSi 2 layers on Si fabricated by triple 56 Fe ion implantations 三次56 Fe离子注入制备硅表面β-FeSi 2层的光学和结构性质
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50187-8
H. Katsumata, Honglie Shen, N. Kobayashi, Y. Makita, M. Hasegawa, H. Shibata, S. Kimura, A. Obara, S. Uekusa
{"title":"Optical and structural properties of β-FeSi 2 layers on Si fabricated by triple 56 Fe ion implantations","authors":"H. Katsumata, Honglie Shen, N. Kobayashi, Y. Makita, M. Hasegawa, H. Shibata, S. Kimura, A. Obara, S. Uekusa","doi":"10.1016/B978-0-444-82334-2.50187-8","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50187-8","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133301762","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Characterization of ion irradiated a-carbon films 离子辐照a-碳薄膜的表征
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50200-8
N. Matsunami, H. Hosono, M. Tazawa
{"title":"Characterization of ion irradiated a-carbon films","authors":"N. Matsunami, H. Hosono, M. Tazawa","doi":"10.1016/B978-0-444-82334-2.50200-8","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50200-8","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124696697","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Ion Beam Induced Epitaxial Crystallization of SiC: Fluence -and Temperature Dependence 离子束诱导SiC外延结晶:通量和温度依赖性
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50180-5
R. Kögler, V. Heera, W. Skorupa, M. Voelskow
{"title":"Ion Beam Induced Epitaxial Crystallization of SiC: Fluence -and Temperature Dependence","authors":"R. Kögler, V. Heera, W. Skorupa, M. Voelskow","doi":"10.1016/B978-0-444-82334-2.50180-5","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50180-5","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"78 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126309403","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Computer simulation of deformed scanning wave effect on dose distribution in ion implantation 离子注入中变形扫描波对剂量分布影响的计算机模拟
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50229-X
Y. Sone, M. Satoh, Yasuhiro Yamamoto
{"title":"Computer simulation of deformed scanning wave effect on dose distribution in ion implantation","authors":"Y. Sone, M. Satoh, Yasuhiro Yamamoto","doi":"10.1016/B978-0-444-82334-2.50229-X","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50229-X","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"56 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123396164","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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