The Open Materials Science Journal最新文献

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Constitutive Modelling for Anisotropic Damage in Woven E-Glass Reinforcements 编织e -玻璃增强材料各向异性损伤的本构模型研究
The Open Materials Science Journal Pub Date : 2017-04-28 DOI: 10.2174/1874088X01711010009
Ping Yang, Y. Tong
{"title":"Constitutive Modelling for Anisotropic Damage in Woven E-Glass Reinforcements","authors":"Ping Yang, Y. Tong","doi":"10.2174/1874088X01711010009","DOIUrl":"https://doi.org/10.2174/1874088X01711010009","url":null,"abstract":"Abstract: It is easy for composite laminates to be damaged by relative lower velocity impact which could give rise to internal delamination that will strongly weaken the compressive strength of laminates. In order to predict the occurrence of matrix failure, the elastic-brittle behaviors of fiber-reinforced composites were modeled constitutively by an anisotropic damage model. The dynamic tensile testing was performed at a constant velocity of 2 mm/min until the sample broke to achieve the mechanical parameters of Eglass reinforcements. The elastic constitutive equation and the constitutive damage model were obtained on basis of the fundamental theory of mechanics about the orthotropic constitutive of reinforcements. The methodology for this constitutive model which is developed by Hashin considered both the effect of fiber and matrix failure. Then, the developed constitutive equations were incorporated into the FE (finite element) codes, ABAQUS, through the user subroutine module to simulate the process of projectile impacting GFRP composite laminates. The results show that the material deformation reaches a maximum at 24 μs, then occurs rebound with the increase of the time. The stress of reinforcements traverse section linearly increases outward from 0 MPa to 509.8 MPa. Material damage area increases with the prolonging of time, and for a fixed time, material damage gradually increases from the edges to the center and reaches a constant value of 1, which means the rupture of the damage process.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"18 1","pages":"9-21"},"PeriodicalIF":0.0,"publicationDate":"2017-04-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81415126","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Microwave-Assisted Synthesis of Pd Nanoparticles and Catalysis Application for Suzuki Coupling Reactions 微波辅助合成纳米钯及其在铃木偶联反应中的催化应用
The Open Materials Science Journal Pub Date : 2017-02-28 DOI: 10.2174/1874088X01711010001
Jian Zhang, X. Bai
{"title":"Microwave-Assisted Synthesis of Pd Nanoparticles and Catalysis Application for Suzuki Coupling Reactions","authors":"Jian Zhang, X. Bai","doi":"10.2174/1874088X01711010001","DOIUrl":"https://doi.org/10.2174/1874088X01711010001","url":null,"abstract":"A facile and efficient method was developed for the synthesis of highly active palladium nanoparticles (PdNPs) by microwave-assisted chemical reduction. The PdNPs with different morphology were prepared with or without KBr (capping agent) using ethylene glycol (EG) and citric acid (CA) as reducing agent in the presence of polyvinylpyrrolidone (PVP), respectively. The as-prepared PdNPs were characterized by (UV-Visible Spectrophotometer) UV-Vis, transmission electron microscopy (TEM) and Xray diffraction (XRD) analysis. The results showed that the PdNPs reduced by EG without KBr (PdNPs-EG) has smaller particle size than other PdNPs. The remarkable catalytic activity of the PdNPs catalysts are obtained using a low amount of PdNPs (0.1 mmol‰) using K2CO3 as base and EtOH/H2O as solvent toward Suzuki coupling reactions of aryl bromides and phenylboronic acid for 15 min.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"257 1","pages":"1-8"},"PeriodicalIF":0.0,"publicationDate":"2017-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75764992","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Book Review on Future Trends for TOP Materials TOP材料未来趋势书评
The Open Materials Science Journal Pub Date : 2016-10-31 DOI: 10.2174/1874088X01610010101
N. Allen
