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Ion Beam Modification of Materials最新文献

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The influence of non-stoichiometry on dopant electrical activation and depth distribution in InP implanted with Group IV or VI elements 非化学计量对IV或VI族元素注入InP中掺杂物电激活和深度分布的影响
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50176-3
C. Johnson, P. Kringhøj, M. Ridgway
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引用次数: 0
A comparative study on ion-beam induced effects in spinel structure types 离子束诱导尖晶石结构类型效应的比较研究
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50217-3
Luming Wang, W. Gong, N. Bordes, R. Ewing
{"title":"A comparative study on ion-beam induced effects in spinel structure types","authors":"Luming Wang, W. Gong, N. Bordes, R. Ewing","doi":"10.1016/B978-0-444-82334-2.50217-3","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50217-3","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127647101","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Structural and Compositional Properties of Ternary Iron-Cobalt Silicides Fabricated by Ion Beam Synthesis 离子束合成三元铁钴硅化物的结构和组成性质
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50186-6
M. Harry, M. S. Finney, G. Curello, K. Reeson, Z. Yang, R. Gwilliam, B. Sealy
{"title":"Structural and Compositional Properties of Ternary Iron-Cobalt Silicides Fabricated by Ion Beam Synthesis","authors":"M. Harry, M. S. Finney, G. Curello, K. Reeson, Z. Yang, R. Gwilliam, B. Sealy","doi":"10.1016/B978-0-444-82334-2.50186-6","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50186-6","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124060122","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Defect levels in H+- bombarded gallium arsenide 氢离子轰击砷化镓的缺陷水平
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50166-0
T. Schmidt, L. Palmetshofer
{"title":"Defect levels in H+- bombarded gallium arsenide","authors":"T. Schmidt, L. Palmetshofer","doi":"10.1016/B978-0-444-82334-2.50166-0","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50166-0","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124506584","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A NEW SILICIDATION TECHNIQUE BY METAL VAPOR VACUUM ARC ION IMPLANTATION 金属蒸汽真空电弧离子注入硅化新技术
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50223-9
Dan Zhu, Y. G. Chen, B. Liu
{"title":"A NEW SILICIDATION TECHNIQUE BY METAL VAPOR VACUUM ARC ION IMPLANTATION","authors":"Dan Zhu, Y. G. Chen, B. Liu","doi":"10.1016/B978-0-444-82334-2.50223-9","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50223-9","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124886589","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Study of Structure Damage and Oxidation Processes in Polymers, Induced by Ion Implantation* 离子注入诱导聚合物结构损伤和氧化过程的研究*
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50213-6
Wang Yugang, Zhao Weijiang, Y. Sha, Cheng Shaolin, Jin Changwen
{"title":"Study of Structure Damage and Oxidation Processes in Polymers, Induced by Ion Implantation*","authors":"Wang Yugang, Zhao Weijiang, Y. Sha, Cheng Shaolin, Jin Changwen","doi":"10.1016/B978-0-444-82334-2.50213-6","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50213-6","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"60 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127121350","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Energy dependence on crystalline growth of aluminum nitride films prepared by ion beam and vapor deposition method 离子束气相沉积法制备氮化铝薄膜晶体生长的能量依赖性
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50147-7
K. Ogata, S. Nishiyama, A. Ebe, Y. Andoh, F. Fujimoto
{"title":"Energy dependence on crystalline growth of aluminum nitride films prepared by ion beam and vapor deposition method","authors":"K. Ogata, S. Nishiyama, A. Ebe, Y. Andoh, F. Fujimoto","doi":"10.1016/B978-0-444-82334-2.50147-7","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50147-7","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"46 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127190826","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Shallow acceptor behavior of calcium in GaAs 钙在砷化镓中的浅受体行为
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50171-4
Honglie Shen, Y. Makita, A. Yamada, S. Kimura, A. Obara, N. Kobayashi, C. L. Lin, S. Zou
{"title":"Shallow acceptor behavior of calcium in GaAs","authors":"Honglie Shen, Y. Makita, A. Yamada, S. Kimura, A. Obara, N. Kobayashi, C. L. Lin, S. Zou","doi":"10.1016/B978-0-444-82334-2.50171-4","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50171-4","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126561277","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Ion Beam Mixing of Isotopic Nickel Bilayers 同位素镍双层的离子束混合
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50134-9
C. Fell, B. King, M. Petravić, L. Wielunski
{"title":"Ion Beam Mixing of Isotopic Nickel Bilayers","authors":"C. Fell, B. King, M. Petravić, L. Wielunski","doi":"10.1016/B978-0-444-82334-2.50134-9","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50134-9","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"558 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115826046","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The influence of implantation-induced non-stoichiometry on the solid-phase epitaxial growth of amorphized GaAs 植入诱导非化学计量对非晶化砷化镓固相外延生长的影响
Ion Beam Modification of Materials Pub Date : 1900-01-01 DOI: 10.1016/B978-0-444-82334-2.50167-2
K. Belay, D. Llewellyn, M. Ridgway
{"title":"The influence of implantation-induced non-stoichiometry on the solid-phase epitaxial growth of amorphized GaAs","authors":"K. Belay, D. Llewellyn, M. Ridgway","doi":"10.1016/B978-0-444-82334-2.50167-2","DOIUrl":"https://doi.org/10.1016/B978-0-444-82334-2.50167-2","url":null,"abstract":"","PeriodicalId":251043,"journal":{"name":"Ion Beam Modification of Materials","volume":"43 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114306734","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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