{"title":"Book Review on Future Trends for TOP Materials","authors":"N. Allen","doi":"10.2174/1874088X01610010101","DOIUrl":"https://doi.org/10.2174/1874088X01610010101","url":null,"abstract":"We investigate the longitudinal and transverse polarized cross-sections of the leptoproduction of the ρ meson in the high energy limit. Our model is based on the computation of the impact factor γ (λγ )→ ρ(λρ ) using the twist expansion in the forward limit which is expressed in the impact parameter space. This treatment involves in the final stage the twist 2 and twist 3 distribution amplitudes (DAs) of the ρ meson and the dipole scattering amplitude. Taking models that exist for the DAs and for the dipole cross-section. We get a phenomenological model for the helicity amplitudes. We compare our predictions with HERA data and get a fairly good description for large enough virtualities of the photon. PACS number(s): 13.60.Le, 12.39.St, 12.38.Bx.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"23 1","pages":"101-101"},"PeriodicalIF":0.0,"publicationDate":"2016-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80963843","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Oxide Spallation during Post-Isothermal High Temperature Oxidation Cooling of Cr-rich Cast Alloys highly alloyed with Hf 高含Hf富cr铸造合金等温后高温氧化冷却过程中的氧化物剥落
The Open Materials Science Journal Pub Date : 2016-09-30 DOI: 10.2174/1874088X01610010089
E. Conrath, P. Berthod
{"title":"Oxide Spallation during Post-Isothermal High Temperature Oxidation Cooling of Cr-rich Cast Alloys highly alloyed with Hf","authors":"E. Conrath, P. Berthod","doi":"10.2174/1874088X01610010089","DOIUrl":"https://doi.org/10.2174/1874088X01610010089","url":null,"abstract":"Cobalt, nickel and iron-based alloys containing 25wt.%Cr and strengthened either by chromium carbides or by HfC were oxidized at 1000, 1100 and 1200°C to obtain external oxide scales. The spallation of these oxides during the post-oxidation cooling was studied by exploiting the cooling part of the thermogravimetry curves. The best resistant alloys against scale spallation were the iron-based alloys which did not lose oxide. The nickel-based alloys well behaved too. The worst alloys were the cobalt alloys, principally due to the complex composition of the oxide scales. Beside the base element, the thickness of the oxide was also identified as a major parameter. The presence of Hf with contents much higher than usual was also beneficial for the resistance against spallation.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"22 1","pages":"89-100"},"PeriodicalIF":0.0,"publicationDate":"2016-09-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83188418","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Characteristic Analysis and Applications of Electromagnetic Shielding Materials for Wireless Communications Device 无线通信设备电磁屏蔽材料的特性分析及应用
The Open Materials Science Journal Pub Date : 2016-07-15 DOI: 10.2174/1874088X01610010044
Han-Nien Lin, Yafeng Chen, Hung-Yun Tsai, Min-Shan Lin
{"title":"Characteristic Analysis and Applications of Electromagnetic Shielding Materials for Wireless Communications Device","authors":"Han-Nien Lin, Yafeng Chen, Hung-Yun Tsai, Min-Shan Lin","doi":"10.2174/1874088X01610010044","DOIUrl":"https://doi.org/10.2174/1874088X01610010044","url":null,"abstract":"Abstract: As the trend of consumer electronics and mobile communications devices is obviously developing toward to miniature and high-speed processing, the problem involving with electromagnetic compatibility (EMC) or radio frequency interference (RFI) is becoming more critical for the system integration of high-speed digital and RF mixed signal platforms. This paper is mainly focusing on the characteristics analysis of various electromagnetic shielding materials by utilizing the various shielding effectiveness (SE) measuring methods developed by TDK and ASTM (ASTM D4935). We also adopt the electromagnetic interference (EMI) testing methods developed by IEC for chip level (IEC 61967-3 and IEC 61967-6) to investigate the characteristics and distribution of EMI noise sources. To effectively shield the electric, magnetic, or electromagnetic field originated from noise source, we thus analyze the shielding capability for various materials with different measuring methods. Finally, we will show the EMI reduction and RF performance improvement with implementation of shielding material on module under investigated. With the systematic measurement and analysis described in this paper, we can further identify the related EMI problem and resolve the severe chip or module level EMC problem more effectively.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"20 1","pages":"44-53"},"PeriodicalIF":0.0,"publicationDate":"2016-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87621483","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
To Design a Cascode LNA by Using Channel-Length-Split Device with Constant-gm in a 0.35 μm Silicon CMOS Technology 在0.35 μm硅CMOS工艺中,采用恒定gm的通道长度分割器件设计Cascode LNA
The Open Materials Science Journal Pub Date : 2016-07-15 DOI: 10.2174/1874088X01610010079
Jui-Lin Lai, Ting-You Lin, Cheng-Fang Tai, Rong-Jian Chen
{"title":"To Design a Cascode LNA by Using Channel-Length-Split Device with Constant-gm in a 0.35 μm Silicon CMOS Technology","authors":"Jui-Lin Lai, Ting-You Lin, Cheng-Fang Tai, Rong-Jian Chen","doi":"10.2174/1874088X01610010079","DOIUrl":"https://doi.org/10.2174/1874088X01610010079","url":null,"abstract":"Abstract: In the paper, the folded-cascode low-noise operational amplifier (LNA) with constant-gm is proposed and analyzed. The channel-length split technique adopted to expand ratio of W/L of the differential pair transistor to improve the performance of LNA for the gain bandwidth product, noise and offset voltage. The channel-length split method is separated differential input transistor into 2 transistors in series. The area of the transistor (W, L) can be properly increased to effectively decrease the flick noise. The double indirect-frequency compensation technique and the clamping circuit are adopted in amplifier to increase the bandwidth. The proposed two sets input differential pair can be provided a constant-gm value and rail-to-rail swing during the operating region. The floating-point structure is used to reach rail-to-rail swing at output stage. Simulation results show that the gain, constant-gm in input stag, noise, offset-voltage, PSRR, CMRR and ICMR of amplifier are improved. The characteristics of LNA are successfully verified by the TSMC 0.35um 2P4M CMOS technology. There have a great potential in the VLSI implementation used in the portable electronic and bio-medicine product applications.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"16 1","pages":"79-88"},"PeriodicalIF":0.0,"publicationDate":"2016-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90171938","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Nanocontact Printing of Aminosilane for Bio-Device Fabrications 用于生物器件制造的氨基硅烷纳米接触印刷
The Open Materials Science Journal Pub Date : 2016-07-15 DOI: 10.2174/1874088X01610010070
K. Lam, F. Huang, L. W. Chen
{"title":"Nanocontact Printing of Aminosilane for Bio-Device Fabrications","authors":"K. Lam, F. Huang, L. W. Chen","doi":"10.2174/1874088X01610010070","DOIUrl":"https://doi.org/10.2174/1874088X01610010070","url":null,"abstract":"Nanocontact printing using hydrogen silsesquioxane (HSQ) soft stamps is studied for nanobio device fabrications in this work. The stamps with designed linewidth 80-200 nm were fabricated by low-dose e-beam lithography on HSQ films. The contact printing technique by using aminosilane as the ink on O2 plasma treated HSQ/Si substrates was developed. The plasma treatment, stamping force and stamping time were manipulated, and afterwards the transferred patterns were examined by the utilization of atomic force microscope and scanning electron microscope. Experimental results demonstrate that the nano-features on the HSQ stamps can be successfully transferred onto the substrates and passed a 3M tape peeling test under specific conditions in the range of 100-200 W O2 plasma treatment for 30 s. Nanolines with printed linewidth 97-205 nm were obtained. The nanopatterning of an antibody affinipure goat anti-mouse IgG(H+L) was also demonstrated onto the transferred aminosilane pattern surfaces for biodevice fabrication.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"3 2 1","pages":"70-78"},"PeriodicalIF":0.0,"publicationDate":"2016-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89076712","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
PL Intensity and Life-Time Enhancements of the n-GaN Light-Emitting Diode During the Device Fabrication 器件制造过程中n-GaN发光二极管的发光强度和寿命增强
The Open Materials Science Journal Pub Date : 2016-07-15 DOI: 10.2174/1874088X01610010020
Shen-Li Chen, Chin-Chai Chen, Y. Lai, W. Chiang, Hung-Wei Chen
{"title":"PL Intensity and Life-Time Enhancements of the n-GaN Light-Emitting Diode During the Device Fabrication","authors":"Shen-Li Chen, Chin-Chai Chen, Y. Lai, W. Chiang, Hung-Wei Chen","doi":"10.2174/1874088X01610010020","DOIUrl":"https://doi.org/10.2174/1874088X01610010020","url":null,"abstract":"In this study, a thermal annealing process was used for evaluating the recovering effect of the surface bombardment in the plasma etching process. After inductively coupled plasma (ICP) etching, the n-GaN samples were heated and annealed in an N2 ambient, which influenced the electrical and photonic characteristics of the devices under test. Eventually, it showed that the resistance improved after the annealing treatment, particularly at a temperature of 550 °C. Furthermore, photoluminescence (and emission-intensity degradation) measurements yielded the same results for these n-GaN LED samples, which increased to 200% (8%) of that of a nonannealing reference group at this annealing temperature. However, this annealing treatment did not completely repair the luminescence intensity and emission life-time because of the formation of deep-level point defects on the n-GaN sample surface during the fabrication process.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"6 1","pages":"20-28"},"PeriodicalIF":0.0,"publicationDate":"2016-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84579901","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Taste Sensors with Conductivity Measurement 具有电导率测量的味觉传感器
The Open Materials Science Journal Pub Date : 2016-07-15 DOI: 10.2174/1874088X01610010037
Hung-Wei Chen, Yi-Mu Lee, Shen-Li Chen
{"title":"The Taste Sensors with Conductivity Measurement","authors":"Hung-Wei Chen, Yi-Mu Lee, Shen-Li Chen","doi":"10.2174/1874088X01610010037","DOIUrl":"https://doi.org/10.2174/1874088X01610010037","url":null,"abstract":"There are many types of electrical signal that can be sensed from liquid solution. Among them conductivity signal is more suitable than voltage signal for the study of liquid. Thus, we choose conductivity as the target sense signal for the study of taste sensors. We developed a chemical sensors array with seven chemical sensors. There are two groups in the designed sensors. The first group is mainly made by the material of conductive polymer, the second group is made by the material of bio-mimic. A statistical method call “Principal Component Analysis” (PCA) is used to process the job of classified the tastes. The PCA results show the taste sensors array can distinguish four basic tastes in liquid. The experiment results show that four basic tastes are successful classified by principal component analysis. Six sport drinks are identified and classified in salt area. The results also show that quantities of salt sample can be analyzed by PCA method.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"23 1","pages":"37-43"},"PeriodicalIF":0.0,"publicationDate":"2016-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79326672","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design Ratio-Memory Cellular Neural Network (RMCNN) in CMOS Circuit Used in Association-Memory Applications for 0.25 mm Silicon Technology 设计用于关联存储器应用的0.25毫米硅制CMOS电路中的比率记忆细胞神经网络(RMCNN)
The Open Materials Science Journal Pub Date : 2016-07-15 DOI: 10.2174/1874088X01610010054
Jui-Lin Lai, Chung-Yu Wu
{"title":"Design Ratio-Memory Cellular Neural Network (RMCNN) in CMOS Circuit Used in Association-Memory Applications for 0.25 mm Silicon Technology","authors":"Jui-Lin Lai, Chung-Yu Wu","doi":"10.2174/1874088X01610010054","DOIUrl":"https://doi.org/10.2174/1874088X01610010054","url":null,"abstract":"Abstract: The paper is proposed the Ratio-Memory Cellular Neural Network (RMCNN) that structure with the self-feedback and the modified Hebbian learning algorithm. The learnable RMCNN architecture was designed and realized in CMOS technology for associative memory neural network applications. The exemplar patterns can be learned and correctly recognized the output patterns for the proposed system. Only self-output pixel value in A template and B template weights are updated by the nearest neighboring five elements for all test input exemplar patterns. The learned ratio weights of the B template are generated that the catch weights are performed the summation of absolute coefficients operation to enhance the feature of recognized pattern. Simulation results express that the system can be learned some exemplar patterns with noise and recognized the correctly pattern. The 9×9 RMCNN structure with self-feedback and the modified Hebbian learning algorithm is implemented and verified in the CMOS circuits for TSMC 0.25 μm 1P5M VLSI technology. The proposed RMCNN have more learning and recognition capability for the variant exemplar patterns in the auto-associative memory neural system applications.","PeriodicalId":22791,"journal":{"name":"The Open Materials Science Journal","volume":"30 1","pages":"54-69"},"PeriodicalIF":0.0,"publicationDate":"2016-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73710541","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
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